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11. 发明授权

US08663876B2 Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same 有权
标题翻译：光掩模坯料，其制造方法，光掩模及其制造方法
公开(公告)号：US08663876B2
公开(公告)日：2014-03-04
申请号：US13201368
申请日：2010-02-04
申请人： Masahiro Hashimoto , Toshiyuki Suzuki , Hiroyuki Iwashita
发明人： Masahiro Hashimoto , Toshiyuki Suzuki , Hiroyuki Iwashita
IPC分类号： C23C16/34 , G03F1/22
CPC分类号： G03F1/50 , G03F1/32 , G03F1/54
摘要： A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon and comprising silicon carbide and/or a transition metal carbide.
摘要翻译：用于制造适用于具有200nm以下的波长的曝光光的光掩模的光掩模坯料在透明基板上具有薄膜。薄膜由含有过渡金属，硅和碳的材料制成，并且包含碳化硅和/或过渡金属碳化物。

12. 发明授权

US08663875B2 Method of manufacturing a photomask 有权
标题翻译：制造光掩模的方法
公开(公告)号：US08663875B2
公开(公告)日：2014-03-04
申请号：US13201148
申请日：2010-01-29
申请人： Yasushi Okubo , Toshiyuki Suzuki , Masahiro Hashimoto
发明人： Yasushi Okubo , Toshiyuki Suzuki , Masahiro Hashimoto
IPC分类号： G03F1/48
CPC分类号： G03F1/48 , G03F1/32 , G03F1/54
摘要： A thin film composed of a material containing a metal and silicon is formed on a transparent substrate, and a thin film pattern is formed by patterning the thin film. Then, the main surface and the side walls of the thin film pattern are previously modified so as to prevent the transfer characteristics of the thin film pattern from changing more than predetermined even in the case where exposure light with a wavelength of 200 nm or less is cumulatively applied onto the thin film pattern which has been formed. The main surface and the side walls are modified by, for instance, performing heat treatment to the main surface and the side walls at 450-900° C. in the atmosphere containing oxygen.
摘要翻译：在透明基板上形成由含有金属和硅的材料构成的薄膜，通过图案化薄膜形成薄膜图案。然后，预先修改薄膜图案的主表面和侧壁，以便即使在波长为200nm以下的曝光光为200nm以下的情况下，也能够防止薄膜图案的转印特性变化超过规定累积地施加到已经形成的薄膜图案上。主表面和侧壁通过例如在含有氧的气氛中在450-900℃下对主表面和侧壁进行热处理而进行改性。

13. 发明授权

US08659305B2 Detection device for detecting impedance of sensor element in gas sensor and sensor unit equipped with detection device 有权
标题翻译：用于检测气体传感器中传感器元件阻抗的检测装置和配备检测装置的传感器单元
公开(公告)号：US08659305B2
公开(公告)日：2014-02-25
申请号：US13108091
申请日：2011-05-16
申请人： Toshiyuki Suzuki
发明人： Toshiyuki Suzuki
IPC分类号： G01R27/04 , G01R27/00 , G01R27/08
CPC分类号： G01N27/4065
摘要： In a sensor control circuit, an impedance signal output unit has a HPF, a P/H circuit, a LPF, etc., and detects an element impedance of a sensor element on the basis of an impedance response signal which is alternately changed in response to an alternating current signal supplied to the sensor element. The P/H circuit has an input comparator which inputs an impedance detection voltage Vz after the HPF, a rectifying element connected to the P/H circuit, and a hold capacitor which is charged by the output of the input comparator. The input comparator has a constant current circuit and a transistor. The constant current circuit limits an updating value of a hold voltage value Vph of the hold capacitor every alternating current period. The sensor control device detects the element impedance of the sensor element with high accuracy while preventing influence of noise.
摘要翻译：在传感器控制电路中，阻抗信号输出单元具有HPF，P / H电路，LPF等，并且基于响应中交替改变的阻抗响应信号来检测传感器元件的元件阻抗提供给传感器元件的交流信号。 P / H电路具有输入比较器，其在HPF之后输入阻抗检测电压Vz，连接到P / H电路的整流元件和由输入比较器的输出充电的保持电容器。输入比较器具有恒流电路和晶体管。恒流电路每交流电流限制保持电容器的保持电压值Vph的更新值。传感器控制装置以高精度检测传感器元件的元件阻抗，同时防止噪声的影响。

14. 发明授权

US08216742B2 Fuel cell and gas separator for fuel cell 有权
公开(公告)号：US08216742B2
公开(公告)日：2012-07-10
申请号：US12531366
申请日：2008-11-17
申请人： Yoshinori Yamamoto , Toshiyuki Suzuki , Haruyuki Aono , Junichi Shirahama
发明人： Yoshinori Yamamoto , Toshiyuki Suzuki , Haruyuki Aono , Junichi Shirahama
IPC分类号： H01M8/04 , H01M2/38
CPC分类号： H01M8/0254 , H01M8/0258 , H01M8/0265
摘要： In at least one of flow distribution areas 35 provided on a separator 15, plurality of first projections 46 formed in a region corresponding to a first section (parted regions 32a and 32c) of a center area (including parted regions 32a through 32c) having a relatively high flow rate of a first fluid (refrigerant) are designed to have a larger diameter of a cross section than plurality of first projections 46 formed in a region corresponding to a second section (parted region 32b) of the center area having a relatively low flow rate of the first fluid. This arrangement effectively attains a substantially uniform flow rate distribution of a fluid in a fluid flow path formed on a separator, which is configured to have concavo-convex structures formed in a mutually reversed relation on two opposed sides thereof.

15. 发明授权

US08100491B2 Liquid jet apparatus and printing apparatus 有权
公开(公告)号：US08100491B2
公开(公告)日：2012-01-24
申请号：US11780357
申请日：2007-07-19
申请人： Atsushi Oshima , Kunio Tabata , Toshiyuki Suzuki , Osamu Shinkawa , Tomoki Hatano
发明人： Atsushi Oshima , Kunio Tabata , Toshiyuki Suzuki , Osamu Shinkawa , Tomoki Hatano
IPC分类号： B41J29/38
摘要： A liquid jet apparatus includes a plurality of nozzles provided to the liquid jet head, an actuator provided corresponding to each of the nozzles, drive unit that applies a drive signal to the actuator, drive waveform signal generation unit that generates a drive waveform signal providing a reference of a signal for controlling the actuator, modulator unit that pulse-modulates the drive waveform signal generated by the drive waveform signal generation unit, a digital power amplifier for power-amplifying the modulated signal, which is pulse-modulated by the modulator unit, and a low-pass filter provided individually corresponding to the actuator and for supplying the actuator with the power amplified modulated signal power-amplified by the digital power amplifier as a drive signal after smoothing.

16. 发明申请

US20110217635A1 METHOD OF MANUFACTURING TRANSFER MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：制造转移掩模的方法和制造半导体器件的方法
公开(公告)号：US20110217635A1
公开(公告)日：2011-09-08
申请号：US13122680
申请日：2010-10-08
申请人： Masahiro Hashimoto , Kazuya Sakai , Toshiyuki Suzuki , Kazunori Ono
发明人： Masahiro Hashimoto , Kazuya Sakai , Toshiyuki Suzuki , Kazunori Ono
IPC分类号： G03F1/00
CPC分类号： G03F1/46 , G03F1/54 , G03F1/80 , G03F1/82
摘要： The present invention is a method of manufacturing a transfer mask with use of a mask blank in which a thin film for pattern formation and a chromium-based thin film made of a material containing chromium are stacked on a transparent substrate in this order. The thin film for pattern formation is made of material containing silicon and a transition metal other than chromium. The chromium-based thin film is made of a material containing chromium. Exposure light having a wavelength of 200 nm or less is applied to the transfer mask. In the manufacturing method, the transfer mask is produced by performing, in the following order, a process of forming a resist film having a transfer pattern on the chromium-based thin film, a process of forming a transfer pattern in the chromium-based thin film with use of a mask of the resist film having the transfer pattern, a process of forming a transfer pattern in the thin film for pattern formation with use of a mask of the chromium-based thin film having the transfer pattern, and a process of removing the chromium-based thin film by etching. The manufacturing method further includes a cleaning process of at least one of alkali solution cleaning, hot water cleaning, and ozone-containing water cleaning on the produced transfer mask until a width of the transfer pattern of the thin film for pattern formation is reduced by 4 nm or a space width of the thin film for pattern formation is increased by 4 nm.
摘要翻译：本发明是一种使用掩模坯料制造转印掩模的方法，其中用于图案形成的薄膜和由含铬材料制成的铬基薄膜依次层叠在透明基板上。用于图案形成的薄膜由含有硅和除铬以外的过渡金属的材料制成。铬基薄膜由含铬的材料制成。将具有200nm以下波长的曝光光施加到转印掩模。在制造方法中，通过以下顺序，通过在铬系薄膜上形成具有转印图案的抗蚀剂膜的工序来制造转印掩模，在铬系薄膜中形成转印图案的工序使用具有转印图案的抗蚀剂膜的掩模的膜，使用具有转印图案的铬基薄膜的掩模在图案形成用薄膜中形成转印图案的工序，以及通过蚀刻去除铬基薄膜。该制造方法还包括在制造的转印掩模上进行碱溶液清洗，热水清洗和含臭氧水清洗中的至少一种的清洗处理，直到图案形成用薄膜的转印图案的宽度减少4 nm或用于图案形成的薄膜的空间宽度增加4nm。

17. 发明授权

US07981265B2 Gas concentration measuring apparatus designed to enhance measurement accuracy in desired range 有权
标题翻译：气体浓度测量仪设计用于提高所需范围内的测量精度
公开(公告)号：US07981265B2
公开(公告)日：2011-07-19
申请号：US11797961
申请日：2007-05-09
申请人： Tomoo Kawase , Eiichi Kurokawa , Satoshi Hada , Toshiyuki Suzuki , Katsuhide Akimoto
发明人： Tomoo Kawase , Eiichi Kurokawa , Satoshi Hada , Toshiyuki Suzuki , Katsuhide Akimoto
IPC分类号： G01N27/41
CPC分类号： G01N27/419 , F02D41/1454 , F02D41/28 , G01R1/203 , G01R15/08 , G01R19/0092
摘要： A gas concentration measuring apparatus for use in air-fuel ratio control of automotive engines is designed to determine the concentration of oxygen within a wide and a narrow range using a sensor current flowing through a sensor element. The apparatus includes an amplifier circuit equipped with an operational amplifier and a plurality of amplifying resistors and a switch. The switch is responsive to a request signal to switch a relation in electrical connection between an operational amplifier and the amplifying resistors to distribute the amplifying resistors into an input resistor and a feedback resistor for the operational amplifier to change an amplification factor of the amplifier circuit. This results in a change in resolution of measurement of the concentration of oxygen, thereby ensuring enhanced accuracy in determining the concentration of oxygen in a selected one of the narrow and wide ranges.
摘要翻译：用于汽车发动机的空燃比控制的气体浓度测量装置设计成使用流过传感器元件的传感器电流来确定宽范围和窄范围内的氧浓度。该装置包括配备有运算放大器和多个放大电阻器和开关的放大器电路。开关响应于请求信号以在运算放大器和放大电阻之间的电气连接中切换关系，以将放大电阻器分配到输入电阻器和用于运算放大器的反馈电阻器以改变放大器电路的放大系数。这导致测量氧浓度的分辨率的变化，从而确保在选定的窄范围和宽范围内确定氧气浓度的提高的准确性。

18. 发明授权

US07884652B2 Pulse signal generating device, transport device, image forming apparatus, and pulse generating method 有权
标题翻译：脉冲信号发生装置，输送装置，成像装置和脉冲发生方法
公开(公告)号：US07884652B2
公开(公告)日：2011-02-08
申请号：US12416234
申请日：2009-04-01
申请人： Toshiyuki Suzuki
发明人： Toshiyuki Suzuki
IPC分类号： H03K17/00 , G06F1/08
CPC分类号： H03K5/19 , B41J11/008 , G03G2215/0141 , G03G2215/0158
摘要： A pulse signal generating device includes: the plurality of encoders each of which outputs an encoder signal with a pulse period corresponding to the speed of an object to be detected; delay amount control unit that controls a relative delay amount with respect to a pulse signal for each of the plurality of pulse output signals output from the plurality of encoders; a detection unit that individually detects abnormalities in pulses of the plurality of encoder signals; a switching unit that performs switching to one pulse output signal, in which pulse abnormalities are not detected, of the plurality of pulse output signals; and a pulse generating unit that generates a pulse signal by delaying the one pulse output signal switched by the switching unit by the corresponding relative delay amount.
摘要翻译：脉冲信号发生装置包括：多个编码器，每个编码器以对应于待检测物体的速度的脉冲周期输出编码器信号; 延迟量控制单元，其对从所述多个编码器输出的所述多个脉冲输出信号中的每一个控制相对于脉冲信号的相对延迟量; 检测单元，其分别检测所述多个编码器信号的脉冲的异常; 切换单元，对所述多个脉冲输出信号进行不检测脉冲异常的一个脉冲输出信号的切换; 以及脉冲发生单元，通过将由开关单元切换的一个脉冲输出信号延迟相应的相对延迟量来产生脉冲信号。

19. 发明授权

US07873137B2 Reactivity control arrangement and fast reactor 有权
标题翻译：反应控制装置和快堆
公开(公告)号：US07873137B2
公开(公告)日：2011-01-18
申请号：US11672782
申请日：2007-02-08
申请人： Toshiyuki Suzuki , Koji Matsumoto , Kenzo Koizumi , Yasushi Tsuboi
发明人： Toshiyuki Suzuki , Koji Matsumoto , Kenzo Koizumi , Yasushi Tsuboi
IPC分类号： G21C7/00 , G21C19/00
CPC分类号： G21C1/02 , G21C7/10 , G21C7/28 , Y02E30/34 , Y02E30/39
摘要： A fast reactor including a reactivity control assembly including a reactor shutdown rod and neutron absorbers, a reactor shutdown rod drive mechanism, and units of neutron absorber drive mechanism. The reactor shutdown rod drive mechanism causes an inner extension tube to fall and release the reactor shutdown rod by a gripper section by turning off the power supply to a holding magnet at the time of scram. When grasping the neutron absorbers, an outer extension shaft is pulled up to allow both of the extension shafts to be inserted. After the outer extension tube gets to a handling head section of the neutron absorber, the outer extension shaft is pushed down to grasp the neutron absorber externally by latch fingers of the gripper section so that the neutron absorber can be moved up and down.
摘要翻译：一种快速反应器，包括反应性控制组件，其包括反应堆关闭棒和中子吸收剂，反应堆关闭棒驱动机构和中子吸收器驱动机构单元。反应堆关闭杆驱动机构通过在卡车时断开对保持磁体的电力使得内部延伸管通过夹持部分下落并释放反应堆关闭杆。当抓住中子吸收器时，拉出外延伸轴以允许两个延伸轴插入。在外延伸管到达中子吸收器的处理头部分之后，外延伸轴被向下推动以通过夹持器部分的闩锁指向外部抓住中子吸收器，使得中子吸收器能够上下移动。

20. 发明授权

US07833387B2 Mask blank manufacturing method and sputtering target for manufacturing the same 有权
标题翻译：掩模坯制造方法及其制造用溅射靶
公开(公告)号：US07833387B2
公开(公告)日：2010-11-16
申请号：US11029652
申请日：2005-01-06
申请人： Masaru Mitsui , Toshiyuki Suzuki
发明人： Masaru Mitsui , Toshiyuki Suzuki
IPC分类号： C23C14/35
CPC分类号： C23C14/3407 , C23C14/0641 , C23C14/225 , G03F1/32 , G03F1/68
摘要： A sputtering target for manufacturing a mask blank having a backing plate 5 where a portion for bonding a target member 4 is protruded like the convex with respect to a base portion 5′, and the target member 4 being formed to have a larger surface area than the area of the bonding portion of the backing plate 5 with extending from the bonding portion over a whole periphery with a bonding agent 30 interposed in-between, and further a metal 40 is deposited to a concave portion formed by a combination of the two structures in such a manner that the elution of the bonding agent 30 can be sealed.
摘要翻译：用于制造具有背板5的掩模坯料的溅射靶，其中用于接合目标构件4的部分相对于基部5'突出为凸起，并且目标构件4形成为具有比背衬板5的接合部分的区域从接合部分在整个周边上以介于其间的粘合剂30延伸，并且另外的金属40沉积到由两个结构的组合形成的凹部以这样的方式可以密封粘合剂30的洗脱。

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