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    • 20. 发明授权
    • Semiconductor device and method for fabricating the same
    • 半导体装置及其制造方法
    • US07602055B2
    • 2009-10-13
    • US11390200
    • 2006-03-28
    • Keiji NosakaYoshitaka Aiba
    • Keiji NosakaYoshitaka Aiba
    • H01L23/02
    • H01L23/3114H01L21/561H01L23/24H01L24/10H01L2924/01078H01L2924/01079H01L2924/3025
    • A semiconductor device with a WLP structure that enables the improvement of heat resistance. A dam layer which spreads over a PI film and an Si substrate for a chip is formed between the Si substrate and a sealing resin so as to surround the chip on all sides. A material for the dam layer is selected so that good adhesion will be obtained between the dam layer and the Si substrate, between the dam layer and the PI film, and between the dam layer and the sealing resin. As a result, even if a crack appears at a portion on a side of the semiconductor device where the Si substrate and the sealed resin are joined in a heating environment, the crack does not run inside the dam layer. This prevents the peeling of the sealing resin or peeling inside the chip and the performance of the semiconductor device is maintained.
    • 具有能够提高耐热性的WLP结构的半导体器件。 在Si衬底和密封树脂之间形成有在PI膜上形成的阻挡层和用于芯片的Si衬底,以便在所有侧面上包围芯片。 选择用于坝层的材料,使得在坝层和Si衬底之间,在阻挡层和PI膜之间以及在坝层和密封树脂之间将获得良好的粘合性。 结果,即使在Si基板和密封树脂在加热环境下接合的半导体器件的一侧的部分处出现裂纹,裂纹也不会在堤层内部流动。 这防止了密封树脂的剥离或芯片内的剥离,并且保持了半导体器件的性能。