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    • 11. 发明授权
    • Movable lens control device
    • 可移动镜头控制装置
    • US07265913B2
    • 2007-09-04
    • US11202088
    • 2005-08-12
    • Nobuyuki NagaiHiroshi NomuraKazunori IshizukaToshiharu Suzuki
    • Nobuyuki NagaiHiroshi NomuraKazunori IshizukaToshiharu Suzuki
    • G02B15/14
    • G02B7/102
    • A movable lens control device for controlling movements of movable lens groups including a first movable lens group and a second movable lens group, the movable lens control device including a lens driving device for moving the first and second movable lens groups in the optical axis direction; a position detector for detecting a position of the second movable lens group and determining whether the second movable lens group is in a predetermined normal moving range thereof; and a controller which controls operations of the lens driving device to stop the first movable lens group and to move the second movable lens group to a position within the normal moving range upon the position detector determining that the second movable lens group is positioned outside of the normal moving range during a movement of the first movable lens group from a predetermined initial position thereof.
    • 一种可移动透镜控制装置,用于控制包括第一可移动透镜组和第二可移动透镜组的可移动透镜组的移动,所述可移动透镜控制装置包括用于使第一和第二可移动透镜组沿光轴方向移动的透镜驱动装置; 位置检测器,用于检测第二可移动透镜组的位置,并确定第二可移动透镜组是否处于预定的正常移动范围内; 以及控制器,其控制透镜驱动装置的操作以停止第一可移动透镜组并且在位置检测器确定第二可移动透镜组位于正常移动范围的外侧时将第二可移动透镜组移动到正常移动范围内的位置 在第一可移动透镜组从其预定的初始位置移动期间的正常移动范围。
    • 13. 发明申请
    • Retractable lens system
    • 伸缩透镜系统
    • US20060045516A1
    • 2006-03-02
    • US11216167
    • 2005-09-01
    • Kazunori IshizukaToshiharu Suzuki
    • Kazunori IshizukaToshiharu Suzuki
    • G03B17/00
    • G02B7/102G03B17/04
    • A retractable lens system includes a linearly movable ring; a radially-retractable optical element supported by the linearly movable ring; an exposure control unit supported by the linearly movable ring and adjacent to the radially-retractable optical element; a recess formed on the exposure control unit to face the radially-retractable optical element when the radially-retractable optical element is in the radially-retracted position; a retracting device which retracts the radially-retractable optical element to the radially-retracted position and brings at least a part of the radially-retractable optical element to enter the recess when the linearly movable ring retracts from a ready-to-photograph position to a retracted position.
    • 可伸缩透镜系统包括可线性移动的环; 由可线性移动环支撑的可径向缩回的光学元件; 曝光控制单元,由所述线性可移动环支撑并且邻近所述可径向缩回的光学元件; 当所述径向缩回的光学元件处于所述径向缩回位置时,形成在所述曝光控制单元上的与所述径向缩回的光学元件相对的凹部; 缩回装置,其将可径向缩回的光学元件缩回到径向缩回位置,并且当线性可移动环从准备就绪位置缩回到第一位置时,使至少一部分可径向缩回的光学元件进入凹部 缩回位置。
    • 15. 发明授权
    • Method of operating an NC machine tool in accordance with workpiece and
tool profile data
    • 根据工件和刀具轮廓数据操作NC机床的方法
    • US4472782A
    • 1984-09-18
    • US342250
    • 1982-01-25
    • Toshiharu Suzuki
    • Toshiharu Suzuki
    • B23Q15/00B23Q35/12G05B19/4093G05B19/4097G05B19/41G05B19/42G06F15/46
    • G05B19/4202G05B19/41G05B2219/35481G05B2219/49008
    • Method of feeding positional data from a virtual model of a profiled physical model into a movement position device which controls movement of a tool according to the positional data fed thereinto. The method comprises the following steps: defining a virtual stylus whose profile depends on the distribution of "1's" and "0's" in bit positions in a memory space, said positions corresponding to positions in real space with respect to each three-dimensional coordinate axis; storing three-dimensional data on a virtual image of the profiled model, the profile of the former depending on the distribution of "1's" and "0's" in each bit positions in a memory space, said positions corresponding to a positions in real space, the positions in the memory space and real space being referred to the related three-dimensional coordinate systems, and moving the virtual stylus within either a "0" bit area or "1" bit area of the profiled model so as to scan the boundary surface between the distributions of "1's" and "0's", whereby the positional data for forming a male work or female work can be obtained and fed into the position control device.
    • 将位置数据从异型物理模型的虚拟模型进给到根据送入的位置数据来控制工具的移动的移动位置装置的方法。 该方法包括以下步骤:定义一个虚拟笔,其轮廓取决于存储器空间中的比特位置中的“1”和“0”的分布,所述位置对应于相对于每个三维坐标轴的实际空间中的位置 ; 将三维数据存储在异形模型的虚拟图像上,前者的轮廓根据存储器空间中每个位的“1”和“0”的分布,所述位置对应于实际空间中的位置, 存储器空间和实际空间中的位置被称为相关的三维坐标系,并且在虚拟模型的“0”位或“1”位区域内移动虚拟触控笔以便扫描边界面 在“1”和“0”的分布之间,由此可以获得用于形成阳型工件或阴型工件的位置数据并将其馈送到位置控制装置。
    • 16. 发明授权
    • Retractable lens system
    • 伸缩透镜系统
    • US07507040B2
    • 2009-03-24
    • US11202087
    • 2005-08-12
    • Hiroshi NomuraKazunori IshizukaToshiharu Suzuki
    • Hiroshi NomuraKazunori IshizukaToshiharu Suzuki
    • G03B17/00G03B17/04
    • G02B7/102
    • A retractable lens system including a radially-retractable optical element movable to a position outside of a common optical axis; a linearly movable frame which supports the radially-retractable optical element; a rotatable member for moving optical element support frames including the linearly movable frame which support the plurality of optical elements, respectively, between a ready-to-photograph position and a retracted position on the common optical axis; a retracting member which retracts the radially-retractable optical element; and an accommodating portion formed on the rotatable member. At least a portion of the radially-retractable optical element enters into the accommodating portion of the rotatable member when the radially-retractable optical element is moved to the radially-retracted position.
    • 一种可伸缩透镜系统,包括可移动到公共光轴外侧的位置的可径向缩回的光学元件; 支撑径向可缩回的光学元件的线性可移动的框架; 用于移动光学元件支撑框架的可旋转构件,所述光学元件支撑框架包括分别支撑所述多个光学元件的线性可移动框架,所述线性可移动框架在准备照相位置和公共光轴上的缩回位置之间; 缩回构件,其缩回径向缩回的光学元件; 以及形成在所述可旋转构件上的容纳部。 当径向可缩回的光学元件移动到径向缩回位置时,可径向缩回的光学元件的至少一部分进入可旋转构件的容纳部分。
    • 20. 发明授权
    • Method of epitaxial growth of semiconductor
    • 半导体外延生长方法
    • US5373803A
    • 1994-12-20
    • US954341
    • 1992-09-30
    • Takashi NoguchiToshiharu Suzuki
    • Takashi NoguchiToshiharu Suzuki
    • C30B1/02H01L21/20C30B1/06
    • H01L21/2026C30B1/023C30B29/06Y10S117/904Y10S117/913
    • A method of epitaxially growing semiconductor crystal by which a single crystal region which is superior in quality can be selectively formed at a high throughput without employing the lithography technique. A shield mask is formed on an upper face of an amorphous semiconductor layer formed on substrate, and excimer laser light is irradiated upon the amorphous semiconductor layer using the shield mask to produce, in the amorphous semiconductor layer, a core from which crystal is to be grown. After the shield mask is removed, low temperature solid phase annealing processing for the amorphous semiconductor layer is performed to grow crystal from the core to form a single crystal region in the amorphous semiconductor layer. Alternatively, the silicon core is formed by irradiating an energy beam, which is capable of being converged into a thin beam and being used to directly draw a picture, at a predetermined position of the amorphous silicon film.
    • 可以在不使用光刻技术的情况下以高通量选择性地形成质量优异的单晶区域的外延生长半导体晶体的方法。 在形成在基板上的非晶半导体层的上表面上形成屏蔽掩模,并且使用屏蔽掩模将准分子激光照射在非晶半导体层上,以在非晶半导体层中产生晶体为芯的芯 长大的。 在去除屏蔽掩模之后,执行用于非晶半导体层的低温固相退火处理以从芯生长晶体,以在非晶半导体层中形成单晶区域。 或者,通过在非晶硅膜的预定位置照射能够被会聚成薄梁并用于直接绘制图像的能量束来形成硅芯。