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    • 11. 发明授权
    • Vane pump
    • 叶片泵
    • US3989426A
    • 1976-11-02
    • US597176
    • 1975-07-18
    • Masayuki SatoFumio FujisawaKenichi Kawashima
    • Masayuki SatoFumio FujisawaKenichi Kawashima
    • F04C2/352F01C1/352F01C21/08F04C15/00F04C18/352F04C29/10
    • F01C21/0836F04C15/0042
    • A vane pump comprising a cylindrical pump chamber, vanes adapted to rotate within the pump chamber, and a drive rotor arranged eccentrically with respect to the center of rotation of the vanes, such vane pump being formed with through holes in portions of opposite end walls of the drive rotor which are in spaced juxtaposed relationship with side end faces of each vane, such through holes being connected to a line for supplying therethrough a portion of the fluid discharged by the vane pump. During operation of the vane pump, the portion of the fluid discharged by the pump and supplied through the line is ejected through the through openings against the side end faces of the vanes so as to avoid collision between the end walls of the drive rotor and the side end faces of the vanes whereby the service life of the vane pump can be increased.
    • 一种叶片泵,包括圆柱形泵室,适于在泵室内旋转的叶片以及相对于叶片旋转中心偏心设置的驱动转子,该叶片泵在相对端壁的相对端壁的部分中形成有通孔 所述驱动转子与每个叶片的侧端面间隔开并置关系,所述通孔连接到用于通过叶片泵排出的流体的一部分供给的管线。 在叶片泵的操作期间,由泵排出并通过管线供应的流体的部分通过通孔被喷射抵靠叶片的侧端面,以避免驱动转子的端壁与 叶片的侧端面,从而可以增加叶片泵的使用寿命。
    • 15. 发明授权
    • Electron beam exposure system
    • 电子束曝光系统
    • US4853870A
    • 1989-08-01
    • US54782
    • 1987-05-27
    • Nobuyuki YasutakeJun-ichi KaiHiroshi YasudaKenichi Kawashima
    • Nobuyuki YasutakeJun-ichi KaiHiroshi YasudaKenichi Kawashima
    • H01J37/147G05B15/02H01J37/304H01J37/317H01L21/027H01L21/30
    • B82Y10/00B82Y40/00H01J37/304H01J37/3174H01J2237/15H01J2237/30455H01J2237/31766
    • In an electron beam exposure system controlled by a computer, the system includes: an electron optical device for generating electron beams and irradiating the beams to a sample on a stage through a plurality of electron lens, a main deflection coil, and sub deflection electrodes, to form predetermined circuit patterns on the sample. The system also includes a position control device controlling the driving of the stage based on a stage position coordinate designated by the computer, detecting an actual stage position coordinate, and calculating an error value between the designated stage position coordinate and the actual stage position coordinate, the error value being divided into two components of an upper bits portion having an relatively large error value and a lower bits portion having a relatively small error value, and a deflection control device controlling the direction of the electron beams based on the main pattern data corrected by the upper bits portion and the sub pattern data corrected by the lower bits portion, and based on selected main and sub wait times determined by exposure and non-exposure timings.
    • 在由计算机控制的电子束曝光系统中,该系统包括:用于产生电子束并通过多个电子透镜,主偏转线圈和副偏转电极将光束照射到载物台上的样品的电子光学装置, 以在样品上形成预定的电路图案。 该系统还包括:基于由计算机指定的舞台位置坐标来控制舞台的驾驶的位置控制装置,检测实际舞台位置坐标,以及计算指定舞台位置坐标与实际舞台位置坐标之间的误差值, 误差值被分成具有相对较大误差值的较高位部分和具有相对较小误差值的较低位部分的两个分量,以及基于校正的主图案数据控制电子束方向的偏转控制装置 通过由较低位部分校正的较高比特部分和子图形数据,并且基于由曝光和非曝光定时确定的选择的主等待时间和次等待时间。
    • 17. 发明授权
    • Refrigerating machine oil composition, and refrigeration and compressor using the refrigerating machine oil composition
    • 制冷机油组成,制冷压缩机采用冷冻机油组成
    • US06176094B1
    • 2001-01-23
    • US09149221
    • 1998-09-08
    • Ryou OhtaYutaka ItoKenichi KawashimaJuichi AraiTadashi Iizuka
    • Ryou OhtaYutaka ItoKenichi KawashimaJuichi AraiTadashi Iizuka
    • F25B4100
    • C10M131/12C10M129/84C10M171/007C10M2207/32C10M2211/044C10M2211/06C10N2240/00C10N2240/22C10N2240/30C10N2240/50C10N2240/52C10N2240/54C10N2240/56C10N2240/58C10N2240/60C10N2240/66F25B31/002
    • The present invention relates to a refrigerating machine oil composition, which is composed of a base oil as a main component containing a single component of a compound or a mixture of compounds selected from the group consisting of cyclic carbonates and aliphatic carbonate derivatives. For example, the refrigerating machine oil composition is characterized by that the single component of a compound or the mixture of compounds selected from the group consisting of cyclic carbonates and aliphatic carbonate derivatives are expressed by the following general chemical formulas for cyclic carbonates (1) and aliphatic carbonate derivatives (2): (R1, R2 in the formula (1) respectively and independently express a hydrogen atom or a fluorine atom or an alkyl having a carbon number of 1 to 4, or a perfluoroalkyl having a carbon number of 1 to 3. Therein, R1 and R2 may be the same or different from each other. R3, R4 in the formula (2) respectively and independently express an alkyl having a carbon number of 1 to 4 or a perfluoroalkyl having a carbon number of 1 to 3. Therein, R3 and R4 may be same or different from each other.) An object of the present invention is to provide a refrigerating machine oil having an excellent wear resistance, a refrigeration system working medium and a refrigeration system using the refrigerating machine oil, and a compressor used in the refrigeration system.
    • 本发明涉及一种制冷机油组合物,其由基油作为主要成分组成,其中含有化合物的单一成分或选自环状碳酸酯和脂肪族碳酸酯衍生物的化合物的混合物。 例如,冷冻机油组合物的特征在于,化合物的单一成分或选自环状碳酸酯和脂肪族碳酸酯衍生物的化合物的混合物由以下的环状碳酸酯的一般化学式(1)和 脂肪族碳酸酯衍生物(2):(式(1)中的R 1,R 2分别独立地表示氢原子或氟原子或碳数为1〜4的烷基或碳数为1〜 其中,R 1和R 2可以相同或不同,式(2)中的R 3,R 4分别独立地表示碳数为1〜4的烷基或碳数为1〜 其中,R 3和R 4可以相同或不同。)本发明的目的是提供一种耐磨性优异的制冷机油,制冷系统工作介质 d使用制冷机油的制冷系统和用于制冷系统的压缩机。
    • 20. 发明授权
    • Method and apparatus for processing negative photoresist
    • 负光致抗蚀剂的处理方法和装置
    • US4426439A
    • 1984-01-17
    • US329941
    • 1981-12-11
    • Koichi KobayashiKenichi KawashimaShuzo Oshio
    • Koichi KobayashiKenichi KawashimaShuzo Oshio
    • H01L21/302G03F7/038G03F7/20G03F7/26G03F7/38H01L21/3065G03C5/04
    • G03F7/38G03F7/20Y10S430/168
    • A negative photoresist emulsion, wherein after a film of negative photoresist emulsion on a substrate has been exposed for pattern writing in vacuum to charged particle beams or soft X-ray beams, the film-coated substrate is transferred to, and kept in, a chamber filled with non-oxidizing gas, and then the substrate is removed to the outside atmosphere. By this method, a curing effect of the photoresist film is prevented, enabling formation of fine patterns with precision. An apparatus for carrying out the above method, has a gas chamber filled with non-oxidizing gas connected to an exposure chamber, and the substrate, after such exposure, is kept in an atmosphere of non-oxidizing gas in the gas chamber before being removed to the outside atmosphere. In either the above-method or apparatus, the concentration of oxygen in the non-oxidizing gas must be less than 5%, preferably less than 1%.
    • 一种负性光致抗蚀剂乳液,其中在基底上的负性光致抗蚀剂乳剂的膜已暴露以在真空中进行图案书写以填充带电粒子束或软X射线束之后,将该膜涂覆的基底转移到并保持在室中 填充非氧化性气体,然后将基板除去到外部气氛。 通过该方法,防止光致抗蚀剂膜的固化效果,从而能够精确地形成精细图案。 用于执行上述方法的装置具有填充有与曝光室连接的非氧化性气体的气室,并且在暴露之后,将衬底在去除之前保持在气体室中的非氧化气体气氛中 到外面的气氛。 在上述方法或装置中,非氧化性气体中的氧浓度必须小于5%,优选小于1%。