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11. 外观设计

USD361749S Electrical charging plug 失效
公开(公告)号：USD361749S
公开(公告)日：1995-08-29
申请号：US20177
申请日：1994-03-18
申请人： Yasuyoshi Fukao , Toshiyuki Sekimori , Hiromichi Kuno , Nobuaki Yoshioka , Toshiaki Hasegawa , Shigemitsu Inaba
设计人： Yasuyoshi Fukao , Toshiyuki Sekimori , Hiromichi Kuno , Nobuaki Yoshioka , Toshiaki Hasegawa , Shigemitsu Inaba

12. 发明授权

US5421888A Low pressure CVD apparatus comprising gas distribution collimator 失效
标题翻译：低压CVD装置包括气体分配准直器
公开(公告)号：US5421888A
公开(公告)日：1995-06-06
申请号：US175690
申请日：1993-12-30
申请人： Toshiaki Hasegawa
发明人： Toshiaki Hasegawa
IPC分类号： C23C16/04 , C23C16/44 , C23C16/455 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/045 , C23C16/45591
摘要： The present invention provides a low-pressure CVD apparatus capable of forming a film with improved step coverage and which fills up contact holes without forming any seam therein. The low-pressure CVD apparatus comprises a CVD reaction chamber (6) provided with a source gas inlet (5), a susceptor (1) for supporting a wafer (2), and a gas distributing means (3) disposed between the source gas inlet (5) and a wafer (2) supported on the susceptor (1) to distribute a source gas uniformly over the surface of the wafer (2). The gas distributing means (3) is provided with a plurality of minute pores (16) serving as passages (10a) for the source gas and extending substantially perpendicularly to the surface of the wafer (2).
摘要翻译：本发明提供一种低压CVD装置，其能够形成具有改善的台阶覆盖率的膜，并且填充接触孔而不在其中形成任何接缝。低压CVD装置包括设置有源气体入口（5）的CVD反应室（6），用于支撑晶片（2）的基座（1）和设置在源气体之间的气体分配装置入口（5）和支撑在基座（1）上的晶片（2），以将源气体均匀地分布在晶片（2）的表面上。气体分配装置（3）设置有用作源气体的通道（10a）的多个微孔（16），并基本上垂直于晶片（2）的表面延伸。

13. 发明授权

US5374591A Method of making a metal plug 失效
标题翻译：制作金属插头的方法
公开(公告)号：US5374591A
公开(公告)日：1994-12-20
申请号：US856115
申请日：1992-03-23
申请人： Toshiaki Hasegawa , Junichi Sato
发明人： Toshiaki Hasegawa , Junichi Sato
IPC分类号： H01L21/285 , H01L21/28 , H01L21/302 , H01L21/3065 , H01L21/768 , H01L21/441
CPC分类号： H01L21/76802 , H01L21/76841 , H01L21/76877
摘要： A metal plug is formed in a connection hole such as a via hole or a contact hole to provide an interconnection between multilayer wires in a semiconductor integrated circuit. First, an adhesion layer is deposited on an insulating film, and an area of the adhesion layer is etched away isotropic etching through an opening in a resist mask, the area being larger than the opening in the resist mask. Thereafter, the insulating film is etched through the opening in the resist mask by anisotropic etching, forming a connection hole in the insulating film. Then, a metal layer such as a blanket tungsten layer is deposited on the adhesion layer and in the connection hole. The metal layer is etched back and the adhesion layer is etched away, leaving the metal layer as a metal plug in the connection hole.
摘要翻译：金属插塞形成在诸如通孔或接触孔的连接孔中，以在半导体集成电路中的多层导线之间形成互连。首先，在绝缘膜上沉积粘合层，并且通过抗蚀剂掩模中的开口蚀刻粘附层的区域各向同性蚀刻，该面积大于抗蚀剂掩模中的开口。此后，通过各向异性蚀刻在抗蚀剂掩模中的开口蚀刻绝缘膜，在绝缘膜中形成连接孔。然后，在粘合层和连接孔中沉积诸如覆盖钨层的金属层。金属层被回蚀刻，并且粘附层被蚀刻掉，使金属层作为连接孔中的金属塞。

14. 发明授权

US5367105A Process and device for production of allyl chloride 失效
标题翻译：制备烯丙基氯的方法和装置
公开(公告)号：US5367105A
公开(公告)日：1994-11-22
申请号：US139851
申请日：1993-10-22
申请人： Hidetaka Miyazaki , Toshiaki Hasegawa , Yoshihiko Kajimoto , Susumu Mochida
发明人： Hidetaka Miyazaki , Toshiaki Hasegawa , Yoshihiko Kajimoto , Susumu Mochida
IPC分类号： C07C17/02 , B01J19/26 , C07C17/10 , C07C21/067
CPC分类号： B01J19/26 , C07C17/10
摘要： A process for the production of allyl chloride, which comprises introducing propylene and chlorine into a reactor having at least one propylene-injection opening and at least one chlorine-injection opening, these openings being independent of each other, through the respective injection openings, and reacting them in a vapor phase, wherein propylene and chlorine are introduced into the reactor by injecting them in almost the same direction from the propylene-injection opening and the chlorine-injection opening which is closest to said propylene-injection opening, with a linear velocity in the propylene-injection opening, calculated as a value of at 300.degree. C. and 1 kg/cm.sup.2.G, of 100 m/sec or higher and a linear velocity of the chlorine-injection opening, calculated as a value of at 100.degree. C. and 1 kg/cm.sup.2.G, of 70 m/sec or higher, and the propylene-injection opening and the chlorine-injection opening are situated to meet the following expression (1),0.5.ltoreq.L/(dp+dc).ltoreq.20 (1)wherein dp is a diameter of the propylene-injection opening, dc is a diameter of the chlorine-injection opening which is closest to said propylene-injection opening, and L is a distance between centers of these two injection openings.
摘要翻译：一种制备烯丙基氯的方法，其包括将丙烯和氯引入具有至少一个丙烯注射开口和至少一个氯注入口的反应器中，这些开口彼此独立地通过相应的注射开口，以及在气相中使它们反应，其中丙烯和氯通过从丙烯注入开口和最接近所述丙烯注入口的氯注入口以几乎相同的方向注入反应器，以线速度在丙烯注入口中，以300℃和1kg / cm 2 G的值计算为100m / sec或更高，氯注入口的线速度计算为100的值 ℃和1kg / cm 2 .G，为70m / sec以上，丙烯注入口和氯气注入口为满足下式（1），0.5≤L/（dp + dc）

15. 发明授权

US5350312A Feeder connector 失效
标题翻译：进纸器连接器
公开(公告)号：US5350312A
公开(公告)日：1994-09-27
申请号：US165886
申请日：1993-12-14
申请人： Hiromichi Kuno , Toshiyuki Sekimori , Shigemitsu Inaba , Toshiaki Hasegawa
发明人： Hiromichi Kuno , Toshiyuki Sekimori , Shigemitsu Inaba , Toshiaki Hasegawa
IPC分类号： H01R13/627 , H01R13/629 , H01R13/639 , H01R13/66 , H01R13/707 , H01R13/717 , H01R13/62
CPC分类号： B60L11/1818 , H01R13/62933 , H01R13/6395 , H01R13/707 , B60L2250/16 , B60L2270/32 , B60L2270/34 , H01R13/6275 , H01R13/6633 , H01R13/717 , H01R13/7175 , H01R23/10 , Y02T10/7005 , Y02T10/7072 , Y02T90/14
摘要： The feeder connector consists of feeding-side and receiving-side connectors. The feeding-side connector includes a casing consisting of split-type cases fastened to each other, a connector body slidably installed in a front half section of the casing, and a handle movably mounted in a rear half section of the casing such that it advances through rotation of a lever to push the connector body against the receiving-side connector, the handle also serving as lead wires-passing tube. The lever includes a first locking means for locking the connector body in an engaged state with a mating connector body of the receiving-side connector, a second locking means operated through energizing an electro-magnetic coil, and a means for releasing the lever from the locking by the first locking means after the locking by the second locking means is released by deenergizing. The feeder connector prevents the feeding-side and receiving-side connectors from detachment during feeding in charging an electric vehicle and has a simple structure suitable for multi-polarization.
摘要翻译：馈线连接器由馈电侧和接收侧连接器组成。进料侧连接器包括由彼此紧固的分体式壳体组成的壳体，可滑动地安装在壳体的前半部分中的连接器主体和可移动地安装在壳体的后半部分中的手柄，使得其前进通过杠杆的旋转将连接器主体推靠在接收侧连接器上，手柄也用作导线穿过管。杠杆包括用于将连接器主体与接收侧连接器的配合连接器本体处于接合状态的第一锁定装置，通过激励电磁线圈操作的第二锁定装置，以及用于将杠杆从在通过第二锁定装置的锁定之后，通过第一锁定装置的锁定被断电释放。馈电连接器防止馈电侧和接收侧连接器在给电动车辆充电期间分离，并且具有适于多极化的简单结构。

16. 发明授权

US08815486B2 Carrier for two-component developer, two-component developer, image forming method, and image forming apparatus 有权
标题翻译：用于双组分显影剂，双组分显影剂，成像方法和图像形成装置的载体
公开(公告)号：US08815486B2
公开(公告)日：2014-08-26
申请号：US13224958
申请日：2011-09-02
申请人： Norihito Fukushima , Toshiaki Hasegawa , Yosuke Tsurumi
发明人： Norihito Fukushima , Toshiaki Hasegawa , Yosuke Tsurumi
IPC分类号： G03G9/00 , G03G9/107 , G03G9/113 , G03G15/09 , G03G9/08
CPC分类号： G03G15/09 , G03G9/0819 , G03G9/107 , G03G9/1075 , G03G9/113 , G03G9/1131 , G03G9/1139 , G03G2215/0607
摘要： A carrier for a two-component developer, includes: magnetic particles and a resin coating layer that is coated on the magnetic particles, the resin coating layer containing metal nitride particles having a volume average primary particle diameter of from about 300 to about 2,000 nm.
摘要翻译：用于双组分显影剂的载体包括：磁性颗粒和涂覆在磁性颗粒上的树脂涂层，所述树脂涂层含有体积平均一次粒径为约300至约2,000nm的金属氮化物颗粒。

17. 发明授权

US08455168B2 Electrophotographic developer, developer cartridge, process cartridge, and image forming apparatus 有权
标题翻译：电子照相显影剂，显影剂盒，处理盒和成像设备
公开(公告)号：US08455168B2
公开(公告)日：2013-06-04
申请号：US12862028
申请日：2010-08-24
申请人： Fusako Kiyono , Sakon Takahashi , Toshiaki Hasegawa , Takeshi Shoji
发明人： Fusako Kiyono , Sakon Takahashi , Toshiaki Hasegawa , Takeshi Shoji
IPC分类号： G03G9/113
CPC分类号： G03G9/1139 , G03G9/0819 , G03G9/0827 , G03G9/08795 , G03G9/08797 , G03G9/1075 , G03G9/1134 , G03G15/0865 , G03G15/0868 , G03G21/1814
摘要： An electrophotographic developer is provided which includes: a toner that includes toner base particles and an external additive attached to a surface of the toner base particles and has an amount of Al on the surface of the toner base particles of from about 0.002 to about 0.02 atm %; and a carrier that includes magnetic particles and a coating resin layer that coats the magnetic particles, the coating resin layer including particles with a volume-average particle diameter of from about 80 to about 800 nm, such as organic particles or inorganic particles having an organic layer on a surface of the inorganic particles, the carrier satisfying any one of the following formulas, where SP1, SP2 and SP3 represent a solubility parameter of resin of the coating resin layer, the organic particles, and the organic layer respectively: about 10>|SP1−SP2|>about 4 (1); and about 10>|SP1−SP3|>about 4 (2).
摘要翻译：提供了一种电子照相显影剂，其包括：调色剂，其包括调色剂基础颗粒和附着到调色剂基础颗粒的表面的外部添加剂，并且调色剂基础颗粒表面上的Al的量为约0.002至约0.02atm ％; 以及包含磁性颗粒的载体和涂覆磁性颗粒的涂覆树脂层，涂层树脂层包括体积平均粒径为约80至约800nm的颗粒，例如有机颗粒或具有有机物的无机颗粒无机粒子的表面上的层，载体满足下式中的任一个，其中SP1，SP2和SP3分别表示涂料树脂层，有机颗粒和有机层的树脂的溶解度参数：约10> | SP1-SP2 |>约4（1）; 和大约10（SP1）| SP1-SP3 |>约4（2）。

18. 发明申请

US20070054227A1 Alternate combustion type regenerative radiant tube burner apparatus 审中-公开
标题翻译：替代燃烧式再生辐射管燃烧器
公开(公告)号：US20070054227A1
公开(公告)日：2007-03-08
申请号：US10546325
申请日：2004-02-25
申请人： Takeshi Tada , Susumu Mochida , Shinya Kitahara , Shinichiro Fukushima , Yutaka Suzukawa , Masaharu Suga , Isao Mori , Hitoshi Oishi , Munehiro Ishioka , Toshiaki Hasegawa
发明人： Takeshi Tada , Susumu Mochida , Shinya Kitahara , Shinichiro Fukushima , Yutaka Suzukawa , Masaharu Suga , Isao Mori , Hitoshi Oishi , Munehiro Ishioka , Toshiaki Hasegawa
IPC分类号： F23C5/08
CPC分类号： F23C3/002 , F23D14/22 , F23L15/02 , Y02E20/348
摘要： The present invention relates to an alternate combustion type regenerative radiant tube burner apparatus which comprises a circular plate positioned between a burner unit and a main combustion chamber, so that preheated secondary combustion air is fed through an opening of the circular plate to the main combustion chamber. The burner apparatus has the circular plate (10), an annular air throat (2), a cylindrical peripheral cover (30) and a heat-transfer tube (11,16). A front end portion of the peripheral cover is integrally connected with a peripheral edge portion of the circular plate so as to prevent the secondary combustion air of the air throat from leaking on a periphery of the circular plate to the air diluting chamber (3). According to the present invention, the concentration of nitrogen oxides in the combustion exhaust gas can be definitely prevented from increasing, without being affected by the installation condition or thermal deformation of the radiant tube burner apparatus.
摘要翻译：本发明涉及一种替代的燃烧式再生辐射管燃烧器装置，其包括位于燃烧器单元和主燃烧室之间的圆形板，使得预热的二次燃烧空气通过圆形板的开口进入主燃烧室。燃烧器装置具有圆板（10），环形空气喉部（2），圆柱形周边盖（30）和传热管（11,16）。外周盖的前端部与圆板的周缘部一体地连接，以防止空气喉的二次燃烧空气在圆板的周围泄漏到空气稀释室（3）。根据本发明，可以明显地防止燃烧废气中的氮氧化物的浓度增加，而不受辐射管燃烧器装置的安装条件或热变形的影响。

19. 发明申请

US20050191591A1 REACTOR COMBUSTION CONTROL METHOD AND REACTOR 失效
标题翻译：反应器燃烧控制方法与反应器
公开(公告)号：US20050191591A1
公开(公告)日：2005-09-01
申请号：US10508929
申请日：2003-03-28
申请人： Takaaki Mohri , Toshiaki Yoshioka , Yoshikazu Hozumi , Tetsu Shiozaki , Toshiaki Hasegawa , Susumu Mochida
发明人： Takaaki Mohri , Toshiaki Yoshioka , Yoshikazu Hozumi , Tetsu Shiozaki , Toshiaki Hasegawa , Susumu Mochida
IPC分类号： F23C1/00 , F23C5/08 , F23L15/02 , F27D13/00
CPC分类号： F23L15/02 , F23C5/08 , Y02E20/348
摘要： A reactor combustion control method using a high temperature air combustion technology capable of reducing a temperature difference in a reactor without producing cracking and caulking in reaction tubes and the reactor controlled by using the method, the reactor wherein second burners (8) are disposed in a space formed between two or more reaction tubes (7) adjacent to each other so as to inject fuel in the extending direction of the reaction tubes (7), and partial combustion air feeding devices (10) and (11) for the second burners discharging exhaust gas in a combustion chamber (2) to the outside of the reactor through a permeable heat reservoir and feeding combustion air heated to a high temperature by the latent heat of the heat reservoir to the second burners (8) are installed; the method comprising the steps of raising the temperature in the reactor by the combustion of only the first burners (3a) to (6a) until the inside of a reactor body (1) is brought into a high temperature air combustion state, starting the combustion of the second burners (8) after the inside of the reactor body (1) is brought into the high temperature air combustion state, and decreasing the amount of combustion of the plurality of first burners (3a) to (6a) according an increase in combustion amount of the second burners (8) whereby a necessary combustion state can be provided.
摘要翻译：一种使用高温空气燃烧技术的反应器燃烧控制方法，其中第二燃烧器（8）设置在反应器中，其中第二燃烧器（8）设置在反应器中，所述反应器燃烧控制方法能够降低反应器中的温度差而不产生反应管中的裂缝和填缝，在彼此相邻的两个或更多个反应管（7）之间形成的空间，以便在反应管（7）的延伸方向上喷射燃料，以及用于第二燃烧器排出的部分燃烧空气供给装置（10）和（11）燃烧室（2）中的废气通过可渗透的储热器并通过蓄热器的潜热将第一燃烧器（8）的加热到高温的燃烧空气供给到反应器的外部; 该方法包括以下步骤：通过仅第一燃烧器（3a）至（6a）的燃烧使反应器中的温度升高直到反应器主体（1）的内部进入高温空气燃烧状态，起动第二燃烧器（8）在反应器主体（1）内部的燃烧进入高温空气燃烧状态，并且减少多个第一燃烧器（3a）至（6a）的燃烧量，根据第二燃烧器（8）的燃烧量的增加，由此可以提供必要的燃烧状态。

20. 发明授权

US6130451A High dielectric constant material containing tantalum, process for forming high dielectric constant film containing tantalum, and semiconductor device using the same 失效
标题翻译：包含钽的高介电常数材料，用于形成含有钽的高介电常数膜的工艺，以及使用其的半导体器件
公开(公告)号：US6130451A
公开(公告)日：2000-10-10
申请号：US680679
申请日：1996-07-16
申请人： Toshiaki Hasegawa
发明人： Toshiaki Hasegawa
IPC分类号： C23C16/30 , C23C16/34 , H01L21/02 , H01L21/316 , H01L29/72
CPC分类号： H01L28/40 , C23C16/30 , C23C16/308 , C23C16/34 , H01L21/31604 , Y10S427/106
摘要： A high dielectric constant material containing tantalum expressed by chemical formula Ta.sub.x O.sub.y N.sub.z, where x, y, and z are each a value which in total yield 1, z is 0.1 or higher but 0.625 or lower, y is 0 or higher but 0.6 or lower, and 0.4y and 0.6z in total equals to the value of x or lower, and a process for depositing a film of the material by means of chemical vapor deposition using Cp.sub.m Ta(N.sub.3).sub.n, where Cp represents cyclopentane, and m+n=5, or using a gaseous tantalum-containing organometallic compound, or by a means comprising plasma treatment under a gas containing nitrogen. Also claimed are a semiconductor device and a MOS transistor using the high dielectric film containing tantalum.
摘要翻译：包含由化学式TaxOyNz表示的钽的高介电常数材料，其中x，y和z分别为总产率1，z为0.1以上且0.625以下，y为0以上且0.6以下的值，总共0.4y和0.6z等于x或更低的值，以及使用CpmTa（N3）n（其中Cp表示环戊烷）通过化学气相沉积沉积材料的膜的方法，m + n = 或使用含气态的有机金属化合物，或通过在含氮气体下进行等离子体处理的方法。还要求保护的是使用含有钽的高电介质膜的半导体器件和MOS晶体管。

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