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11. 发明申请

US20080131747A1 MODULE-TYPE FUEL CELL SYSTEM 有权
标题翻译：模块式燃料电池系统
公开(公告)号：US20080131747A1
公开(公告)日：2008-06-05
申请号：US11946491
申请日：2007-11-28
申请人： Jung-kurn Park , Dong-hyun Kim , Eun-suk Cho
发明人： Jung-kurn Park , Dong-hyun Kim , Eun-suk Cho
IPC分类号： H01M8/02
CPC分类号： H01M8/04156 , H01M8/04074 , H01M8/04089 , H01M8/04097 , H01M2008/1095 , Y02P70/56
摘要： A module-type fuel cell system including a power module includes a generator installed inside and a power housing having a plurality of connection holes formed sideward, wherein the generator generates electricity through an oxidation-reduction reaction of an oxidizing agent with a hydrogen-containing fuel; a fuel supply module including a fuel supply unit installed inside and a power housing having a plurality of connection holes formed sideward, wherein the fuel supply unit supplies a hydrogen-containing fuel to the generator; an oxidizing agent supply module including an oxidizing agent supply unit installed inside and an oxidizing agent supply housing having connection holes formed sideward, wherein the oxidizing agent supply unit supplies an oxidizing agent to the generator; and a recovery module including a storage space formed therein and a recovery housing having a plurality of connection holes formed sideward, wherein the storage space recovers an unreacted fuel generated in the generator, wherein the power module is closely attached and assembled in one side of the recovery module in a surface-to-surface contact manner, and the fuel supply module and the oxidizing agent supply module are closely attached and assembled in the other side of the recovery module in a surface-to-surface contact manner.
摘要翻译：包括功率模块的模块型燃料电池系统包括安装在内部的发电机和具有侧面形成的多个连接孔的动力壳体，其中发电机通过氧化剂与含氢燃料的氧化还原反应发电 ; 燃料供给模块，其包括安装在内部的燃料供给单元和具有侧面形成的多个连接孔的动力壳体，其中，所述燃料供给单元向所述发电机供给含氢燃料; 包括安装在内部的氧化剂供给单元和具有侧面形成有连接孔的氧化剂供给壳体的氧化剂供给模块，其中，所述氧化剂供给单元向所述发电机供给氧化剂; 以及回收模块，其包括形成在其中的储存空间和具有多个侧面形成的连接孔的回收壳体，其中所述储存空间回收在所述发生器中产生的未反应燃料，其中所述功率模块紧密地附接和组装在回收模块以面对面接触方式，并且燃料供给模块和氧化剂供应模块以面对面的接触方式紧密地附接和组装在恢复模块的另一侧。

12. 发明授权

US08889560B2 Methods of forming fine patterns for semiconductor device 有权
标题翻译：形成半导体器件精细图案的方法
公开(公告)号：US08889560B2
公开(公告)日：2014-11-18
申请号：US13474764
申请日：2012-05-18
申请人： Byung-hong Chung , Cha-young Yoo , Dong-hyun Kim
发明人： Byung-hong Chung , Cha-young Yoo , Dong-hyun Kim
IPC分类号： H01L21/311 , H01L21/3213 , H01L21/033 , H01L27/108 , H01L21/308 , H01L27/02 , H01L27/115 , H01L21/02
CPC分类号： H01L21/32139 , H01L21/0217 , H01L21/0228 , H01L21/0337 , H01L21/0338 , H01L21/3086 , H01L21/3088 , H01L21/31116 , H01L27/0207 , H01L27/10888 , H01L27/10891 , H01L27/11568
摘要： Methods of forming fine patterns for a semiconductor device include forming a hard mask layer on an etch target layer; forming a carbon containing layer on the hard mask layer; forming carbon containing layer patterns by etching the carbon containing layer; forming spacers covering opposing side walls of each of the carbon containing layer patterns; removing the carbon containing layer patterns; forming hard mask patterns by etching the hard mask layer using the spacers as a first etching mask; and etching the etch target layer by using the hard mask patterns a second etching mask.
摘要翻译：形成用于半导体器件的精细图案的方法包括在蚀刻目标层上形成硬掩模层; 在所述硬掩模层上形成含碳层; 通过蚀刻含碳层形成含碳层图案; 形成覆盖每个含碳层图案的相对侧壁的间隔物; 去除含碳层图案; 通过使用间隔物作为第一蚀刻掩模蚀刻硬掩模层来形成硬掩模图案; 以及通过使用所述硬掩模图案蚀刻所述蚀刻目标层的第二蚀刻掩模。

13. 发明授权

US08818126B2 Method and apparatus for block-based image denoising 有权
标题翻译：基于块的图像去噪的方法和装置
公开(公告)号：US08818126B2
公开(公告)日：2014-08-26
申请号：US12913909
申请日：2010-10-28
申请人： Gun-shik Shin , Dong-hyun Kim , Jae-hun Lee , Sang-yun Kim
发明人： Gun-shik Shin , Dong-hyun Kim , Jae-hun Lee , Sang-yun Kim
IPC分类号： G06K9/40 , G06K9/36
CPC分类号： G06T5/002 , G06T2207/20021
摘要： A block-based image denoising method includes determining similarities between a current block and reference blocks within a search range around the current block, from among certain-sized blocks divided from an input image; determining weights of the reference blocks with respect to the current block based on the similarities; and generating resultant blocks by denoising the current block with respect to every block of the input image based on the weights of the reference blocks.
摘要翻译：基于块的图像去噪方法包括：从当前块与当前块周围的搜索范围内的参考块之间确定与从输入图像分开的特定大小的块中的相似度; 基于相似度确定参考块相对于当前块的权重; 以及基于所述参考块的权重，通过对所述输入图像的每个块去除当前块来生成合成块。

14. 发明授权

US08304886B2 Semiconductor device having integral structure of contact pad and conductive line 有权
标题翻译：具有接触焊盘和导线整体结构的半导体器件
公开(公告)号：US08304886B2
公开(公告)日：2012-11-06
申请号：US12590802
申请日：2009-11-13
申请人： Dong-hyun Kim
发明人： Dong-hyun Kim
IPC分类号： H01L23/48
CPC分类号： H01L24/05 , H01L21/0337 , H01L21/0338 , H01L21/32139 , H01L23/522 , H01L24/06 , H01L27/11519 , H01L27/11529 , H01L2224/05599 , H01L2224/0612 , H01L2224/06515 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01014 , H01L2924/01018 , H01L2924/01033 , H01L2924/01047 , H01L2924/0105 , H01L2924/01074 , H01L2924/04953 , H01L2924/05042 , H01L2924/10253 , H01L2924/12044 , H01L2924/00
摘要： Provided are a semiconductor device and a method of forming a semiconductor device in which a plurality of patterns are simultaneously formed to have different widths and the pattern densities of some regions are increased using a double patterning. The semiconductor device includes a plurality of conductive lines each including a first line portion and a second line portion, where the first line portion extends on a substrate in a first direction, the second line portion extends from one end of the first line portion in a second direction different from the first direction; a plurality of contact pads each of which is connected with a respective conductive line of the plurality of conductive lines and a respective second line portion of a respective conductive line of the plurality of conductive lines; and a plurality of dummy conductive lines each including a first dummy portion extending from a respective contact pad of the plurality of contact pads, in parallel with the corresponding second line portion in the second direction.
摘要翻译：提供半导体器件和形成半导体器件的方法，其中多个图案同时形成为具有不同的宽度，并且使用双重图案化来增加一些区域的图案密度。半导体器件包括多个导线，每条导线包括第一线部分和第二线部分，其中第一线部分在第一方向上在衬底上延伸，第二线部分从第一线部分的一端延伸到第二方向与第一方向不同; 多个接触焊盘，其各自与所述多根导电线中的相应导电线连接，并且所述多条导线的相应导电线的相应的第二线部分; 以及多个虚设导电线，每个虚设导电线包括从所述多个接触焊盘的相应的接触焊盘延伸的第一虚设部分，与所述第二方向上的对应的第二线部分平行。

15. 发明申请

US20080224957A1 PLASMA DISPLAY PANEL 审中-公开
标题翻译：等离子显示面板
公开(公告)号：US20080224957A1
公开(公告)日：2008-09-18
申请号：US12044785
申请日：2008-03-07
申请人： Dong-hyun Kim
发明人： Dong-hyun Kim
IPC分类号： G09G3/28
CPC分类号： G09G3/288 , G09G2300/0426 , G09G2320/0219 , G09G2330/06
摘要： A plasma display panel (PDP) capable of reducing or suppressing resonance between adjacent capacitively coupled sustain electrodes, which can generate audible noise from a panel, and accordingly reducing the noise of the panel. The sustain electrodes comprise a plurality of X electrodes and a plurality of Y electrodes, which cross a substantially perpendicular plurality of address electrodes. According to one embodiment, the sustain electrodes are arranged using at least two of four different patterns of four, such as X-Y:X-Y, X-Y:Y-X, Y-X:Y-X, and Y-X:X-Y. According to another embodiment, a pattern of four adjacent electrodes is not repeated more than once.
摘要翻译：能够降低或抑制相邻的电容耦合维持电极之间的共振的等离子体显示面板（PDP），其可以从面板产生可听见的噪声，并因此降低面板的噪音。维持电极包括多个X电极和多个Y电极，其跨过基本垂直的多个寻址电极。根据一个实施例，使用四个不同的四个图案中的至少两个，例如X-Y：X-Y，X-Y：Y-X，Y-X：Y-X和Y-X：X-Y来布置维持电极。根据另一个实施例，四个相邻电极的图案不会重复多于一次。

16. 发明授权

US06395411B1 Display device adopting light-emitting compound as color-developing substance 有权
标题翻译：显示装置采用发光复合材料作为显色物质
公开(公告)号：US06395411B1
公开(公告)日：2002-05-28
申请号：US09351162
申请日：1999-07-12
申请人： Soon-ki Kwon , Yun-hi Kim , Dong-cheol Shin , Han-sung Yu , Sung-woo Cho , Dong-hyun Kim , Sung-hyun Cho
发明人： Soon-ki Kwon , Yun-hi Kim , Dong-cheol Shin , Han-sung Yu , Sung-woo Cho , Dong-hyun Kim , Sung-hyun Cho
IPC分类号： H05B3314
CPC分类号： H01L51/005 , C09K11/06 , H01L51/004 , H01L51/0052 , H01L51/0058 , H01L51/0059 , H01L51/0081 , H01L51/5012 , H01L2251/308 , Y10S428/917
摘要： A light-emitting compound and a display device adopting the light-emitting compound as a color-developing substance. When an organic layer such as a light-emitting layer is formed using the light-emitting compound as a blue light-emitting material, an organic electro-luminescence device having improved luminous efficiency and luminance characteristics can be obtained.
摘要翻译：发光性化合物和采用该发光性化合物作为显色性物质的显示装置。当使用发光化合物作为蓝色发光材料形成诸如发光层的有机层时，可以获得具有改善的发光效率和亮度特性的有机电致发光器件。

17. 发明授权

US09379001B2 Semiconductor device and method of fabricating the same 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US09379001B2
公开(公告)日：2016-06-28
申请号：US14182686
申请日：2014-02-18
申请人： Yonggyu Choi , Dong-hyun Kim , Yongchul Oh , Kichul Nam
发明人： Yonggyu Choi , Dong-hyun Kim , Yongchul Oh , Kichul Nam
IPC分类号： H01L29/06 , H01L23/485 , H01L21/764 , H01L21/768 , H01L27/02
CPC分类号： H01L21/764 , H01L21/76831 , H01L21/76895 , H01L21/76897 , H01L27/0207
摘要： A semiconductor device includes line patterns disposed on a substrate, the line patterns extending in a first direction and being parallel to one another. The semiconductor device includes conductive patterns spaced apart from each other in the first direction between an adjacent pair of the line patterns. The semiconductor device includes insulating fences electrically isolating the conductive patterns from each other and having chamfered corners. The semiconductor device includes insulating patterns filling gaps between side surfaces of the line patterns and the chamfered corners of the insulating fences.
摘要翻译：半导体器件包括设置在衬底上的线图案，线图案沿第一方向延伸并彼此平行。半导体器件包括在相邻的一对线图案之间沿第一方向彼此间隔开的导电图案。半导体器件包括将导电图案彼此电隔离并具有倒角的绝缘栅栏。半导体器件包括填充线图案的侧表面和绝缘栅栏的倒角的间隙的绝缘图案。

18. 发明授权

US08953896B2 Method and apparatus for enhancing image quality using spatial modulation per band 有权
标题翻译：使用每频带空间调制增强图像质量的方法和装置
公开(公告)号：US08953896B2
公开(公告)日：2015-02-10
申请号：US13181824
申请日：2011-07-13
申请人： Hyun-seung Lee , Dong-hyun Kim , Se-hyeok Park , Jong-hyun Park , Gun-shik Shin , Youn-jin Kim
发明人： Hyun-seung Lee , Dong-hyun Kim , Se-hyeok Park , Jong-hyun Park , Gun-shik Shin , Youn-jin Kim
IPC分类号： G06K9/00 , H04N19/33
CPC分类号： H04N19/00436 , H04N19/33
摘要： A method and apparatus for enhancing and improving image quality are provided. The method includes separating an input image into at least one low frequency component and at least one high frequency component; modulating the low frequency components in a block unit by dithering; modulating the high frequency components by sampling; and combining the modulated low frequency components and the modulated high frequency components.
摘要翻译：提供了一种提高和提高图像质量的方法和装置。该方法包括将输入图像分离成至少一个低频分量和至少一个高频分量; 通过抖动调制块单元中的低频分量; 通过采样调制高频分量; 以及组合调制的低频分量和调制的高频分量。

19. 发明申请

US20130048603A1 METHOD OF FORMING MICROPATTERNS 有权
标题翻译：形成微孔蛋白的方法
公开(公告)号：US20130048603A1
公开(公告)日：2013-02-28
申请号：US13588011
申请日：2012-08-17
申请人： Ki-jeong Kim , Jae-ho Min , Kyoung-sub Shin , Dong-hyun Kim
发明人： Ki-jeong Kim , Jae-ho Min , Kyoung-sub Shin , Dong-hyun Kim
IPC分类号： B44C1/22
CPC分类号： G03F7/0035 , G03F7/00
摘要： A method of forming micropatterns separated over a misalignment margin includes forming a first mold pattern including a main pattern and a separation-assist pattern, forming a first spacer mask having a first width around the first mold pattern, forming a second mold pattern using the first spacer mask as an etch mask, forming a second spacer mask having a second width around the second mold pattern, and forming a target pattern using the second spacer mask as an etch mask.
摘要翻译：形成在不对准边缘上分离的微图案的方法包括形成包括主图案和分离辅助图案的第一模具图案，形成具有围绕第一模具图案的第一宽度的第一间隔掩模，使用第一模具形成第二模具图案间隔掩模作为蚀刻掩模，形成具有围绕第二模具图案的第二宽度的第二间隔掩模，以及使用第二间隔掩模作为蚀刻掩模形成目标图案。

20. 发明申请

US20130034963A1 METHODS OF FORMING FINE PATTERNS FOR SEMICONDUCTOR DEVICE 有权
标题翻译：形成半导体器件精细图案的方法
公开(公告)号：US20130034963A1
公开(公告)日：2013-02-07
申请号：US13474764
申请日：2012-05-18
申请人： Byung-hong Chung , Cha-young Yoo , Dong-hyun Kim
发明人： Byung-hong Chung , Cha-young Yoo , Dong-hyun Kim
IPC分类号： H01L21/311
CPC分类号： H01L21/32139 , H01L21/0217 , H01L21/0228 , H01L21/0337 , H01L21/0338 , H01L21/3086 , H01L21/3088 , H01L21/31116 , H01L27/0207 , H01L27/10888 , H01L27/10891 , H01L27/11568
摘要： Methods of forming fine patterns for a semiconductor device include forming a hard mask layer on an etch target layer; forming a carbon containing layer on the hard mask layer; forming carbon containing layer patterns by etching the carbon containing layer; forming spacers covering opposing side walls of each of the carbon containing layer patterns; removing the carbon containing layer patterns; forming hard mask patterns by etching the hard mask layer using the spacers as a first etching mask; and etching the etch target layer by using the hard mask patterns a second etching mask.
摘要翻译：形成用于半导体器件的精细图案的方法包括在蚀刻目标层上形成硬掩模层; 在所述硬掩模层上形成含碳层; 通过蚀刻含碳层形成含碳层图案; 形成覆盖每个含碳层图案的相对侧壁的间隔物; 去除含碳层图案; 通过使用间隔物作为第一蚀刻掩模蚀刻硬掩模层来形成硬掩模图案; 以及通过使用所述硬掩模图案蚀刻所述蚀刻目标层的第二蚀刻掩模。

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