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11. 发明申请

US20110229661A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME 有权
标题翻译：正性感光树脂组合物和固化膜的形成方法
公开(公告)号：US20110229661A1
公开(公告)日：2011-09-22
申请号：US12680273
申请日：2008-09-26
申请人： Satoshi Takita
发明人： Satoshi Takita
IPC分类号： B32B3/10 , G03F7/004 , G03F7/20
CPC分类号： G03F7/004 , B32B2457/202 , B32B2457/206 , G03F7/0045 , G03F7/0392 , G03F7/20 , G03F7/40 , Y10T428/10 , Y10T428/24802
摘要： There are provided a positive photosensitive resin composition excellent in the sensitivity, film residual ratio and storage stability, comprising a resin containing a specific acrylic acid-based constituent unit capable of dissociating an acid-dissociable group to produce a carboxyl group, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates, a resin containing a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, and a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a cured film forming method using the positive photosensitive resin composition; and a cured film excellent in the heat resistance, adhesion, transmittance and the like.
摘要翻译：提供了灵敏度，膜残留率和保存稳定性优异的正性感光性树脂组合物，其含有能够解离酸解离基而产生羧基的特定的丙烯酸系构成单元的树脂，该树脂为碱 - 不溶或微溶碱性并且当酸解离基解离时变为碱溶性，含有具有能够与羧基反应形成共价键的官能团的构成单元的树脂和能够产生用光化射线或辐射照射时酸; 使用正型感光性树脂组合物的固化成膜方法; 以及耐热性，粘合性，透射率等优异的固化膜。

12. 发明申请

US20110224250A1 ISOQUINOLINE DERIVATIVE, AND PDE INHIBITOR COMPRISING SAME AS ACTIVE INGREDIENT 审中-公开
标题翻译：异喹啉衍生物和含有相同活性成分的PDE抑制剂
公开(公告)号：US20110224250A1
公开(公告)日：2011-09-15
申请号：US13123274
申请日：2009-10-08
申请人： Yasushi Kohno , Satoshi Takita , Akihiko Kojima
发明人： Yasushi Kohno , Satoshi Takita , Akihiko Kojima
IPC分类号： A61K31/437 , C07D471/04 , C07D401/10 , A61K31/4725 , A61P9/00 , A61P9/04 , A61P9/12 , A61P11/06 , A61P11/00 , A61P25/28 , A61P29/00 , A61P19/02 , A61P19/10 , A61P25/00 , A61P25/16 , A61P25/24 , A61P25/18 , A61P3/04 , A61P3/00 , A61P1/16
CPC分类号： C07D401/04 , C07D471/04
摘要： The present invention provides a novel isoquinoline derivative which is useful as a pharmaceutical agent having a phosphodiesterase inhibitory activity.The isoquinoline derivative of the present invention is represented by the following general formula (1):
摘要翻译：本发明提供了可用作具有磷酸二酯酶抑制活性的药剂的新型异喹啉衍生物。本发明的异喹啉衍生物由以下通式（1）表示：

13. 发明授权

US4761493A Preparation process of quaternary phosphonium hydroxide 失效
标题翻译：季鏻氢氧化物的制备方法
公开(公告)号：US4761493A
公开(公告)日：1988-08-02
申请号：US24074
申请日：1987-03-10
申请人： Masayuki Umeno , Satoshi Takita
发明人： Masayuki Umeno , Satoshi Takita
IPC分类号： C07F9/54 , C08G77/08 , C07F9/02
CPC分类号： C07F9/54
摘要： A quaternary phosphonium hydroxide, which is represented by the following general formula (II): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 mean independently an alkyl group having 1-8 carbon atoms, a phenyl group or a benzyl group, is prepared by dissolving a quaternary phosphonium halide represented by the following general formula (I): ##STR2## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 has the same meaning as defined above and X denotes a chlorine, bromine or iodine atom, in a solvent selected from water, lower alcohols and aqueous lower alcohols, and then bringing the resultant solution into contact with a strongly basic anion exchange resin (OH-form).
摘要翻译：由下列通式（II）表示的季鏻氢氧化物：其中R1，R2，R3和R4独立地表示具有1-8个碳原子的烷基，苯基或苄基通过溶解由以下通式（I）表示的季鏻卤化物制备：其中R 1，R 2，R 3和R 4具有与上述相同的含义，X表示氯，溴或碘原子在选自水，低级醇和低级醇的溶剂中，然后将所得溶液与强碱性阴离子交换树脂（OH-型）接触。

14. 发明授权

US08771907B2 Positive photosensitive resin composition and method of forming cured film from the same 有权
标题翻译：正型感光性树脂组合物及其固化膜的形成方法
公开(公告)号：US08771907B2
公开(公告)日：2014-07-08
申请号：US12891558
申请日：2010-09-27
申请人： Satoshi Takita
发明人： Satoshi Takita
IPC分类号： G03F7/039 , G03F7/085 , G03F7/20 , G03F7/40
CPC分类号： G03F7/0392 , C08F2/48 , C08F20/28 , C08F212/08 , C08F212/14 , C08F216/1416 , C08F220/06 , C08F220/26 , C08F220/28 , C08F220/32 , G03F7/0045 , G03F7/40 , Y10T428/24802 , C08F220/18
摘要： According to one embodiment, a positive photosensitive resin composition includes a resin containing a specified acrylic acid besed-structural unit which generates a carboxyl group when its dissociative group is dissociated, which resin is insoluble in alkali or sparingly soluble in alkali but when its acid-dissociative group is dissociated, becomes soluble in alkali, a resin containing a structural unit derived from a radical-polymerizable monomer containing an epoxy group, a compound containing two or more epoxy groups in its molecule, provided that the resin containing the structural unit derived from a radical-polymerizable monomer containing an epoxy group is not included in this compound, and a compound that when exposed to actinic rays of 300 nm or longer wavelength, generates an acid.
摘要翻译：根据一个实施方案，正型感光性树脂组合物包含含有特定的丙烯酸包合结构单元的树脂，当其解离基团解离时，该树脂不溶于碱或微溶于碱，但是当其酸 - 解离基解离，溶于碱，含有衍生自含有环氧基的自由基聚合性单体的结构单元的树脂，分子中含有两个以上环氧基的化合物，条件是含有来自在该化合物中不包含含有环氧基的自由基聚合性单体，当暴露于300nm以上的波长的光化射线时，产生酸。

15. 发明授权

US08329380B2 Positive photosensitive resin composition and method for forming cured film using the same 有权
标题翻译：正型感光性树脂组合物及使用其形成固化膜的方法
公开(公告)号：US08329380B2
公开(公告)日：2012-12-11
申请号：US12663016
申请日：2008-06-05
申请人： Satoshi Takita
发明人： Satoshi Takita
IPC分类号： G03F7/039 , G03F7/40
CPC分类号： G03F7/0392 , C08F220/28 , G03F7/0045 , G03F7/40
摘要： The present invention provides a positive photosensitive resin composition including: a resin containing a specific acrylic acid-based constituent unit capable of undergoing dissociation of an acid-dissociable group to produce a carboxyl group, and a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates; and a compound capable of generating an acid upon irradiation with an actinic ray or radiation. The present invention also provides a method for forming a cured film using the composition. The positive photosensitive composition is excellent in the sensitivity, film residual ratio and storage stability and by the method for forming a cured film using the positive photosensitive resin composition, a cured film excellent in the heat resistance, adhesion, transmittance and the like can be provided.
摘要翻译：本发明提供一种正型感光性树脂组合物，其包含：含有可分解酸分解基团以产生羧基的特定丙烯酸类结构单元的树脂，以及具有能够与羧基形成共价键，当酸解离基解离时，该树脂是碱不溶性或微溶碱性的并变成碱溶性的; 以及能够在用光化射线或辐射照射时能够产生酸的化合物。本发明还提供了使用该组合物形成固化膜的方法。正性感光性组合物的灵敏度，膜残留率和保存稳定性优异，通过使用正型感光性树脂组合物的固化膜的形成方法，可以提供耐热性，粘合性，透射率等优异的固化膜。

16. 发明申请

US20110178041A1 HETEROCYCLIC BIARYL DERIVATIVE AND PDE INHIBITOR COMPRISING SAME AS ACTIVE INGREDIENT 审中-公开
标题翻译：含有作为活性成分的异源二异氰酸酯衍生物和PDE抑制剂
公开(公告)号：US20110178041A1
公开(公告)日：2011-07-21
申请号：US13121099
申请日：2009-09-24
申请人： Yasushi Kohno , Tatsunobu Sumiya , Satoshi Takita , Akihiko Kojima
发明人： Yasushi Kohno , Tatsunobu Sumiya , Satoshi Takita , Akihiko Kojima
IPC分类号： A61K31/437 , C07D471/04 , C07F5/02 , A61K31/69 , A61P11/00 , A61P19/02 , A61P25/00 , A61P25/28 , A61P25/16 , A61P25/24 , A61P25/18 , A61P3/00 , A61P3/04 , A61P29/00 , A61P11/06 , A61P11/02
CPC分类号： C07D215/26 , C07D401/04 , C07D405/04 , C07D409/04 , C07D413/04 , C07D417/04 , C07D471/04
摘要： Novel heterocyclic biaryl derivatives were disclosed which are useful as pharmaceutical agents and which exhibit a phosphodiesterase-inhibitory action.The heterocyclic biaryl derivatives are represented by the following general formula (1): wherein the Heterocycle 1 and the Heterocycle 2 are directly bonded together.
摘要翻译：公开了可用作药剂并且表现出磷酸二酯酶抑制作用的新型杂环联芳基衍生物。杂环联芳基衍生物由以下通式（1）表示：其中杂环1和杂环2直接键合在一起。

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