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    • 11. 发明授权
    • Revolution detecting device
    • US06661225B2
    • 2003-12-09
    • US10348187
    • 2003-01-22
    • Inao ToyodaYasutoshi SuzukiYuichiro MurataHirofumi Uenoyama
    • Inao ToyodaYasutoshi SuzukiYuichiro MurataHirofumi Uenoyama
    • G11B5147
    • G01D5/145B82Y25/00G01P3/487G01R33/093
    • In a revolution detecting device, a tunneling magnetoresistance sensor having an element located in a region is provided. The tunneling magnetoresistance sensor comprises a substrate, a pinned layer composed of ferromagnetism material and located to one side of the substrate, a tunneling layer composed of insulating film and located to one side of the pinned layer and a free layer composed of ferromagnetism film and located to one side of the tunneling layer. The element is configured to detect a change of magnetoresistance of the element according to a magnetic field applied in the region in which the element is located. The change of the magnetoresistance of the element is based on a change of current flowing through the tunneling layer between the pinned layer and the free layer. In the revolution detecting device, a revolution member is disposed in a vicinity of the element in the Y axis from a viewpoint of the element. The revolution member has a surface portion opposite to the element. The surface portion is formed with S poles and N poles which are alternately arranged. In the revolution detecting device, a magnet is disposed in a vicinity of the element and generating the magnetic field and a direction of the magnetic field is substantially parallel to the Y axis at a center portion of the element. When the revolution member revolves, the S poles and N poles are configured to move substantially in parallel to the X axis on the Y axis determined by the element.
    • 13. 发明授权
    • Magnetic sensor adjusting method, magnetic sensor adjusting device and magnetic sensor
    • 磁传感器调节方法,磁传感器调节装置及磁传感器
    • US06812694B2
    • 2004-11-02
    • US10811874
    • 2004-03-30
    • Hirofumi Uenoyama
    • Hirofumi Uenoyama
    • G01B714
    • G01D5/24452G01D5/147G01D5/24428
    • The present invention provides a magnetic sensor adjusting method that can always be accurate in sensing a sensing target satisfactorily irrespective of fluctuations of a sensing gap length that may occur between different magnetic sensor products or in one magnetic sensor product, and that can prevent from occurring an irregularity of a phase of a binarized waveform edge. Within a magnetic gap of the magnetic sensor, a sensing gap length formed between a concave and convex portions of a sensing target units and a magnetic filed detecting sections is changed among a plurality of setting values. Then, the magnetic filed detecting sections 3, 5 obtain detection waveforms 201, 202 in every setting values of the sensing gap length. Next, an intersection point level value AG0 obtained by superimposing the plurality of detection waveforms in phase is calculated. Then, a threshold value VTH is adjusted so as to agree with the calculated intersection point level value AG0.
    • 本发明提供了一种磁传感器调节方法,其无论在不同磁传感器产品之间或在一个磁传感器产品中可能发生的感测间隙长度的波动如何,都可以令人满意地感测感测目标是准确的,并且可以防止发生 二值化波形边缘的相位不规则。 在磁传感器的磁隙中,在多个设定值之间改变形成在检测对象单元的凹部和凸部之间的感测间隙长度和磁场检测部。 然后,磁场检测部3,5在检测间隙长度的各设定值中取得检测波形201,202。 接下来,计算通过叠加多个相位检测波形而获得的交点电平值AG0。 然后,调整阈值VTH,使其与计算出的交点电平值AG0一致。
    • 14. 发明授权
    • Method for fabricating a semiconductor acceleration sensor
    • 半导体加速度传感器的制造方法
    • US5851851A
    • 1998-12-22
    • US399342
    • 1995-03-06
    • Hirofumi UenoyamaMasakazu KanosueKenichi AoYasutoshi Suzuki
    • Hirofumi UenoyamaMasakazu KanosueKenichi AoYasutoshi Suzuki
    • G01P15/08G01P15/12H01L21/78
    • G01P15/0802G01P15/124G01P2015/0814
    • It is an object to provide a method of fabrication for a semiconductor acceleration sensor which can prevent destruction of a movable portion during dicing. A sacrificial layer composed of silicon oxide film is formed on a silicon substrate, and a movable member composed of polycrystalline silicon is formed on the sacrificial layer. A polyimide film is applied on the movable member at room temperature and heated to approximately 350.degree. C. to harden. The movable member is supported by this polyimide film. Accordingly, etching liquid penetration holes are formed on the polyimide film. Further, the sacrificial layer disposed between the movable member and the silicon substrate is etched away by means of dipping the silicon substrate into hydrofluoric acid-based etching liquid. Thereafter, the silicon substrate is dipped into demineralized water to replace the etching liquid with demineralized water, and subsequently the silicon substrate is dried. Accordingly, the silicon substrate is diced and thereafter the polyimide film is etched away by O.sub.2 ashing.
    • 本发明的目的是提供一种半导体加速度传感器的制造方法,其可以防止在切割期间可动部分的破坏。 在硅衬底上形成由氧化硅膜构成的牺牲层,在牺牲层上形成由多晶硅构成的可动构件。 将聚酰亚胺膜在室温下涂布在可动件上并加热至约350℃以硬化。 可动构件由该聚酰亚胺膜支撑。 因此,在聚酰亚胺膜上形成蚀刻液体穿透孔。 此外,通过将硅衬底浸入氢氟酸蚀刻液中,设置在可移动部件和硅衬底之间的牺牲层被蚀刻掉。 此后,将硅衬底浸入软化水​​中以用软化水代替蚀刻液,随后将硅衬底干燥。 因此,对硅衬底进行切割,然后通过氧化物灰蚀蚀刻掉聚酰亚胺膜。
    • 17. 发明授权
    • Signal processing circuit for rotation detecting device
    • 旋转检测装置的信号处理电路
    • US08130115B2
    • 2012-03-06
    • US12507916
    • 2009-07-23
    • Norihiro KurumadoHiroshi OkadaNobukazu ObaHirofumi Uenoyama
    • Norihiro KurumadoHiroshi OkadaNobukazu ObaHirofumi Uenoyama
    • G08B21/00
    • G01P13/045G01D5/24428G01D5/2451
    • In the normal rotation direction, a change in the main sensing signal caused by a front edge is defined as a signal change caused by an effective edge, and a change in the main sensing signal caused by a back edge is defined as a signal change caused by an ineffective edge. In the reverse direction, a change in the main sensing signal caused by the back edge is defined as a signal change caused by an effective edge, and a change caused by a front edge is defined as a signal change caused by an ineffective edge. Regardless of the rotation direction, a detection signal generating circuit generates a detection signal including falling-edge changes and rising edge changes caused by the effective edge and ineffective edge respectively. When the direction is changed, the signal change on the detection signal is prohibited. As a result, gear tooth detection discrepancies are prevented.
    • 在正常旋转方向上,由前沿引起的主感测信号的变化被定义为由有效边缘引起的信号变化,并且由后沿引起的主感测信号的变化被定义为引起的信号变化 由无效的边缘。 在相反方向上,由后沿引起的主感测信号的变化被定义为由有效边缘引起的信号变化,并且由前沿引起的变化被定义为由无效边缘引起的信号变化。 不管旋转方向如何,检测信号发生电路分别产生包括下降沿变化和由有效边缘和无效边缘引起的上升沿变化的检测信号。 当方向改变时,检测信号上的信号变化被禁止。 结果,防止齿轮齿检测差异。
    • 18. 发明申请
    • SIGNAL PROCESSING CIRCUIT FOR ROTATION DETECTING DEVICE
    • 用于旋转检测装置的信号处理电路
    • US20100019917A1
    • 2010-01-28
    • US12507916
    • 2009-07-23
    • Norihiro KurumadoHiroshi OkadaNobukazu ObaHirofumi Uenoyama
    • Norihiro KurumadoHiroshi OkadaNobukazu ObaHirofumi Uenoyama
    • G08B21/00
    • G01P13/045G01D5/24428G01D5/2451
    • In the normal rotation direction, a change in the main sensing signal caused by a front edge is defined as a signal change caused by an effective edge, and a change in the main sensing signal caused by a back edge is defined as a signal change caused by an ineffective edge. In the reverse direction, a change in the main sensing signal caused by the back edge is defined as a signal change caused by an effective edge, and a change caused by a front edge is defined as a signal change caused by an ineffective edge. Regardless of the rotation direction, a detection signal generating circuit generates a detection signal including falling-edge changes and rising edge changes caused by the effective edge and ineffective edge respectively. When the direction is changed, the signal change on the detection signal is prohibited. As a result, gear tooth detection discrepancies are prevented.
    • 在正常旋转方向上,由前沿引起的主感测信号的变化被定义为由有效边缘引起的信号变化,并且由后沿引起的主感测信号的变化被定义为引起的信号变化 由无效的边缘。 在相反方向上,由后沿引起的主感测信号的变化被定义为由有效边缘引起的信号变化,并且由前沿引起的变化被定义为由无效边缘引起的信号变化。 不管旋转方向如何,检测信号发生电路分别产生包括下降沿变化和由有效边缘和无效边缘引起的上升沿变化的检测信号。 当方向改变时,检测信号上的信号变化被禁止。 结果,防止齿轮齿检测差异。