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11. 发明申请

US20120048830A1 Abrasive Liquid For Metal and Method for Polishing 有权
标题翻译：金属研磨液和抛光方法
公开(公告)号：US20120048830A1
公开(公告)日：2012-03-01
申请号：US13218590
申请日：2011-08-26
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： C23F1/16 , C23F1/00
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.
摘要翻译：一种用于金属的研磨液，包括（1）金属氧化剂，（2）氧化金属的溶解剂，（3）第一保护膜形成剂，例如氨基酸或唑，物理上吸附金属的表面和/或形成化学键，从而形成保护膜，（4）辅助第一保护膜形成剂的第二保护膜形成剂如聚丙烯酸，聚酰胺或其盐形成保护膜和（5）水; 和抛光方法。

12. 发明授权

US06899821B2 Abrasive liquid for metal and method for polishing 有权
标题翻译：金属研磨液和抛光方法
公开(公告)号：US06899821B2
公开(公告)日：2005-05-31
申请号：US09976001
申请日：2001-10-15
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/321 , C09K13/00 , C09K13/06 , H01L21/302
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent informing a protecting film and (5) water; and a method for polishing.
摘要翻译：一种用于金属的研磨液，包括（1）金属氧化剂，（2）氧化金属的溶解剂，（3）第一保护膜形成剂，例如氨基酸或唑，物理上吸附金属的表面和/或形成化学键，从而形成保护膜，（4）辅助第一保护膜形成剂的第二保护膜形成剂如聚丙烯酸，聚酰胺或其盐通知保护膜和（5）水; 和抛光方法。

13. 发明申请

US20050095860A1 Abrasive liquid for metal and method for polishing 有权
公开(公告)号：US20050095860A1
公开(公告)日：2005-05-05
申请号：US10995494
申请日：2004-11-24
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/321 , H01L21/4763 , H01L21/302 , H01L21/461
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.

14. 发明授权

US07232529B1 Polishing compound for chemimechanical polishing and polishing method 有权
标题翻译：抛光剂用于化学抛光和抛光方法
公开(公告)号：US07232529B1
公开(公告)日：2007-06-19
申请号：US10069404
申请日：2000-08-25
申请人： Takeshi Uchida , Yasuo Kamigata , Hiroki Terasaki , Yasushi Kurata , Tetsuya Hoshino , Akiko Igarashi
发明人： Takeshi Uchida , Yasuo Kamigata , Hiroki Terasaki , Yasushi Kurata , Tetsuya Hoshino , Akiko Igarashi
IPC分类号： C09K13/00 , C09K13/04 , C09K13/06 , H01L21/302
CPC分类号： B24B37/24 , C09G1/02 , C09G1/04 , C11D11/0047 , H01L21/3212
摘要： This invention provides a polishing medium for CMP, comprising an oxidizing agent, a metal-oxide-dissolving agent, a protective-film-forming agent, a water-soluble polymer, and water, and a polishing method making use of this polishing medium. Also, it is preferable that the water-soluble polymer has a weight-average molecular weight of 500 or more and the polishing medium has a coefficient of kinetic friction of 0.25 or more, a Ubbelode's viscosity of from 0.95 mPa·s (0.95 cP) to 1.5 mPa·s (1.5 cP) and a point-of-inflection pressure of 5 kPa (50 gf/cm2).
摘要翻译：本发明提供了一种用于CMP的抛光介质，包括氧化剂，金属氧化物溶解剂，保护膜形成剂，水溶性聚合物和水，以及使用该抛光介质的研磨方法。此外，优选水溶性聚合物的重均分子量为500以上，研磨介质的摩擦系数为0.25以上，Ubbelode粘度为0.95mPa·s（0.95cP）至1.5mPa.s（1.5cP）和5kPa（50gf / cm 2）的拐点压力。

15. 发明申请

US20070190906A1 POLISHING MEDIUM FOR CHEMICAL-MECHANICAL POLISHING, AND POLISHING METHOD 审中-公开
标题翻译：用于化学机械抛光的抛光介质和抛光方法
公开(公告)号：US20070190906A1
公开(公告)日：2007-08-16
申请号：US11737502
申请日：2007-04-19
申请人： TAKESHI UCHIDA , Yasuo Kamigata , Hiroki Terasaki , Yasushi Kurata , Tetsuya Hoshino , Akiko Igarashi
发明人： TAKESHI UCHIDA , Yasuo Kamigata , Hiroki Terasaki , Yasushi Kurata , Tetsuya Hoshino , Akiko Igarashi
IPC分类号： B24B1/00 , B24C1/00
CPC分类号： B24B37/24 , C09G1/02 , C09G1/04 , C11D11/0047 , H01L21/3212
摘要： This invention provides a polishing medium for CMP, comprising an oxidizing agent, a metal-oxide-dissolving agent, a protective-film-forming agent, a water-soluble polymer, and water, and a polishing method making use of this polishing medium. Also, it is preferable that the water-soluble polymer has a weight-average molecular weight of 500 or more and the polishing medium has a coefficient of kinetic friction of 0.25 or more, a Ubbelode's viscosity of from 0.95 mPa·s (0.95 cP) to 1.5 mPa·s (1.5 cP) and a point-of-inflection pressure of 5 kPa (50 gf/cm2).
摘要翻译：本发明提供了一种用于CMP的抛光介质，包括氧化剂，金属氧化物溶解剂，保护膜形成剂，水溶性聚合物和水，以及使用该抛光介质的研磨方法。此外，优选水溶性聚合物的重均分子量为500以上，研磨介质的摩擦系数为0.25以上，Ubbelode粘度为0.95mPa·s（0.95cP）至1.5mPa.s（1.5cP）和5kPa（50gf / cm 2）的拐点压力。

16. 发明申请

US20060186373A1 Polishing medium for chemical-mechanical polishing, and polishing method 审中-公开
标题翻译：抛光介质用于化学机械抛光和抛光方法
公开(公告)号：US20060186373A1
公开(公告)日：2006-08-24
申请号：US11407903
申请日：2006-04-21
申请人： Takeshi Uchida , Yasuo Kamigata , Hiroki Terasaki , Yasushi Kurata , Tetsuya Hoshino , Akiko Igarashi
发明人： Takeshi Uchida , Yasuo Kamigata , Hiroki Terasaki , Yasushi Kurata , Tetsuya Hoshino , Akiko Igarashi
IPC分类号： C09K13/00 , C09K13/06
CPC分类号： B24B37/24 , C09G1/02 , C09G1/04 , C11D11/0047 , H01L21/3212
摘要： This invention provides a polishing medium for CMP, comprising an oxidizing agent, a metal-oxide-dissolving agent, a protective-film-forming agent, a water-soluble polymer, and water, and a polishing method making use of this polishing medium. Also, it is preferable that the water-soluble polymer has a weight-average molecular weight of 500 or more and the polishing medium has a coefficient of kinetic friction of 0.25 or more, a Ubbelode's viscosity of from 0.95 mPa.s (0.95 cP) to 1.5 mPa.s (1.5 cP) and a point-of-inflection pressure of 5 kPa (50 gf/cm2).
摘要翻译：本发明提供了一种用于CMP的抛光介质，包括氧化剂，金属氧化物溶解剂，保护膜形成剂，水溶性聚合物和水，以及使用该抛光介质的研磨方法。此外，优选水溶性聚合物的重均分子量为500以上，研磨介质的摩擦系数为0.25以上，Ubbelode粘度为0.95mPa·s（0.95cP）至1.5mPa.s（1.5cP）和5kPa（50gf / cm 2）的拐点压力。

17. 发明申请

US20110043860A1 Information processing device, information processing method, and program 失效
标题翻译：信息处理装置，信息处理方法和程序
公开(公告)号：US20110043860A1
公开(公告)日：2011-02-24
申请号：US12804982
申请日：2010-08-03
申请人： Shingo Hitose , Noboru Koyama , Tetsuya Hoshino , Yuma Kokuzawa
发明人： Shingo Hitose , Noboru Koyama , Tetsuya Hoshino , Yuma Kokuzawa
IPC分类号： G06F15/00
CPC分类号： G06F15/00 , H04N1/00347 , H04N2201/0082 , H04N2201/0089
摘要： An information processing device includes a printer unit configured to perform a printing process, a display unit configured to display an image and display printing information including setting information of the printing process using the printer unit, a position sensor configured to output a detection signal enabling a determination of whether the information processing device is set in an image display position or a printing position, and a control unit configured to receive the detection signal from the position sensor and display the printing information on the display unit when it is determined that the information processing device is in the printing position.
摘要翻译：信息处理装置包括被配置为执行打印处理的打印机单元，被配置为显示图像的显示单元和包括使用打印机单元的打印处理的设置信息的打印信息，位置传感器，被配置为输出检测信号，确定信息处理装置是否设置在图像显示位置或打印位置，以及控制单元，被配置为当确定信息处理时从位置传感器接收检测信号并将显示单元显示在显示单元上设备处于打印位置。

18. 发明申请

US20070229642A1 Printer device 失效
标题翻译：打印机设备
公开(公告)号：US20070229642A1
公开(公告)日：2007-10-04
申请号：US11717073
申请日：2007-03-13
申请人： Noboru Koyama , Tetsuya Hoshino
发明人： Noboru Koyama , Tetsuya Hoshino
IPC分类号： B41J2/385
CPC分类号： B41J11/0095 , B41J2/325
摘要： A printer device that prints an image to a printing paper using a thermal head formed with a plurality of heating resistors. The printer device includes: edge position detection means for performing edge position detection, at four corners, to an incoming printing paper using the thermal head based on a change of temperature increase observed in, as a result of energization, any of the heating resistors opposing the printing paper and the remaining heating resistors not opposing the printing paper; and control means for exercising control over an image printing operation using the thermal head based on a detection output derived by the edge position detection means.
摘要翻译：一种打印机装置，其使用由多个加热电阻器形成的热敏头将图像打印到打印纸上。打印机装置包括：边缘位置检测装置，用于在四角处对使用热敏头的进入打印纸进行边缘位置检测，所述打印纸基于作为通电的结果中观察到的任何加热电阻器相对的温度升高的变化，打印纸和剩余的加热电阻器不与打印纸相对; 以及控制装置，用于基于由边缘位置检测装置导出的检测输出来对使用热敏头的图像打印操作进行控制。

19. 发明授权

US5613432A Arch type strapping machine 失效
标题翻译：拱型捆扎机
公开(公告)号：US5613432A
公开(公告)日：1997-03-25
申请号：US524838
申请日：1995-09-07
申请人： Tetsuya Hoshino
发明人： Tetsuya Hoshino
IPC分类号： B65B13/06
CPC分类号： B65B13/06
摘要： An arch type band guide includes corner elements and straight elements each having the same shape and the same size, wherein the elements are connected in a manner capable of swinging in an arch unit, whereby various sizes of band guide can be easily fabricated depending on the size of articles to be packed.
摘要翻译：拱型带引导件包括角形元件和每个具有相同尺寸的相同尺寸的直线元件，其中元件以能够在拱形单元中摆动的方式连接，由此可以根据要包装的物品的大小。

20. 发明授权

US07768685B2 Hologram optical element and surface light source device using the hologram optical element 有权
标题翻译：全息光学元件和使用全息光学元件的表面光源装置
公开(公告)号：US07768685B2
公开(公告)日：2010-08-03
申请号：US10555591
申请日：2004-05-07
申请人： Tetsuya Hoshino , Yasushi Sugimoto
发明人： Tetsuya Hoshino , Yasushi Sugimoto
IPC分类号： G02B5/32
CPC分类号： G02B6/0053 , G02B5/0252 , G02B5/1871 , G02B5/32 , G02B6/0038 , G02B6/0065 , G02F2001/133607 , G03H2001/264
摘要： A hologram optical element having a thin form and a high degree of light transmittance, moreover that provides superior handling ease, as well as a surface light source device employing this hologram optical element. The angle at which light can be bent in this hologram optical element, has low wavelength dependency, and the hologram optical element enables prevention of spectral separation in white light incident from an oblique direction which is bent to a vertical direction and emitted. A transmitting diffraction grating, when light of wavelengths λ1, λ2 and λ3 within the ranges 0.46≦λ1≦0.50 μm (blue light), 0.53≦λ2≦0.57 μm (green light), 0.60≦λ3≦0.64 μm (red light) is incident at angle θi, the maximum diffraction angle for diffractive efficiency of each wavelength is within the range from −5 degrees to +5 degrees.
摘要翻译：具有薄型和高透光率的全息光学元件，而且提供了优异的处理容易性，以及采用该全息光学元件的表面光源装置。在该全息光学元件中光可以弯曲的角度具有低的波长依赖性，并且全息光学元件能够防止从向垂直方向弯曲的倾斜方向入射的白光中的光谱分离并发射。波长λ1，λ2和λ3的光在0.46＆nlE;λ1＆nlE;0.50μm（蓝光），0.53＆nlE;λ2＆nlE;0.57μm（绿光），0.60＆amp; NlE;λ3＆nlE;0.64μm 光）以角度入射; i，每个波长的衍射效率的最大衍射角在-5度至+5度的范围内。

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