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    • 12. 发明授权
    • Inkjet head
    • 喷墨头
    • US07156501B2
    • 2007-01-02
    • US10913442
    • 2004-08-09
    • Atsushi HirotaMikio Sakuma
    • Atsushi HirotaMikio Sakuma
    • B41J2/045
    • B41J2/14209B41J2002/14217B41J2002/14225B41J2002/14459B41J2202/20
    • Pressure chambers arranged in the form of a matrix along a plane form first and second pressure chamber columns arranged alternately in the plane and having nozzles connected on opposite sides respectively. Two adjacent pressure chamber columns constituted by a first pressure chamber column and a second pressure chamber column are arranged opposite to each common ink path. First connection holes formed in the pressure chambers of the first pressure chamber column and connected to nozzles and second connection holes formed in the pressure chambers of the second pressure chamber column and connected to nozzles are arranged side by side on opposite sides of a corresponding common ink path. Between two adjacent common ink paths, first connection holes and second connection holes are arranged on a column.
    • 沿着平面以矩阵形式布置的压力室形成在平面中交替布置并且分别在相对侧连接有喷嘴的第一和第二压力室列。 由第一压力室列和第二压力室列构成的两个相邻的压力室列布置成与每个常用油墨通道相对。 形成在第一压力室列的压力室中并与喷嘴连接的第一连接孔和形成在第二压力室列的压力室中并连接到喷嘴的第二连接孔并排布置在相应的公共墨水的相对侧上 路径。 在两个相邻的公共墨道之间,第一连接孔和第二连接孔布置在列上。
    • 13. 发明申请
    • Wafer observation position designating apparatus and wafer display position designating method
    • 晶圆观察位置指定装置和晶圆显示位置指定方法
    • US20050105790A1
    • 2005-05-19
    • US10493865
    • 2001-11-06
    • Hiroyuki YasutomiMikio SakumaHirofumi Shimoda
    • Hiroyuki YasutomiMikio SakumaHirofumi Shimoda
    • H01L21/00H01L21/68G06K9/00
    • H01L21/67259H01L21/681
    • A wafer observation position designating apparatus and a wafer display position designating method for moving a wafer quickly to a desired observation position before the wafer surface is observed. The apparatus comprises imaging means for imaging the surface of a wafer, display means for displaying the image picked up by the imaging means, input means for inputting position information by designating an arbitrary position displayed by the display means, by using the display position on the display means, conversion means for converting the inputted position information into positional information on the position of the wafer surface, and moving means for moving the display position on the basis of the converted positional information. The apparatus displays the image in the displayed position moved.
    • 晶片观察位置指定装置和晶片显示位置指定方法,用于在晶片表面被观察之前将晶片快速移动到期望的观察位置。 该装置包括用于对晶片表面进行成像的成像装置,用于显示由成像装置拾取的图像的显示装置,用于通过使用显示装置上的显示位置指定由显示装置显示的任意位置来输入位置信息的输入装置 显示装置,用于将输入的位置信息转换成关于晶片表面的位置的位置信息的转换装置,以及用于基于转换的位置信息移动显示位置的移动装置。 该设备将显示的图像显示在移动的位置。