会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 14. 发明授权
    • Manufacturing method for light emitting device
    • 发光装置的制造方法
    • US08168483B2
    • 2012-05-01
    • US13108128
    • 2011-05-16
    • Shunpei YamazakiHideaki KuwabaraMasakazu Murakami
    • Shunpei YamazakiHideaki KuwabaraMasakazu Murakami
    • H01L21/84
    • H01L51/56C23C14/046C23C14/12C23C14/246C23C14/564H01L27/3244H01L33/44
    • The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.
    • 本发明提供一种可以更有效地使用EL材料的成膜系统的气相沉积方法和气相沉积系统,并且形成具有高生产率的均匀性优异的EL材料。 根据本发明,在成膜室内部,将密封蒸发材料的多个容器以一定间距移动到基板上的矩形状的蒸发源保持器和蒸发材料蒸镀在基板上。 此外,蒸发源保持器的纵向方向可以在基板的一侧倾斜,同时蒸发源保持器被移动。 此外,优选的是,蒸镀源夹持器在气相沉积期间的移动方向与形成TFT的激光束的扫描方向不同。