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11. 发明授权

US4844767A Method of and apparatus for etching 失效
标题翻译：蚀刻方法和设备
公开(公告)号：US4844767A
公开(公告)日：1989-07-04
申请号：US158126
申请日：1988-02-16
申请人： Sadayuki Okudaira , Shigeru Nishimatsi , Keizo Suzuki , Ken Ninomiya
发明人： Sadayuki Okudaira , Shigeru Nishimatsi , Keizo Suzuki , Ken Ninomiya
IPC分类号： H01L21/302 , C23F4/00 , H01J37/32 , H01L21/3065 , H01L21/3213
CPC分类号： H01J37/32192 , H01J37/32706 , H01L21/32136 , H01J2237/3346
摘要： A plasma which is formed by the contact between a microwave and a reaction gas is brought into contact with an article to be etched which is AC-biased, thereby effecting etching of an exposed region of the article. The etching is carried out in a state wherein the self-bias formed between the plasma and the article is minimized, whereby it is possible to effect etching which provides high selectivity and which enables a substantially vertical side wall to be formed.
摘要翻译：通过微波和反应气体之间的接触而形成的等离子体与被AC偏压的被蚀刻物接触，从而进行对物品的暴露区域的蚀刻。在等离子体和制品之间形成的自偏压最小化的状态下进行蚀刻，从而可以实现提供高选择性的蚀刻，并且能够形成基本垂直的侧壁。

12. 发明授权

US4522674A Surface treatment apparatus 失效
标题翻译：表面处理装置
公开(公告)号：US4522674A
公开(公告)日：1985-06-11
申请号：US573325
申请日：1984-01-24
申请人： Ken Ninomiya , Keizo Suzuki , Shigeru Nishimatsu
发明人： Ken Ninomiya , Keizo Suzuki , Shigeru Nishimatsu
IPC分类号： H01L21/324 , B23K15/00 , H01J37/32 , H01L21/302 , H01L21/3065 , B44C1/22 , C03C15/00 , C03C25/06 , C23C13/08
CPC分类号： H01J37/3244 , B23K15/00
摘要： A gas is introduced into a surface treatment chamber and is activated therein. The surface of a specimen placed in the surface treatment chamber is treated by using reactive species generated by this activation. A means of supplying controllable energy such as the energy of heat, light, or electron beams is provided in a stage preceding the surface treatment chamber so as to activate the gas beforehand. The pre-activated gas is introduced into the surface treatment chamber and is activated again therein.
摘要翻译：气体被引入表面处理室并在其中被激活。通过使用通过该活化产生的反应物种来处理放置在表面处理室中的样品的表面。在表面处理室之前的一个阶段提供了提供可控能量的装置，例如热能，光能或电子束的能量，以便事先激活气体。预活化气体被引入到表面处理室中并再次被激活。

13. 发明授权

US5220169A Surface analyzing method and apparatus 失效
标题翻译：表面分析方法和装置
公开(公告)号：US5220169A
公开(公告)日：1993-06-15
申请号：US517692
申请日：1990-05-02
申请人： Ken Ninomiya , Keizo Suzuki , Shigeru Nishimatsu
发明人： Ken Ninomiya , Keizo Suzuki , Shigeru Nishimatsu
IPC分类号： G01N21/33 , G01N23/22 , G01N23/227 , G21K1/06 , G21K7/00 , H01J49/16
CPC分类号： G01N23/2273 , G01N23/22 , G21K1/06 , G21K7/00 , H01J49/16
摘要： A first beam of light having a wavelength ranging from a soft X-ray to a vacuum ultraviolet region is focused into a thin beam of light and irradiated upon a surface of a specimen, and physical information obtained as a result of such irradiation is detected to obtain information of the surface of the specimen. A second beam of light is focused into a thin beam of light and irradiated at the irradiation spot of the first beam of light upon the surface of the specimen, and the position of the irradiation spot of the second beam of light on the surface of the specimen is visually observed to located the position of the irradiation point of the first beam of light on the surface of the specimen.
摘要翻译：将具有从软X射线到真空紫外线区域的波长的第一光束聚焦成薄光束并照射到样本的表面，并且检测作为这种照射的结果获得的物理信息获取样品表面的信息。第二光束被聚焦成薄的光束，并且在第一光束的照射点被照射在被检体的表面上，第二光束的照射点的位置在目视观察样本，将第一光束的照射点的位置定位在样品的表面上。

14. 发明授权

US5028778A Surface analysis method and a device therefor 失效
标题翻译：表面分析方法及其装置
公开(公告)号：US5028778A
公开(公告)日：1991-07-02
申请号：US425056
申请日：1989-10-20
申请人： Ken Ninomiya , Shigeru Nishimatsu
发明人： Ken Ninomiya , Shigeru Nishimatsu
IPC分类号： G01N21/00 , G01N23/00 , G01N23/227 , G01Q60/00
CPC分类号： G01N23/2273
摘要： Surface analysis method capable of obtaining depth profiles of elements and chemical bonds in a nondestructive manner and with high accuracy, which comprises irradiating light to a sample surface to be analyzed with changing its energy, detecting electrons emitted from the surface of the above sample and corresponding to a certain binding energy, and subjecting the resultant detected signal to integration transform; and constitution of a device for carrying out the method.

15. 发明授权

US5138158A Surface analysis method and apparatus 失效
标题翻译：表面分析方法和装置
公开(公告)号：US5138158A
公开(公告)日：1992-08-11
申请号：US378400
申请日：1989-07-11
申请人： Ken Ninomiya , Shigeru Nishimatsu
发明人： Ken Ninomiya , Shigeru Nishimatsu
IPC分类号： G01N23/00 , G01N23/227 , G01Q20/02 , G01Q20/04
CPC分类号： G01N23/2273
摘要： Described is a surface analysis method for analyzing energy of particles such as photoelectrons which are emitted from a sample surface by the irradiation of light with wavelengths ranging from the soft x-ray region to the vacuum ultraviolet region using an optical system including a reflective optical element to the sample surface so as to obtain chemical state information about the sample surface, wherein the beam diameter of the light on the sample surface is reduced to 1 .mu.m or less in terms of full width at half maximum of the beam intensity profile on the sample surface so that the chemical state information about the sample surface can be obtained with high sensitivity and high resolution, and an apparatus for implementing this method.

16. 发明授权

US5115130A Surface measuring method and apparatus 失效
标题翻译：表面测量方法和装置
公开(公告)号：US5115130A
公开(公告)日：1992-05-19
申请号：US536152
申请日：1990-06-07
申请人： Keizo Suzuki , Ken Ninomiya , Takashi Yunogami
发明人： Keizo Suzuki , Ken Ninomiya , Takashi Yunogami
IPC分类号： H01J49/44 , G01N23/20 , H05H3/02
CPC分类号： H05H3/02 , G01N23/20
摘要： A surface measuring method and apparatus utilizes a low energy neutral particle (neutral atom, neutral molecule) controlled to be equal to or lower than 1 eV, which is caused to collide against the surface of a specimen. A neutral particle reflected at the specimen surface is detected, and its energy is measured to non-destructively measure the chemical bonding state of the specimen surface.
摘要翻译：表面测量方法和装置利用被控制为等于或低于1eV的低能量中性粒子（中性原子，中性分子），其与样品的表面碰撞。检测到在样品表面反射的中性粒子，并测量其能量以非破坏性地测量样品表面的化学粘合状态。

17. 发明授权

US5055679A Surface analysis method and apparatus 失效
标题翻译：表面分析方法和装置
公开(公告)号：US5055679A
公开(公告)日：1991-10-08
申请号：US460373
申请日：1990-01-03
申请人： Ken Ninomiya , Keizo Suzuki
发明人： Ken Ninomiya , Keizo Suzuki
IPC分类号： G01N23/225 , G01N21/62 , G01N21/63 , G01N23/22 , G01N23/227 , G01Q70/08
CPC分类号： G01N21/63 , G01N23/22 , G01N2021/178 , G01N21/1702 , G01N2201/1035 , G01N2223/10 , G01N2223/33 , G01N2223/345
摘要： A method of and an apparatus for analyzing a surface are disclosed, in which the intensity profile of a probe beam at the surface of a sample is measured, the intensity distribution of a detection signal along the surface of the sample is measured by scanning the surface of the sample with the probe beam, and mathematical transformation is carried out for each of the measured intensity profile and the measured signal-intensity distribution, to make surface analysis with high resolution.

18. 发明授权

US5969357A Scanning electron microscope and method for dimension measuring by using the same 失效
公开(公告)号：US5969357A
公开(公告)日：1999-10-19
申请号：US979327
申请日：1997-11-26
申请人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
发明人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
IPC分类号： G01Q30/02 , G01B15/00 , G01B15/04 , G01Q30/04 , H01J37/26
CPC分类号： G01B15/00 , G01B15/04 , H01J2237/2448 , H01J2237/24495 , H01J2237/281
摘要： An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.

19. 发明授权

US5594246A Method and apparatus for x-ray analyses 失效
标题翻译： x射线分析的方法和装置
公开(公告)号：US5594246A
公开(公告)日：1997-01-14
申请号：US430535
申请日：1995-04-25
申请人： Yoshimi Sudo , Tokuo Kure , Ken Ninomiya , Katsuhiro Kuroda , Takashi Nishida , Hideo Todokoro , Yasuhiro Mitsui , Hiroyasu Shichi
发明人： Yoshimi Sudo , Tokuo Kure , Ken Ninomiya , Katsuhiro Kuroda , Takashi Nishida , Hideo Todokoro , Yasuhiro Mitsui , Hiroyasu Shichi
IPC分类号： G01N23/225 , H01J37/252 , G01N23/223
CPC分类号： G01N23/2252 , H01J37/252 , H01J2237/2445
摘要： An X-ray analyzing method includes the steps of applying an irradiated electron beam, converged by a condenser lens and an objective lens into a thin beam, to the inside of a fine hole existing on the surface of a sample; observing X-rays generated from a residual substance existing inside the fine hole; and performing a qualitative and quantitative analysis of the residual substance. The X-rays are observed by an X-ray detector installed in an internal space of the condenser lens, an internal space of the objective lens, or between the condenser lens and the objective lens, by detecting only the X-rays radiated within the angular range -.theta. to +.theta., where .theta. is an angle formed with a center axis of the electron beam, and so defined that tan .theta. is substantially equal to a/d, where a and d are the radius and the depth of the fine hole, respectively.
摘要翻译： X射线分析方法包括以下步骤：将由聚光透镜和物镜会聚的照射的电子束施加到薄的光束中，使其存在于样品表面上的细孔的内部; 观察由存在于细孔内的残留物质产生的X射线; 并对剩余物质进行定性和定量分析。 X射线由安装在聚光透镜的内部空间，物镜的内部空间或者聚光透镜与物镜之间的X射线检测器观测，仅检测在该透镜内辐射的X射线角度范围-θ至+θ，其中θ是与电子束的中心轴形成的角度，并且如此定义为tanθ基本上等于a / d，其中a和d是微细的半径和深度孔。

20. 发明授权

US5877498A Method and apparatus for X-ray analyses 失效
标题翻译： X射线分析的方法和装置
公开(公告)号：US5877498A
公开(公告)日：1999-03-02
申请号：US893034
申请日：1997-07-15
申请人： Aritoshi Sugimoto , Yoshimi Sudo , Tokuo Kure , Ken Ninomiya , Katsuhiro Kuroda , Takashi Nishida , Hideo Todokoro , Yasuhiro Mitsui , Hiroyasu Shichi
发明人： Aritoshi Sugimoto , Yoshimi Sudo , Tokuo Kure , Ken Ninomiya , Katsuhiro Kuroda , Takashi Nishida , Hideo Todokoro , Yasuhiro Mitsui , Hiroyasu Shichi
IPC分类号： G01N23/225 , H01J37/256
CPC分类号： G01N23/2252 , H01J2237/2445 , H01J2237/2807
摘要： An X-ray analyzing method for inspecting opening states of fine holes comprises the steps of: irradiating a finely converged electron beam into a first fine hole, observing an X-ray emitted from the inside of said first fine hole in order to obtain an first X-ray analysis data about the residue substance existing at the bottom of said first fine hole; irradiating a finely converged electron beam into a second fine hole, observing an X-ray emitted from the inside of said second fine hole in order to obtain an second X-ray analysis data about the residue substance existing at the bottom of said second fine hole; and comparing said first X-ray analysis data with said second X-ray analysis data, forming a judgment as to whether or not a difference between said first and second analysis data is smaller than a predetermined threshold value and using an outcome of said judgment to determine the opening states of said first and second fine holes. The X-ray observations are carried out by detecting only the X-rays emitted within the angular range -.theta. to +.theta. where notation .theta. is an angle formed with a center axis of the irradiated electron beam and so defined that tan .theta. is equal to a/d whereas notations a and d are the radius and the depth of the fine holes.
摘要翻译：用于检查细孔的打开状态的X射线分析方法包括以下步骤：将精细会聚的电子束照射到第一细孔中，观察从所述第一细孔的内部发射的X射线，以获得第一细孔关于存在于所述第一细孔底部的残留物质的X射线分析数据; 将精细会聚的电子束照射到第二细孔中，观察从所述第二细孔的内部发射的X射线，以获得关于存在于所述第二细孔底部的残留物质的第二X射线分析数据 ; 以及将所述第一X射线分析数据与所述第二X射线分析数据进行比较，形成关于所述第一和第二分析数据之间的差是否小于预定阈值的判断，并且使用所述判断结果确定所述第一和第二细孔的打开状态。通过仅检测在角度范围θ至+θ内发射的X射线来进行X射线观察，其中符号θ是与照射的电子束的中心轴形成的角度，并且如此定义，tanθ等于 a / d，而符号a和d是细孔的半径和深度。

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