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11. 发明申请

US20090180108A1 DETERMINING ANGLE OF INCIDENCE WITH RESPECT TO WORKPIECE 失效
标题翻译：确定与工作有关的角度
公开(公告)号：US20090180108A1
公开(公告)日：2009-07-16
申请号：US12014408
申请日：2008-01-15
申请人： Clemente Bottini , Ronald D. Fiege , Roger M. Young , Shahin Zangooie , Lin Zhou
发明人： Clemente Bottini , Ronald D. Fiege , Roger M. Young , Shahin Zangooie , Lin Zhou
IPC分类号： G01C1/00
CPC分类号： G01B11/26
摘要： A method, system and computer program product for determining an angle of incidence of a light beam illuminating a workpiece positioned on a stage are disclosed. A method for determining an angle of incidence of a light beam illuminating a workpiece positioned on a stage may include: positioning a calibration target on the stage with multiple different tilts; first determining an angle of incident of the light beam with respect to the calibration target with each tilt using a detector; mapping a response of the detector to a determined angle of incidence; and second determining the angle of incidence with respect to the workpiece based on a result of the mapping.
摘要翻译：公开了一种用于确定照射位于台架上的工件的光束的入射角的方法，系统和计算机程序产品。用于确定照射位于台架上的工件的光束的入射角的方法可以包括：将校准目标放置在具有多个不同倾斜的平台上; 首先使用检测器确定每个倾斜的光束相对于校准目标的入射角; 将检测器的响应映射到确定的入射角; 并且基于所述映射的结果，第二确定相对于所述工件的入射角。

12. 发明授权

US07542136B2 Flipping stage arrangement for reduced wafer contamination cross section and improved measurement accuracy and throughput 失效
标题翻译：翻转平台布置可减少晶圆污染截面，提高测量精度和产量
公开(公告)号：US07542136B2
公开(公告)日：2009-06-02
申请号：US11772838
申请日：2007-07-03
申请人： Shahin Zangooie , Lin Zhou , Roger M. Young , Clemente Bottini , Robert J. Foster , Ronald D. Fiege
发明人： Shahin Zangooie , Lin Zhou , Roger M. Young , Clemente Bottini , Robert J. Foster , Ronald D. Fiege
IPC分类号： G01N21/01 , G01J4/00
CPC分类号： G01N21/9501
摘要： A sample stage for performing measurements using an optical metrology system includes at least one sample section for retention of a sample, and components for controlling orientation of the sample section with relation to the optical metrology system. A method and a computer program product are provided.
摘要翻译：用于使用光学测量系统进行测量的样品台包括用于保持样品的至少一个样品部分和用于控制样品部分相对于光学测量系统的取向的部件。提供了一种方法和计算机程序产品。

13. 发明申请

US20090021236A1 Alignment Correction System and Method of Use 失效
标题翻译：对准校正系统及其使用方法
公开(公告)号：US20090021236A1
公开(公告)日：2009-01-22
申请号：US11778679
申请日：2007-07-17
申请人： Robert J. Foster , Lin Zhou , Shahin Zangooie , Roger M. Young , Clemente Bottini
发明人： Robert J. Foster , Lin Zhou , Shahin Zangooie , Roger M. Young , Clemente Bottini
IPC分类号： G01R19/00 , G01C1/00
CPC分类号： G01B7/30 , G05B15/02 , H01L21/68
摘要： A system and method for correcting alignment of a product on a tool and, more particularly, to a system and method for correcting alignment of a wafer on a chuck of a tool. The system is a tool comprising at least one contact near a circumference of the tool and a grounded contact proximate to the at least one contact. The method comprises measuring current on each branch of a circuit and calculating an angle of a wafer based on a difference in the current on each branch of the circuit.
摘要翻译：一种用于校正工具上的产品对准的系统和方法，更具体地，涉及一种用于校正工具的卡盘上的晶片对准的系统和方法。该系统是一种工具，其包括在工具的圆周附近的至少一个触点和靠近该至少一个触点的接地触点。该方法包括测量电路的每个分支上的电流，并且基于电路的每个分支上的电流差来计算晶片的角度。

14. 发明授权

US07742160B2 Determining angle of incidence with respect to workpiece 失效
标题翻译：确定相对于工件的入射角
公开(公告)号：US07742160B2
公开(公告)日：2010-06-22
申请号：US12014408
申请日：2008-01-15
申请人： Clemente Bottini , Ronald D. Fiege , Roger M. Young , Shahin Zangooie , Lin Zhou
发明人： Clemente Bottini , Ronald D. Fiege , Roger M. Young , Shahin Zangooie , Lin Zhou
IPC分类号： G01B11/26
CPC分类号： G01B11/26
摘要： A method, system and computer program product for determining an angle of incidence of a light beam illuminating a workpiece positioned on a stage are disclosed. A method for determining an angle of incidence of a light beam illuminating a workpiece positioned on a stage may include: positioning a calibration target on the stage with multiple different tilts; first determining an angle of incident of the light beam with respect to the calibration target with each tilt using a detector; mapping a response of the detector to a determined angle of incidence; and second determining the angle of incidence with respect to the workpiece based on a result of the mapping.
摘要翻译：公开了一种用于确定照射位于台架上的工件的光束的入射角的方法，系统和计算机程序产品。用于确定照射位于台架上的工件的光束的入射角的方法可以包括：将校准目标放置在具有多个不同倾斜的平台上; 首先使用检测器确定每个倾斜的光束相对于校准目标的入射角; 将检测器的响应映射到确定的入射角; 并且基于所述映射的结果，第二确定相对于所述工件的入射角。

15. 发明授权

US07646491B2 Determining azimuth angle of incident beam to wafer 失效
标题翻译：确定入射光束到晶圆的方位角
公开(公告)号：US07646491B2
公开(公告)日：2010-01-12
申请号：US11766820
申请日：2007-06-22
申请人： Shahin Zangooie , Roger M. Young , Lin Zhou , Clemente Bottini , Ronald D. Fiege
发明人： Shahin Zangooie , Roger M. Young , Lin Zhou , Clemente Bottini , Ronald D. Fiege
IPC分类号： G01B11/24
CPC分类号： G01B11/26
摘要： A method, system and computer program product for determining an Azimuth angle of an incident beam to a wafer are disclosed. A method comprises: using the incident beam to make a first set of measurements of calibration targets of a first set of grating angles that are different than one another; analyzing the first set of measurements to determine an reference grating angle which corresponds to a grating line to which the incident beam has a practically zero Azimuth angle; and determining the Azimuth angle of the incident beam to the wafer using the determined reference grating angle.
摘要翻译：公开了一种用于确定入射光束到晶片的方位角的方法，系统和计算机程序产品。一种方法包括：使用入射光束对彼此不同的第一组光栅角进行校准目标的第一组测量; 分析第一组测量以确定对应于入射光束具有实际上零方位角的光栅线的参考光栅角度; 以及使用所确定的参考光栅角度确定入射光束到晶片的方位角。

16. 发明申请

US20090185183A1 MONITORING STAGE ALIGNMENT AND RELATED STAGE AND CALIBRATION TARGET 失效
标题翻译：监控阶段对准和相关阶段和校准目标
公开(公告)号：US20090185183A1
公开(公告)日：2009-07-23
申请号：US12015789
申请日：2008-01-17
申请人： Shahin Zangooie , Lin Zhou , Roger M. Young , Clemente Bottini , Ronald D. Fiege
发明人： Shahin Zangooie , Lin Zhou , Roger M. Young , Clemente Bottini , Ronald D. Fiege
IPC分类号： G01B11/00 , G01D18/00
CPC分类号： H01L21/681
摘要： Methods, apparatuses and systems for monitoring a stage alignment in a processing system are disclosed. A method for monitoring a stage alignment in a processing system may include providing a calibration target on a surface of the stage; measuring an angle of incident of a light beam to the calibration target; and monitoring the stage alignment based on the determined angle of incidence.
摘要翻译：公开了用于监视处理系统中的台对准的方法，装置和系统。用于监测处理系统中的台对准的方法可以包括在台的表面上提供校准目标; 测量光束入射到校准目标的角度; 以及基于所确定的入射角来监视所述平台对准。

17. 发明申请

US20090027660A1 OPTICAL SPOT GEOMETRIC PARAMETER DETERMINATION USING CALIBRATION TARGETS 审中-公开
标题翻译：使用校准目标的光点几何参数确定
公开(公告)号：US20090027660A1
公开(公告)日：2009-01-29
申请号：US12173857
申请日：2008-07-16
申请人： Shahin Zangooie , Roger M. Young , Lin Zhou , Clemente Bottini , Ronald D. Fiege
发明人： Shahin Zangooie , Roger M. Young , Lin Zhou , Clemente Bottini , Ronald D. Fiege
IPC分类号： G01B9/08
CPC分类号： G03F7/70516
摘要： A method, system and computer program product for determining a geometric parameter of an optical spot of a light beam are disclosed. A method comprises: providing a calibration target, the calibration target including a systematic variation in a parameter; measuring the calibration target with respect to the systematic variation using the light beam to obtain a plurality of measurements; and analyzing the measurements and the systematic variation to determine the geometric parameter of the optical spot.
摘要翻译：公开了一种用于确定光束的光点的几何参数的方法，系统和计算机程序产品。一种方法包括：提供校准目标，所述校准目标包括参数中的系统变化; 使用光束测量相对于系统变化的校准目标以获得多个测量值; 并分析测量和系统变化，以确定光点的几何参数。

18. 发明申请

US20090009763A1 FLIPPING STAGE ARRANGEMENT FOR REDUCED WAFER CONTAMINATION CROSS SECTION AND IMPROVED MEASUREMENT ACCURACY AND THROUGHPUT 失效
标题翻译：减少波浪污染的转运阶段安排交叉部分和改进的测量精度和通过率
公开(公告)号：US20090009763A1
公开(公告)日：2009-01-08
申请号：US11772838
申请日：2007-07-03
申请人： Shahin Zangooie , Lin Zhou , Roger M. Young , Clemente Bottini , Robert J. Foster , Ronald D. Fiege
发明人： Shahin Zangooie , Lin Zhou , Roger M. Young , Clemente Bottini , Robert J. Foster , Ronald D. Fiege
IPC分类号： G01J3/45 , G01B11/14 , G01B11/30
CPC分类号： G01N21/9501
摘要： A sample stage for performing measurements using an optical metrology system includes at least one sample section for retention of a sample, and components for controlling orientation of the sample section with relation to the optical metrology system. A method and a computer program product are provided.
摘要翻译：用于使用光学测量系统进行测量的样品台包括用于保持样品的至少一个样品部分和用于控制样品部分相对于光学测量系统的取向的部件。提供了一种方法和计算机程序产品。

19. 外观设计

USD988560S1 Garage lamp 有权
公开(公告)号：USD988560S1
公开(公告)日：2023-06-06
申请号：US29796590
申请日：2021-06-25
申请人： Lin Zhou
设计人： Lin Zhou
摘要： FIG. 1 is a perspective view of a garage lamp showing my new design;
FIG. 2 is another perspective view thereof;
FIG. 3 is a front elevational view thereof;
FIG. 4 is a rear elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a right side elevational view thereof;
FIG. 7 is a top plan view thereof;
FIG. 8 is a bottom plan view thereof; and,
FIG. 9 is a perspective view of the garage lamp where the garage lamp is in a configuration of use.
The broken lines in the drawings depict portions of the garage lamp that form no part of the claimed design.

20. 发明申请

US20130081159A1 ADVANCED ATOMIC FORCE MICROSCOPY SCANNING FOR OBTAINING A TRUE SHAPE 审中-公开
标题翻译：用于获得真实形状的高级原子力显微镜扫描
公开(公告)号：US20130081159A1
公开(公告)日：2013-03-28
申请号：US13559034
申请日：2012-07-26
申请人： Huiwen Liu , Peter Gunderson , Lin Zhou
发明人： Huiwen Liu , Peter Gunderson , Lin Zhou
IPC分类号： G01Q60/24
CPC分类号： G01Q60/24 , G01Q10/06 , G01Q30/06
摘要： Advanced atomic force microscopy (AFM) methods and apparatuses are presented. An embodiment may comprise performing a first scan at a first angle, a second scan at a second angle, and correcting a system drift error in the first scan based on the second scan. Another embodiment may comprise performing a global scan of a first area, a local scan of a second area within the first area, correcting a leveling error in the local scan based on the global scan, and outputting a corrected sample image. Another embodiment may comprise performing a first scan at a first position at a first angle, a second scan at a flat region using the same scan angle and scan size to correct a scanner runout error in the first scan based on the second scan.
摘要翻译：提出了先进的原子力显微镜（AFM）方法和装置。实施例可以包括以第一角度执行第一扫描，以第二角度执行第二扫描，以及基于第二扫描来校正第一扫描中的系统漂移误差。另一个实施例可以包括执行第一区域的全局扫描，第一区域内的第二区域的局部扫描，基于全局扫描校正局部扫描中的调平误差，以及输出校正的采样图像。另一个实施例可以包括以第一角度在第一位置执行第一扫描，使用相同的扫描角度和扫描尺寸在平坦区域执行第二次扫描，以基于第二次扫描来校正第一扫描中的扫描器跳动误差。

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