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11. 发明申请

US20110192975A1 SELECTABLE COULOMB APERTURE IN E-BEAM SYSTEM 有权
标题翻译：电子束系统中可选择的COULOMB孔
公开(公告)号：US20110192975A1
公开(公告)日：2011-08-11
申请号：US13012710
申请日：2011-01-24
申请人： ZHONGWEI CHEN
发明人： ZHONGWEI CHEN
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/09 , H01J37/15 , H01J2237/0453 , H01J2237/0458
摘要： A selectable Coulomb aperture in charged particle system comprises a non-magnetic conductive plate with a plurality of holes therein. The plurality of holes has variant sizes or diameters to select different beam currents of primary beam in the charged particle system. The charged particle system may include a charged particle source for emitting a primary beam, a condenser lens for receiving the primary beam and condensing the primary beam, an objective lens for receiving the primary beam and focusing the primary beam on a surface of a specimen. The selectable Coulomb aperture is positioned between the charged particle source and the condenser lens.
摘要翻译：带电粒子系统中的可选择的库仑孔径包括其中具有多个孔的非磁性导电板。多个孔具有不同的尺寸或直径，以在带电粒子系统中选择主波束的不同束流。带电粒子系统可以包括用于发射主光束的带电粒子源，用于接收主光束并聚光主光束的聚光透镜，用于接收主光束并将主光束聚焦在样本表面上的物镜。可选择的库仑孔位于带电粒子源和聚光透镜之间。

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