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    • 13. 发明申请
    • Information transfer apparatus and information transfer method
    • 信息传递装置和信息传递方法
    • US20070255864A1
    • 2007-11-01
    • US11705717
    • 2007-02-14
    • Minoru Moriwaki
    • Minoru Moriwaki
    • G06F13/28
    • G06F13/28H04N21/42692
    • According to one embodiment, an information transfer apparatus for performing direct memory access (DMA) between a memory unit and an input/output device comprises a first port to form a first transfer path which performs DMA transfer of information between the memory and the input/output device via a general-purpose bus, a second port to form a second transfer path which directly performs DMA transfer of information between the memory unit and the input/output device no via the general-purpose bus, and a selecting unit to select the first transfer path and the second transfer path on the basis of control from the outside.
    • 根据一个实施例,用于在存储器单元和输入/输出设备之间执行直接存储器访问(DMA)的信息传送设备包括:第一端口,用于形成在存储器和输入/输出设备之间执行信息DMA传输的第一传送路径; 输出设备,第二端口,以形成第二传送路径,其直接通过通用总线在存储器单元和输入/输出设备之间直接执行信息的DMA传送;以及选择单元,用于选择 基于来自外部的控制的第一传送路径和第二传送路径。
    • 15. 发明授权
    • Thienylazole compound and thienotriazolodiazepine compound
    • 噻吩唑化合物和噻吩并三唑并噻嗪类化合物
    • US5760032A
    • 1998-06-02
    • US750025
    • 1996-11-22
    • Hiroshi KitajimaSyuji EharaHideaki SatoMinoru MoriwakiKenichi Onishi
    • Hiroshi KitajimaSyuji EharaHideaki SatoMinoru MoriwakiKenichi Onishi
    • C07D409/04C07D409/14C07D495/14A61K31/55C07D491/00C07D513/00C07D515/00
    • C07D409/14C07D409/04C07D495/14
    • Thienylazole compounds (I) and thienotriazolodiazepine compounds (II) of the formulas ##STR1## wherein R.sup.1 and R.sup.2 are hydrogen, halogen, C.sub.1 -C.sub.5 alkyl and the like; --A.dbd.B-- is --N.dbd.N-- and the like; R.sup.3 and R.sup.19 are hydrogen, C.sub.1 -C.sub.5 alkyl and the like; Y is --NHCO--, --NHCONH--, --NHCOO-- and the like; Z.sup.1 and Z.sup.2 are aryl, heteroaryl and the like; Ar is halogen-substituted phenyl and the like; and m is 0 or an integer of 1-5. The compounds of the present invention have CCK antagonistic action and gastrin antagonistic action, particularly potent antagonistic action against CCK-A receptor, and are useful as agents for the prophylaxis and treatment of central and peripheral nervous system diseases (e.g., anxiety, schizophrenia, and the like) and digestive diseases (e.g., pancreatitis, gastric ulcer, enterelcosis, irritable bowel syndrome, constipation, and the like).
    • PCT No.PCT / JP95 / 01071 Sec。 371日期:1996年11月22日 102(e)日期1996年11月22日PCT归档1995年6月1日PCT公布。 公开号WO95 / 32964 日期:1995年12月7日式(I)其中R 1和R 2为氢,卤素,C 1 -C 5烷基等的噻吩唑化合物(I)和噻吩并三唑并二氮杂化合物(Ⅱ) -A = B-是-N = N-等; R3和R19是氢,C1-C5烷基等; Y是-NHCO-,-NHCONH-,-NHCOO-等; Z 1和Z 2是芳基,杂芳基等; Ar是卤素取代的苯基等; m为0或1-5的整数。 本发明的化合物具有CCK拮抗作用和胃泌素拮抗作用,特别是针对CCK-A受体的强效拮抗作用,可用作预防和治疗中枢和周围神经系统疾病(例如焦虑,精神分裂症和 类似物)和消化疾病(例如胰腺炎,胃溃疡,入侵性肠易激综合征,便秘等)。
    • 18. 发明申请
    • ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS
    • 电光设备和电子设备
    • US20110242470A1
    • 2011-10-06
    • US13079203
    • 2011-04-04
    • Minoru Moriwaki
    • Minoru Moriwaki
    • G02F1/1333
    • G02F1/136213G02F2001/13629H01L27/1255
    • An electro-optical device includes: a pixel electrode provided on a substrate; a transistor being provided between the substrate and the pixel electrodes; and a holding capacitor, provided between the pixel electrode and the transistor, configured of a first electrode, a second electrode provided opposing the first electrode via a first capacitor insulation film, and a third electrode provided opposing the first electrode via a second capacitor insulation film. Both the first capacitor insulation film and the second capacitor insulation film have multiple layers; the first capacitor insulation film and the second electrode are formed symmetrical to the second capacitor insulation film and the third electrode when viewed from the first electrode.
    • 电光装置包括:设置在基板上的像素电极; 在所述基板和所述像素电极之间设置晶体管; 以及设置在像素电极和晶体管之间的保持电容器,由第一电极,经由第一电容器绝缘膜与第一电极相对设置的第二电极和经由第二电容器绝缘膜设置成与第一电极相对设置的第三电极 。 第一电容绝缘膜和第二电容绝缘膜都有多层; 当从第一电极观察时,第一电容器绝缘膜和第二电极形成为与第二电容器绝缘膜和第三电极对称。
    • 19. 发明授权
    • Method of manufacturing substrate for electro-optical device, substrate for electro-optical device, electro-optical device, and electronic apparatus
    • 电光装置用基板,电光装置用基板,电光装置及电子装置的制造方法
    • US07226836B2
    • 2007-06-05
    • US10964732
    • 2004-10-15
    • Minoru Moriwaki
    • Minoru Moriwaki
    • H01L21/8242
    • G02F1/136213G02F1/136227
    • Exemplary embodiments provide a method of manufacturing a substrate for an electro-optical device. The method includes sequentially depositing on the substrate a lower conductive layer which is a lower electrode of the capacitor, an intermediate layer which is a dielectric film of the capacitor, and an upper conductive layer which is an upper electrode of the capacitor, in which the lower conductive layer is made of a material having an etching rate lower than an etching rate of a material of the upper conductive layer with respect to a predetermined etching agent; forming a mask having a predetermined planar pattern on the upper conductive layer; patterning the upper conductive layer, the intermediate layer and the lower conductive layer by etching with the mask, in which the etching agent is applied to at least the upper conductive layer and the lower conductive layer; and removing the mask. Accordingly, it is possible to simply manufacture a high reliable capacitor on the substrate.
    • 示例性实施例提供了一种制造用于电光器件的衬底的方法。 该方法包括在基板上依次沉积作为电容器的下电极的下导电层,作为电容器的电介质膜的中间层和作为电容器的上电极的上导电层, 下导电层由蚀刻速率低于上导电层的材料相对于预定蚀刻剂的蚀刻速率的材料制成; 在上导电层上形成具有预定平面图案的掩模; 通过用掩模进行蚀刻来图案化上导电层,中间层和下导电层,其中将蚀刻剂施加到至少上导电层和下导电层; 并取下面罩。 因此,可以简单地在基板上制造高可靠性的电容器。
    • 20. 发明申请
    • Method of manufacturing substrate for electro-optical device, substrate for electro-optical device, electro-optical device, and electronic apparatus
    • 电光装置用基板,电光装置用基板,电光装置及电子装置的制造方法
    • US20050104066A1
    • 2005-05-19
    • US10964732
    • 2004-10-15
    • Minoru Moriwaki
    • Minoru Moriwaki
    • G02F1/1368G02F1/133G02F1/1362G09F9/30H01L21/28H01L21/786H01L29/786H01L31/036
    • G02F1/136213G02F1/136227
    • Exemplary embodiments provide a method of manufacturing a substrate for an electro-optical device. The method includes sequentially depositing on the substrate a lower conductive layer which is a lower electrode of the capacitor, an intermediate layer which is a dielectric film of the capacitor, and an upper conductive layer which is an upper electrode of the capacitor, in which the lower conductive layer is made of a material having an etching rate lower than an etching rate of a material of the upper conductive layer with respect to a predetermined etching agent; forming a mask having a predetermined planar pattern on the upper conductive layer; patterning the upper conductive layer, the intermediate layer and the lower conductive layer by etching with the mask, in which the etching agent is applied to at least the upper conductive layer and the lower conductive layer; and removing the mask. Accordingly, it is possible to simply manufacture a high reliable capacitor on the substrate.
    • 示例性实施例提供了一种制造用于电光器件的衬底的方法。 该方法包括在基板上依次沉积作为电容器的下电极的下导电层,作为电容器的电介质膜的中间层和作为电容器的上电极的上导电层, 下导电层由蚀刻速率低于上导电层的材料相对于预定蚀刻剂的蚀刻速率的材料制成; 在上导电层上形成具有预定平面图案的掩模; 通过用掩模进行蚀刻来图案化上导电层,中间层和下导电层,其中将蚀刻剂施加到至少上导电层和下导电层; 并取下面罩。 因此,可以简单地在基板上制造高可靠性的电容器。