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11. 发明申请

US20070058274A1 Illumination system for microlithography 有权
标题翻译：微光刻照明系统
公开(公告)号：US20070058274A1
公开(公告)日：2007-03-15
申请号：US10563175
申请日：2004-04-13
申请人： Wolfgang Singer , Joachim Wietzorrek , Joachim Hainz , Gabriele Weirauch , Manfred Maul
发明人： Wolfgang Singer , Joachim Wietzorrek , Joachim Hainz , Gabriele Weirauch , Manfred Maul
IPC分类号： G02B5/08
CPC分类号： G03F7/702 , G02B17/0647 , G03F7/70233 , G03F7/70358 , G21K1/06
摘要： The present invention relates to an illumination system for microlithography, especially for wavelengths ≦193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity, characterized in that a filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.
摘要翻译：本发明涉及用于微光刻的照明系统，特别是对于<= 193nm的波长，特别优选用于用至少一个光学积分器照射场平面中的场的EUV光刻，所述光学积分器将由光源发射的光束分成多个光通道各自具有光强度，其特征在于，在从光源到场平面的光路中提供滤光器，滤光器包括滤光元件，其以如下方式配置，使得光在过滤元件之后的光路中减少至少一个光通道。

12. 发明授权

US07362414B2 Optical system having an optical element that can be brought into at least two positions 失效
标题翻译：光学系统具有可以进入至少两个位置的光学元件
公开(公告)号：US07362414B2
公开(公告)日：2008-04-22
申请号：US11065327
申请日：2005-02-24
申请人： Wolfgang Singer , Joachim Hainz , Joachim Wietzorrek , Markus Weiss
发明人： Wolfgang Singer , Joachim Hainz , Joachim Wietzorrek , Markus Weiss
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G02B27/0006 , G02B17/0657 , G03F7/702 , G03F7/70233 , G03F7/70825 , G03F7/70925 , G03F7/70975
摘要： There is provided an optical system including an optical element having a first used area and a second used area on which impinge rays of a light bundle, and a device for moving the optical element between a first position and a second position. The light bundle impinges on the first used area when the optical element is in the first position, and light bundle impinges on the second used area when the optical element is in the second position.
摘要翻译：提供了一种光学系统，其包括具有第一使用区域的光学元件和光束的入射光线的第二使用区域，以及用于在第一位置和第二位置之间移动光学元件的装置。当光学元件处于第一位置时，光束照射在第一使用区域上，并且当光学元件处于第二位置时，光束照射在第二使用区域上。

13. 发明授权

US07911584B2 Illumination system for microlithography 有权
标题翻译：微光刻照明系统
公开(公告)号：US07911584B2
公开(公告)日：2011-03-22
申请号：US10563175
申请日：2004-04-13
申请人： Wolfgang Singer , Joachim Wietzorrek , Joachim Hainz , Gabriele Weirauch , Manfred Maul
发明人： Wolfgang Singer , Joachim Wietzorrek , Joachim Hainz , Gabriele Weirauch , Manfred Maul
IPC分类号： G03B27/54
CPC分类号： G03F7/702 , G02B17/0647 , G03F7/70233 , G03F7/70358 , G21K1/06
摘要： The present invention relates to an illumination system for microlithography, especially for wavelengths ≦193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity,characterized in thata filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.
摘要翻译：本发明涉及用于微光刻的照明系统，特别是对于波长为193nm的照明系统，特别优选用于用至少一个光学积分器照射场平面中的场的EUV光刻，所述光学积分器将由光源发射的光束分成多个光通道各自具有光强度，其特征在于，在从光源到场平面的光路中提供滤光器，滤光器包括滤光元件，其以如下方式配置，使得光在过滤元件之后的光路中减少至少一个光通道。

14. 发明申请

US20060001854A1 Optical system having an optical element that can be brought into at least two positions 失效
标题翻译：光学系统具有可以进入至少两个位置的光学元件
公开(公告)号：US20060001854A1
公开(公告)日：2006-01-05
申请号：US11065327
申请日：2005-02-24
申请人： Wolfgang Singer , Joachim Hainz , Joachim Wietzorrek , Markus Weiss
发明人： Wolfgang Singer , Joachim Hainz , Joachim Wietzorrek , Markus Weiss
IPC分类号： G03B27/54
CPC分类号： G02B27/0006 , G02B17/0657 , G03F7/702 , G03F7/70233 , G03F7/70825 , G03F7/70925 , G03F7/70975
摘要： There is provided an optical system including an optical element having a first used area and a second used area on which impinge rays of a light bundle, and a device for moving the optical element between a first position and a second position. The light bundle impinges on the first used area when the optical element is in the first position, and light bundle impinges on the second used area when the optical element is in the second position.
摘要翻译：提供了一种光学系统，其包括具有第一使用区域的光学元件和光束的入射光线的第二使用区域，以及用于在第一位置和第二位置之间移动光学元件的装置。当光学元件处于第一位置时，光束照射在第一使用区域上，并且当光学元件处于第二位置时，光束照射在第二使用区域上。

15. 发明申请

US20070283591A1 EUV-lithography apparatus having a chamber for cleaning an optical element 审中-公开
标题翻译：具有用于清洁光学元件的室的EUV光刻设备
公开(公告)号：US20070283591A1
公开(公告)日：2007-12-13
申请号：US11796475
申请日：2007-04-27
申请人： Wolfgang Singer , Joachim Hainz , Joachim Wietzorrek , Markus Weiss
发明人： Wolfgang Singer , Joachim Hainz , Joachim Wietzorrek , Markus Weiss
IPC分类号： F26B3/34
CPC分类号： G02B27/0006 , G02B17/0657 , G03F7/702 , G03F7/70233 , G03F7/70825 , G03F7/70925 , G03F7/70975
摘要： There is provided, a system that includes (a) a source of light having a wavelength of less than or equal to about 193 nm, (b) an optical element having a region for directing the light, (c) an arrangement for cleaning the region, and (d) a chamber to accommodate the region during the cleaning.
摘要翻译：提供了一种系统，其包括（a）波长小于或等于约193nm的光源，（b）具有用于引导光的区域的光学元件，（c）用于清洁区域，以及（d）在清洁期间容纳该区域的室。

16. 发明授权

US07551361B2 Lithography lens system and projection exposure system provided with at least one lithography lens system of this type 有权
标题翻译：具有这种类型的至少一个光刻透镜系统的光刻透镜系统和投影曝光系统
公开(公告)号：US07551361B2
公开(公告)日：2009-06-23
申请号：US10571267
申请日：2004-07-14
申请人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
发明人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
IPC分类号： G02B3/00
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
摘要翻译：用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。特别是可以涉及在照明系统中使用的投影物镜或中继物镜。成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。

17. 发明申请

US20070258134A1 Lithography Lens System And Projection Exposure System Provided With At Least One Lithography Lens System Of This Type 有权
标题翻译：光刻镜片系统和投影曝光系统提供了这种类型的至少一个平版镜片系统
公开(公告)号：US20070258134A1
公开(公告)日：2007-11-08
申请号：US10571267
申请日：2004-07-14
申请人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
发明人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
IPC分类号： G02B17/00
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
摘要翻译：用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。特别是可以涉及在照明系统中使用的投影物镜或中继物镜。成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。

18. 发明申请

US20070285644A1 Microlithographic Projection Exposure Apparatus 审中-公开
标题翻译：微光刻投影曝光装置
公开(公告)号：US20070285644A1
公开(公告)日：2007-12-13
申请号：US11575042
申请日：2005-09-13
申请人： Markus Brotsack , Markus Deguenther , Wilhelm Ulrich , Joachim Wietzorrek , Johannes Wangler , Heiko Feldmann , Andreas Zeiler
发明人： Markus Brotsack , Markus Deguenther , Wilhelm Ulrich , Joachim Wietzorrek , Johannes Wangler , Heiko Feldmann , Andreas Zeiler
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70066
摘要： An illumination system for a microlithographic projection exposure apparatus comprises a masking device and a masking objective which projects the masking device onto an image plane. The illumination system further includes an optical correction element having a surface that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane which precedes the image plane of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system in the image plane matches a principal ray distribution required by a projection objective.
摘要翻译：用于微光刻投影曝光装置的照明系统包括掩蔽装置和将掩模装置投影到图像平面上的掩蔽对象。照明系统还包括光学校正元件，其具有非球面形状的表面或支撑具有至少基本上非球面的作用的衍射结构。该表面至少大致布置在掩蔽对象的图像平面之前的场平面中。非球面作用表面被设计成使得由照明系统在图像平面中产生的主射线分布与投影所需的主射线分布相匹配目的。

19. 发明申请

US20100019157A1 Excitation and Imaging Optics for Fluorescence Detection 有权
标题翻译：激光和成像光学荧光检测
公开(公告)号：US20100019157A1
公开(公告)日：2010-01-28
申请号：US12506792
申请日：2009-07-21
申请人： Alan Furlan , Joachim Wietzorrek
发明人： Alan Furlan , Joachim Wietzorrek
IPC分类号： G01T1/20
CPC分类号： G02B27/0018 , G01N21/6452 , G02B3/0056 , G02B3/0062 , G02B21/16 , G02B2207/113
摘要： The invention concerns an optical instrument for imaging fluorescence signals from an arrangement of a plurality of individual detection sites, for example the wells of a microtitre plate. In order to improve the light yield of the fluorescence excitation with excitation light as well as the light yield of the detection of the fluorescence signals, an objective array is provided which is arranged in the beam path between the field lens and the detection sites and comprises a field lens array with field lens array elements and a pupil lens array with pupil lens array elements. In order to improve the channel separation and suppress interfering light the objective array can comprise a diaphragm array with in each case two diaphragm openings per detection site.
摘要翻译：本发明涉及一种用于从多个单独检测位置（例如微量滴定板的孔）的布置成像荧光信号的光学仪器。为了提高用激发光的荧光激发的光产率以及荧光信号的检测的光产率，提供了一种物镜阵列，其布置在场透镜和检测点之间的光束路径中，并且包括具有场透镜阵列元件的场透镜阵列和具有光瞳透镜阵列元件的光瞳透镜阵列。为了改善通道分离并抑制干扰光，物镜阵列可以包括隔膜阵列，每个检测位置都有两个隔膜孔。

20. 发明授权

US07906767B2 Excitation and imaging optics for fluorescence detection 有权
标题翻译：用于荧光检测的激发和成像光学
公开(公告)号：US07906767B2
公开(公告)日：2011-03-15
申请号：US12506792
申请日：2009-07-21
申请人： Alan Furlan , Joachim Wietzorrek
发明人： Alan Furlan , Joachim Wietzorrek
IPC分类号： G01J1/58
CPC分类号： G02B27/0018 , G01N21/6452 , G02B3/0056 , G02B3/0062 , G02B21/16 , G02B2207/113
摘要： The invention concerns an optical instrument for imaging fluorescence signals from an arrangement of a plurality of individual detection sites, for example the wells of a microtitre plate. In order to improve the light yield of the fluorescence excitation with excitation light as well as the light yield of the detection of the fluorescence signals, an objective array is provided which is arranged in the beam path between the field lens and the detection sites and comprises a field lens array with field lens array elements and a pupil lens array with pupil lens array elements. In order to improve the channel separation and suppress interfering light the objective array can comprise a diaphragm array with in each case two diaphragm openings per detection site.
摘要翻译：本发明涉及一种用于从多个单独检测位置（例如微量滴定板的孔）的布置成像荧光信号的光学仪器。为了提高用激发光的荧光激发的光产率以及荧光信号的检测的光产率，提供了一种物镜阵列，其布置在场透镜和检测点之间的光束路径中，并且包括具有场透镜阵列元件的场透镜阵列和具有光瞳透镜阵列元件的光瞳透镜阵列。为了改善通道分离并抑制干扰光，物镜阵列可以包括隔膜阵列，每个检测位置都有两个隔膜孔。

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