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11. 发明申请

US20070163716A1 Gas distribution apparatuses and methods for controlling gas distribution apparatuses 审中-公开
标题翻译：用于控制气体分配装置的气体分配装置和方法
公开(公告)号：US20070163716A1
公开(公告)日：2007-07-19
申请号：US11335455
申请日：2006-01-19
申请人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Lawrance Sheu
发明人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Lawrance Sheu
IPC分类号： H01L21/306 , C23F1/00 , C23C16/00
CPC分类号： C23C16/45565 , H01J37/3244 , H01J37/32449
摘要： A gas distribution apparatus includes a first plate and a second plate comprising a plurality of first openings and second openings, respectively. The second plate is disposed in overlapping relation with the first plate. Overlaps of the first openings and the second openings form third openings, which provide a first gas distribution pattern at a first orientation of the plates relative to one another and a second gas distribution pattern at a second orientation different than the first orientation.
摘要翻译：气体分配装置包括分别包括多个第一开口和第二开口的第一板和第二板。第二板与第一板重叠设置。第一开口和第二开口的重叠形成第三开口，第三开口提供第一气体分布图案，该第一气体分布图案在板的相对于彼此的第一取向和第二取向不同于第一取向的第二气体分配图案。

12. 发明申请

US20070068804A1 PVD TARGET WITH END OF SERVICE LIFE DETECTION CAPABILITY 有权
标题翻译： PVD目标终止服务生命检测能力
公开(公告)号：US20070068804A1
公开(公告)日：2007-03-29
申请号：US11427618
申请日：2006-06-29
申请人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Lawrance Sheu
发明人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Lawrance Sheu
IPC分类号： C23C14/00
CPC分类号： C23C14/3407 , C23C14/3414 , H01J37/3435 , H01J37/3479 , H01J37/3482 , Y10T29/49826 , Y10T29/4998
摘要： A PVD target structure for use in physical vapor deposition. The PVD target structure includes a consumable slab of source material and one or more detectors for indicating when the slab of source material is approaching or has been reduced to a given quantity representing a service lifetime endpoint of the target structure. Each detector includes an enclosure which may be made by forming a plurality of bores in a bulk material and separating the bulk material into a plurality of discrete enclosure units each including one of the bores. Alternatively, the enclosure of the detector may be made using a mold having one or more mold members and an extrusion, casting, electrical chemical plating, and/or sheet forming method.
摘要翻译：用于物理气相沉积的PVD靶结构。 PVD目标结构包括源材料的可消耗板和一个或多个检测器，用于指示源材料的板块何时接近或已经被减少到表示目标结构的使用寿命端点的给定量。每个检测器包括可以通过在散装材料中形成多个孔并将散装材料分离成多个分立的包围单元而构成的外壳，每个孔包括孔中的一个。或者，检测器的外壳可以使用具有一个或多个模具构件的模具和挤出，铸造，电化学镀和/或片材成型方法来制造。

13. 发明申请

US20070068796A1 METHOD OF USING A TARGET HAVING END OF SERVICE LIFE DETECTION CAPABILITY 审中-公开
标题翻译：使用具有终点服务终点检测能力的目标的方法
公开(公告)号：US20070068796A1
公开(公告)日：2007-03-29
申请号：US11463406
申请日：2006-08-09
申请人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Lawrance Sheu
发明人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Lawrance Sheu
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407 , H01J37/3435 , H01J37/3479 , H01J37/3482
摘要： A method and system for detecting a lifetime of a slab of consumable material used by a process tool. In the method and system, the slab of consumable material is provided with at least one indicator. A determination is made as to whether a value of a signal generated by a detector associated with the at least one indicator during operation of the process tool is equal to a warning setting value, is between the warning setting value and an alarm setting value, is equal to an alarm setting value, or is above the alarm setting value. A first warning is provided if the value of the signal is equal to the warning setting value or between the warning setting value and the alarm setting value, the first warning indicating that the slab of consumable material is approaching a predetermined quantity which is less than an original quantity of the slab of consumable material. A second warning is provided if the value of the signal is between the warning setting value and the alarm setting value, the second warning indicating that the slab of consumable material is approaching the predetermined quantity. An alarm is provided if the value of the signal is equal to the alarm setting value or above the alarm setting value, the alarm indicating that the slab of consumable material is approaching the predetermined quantity or has been reduced to the predetermined quantity.
摘要翻译：一种用于检测由加工工具使用的消耗材料的板坯的寿命的方法和系统。在该方法和系统中，消耗材料板具有至少一个指示器。确定在处理工具的操作期间由与至少一个指示器相关联的检测器产生的信号的值是否等于警告设置值，在警告设置值和报警设置值之间是否为等于报警设定值，或高于报警设定值。如果信号的值等于警告设定值或者在警告设定值和警报设定值之间，则提供第一警告，第一警告指示消耗材料的平板接近预定量小于消耗材料板坯的原始数量。如果信号值在警告设定值和报警设定值之间，则第二警告提供，第二警告指示消耗材料的板坯接近预定量。如果信号的值等于报警设定值或报警设定值以上，则指示消耗材料的板坯接近预定量或已经减少到预定量的报警。

14. 发明授权

US08109407B2 Apparatus for storing substrates 有权
标题翻译：用于存储基板的装置
公开(公告)号：US08109407B2
公开(公告)日：2012-02-07
申请号：US11755508
申请日：2007-05-30
申请人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Jui-Pin Hung , Ming-Shih Yeh
发明人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Jui-Pin Hung , Ming-Shih Yeh
IPC分类号： B65D45/28 , B65D53/06
CPC分类号： H01L21/67373 , H01L21/67376 , H01L21/67389
摘要： An apparatus includes an enclosure and a door configured to seal the enclosure. The door includes a plate. A rotational apparatus is disposed over the plate. At least one first member with a first arm extends from a first rib of the first member. At least one second member with a second arm extends from a second rib of the second member. The first and second arms are connected to the rotational apparatus. At least one corner member has a first edge. The first edge has a shape corresponding to a shape of a corner of the frame. The corner member is connected to a first end of the third arm. A second end of the third arm is connected to the rotational apparatus. A sealing material is disposed along a first longitudinal side of the first rib and a second longitudinal side of the second rib.
摘要翻译：一种装置包括外壳和构造成密封外壳的门。门包括一个板。旋转装置设置在板上。具有第一臂的至少一个第一构件从第一构件的第一肋延伸。具有第二臂的至少一个第二构件从第二构件的第二肋延伸。第一和第二臂连接到旋转装置。至少一个角部件具有第一边缘。第一边缘具有与框架的角部的形状对应的形状。角部件连接到第三臂的第一端。第三臂的第二端连接到旋转装置。密封材料沿着第一肋的第一纵向侧面和第二肋的第二纵向侧面设置。

15. 发明申请

US20080298933A1 SUBSTRATE CARRIER, PORT APPARATUS AND FACILITY INTERFACE AND APPARATUS INCLUDING SAME 有权
标题翻译：底板承载器，端口装置和设备接口以及包括其中的设备
公开(公告)号：US20080298933A1
公开(公告)日：2008-12-04
申请号：US11754789
申请日：2007-05-29
申请人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Fu-Kang Tien , Jui-Pin Hung
发明人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Fu-Kang Tien , Jui-Pin Hung
IPC分类号： H01L21/00
CPC分类号： H01L21/67017 , H01L21/67393 , H01L21/67772
摘要： An apparatus includes a first enclosure, a first door, at least one first valve, at least one inlet diffuser and at least one substrate holder. The first enclosure has a first opening. The first door is configured to seal the first opening. The first valve is coupled to the first enclosure. The inlet diffuser is coupled to the first valve and configured to provide a first gas with a temperature substantially higher than a temperature of an environment around the first enclosure. Each substrate holder disposed within the first enclosure supports at least one substrate.
摘要翻译：一种装置包括第一外壳，第一门，至少一个第一阀，至少一个入口扩散器和至少一个基板支架。第一个外壳具有第一个开口。第一个门被配置为密封第一个开口。第一阀联接到第一外壳。入口扩散器联接到第一阀并且被配置为提供具有基本上高于围绕第一外壳的环境的温度的温度的第一气体。设置在第一外壳内的每个衬底保持器支撑至少一个衬底。

16. 发明申请

US20090317214A1 NOVEL WAFER'S AMBIANCE CONTROL 有权
标题翻译：新浪潮的安全控制
公开(公告)号：US20090317214A1
公开(公告)日：2009-12-24
申请号：US12435861
申请日：2009-05-05
申请人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Ming-che Ho , Chien-Ling Hwang , Jui-Pin Hung
发明人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Ming-che Ho , Chien-Ling Hwang , Jui-Pin Hung
IPC分类号： H01L21/00 , H01L21/677 , H01L21/67 , B65D81/26 , F25B29/00
CPC分类号： H01L21/67772 , H01L21/67017 , Y10S414/135
摘要： A semiconductor manufacturing system, an interface system, a carrier, and a method for providing an ambient controlled environment is disclosed. The semiconductor manufacturing system comprises a plurality of process chambers; at least one interface system, wherein the interface system includes a first ambient control element; at least one carrier, wherein the carrier comprises a second ambient control element; and a control module coupled to the plurality of process chambers, the at least one interface system, and the at least one carrier.
摘要翻译：公开了一种半导体制造系统，接口系统，载体和用于提供环境受控环境的方法。半导体制造系统包括多个处理室; 至少一个接口系统，其中所述接口系统包括第一环境控制元件; 至少一个载体，其中载体包括第二环境控制元件; 以及耦合到所述多个处理室，所述至少一个接口系统和所述至少一个载体的控制模块。

17. 发明申请

US20080295412A1 APPARATUS FOR STORING SUBSTRATES 有权
标题翻译：储存基材的装置
公开(公告)号：US20080295412A1
公开(公告)日：2008-12-04
申请号：US11755508
申请日：2007-05-30
申请人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Jui-Pin Hung , Ming-Shih Yeh
发明人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Jui-Pin Hung , Ming-Shih Yeh
IPC分类号： E06B7/16 , H01L21/00
CPC分类号： H01L21/67373 , H01L21/67376 , H01L21/67389
摘要： An apparatus includes an enclosure and a door configured to seal the enclosure. The door includes a plate. A rotational apparatus is disposed over the plate. At least one first member with a first arm extends from a first rib of the first member. At least one second member with a second arm extends from a second rib of the second member. The first and second arms are connected to the rotational apparatus. At least one corner member has a first edge. The first edge has a shape corresponding to a shape of a corner of the frame. The corner member is connected to a first end of the third arm. A second end of the third arm is connected to the rotational apparatus. A sealing material is disposed along a first longitudinal side of the first rib and a second longitudinal side of the second rib.
摘要翻译：一种装置包括外壳和构造成密封外壳的门。门包括一个板。旋转装置设置在板上。具有第一臂的至少一个第一构件从第一构件的第一肋延伸。具有第二臂的至少一个第二构件从第二构件的第二肋延伸。第一和第二臂连接到旋转装置。至少一个角部件具有第一边缘。第一边缘具有与框架的角部的形状对应的形状。角部件连接到第三臂的第一端。第三臂的第二端连接到旋转装置。密封材料沿着第一肋的第一纵向侧面和第二肋的第二纵向侧面设置。

18. 发明授权

US08827695B2 Wafer's ambiance control 有权
标题翻译：晶圆的氛围控制
公开(公告)号：US08827695B2
公开(公告)日：2014-09-09
申请号：US12435861
申请日：2009-05-05
申请人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Ming-che Ho , Chien-Ling Hwang , Jui-Pin Hung
发明人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Ming-che Ho , Chien-Ling Hwang , Jui-Pin Hung
IPC分类号： F27D15/00 , H01L21/677 , H01L21/67
CPC分类号： H01L21/67772 , H01L21/67017 , Y10S414/135
摘要： A semiconductor manufacturing system, an interface system, a carrier, and a method for providing an ambient controlled environment is disclosed. The semiconductor manufacturing system comprises a plurality of process chambers; at least one interface system, wherein the interface system includes a first ambient control element; at least one carrier, wherein the carrier comprises a second ambient control element; and a control module coupled to the plurality of process chambers, the at least one interface system, and the at least one carrier.
摘要翻译：公开了一种半导体制造系统，接口系统，载体和用于提供环境受控环境的方法。半导体制造系统包括多个处理室; 至少一个接口系统，其中所述接口系统包括第一环境控制元件; 至少一个载体，其中载体包括第二环境控制元件; 以及耦合到所述多个处理室，所述至少一个接口系统和所述至少一个载体的控制模块。

19. 发明授权

US07758338B2 Substrate carrier, port apparatus and facility interface and apparatus including same 有权
标题翻译：基板载体，端口装置和设备接口及包括其的设备
公开(公告)号：US07758338B2
公开(公告)日：2010-07-20
申请号：US11754789
申请日：2007-05-29
申请人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Fu-Kang Tien , Jui-Pin Hung
发明人： Yi-Li Hsiao , Chen-Hua Yu , Jean Wang , Fu-Kang Tien , Jui-Pin Hung
IPC分类号： F27B5/16
CPC分类号： H01L21/67017 , H01L21/67393 , H01L21/67772
摘要： An apparatus includes a first enclosure, a first door, at least one first valve, at least one inlet diffuser and at least one substrate holder. The first enclosure has a first opening. The first door is configured to seal the first opening. The first valve is coupled to the first enclosure. The inlet diffuser is coupled to the first valve and configured to provide a first gas with a temperature substantially higher than a temperature of an environment around the first enclosure. Each substrate holder disposed within the first enclosure supports at least one substrate.
摘要翻译：一种装置包括第一外壳，第一门，至少一个第一阀，至少一个入口扩散器和至少一个基板支架。第一个外壳具有第一个开口。第一个门被配置为密封第一个开口。第一阀联接到第一外壳。入口扩散器联接到第一阀并且被配置为提供具有基本上高于围绕第一外壳的环境的温度的温度的第一气体。设置在第一外壳内的每个衬底保持器支撑至少一个衬底。

20. 发明申请

US20060023395A1 Systems and methods for temperature control of semiconductor wafers 审中-公开
标题翻译：半导体晶圆温度控制系统和方法
公开(公告)号：US20060023395A1
公开(公告)日：2006-02-02
申请号：US11085354
申请日：2005-03-21
申请人： Yi-Li Hsiao , Tse-Yi Chen , Jerry Hwang , Chin-Hsin Peng , Jean Wang , Chen-Hua Yu
发明人： Yi-Li Hsiao , Tse-Yi Chen , Jerry Hwang , Chin-Hsin Peng , Jean Wang , Chen-Hua Yu
IPC分类号： H01T23/00
CPC分类号： H01L21/6831 , H01L21/67109
摘要： Systems and methods for temperature control of semiconductor wafers are provided. An exemplary embodiment of semiconductor wafer is held by an electrostatic chuck. An exemplary embodiment of system includes a cooling apparatus connecting the electrostatic chuck. The cooling apparatus comprises an inlet, an outlet, a porous flow layer, a porous contact layer contacting the electrostatic chuck, and a porous heat exchange layer disposed between the flow layer and the contact layer. The inlet communicates with the flow layer, and the outlet communicates with the contact layer. The fluid medium is introduced into the flow layer from the inlet and sequentially flows through the heat exchange layer and the contact layer. The fluid medium is discharged from the contact layer through the outlet, thereby exchanging heat from the semiconductor wafer.
摘要翻译：提供了用于半导体晶片温度控制的系统和方法。半导体晶片的示例性实施例由静电卡盘保持。系统的示例性实施例包括连接静电卡盘的冷却装置。冷却装置包括入口，出口，多孔流动层，与静电卡盘接触的多孔接触层和设置在流动层和接触层之间的多孔热交换层。入口与流动层连通，出口与接触层连通。流体介质从入口引入流层，并依次流过热交换层和接触层。流体介质通过出口从接触层排出，从而交换来自半导体晶片的热量。

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