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11. 发明授权

US08028254B2 Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale 有权
标题翻译：使用连续的衍生物确定平版印刷掩模的可制造性，表征连续刻度上的可制造性
公开(公告)号：US08028254B2
公开(公告)日：2011-09-27
申请号：US12334488
申请日：2008-12-14
申请人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masaharu Sakamoto , Alan E. Rosenbluth
发明人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masaharu Sakamoto , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/76 , G03F1/36
摘要： The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edge pairs are selected from mask layout data of the lithographic mask, for determining a manufacturing penalty in making the lithographic mask. The mask layout data includes polygons, where each polygon has a number of edges. Each target edge pair is defined by two of the edges of one or more of the polygons. The manufacturability of the lithographic mask, including the manufacturing penalty in making the lithographic mask, is determined. Determining the manufacturing penalty is based on the target edge pairs as selected. Determining the manufacturability of the lithographic mask uses continuous derivatives characterizing the manufacturability of the lithographic mask on a continuous scale. The manufacturability of the lithographic mask is output. The manufacturability of the lithographic mask is dependent on the manufacturing penalty in making the lithographic mask.
摘要翻译：确定用于制造半导体器件的实例的光刻掩模的可制造性。从光刻掩模的掩模布局数据中选择目标边缘对，以确定在制作光刻掩模时的制造损失。掩模布局数据包括多边形，其中每个多边形具有多个边。每个目标边对由一个或多个多边形的两个边缘定义。确定了光刻掩模的可制造性，包括制造光刻掩模的制造损失。确定制造损失是基于所选择的目标边缘对。确定平版印刷掩模的可制造性使用连续的衍生物来表征平版印刷掩模的可制造性在连续尺度上。输出光刻掩模的可制造性。光刻掩模的可制造性取决于制造光刻掩模的制造损失。

12. 发明授权

US07934063B2 Invoking externally assisted calls from an isolated environment 有权
标题翻译：从孤立的环境调用外部辅助呼叫
公开(公告)号：US07934063B2
公开(公告)日：2011-04-26
申请号：US11693406
申请日：2007-03-29
申请人： Masana Murase , Wilfred E. Plouffe, Jr. , Masaharu Sakamoto , Kanna Shimizu , Vladimir Zbarsky
发明人： Masana Murase , Wilfred E. Plouffe, Jr. , Masaharu Sakamoto , Kanna Shimizu , Vladimir Zbarsky
IPC分类号： G06F13/28
CPC分类号： G06F9/544
摘要： A method of invoking power processor element (PPE) serviced C library functions on a synergistic processing element (SPE) running in isolated mode. When the SPE initiates a PPE-serviced function, an SPE stub routine allocates a parameter buffer in an open area of a local store (LS) memory within the SPE. The LS memory includes an open area accessible to the PPE, and an isolated area inaccessible to the PPE. The SPE stub routine copies function parameters corresponding to the PPE-serviced function to a buffer within the open area of the LS memory, and writes a message word, which contains an identification variable of the PPE-serviced function and a location variable of the function parameters, to the open area. When execution is temporarily suspended on the SPE, the PPE reads the message word from the open area of the LS memory and executes the PPE-serviced function.
摘要翻译：一种在隔离模式下运行的协同处理元件（SPE）上调用功率处理器元件（PPE）服务C库函数的方法。当SPE启动PPE服务功能时，SPE stub例程在SPE内的本地存储（LS）存储器的打开区域中分配参数缓冲区。 LS存储器包括PPE可访问的开放区域和PPE无法访问的隔离区域。 SPE存根例程将对应于PPE服务功能的功能参数复制到LS存储器的开放区域内的缓冲区，并写入一个消息字，其中包含PPE服务功能的标识变量和功能的位置变量参数，到开放区域。当执行暂停在SPE上时，PPE从LS存储器的打开区域读取消息字，并执行PPE服务功能。

13. 发明授权

US5671330A Speech synthesis using glottal closure instants determined from adaptively-thresholded wavelet transforms 失效
标题翻译：使用自适应阈值小波变换确定声门闭合时刻的语音合成
公开(公告)号：US5671330A
公开(公告)日：1997-09-23
申请号：US500793
申请日：1995-07-11
申请人： Masaharu Sakamoto , Mei Kobayashi , Takashi Saito , Masafumi Nishimura
发明人： Masaharu Sakamoto , Mei Kobayashi , Takashi Saito , Masafumi Nishimura
IPC分类号： G10L15/02 , G06F17/14 , G10L11/00 , G10L13/00 , G10L13/06 , G10L13/08 , G10L21/06 , G10L5/04
CPC分类号： G10L13/07 , G10L13/04 , G10L25/27
摘要： A speech synthesis system making use of a pitch-synchronous waveform overlap method to realize stable speech synthesis processing in which pitch shaking is negligible. The present invention is characterized in that glottal closure instants are used as reference points (pitch marks) for overlapping. Since the glottal closure instants can be extracted stably and accurately by using dyadic Wavelet conversion, speech in which pitch shaking is negligible and rumbling sounds are minimized can be synthesized stably. In addition, more flexible waveform separation becomes possible by setting the reference point for overlapping and the reference point for waveform separation to different positions. The extraction of glottal closure instants is performed by searching the local peaks of the dyadic Wavelet conversion, but preferably a threshold value for searching for the local peaks of the dyadic Wavelet conversion is adaptively controlled each time dyadic Wavelet conversion is obtained.
摘要翻译：一种使用音调同步波形重叠方法的语音合成系统来实现音调抖动可忽略的稳定语音合成处理。本发明的特征在于，将声门关闭时刻用作用于重叠的参考点（间距标记）。由于可以通过使用二次小波变换来稳定和准确地提取声门闭合时刻，因此可以稳定地合成音调抖动可忽略且隆隆声音最小化的语音。此外，通过将重叠的参考点和波形分离的参考点设置到不同的位置，可以实现更灵活的波形分离。通过搜索二次小波变换的局部峰值来执行声门闭合时刻的提取，但是优选地，每次获得二次小波变换时，自适应地控制用于搜索二次小波变换的局部峰值的阈值。

14. 外观设计

USD366220S Handheld position detecting and indicating receiver 失效
公开(公告)号：USD366220S
公开(公告)日：1996-01-16
申请号：US36652
申请日：1995-03-24
申请人： Masaharu Sakamoto
设计人： Masaharu Sakamoto

15. 发明授权

US5364445A Recovery method of rhodium 失效
标题翻译：铑的回收方法
公开(公告)号：US5364445A
公开(公告)日：1994-11-15
申请号：US102153
申请日：1993-08-04
申请人： Masaharu Sakamoto , Tomoyuki Mori , Akio Tsuboi
发明人： Masaharu Sakamoto , Tomoyuki Mori , Akio Tsuboi
IPC分类号： C22B11/00 , C22B3/16 , C22B3/44 , C22B61/00
CPC分类号： C22B11/04 , C22B3/44 , Y02P10/234
摘要： A method for recovering rhodium comprising the steps of: adding a basic compound to an organic solution containing a rhodium complex containing at least one type of organophosphorus compound as a ligand and an organophosphorus compound, combusting the resultant mixture to ash under a controlled temperature of less than 1,000.degree. C.; and cleaning the ash using a cleaning solution containing a reducing agent.
摘要翻译：一种回收铑的方法，包括以下步骤：将碱性化合物加入到含有至少一种有机磷化合物作为配体的铑配合物和有机磷化合物的有机溶液中，将所得混合物在较少的控制温度下燃烧超过1000℃。并使用含有还原剂的清洗溶液清洗灰分。

16. 发明授权

US4607359A Optical recording/reproducing apparatus 失效
标题翻译：光记录/重放装置
公开(公告)号：US4607359A
公开(公告)日：1986-08-19
申请号：US575045
申请日：1984-01-30
申请人： Nobuhide Matsubayashi , Kiichi Kato , Masaharu Sakamoto
发明人： Nobuhide Matsubayashi , Kiichi Kato , Masaharu Sakamoto
IPC分类号： G11B7/135 , G11B7/09 , G11B7/12 , G11B7/125 , G11B7/1359 , G11B7/1378 , G11B7/1381 , G11B7/08
CPC分类号： G11B7/0903 , G11B7/1359 , G11B7/1378 , G11B7/1381
摘要： An optical recording/reproducing apparatus has a beam emitting device adapted to emit at least two light beams in directions at a minute angle to each other. The light beams are condensed by a condensing member onto slightly separated two points on a disk and reflected by the disk. The light beams from the disk are polarized to a prism by a polarizing device. The prism refracts the light beams from the polarizing device, thereby increasing the relative angle between the light beams. The refracted light beams are converged by a converging lens on a detector.
摘要翻译：光学记录/再现装置具有适于在至少两个彼此以小角度的方向发射的光束的发射装置。光束被聚光部件聚集在盘上略微分开的两个点上，并被光盘反射。来自盘的光束通过偏振装置偏振到棱镜。棱镜折射来自偏振装置的光束，从而增加光束之间的相对角度。折射光束被会聚透镜会聚在检测器上。

17. 发明授权

US4464050A Apparatus for detecting optically defects 失效
标题翻译：用于检测光学缺陷的设备
公开(公告)号：US4464050A
公开(公告)日：1984-08-07
申请号：US345153
申请日：1982-02-02
申请人： Kiichi Kato , Masaharu Sakamoto , Shoji Yoshikawa , Kunio Yamamiya , Hiroshi Kodama , Ken Ohsima
发明人： Kiichi Kato , Masaharu Sakamoto , Shoji Yoshikawa , Kunio Yamamiya , Hiroshi Kodama , Ken Ohsima
IPC分类号： G01N21/88 , G01N21/95 , G01N21/956 , G11B7/0037 , G11B7/26 , H01L21/66
CPC分类号： G11B7/00375 , G01N21/9506
摘要： An apparatus for detecting optically defects in object such as original glass disc for use in manufacturing video and audio discs by projecting a laser light flux onto the object includes an objective lens for focussing the incident laser light flux onto the object as a small light spot, the laser light flux passing through the objective lens at only its central portion. When the object has no defect in the light spot area, the laser light flux is regularly reflected by the object surface, but when the object includes a defect in the light spot area, the light flux is scattered by the defect. The directly reflected and scattered light fluxes are collected by the objective lens and are then separated from each other by means of a small mirror arranged in an optical axis of the directly reflected light flux. The directly reflected and scattered light fluxes thus separated are received by first and second light detectors. A cylindrical lens is inserted between the small mirror and the first light detector having four divided light receiving regions. The objective lens is driven into an in-focussed position under the control of a focussing error signal which is derived by processing output signals from the four divided light receiving regions. A defect signal is derived by processing output signals supplied from the first and second light detectors.
摘要翻译：用于通过将激光光束投射到物体上来制造视频和音频盘的用于检测用于制造视频和音频盘的原始玻璃盘的物体的光学缺陷的装置包括：用于将入射的激光光束聚焦到物体上作为小光斑的物镜，激光光束仅在其中心部分通过物镜。当物体在光斑区域没有缺陷时，激光光束被物体表面规则地反射，但是当物体包含光斑区域的缺陷时，光通量被缺陷散射。直接反射和散射的光束由物镜收集，然后通过布置在直射反射光束的光轴上的小反射镜彼此分离。这样分离的直接反射和散射的光束被第一和第二光检测器接收。在具有四个分开的光接收区域的小反射镜和第一光检测器之间插入柱面透镜。在通过处理来自四个分开的光接收区域的输出信号导出的聚焦误差信号的控制下，物镜被驱动到聚焦位置。通过处理从第一和第二光检测器提供的输出信号来导出缺陷信号。

18. 发明授权

US08332636B2 Secure policy differentiation by secure kernel design 失效
标题翻译：通过安全内核设计来确保策略的差异化
公开(公告)号：US08332636B2
公开(公告)日：2012-12-11
申请号：US11866001
申请日：2007-10-02
申请人： Masana Murase , Masaharu Sakamoto , Kanna Shimizu , Vladimir Zbarsky
发明人： Masana Murase , Masaharu Sakamoto , Kanna Shimizu , Vladimir Zbarsky
IPC分类号： H04L29/06
CPC分类号： G06F21/575
摘要： A method, computer program product, and data processing system are disclosed for ensuring that applications executed in the data processing system originate only from trusted sources are disclosed. In a preferred embodiment, a secure operating kernel maintains a “key ring” containing keys corresponding to trusted software vendors. The secure kernel uses vendor keys to verify that a given application was signed by an approved vendor. To make it possible for users to execute software from independent software developers, an administrative user may disable the above-described vendor key-checking as an option.
摘要翻译：公开了一种方法，计算机程序产品和数据处理系统，用于确保在数据处理系统中执行的应用仅来自可信源。在优选实施例中，安全操作内核维护包含与可信软件供应商相对应的密钥的密钥环。安全内核使用供应商密钥来验证给定的应用程序是否由经过批准的供应商签名。为了使用户可以从独立软件开发人员执行软件，管理用户可以选择禁用上述供应商密钥检查。

19. 发明申请

US20110231803A1 Wavefront engineering of mask data for semiconductor device design 有权
标题翻译：用于半导体器件设计的掩模数据的波前工程
公开(公告)号：US20110231803A1
公开(公告)日：2011-09-22
申请号：US12725287
申请日：2010-03-16
申请人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Alan E. Rosenbluth , Kehan Tian , Masaharu Sakamoto , Saeed Bagheri
发明人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Alan E. Rosenbluth , Kehan Tian , Masaharu Sakamoto , Saeed Bagheri
IPC分类号： G06F17/50
CPC分类号： G03F7/70433 , G03F1/36 , G03F1/70 , G03F7/705
摘要： Optical wave data for a semiconductor device design is divided into regions. First wavefront engineering is performed on the wave data of each region, accounting for just the wave data of each region and not accounting for the wave data of neighboring regions of each region. The optical wave data of each region is normalized based on results of the first wavefront engineering. Second wavefront engineering is performed on the wave data of each region, based at least on the wave data of each region as has been normalized. The second wavefront engineering takes into account the wave data of each region and a guard band around each region that includes the wave data of the neighboring regions of each region. The second wavefront engineering can be sequentially performed by organizing the regions into groups, and sequentially performing the second wavefront engineering on the regions of each group in parallel.
摘要翻译：半导体器件设计的光波数据分为几个区域。对每个区域的波形数据执行第一波前工程，仅考虑每个区域的波形数据，不考虑每个区域的相邻区域的波形数据。基于第一波前工程的结果对每个区域的光波数据进行归一化。至少基于已经归一化的每个区域的波形数据，对每个区域的波形数据执行第二波前工程。第二波前工程考虑了每个区域的波形数据和围绕每个区域的保护带，其包括每个区域的相邻区域的波形数据。可以通过将区域组合成组并且顺序地在并行地对每个组的区域执行第二波前工程来顺序执行第二波前工程。

20. 发明申请

US20100153903A1 DETERMINING MANUFACTURABILITY OF LITHOGRAPHIC MASK USING CONTINUOUS DERIVATIVES CHARACTERIZING THE MANUFACTURABILITY ON A CONTINUOUS SCALE 有权
标题翻译：使用连续衍生物确定表面掩模的可制造性，表征连续性尺度上的可制造性
公开(公告)号：US20100153903A1
公开(公告)日：2010-06-17
申请号：US12334488
申请日：2008-12-14
申请人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masaharu Sakamoto , Alan E. Rosenbluth
发明人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masaharu Sakamoto , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/76 , G03F1/36
摘要： The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edge pairs are selected from mask layout data of the lithographic mask, for determining a manufacturing penalty in making the lithographic mask. The mask layout data includes polygons, where each polygon has a number of edges. Each target edge pair is defined by two of the edges of one or more of the polygons. The manufacturability of the lithographic mask, including the manufacturing penalty in making the lithographic mask, is determined. Determining the manufacturing penalty is based on the target edge pairs as selected. Determining the manufacturability of the lithographic mask uses continuous derivatives characterizing the manufacturability of the lithographic mask on a continuous scale. The manufacturability of the lithographic mask is output. The manufacturability of the lithographic mask is dependent on the manufacturing penalty in making the lithographic mask.
摘要翻译：确定用于制造半导体器件的实例的光刻掩模的可制造性。从光刻掩模的掩模布局数据中选择目标边缘对，以确定在制作光刻掩模时的制造损失。掩模布局数据包括多边形，其中每个多边形具有多个边。每个目标边对由一个或多个多边形的两个边缘定义。确定了光刻掩模的可制造性，包括制造光刻掩模的制造损失。确定制造损失是基于所选择的目标边缘对。确定平版印刷掩模的可制造性使用连续的衍生物来表征平版印刷掩模的可制造性在连续尺度上。输出光刻掩模的可制造性。光刻掩模的可制造性取决于制造光刻掩模的制造损失。

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