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11. 发明授权

US08900944B2 Methods of manufacturing a semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US08900944B2
公开(公告)日：2014-12-02
申请号：US13307270
申请日：2011-11-30
申请人： Soo-Yeon Jeong , Myeong-Cheol Kim , Do-Hyoung Kim , Do-Haing Lee , Nam-Myun Cho , In-Ho Kim
发明人： Soo-Yeon Jeong , Myeong-Cheol Kim , Do-Hyoung Kim , Do-Haing Lee , Nam-Myun Cho , In-Ho Kim
IPC分类号： H01L21/8238 , H01L29/49 , H01L29/66 , H01L21/768 , H01L21/285
CPC分类号： H01L27/088 , H01L21/28518 , H01L21/76897 , H01L29/45 , H01L29/49 , H01L29/66545
摘要： A method of manufacturing a semiconductor device includes forming a gate structure through a first insulating interlayer on a substrate such that the gate structure includes a spacer on a sidewall thereof, forming a first hard mask on the gate structure, partially removing the first insulating interlayer using the first hard mask as an etching mask to form a first contact hole such that the first contact hole exposes a top surface of the substrate, forming a metal silicide pattern on the top surface of the substrate exposed by the first contact hole, and forming a plug electrically connected to the metal silicide pattern.
摘要翻译：一种制造半导体器件的方法包括通过基板上的第一绝缘中间层形成栅极结构，使得栅极结构在其侧壁上包括间隔物，在栅极结构上形成第一硬掩模，使用所述第一硬掩模作为蚀刻掩模以形成第一接触孔，使得所述第一接触孔暴露所述基板的顶表面，在所述基板的由所述第一接触孔暴露的所述顶表面上形成金属硅化物图案，并形成插头电连接到金属硅化物图案。

12. 发明申请

US20120156867A1 METHODS OF MANUFACTURING A SEMICONDUCTOR DEVICE 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US20120156867A1
公开(公告)日：2012-06-21
申请号：US13307270
申请日：2011-11-30
申请人： Soo-Yeon Jeong , Myeong-Cheol Kim , Do-Hyoung Kim , Do-Haing Lee , Nam-Myun Cho , In-Ho Kim
发明人： Soo-Yeon Jeong , Myeong-Cheol Kim , Do-Hyoung Kim , Do-Haing Lee , Nam-Myun Cho , In-Ho Kim
IPC分类号： H01L21/283
CPC分类号： H01L27/088 , H01L21/28518 , H01L21/76897 , H01L29/45 , H01L29/49 , H01L29/66545
摘要： A method of manufacturing a semiconductor device includes forming a gate structure through a first insulating interlayer on a substrate such that the gate structure includes a spacer on a sidewall thereof, forming a first hard mask on the gate structure, partially removing the first insulating interlayer using the first hard mask as an etching mask to form a first contact hole such that the first contact hole exposes a top surface of the substrate, forming a metal silicide pattern on the top surface of the substrate exposed by the first contact hole, and forming a plug electrically connected to the metal silicide pattern.
摘要翻译：一种制造半导体器件的方法包括通过基板上的第一绝缘中间层形成栅极结构，使得栅极结构在其侧壁上包括间隔物，在栅极结构上形成第一硬掩模，使用所述第一硬掩模作为蚀刻掩模以形成第一接触孔，使得所述第一接触孔暴露所述基板的顶表面，在所述基板的由所述第一接触孔暴露的所述顶表面上形成金属硅化物图案，并形成插头电连接到金属硅化物图案。

13. 发明申请

US20120122286A1 METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US20120122286A1
公开(公告)日：2012-05-17
申请号：US13290285
申请日：2011-11-07
申请人： Sang-Jin Kim , Jong-Chan Shin , Yong-Kug Bae , Do-Hyoung Kim , Dong-Woon Park
发明人： Sang-Jin Kim , Jong-Chan Shin , Yong-Kug Bae , Do-Hyoung Kim , Dong-Woon Park
IPC分类号： H01L21/336 , H01L21/768
CPC分类号： H01L21/76895 , H01L21/28518 , H01L21/31144 , H01L21/76897 , H01L21/823418 , H01L21/823475 , H01L21/823481 , H01L29/66545 , H01L29/66628 , H01L29/66636 , H01L29/7848
摘要： In a method of manufacturing a semiconductor device, a first etching mask and a second etching mask are formed sequentially on a metal gate structure on a substrate and a first insulating interlayer covering a sidewall of the metal gate structure respectively. An opening is formed to expose a top surface of the substrate by removing a portion of the first insulating interlayer not overlapped with the first etching mask or the second etching mask. A metal silicide pattern is formed on the exposed top surface of the substrate. A plug on the metal silicide pattern is formed to fill a remaining portion of the opening. Further, a planarization layer may be used as the second etching mask.
摘要翻译：在制造半导体器件的方法中，依次在基板上的金属栅极结构和覆盖金属栅极结构的侧壁的第一绝缘夹层上形成第一蚀刻掩模和第二蚀刻掩模。通过除去与第一蚀刻掩模或第二蚀刻掩模不重叠的第一绝缘夹层的一部分，形成开口以暴露基板的顶表面。在衬底的暴露的顶表面上形成金属硅化物图案。形成金属硅化物图案上的塞子以填充开口的剩余部分。此外，可以使用平坦化层作为第二蚀刻掩模。

14. 发明授权

US06825621B2 Electron gun for color cathode ray tube 失效
标题翻译：彩色阴极射线管用电子枪
公开(公告)号：US06825621B2
公开(公告)日：2004-11-30
申请号：US10032481
申请日：2002-01-02
申请人： Yong-Seok Song , Sung-Jun An , Do-Hyoung Kim
发明人： Yong-Seok Song , Sung-Jun An , Do-Hyoung Kim
IPC分类号： H01J2962
CPC分类号： H01J29/503 , H01J29/488 , H01J2229/4841 , H01J2229/4848 , H01J2229/4865 , H01J2229/4872
摘要： An electron gun for a color cathode ray tube includes a cathode which is a source for emitting an electron beam, a control electrode, through which the electron beam emitted from the cathode passes, having first electron beam passing holes each including a first vertically elongated indented portion formed at an output side surface of the control electrode and a first electron beam passing hole portion formed in the first indented portion, a screen electrode installed adjacent to the control electrode and having second electron beam passing holes formed in the screen electrode, a plurality of focusing electrodes for forming a plurality of quadrupole lenses, sequentially installed from the screen electrode and respectively having electron beam passing holes having a predetermined shape.
摘要翻译：用于彩色阴极射线管的电子枪包括作为发射电子束的源的阴极，从阴极射出的电子束经过的控制电极，具有第一电子束通过孔，每个电子束通孔包括第一垂直伸长的凹入形成在控制电极的输出侧表面上的部分和形成在第一凹入部分中的第一电子束通过孔部分，与控制电极相邻设置并具有形成在屏幕电极中的第二电子束通孔的屏幕电极，多个用于形成多个四极透镜的聚焦电极，从屏幕电极依次安装并分别具有预定形状的电子束通过孔。

15. 发明授权

US06548968B2 Electrode assembly and dynamic focus electron gun utilizing the same 失效
公开(公告)号：US06548968B2
公开(公告)日：2003-04-15
申请号：US09989433
申请日：2001-11-21
申请人： Yong-Seok Song , Sung-Jun An , Do-Hyoung Kim
发明人： Yong-Seok Song , Sung-Jun An , Do-Hyoung Kim
IPC分类号： G09G104
CPC分类号： G09G1/04
摘要： An electrode assembly includes at least first and second electrodes for forming one or more dynamic quadrupole lenses to emit electron beams and an electron gun using the same. A first parabolic waveform signal having voltages decreasing from the center to the periphery of a screen on which the electron beams land is applied to the first electrode, and a second parabolic waveform signal having voltages increasing from the center to the periphery of the screen is applied to the second electrode, in synchronization with horizontal and vertical deflection signals for horizontally and vertically deflecting electron beams emitted from the electrode assembly.

16. 发明授权

US09768163B2 Semiconductor device and method for fabricating the same 有权
公开(公告)号：US09768163B2
公开(公告)日：2017-09-19
申请号：US14744722
申请日：2015-06-19
申请人： Doo-Young Lee , Sang-Hyun Lee , Myung-Hoon Jung , Do-Hyoung Kim
发明人： Doo-Young Lee , Sang-Hyun Lee , Myung-Hoon Jung , Do-Hyoung Kim
IPC分类号： H01L27/088 , H01L29/45 , H01L21/768 , H01L21/28 , H01L29/417 , H01L29/78 , H01L21/8234 , H01L27/02 , H01L27/11
CPC分类号： H01L27/088 , H01L21/28114 , H01L21/76804 , H01L21/76805 , H01L21/76831 , H01L21/76843 , H01L21/76897 , H01L21/823425 , H01L21/823475 , H01L23/485 , H01L27/0207 , H01L27/0886 , H01L27/1104 , H01L29/41758 , H01L29/41775 , H01L29/45 , H01L29/78
摘要： A semiconductor device includes a first gate pattern and a second gate pattern on a substrate, the first gate pattern having a first height and the second gate pattern having a second height, an insulating pattern on the substrate covering the first and second gate patterns, the insulating pattern including a trench exposing the substrate between the first and second gate patterns, a spacer contacting at least a portion of a sidewall of the insulating pattern within the trench, the spacer spaced apart from the first and second gate patterns and having a third height larger than the first and second heights, and a contact structure filling the trench.

17. 发明授权

US09543155B2 Method of forming minute patterns and method of manufacturing a semiconductor device using the same 有权
标题翻译：形成微小图案的方法和使用其制造半导体器件的方法
公开(公告)号：US09543155B2
公开(公告)日：2017-01-10
申请号：US14975932
申请日：2015-12-21
申请人： Bok-Young Lee , Yoo-Jung Lee , Dong-Hoon Khang , Do-Hyoung Kim , Cheol Kim , In-Hee Lee , Ji-Eun Han
发明人： Bok-Young Lee , Yoo-Jung Lee , Dong-Hoon Khang , Do-Hyoung Kim , Cheol Kim , In-Hee Lee , Ji-Eun Han
IPC分类号： H01L21/28 , H01L29/66 , H01L27/11
CPC分类号： H01L21/28132 , H01L27/1104 , H01L27/1116 , H01L29/66545
摘要： A method includes forming a first etch target layer and a first mask layer on a substrate. Sacrificial patterns extending in a first direction are formed on the first mask layer in a second direction. Spacers are formed on sidewalls of the sacrificial patterns. After removing the sacrificial patterns, the first mask layer is etched using the spacers as an etching mask to form first masks. Second masks are formed on sidewalls of each first mask to define a third masks including each first mask and the second masks on sidewalls of each first mask. The first etch target layer is etched using the first and third masks as an etching mask to form first and second patterns in the first and second regions, respectively. Each first pattern has a first width, and each second pattern has a second width greater than the first width.
摘要翻译：一种方法包括在衬底上形成第一蚀刻目标层和第一掩模层。在第一方向上在第一掩模层上形成沿第一方向延伸的牺牲图案。垫片形成在牺牲图案的侧壁上。在去除牺牲图案之后，使用间隔件作为蚀刻掩模来蚀刻第一掩模层以形成第一掩模。第二掩模形成在每个第一掩模的侧壁上以限定包括每个第一掩模的第三掩模和在每个第一掩模的侧壁上的第二掩模。使用第一和第三掩模蚀刻第一蚀刻目标层作为蚀刻掩模，以分别在第一和第二区域中形成第一和第二图案。每个第一图案具有第一宽度，并且每个第二图案具有大于第一宽度的第二宽度。

18. 发明申请

US20090030181A1 Peptides for Inhibiting MDM2 Function 有权
标题翻译：抑制MDM2功能的肽
公开(公告)号：US20090030181A1
公开(公告)日：2009-01-29
申请号：US11547730
申请日：2004-12-29
申请人： Kyou-Hoon Han , Seung-Wook Chi , Hyun-Jeong Kim , Si-Hyung Lee , Min-Jung Ahn , Do-Hyoung Kim , Jae-Sung Kim , Shin-Ae Park
发明人： Kyou-Hoon Han , Seung-Wook Chi , Hyun-Jeong Kim , Si-Hyung Lee , Min-Jung Ahn , Do-Hyoung Kim , Jae-Sung Kim , Shin-Ae Park
IPC分类号： C07K7/06 , C07K5/08 , C07K5/10
CPC分类号： C07K14/4746
摘要： Disclosed are peptides for inhibiting mdm2 (mouse double minute 2) and a pharmaceutical composition comprising the same.
摘要翻译：公开了抑制mdm2（小鼠双倍分子2）的肽和包含其的药物组合物。

19. 发明授权

US06819038B2 Double dynamic focus electron gun 失效
标题翻译：双动态聚焦电子枪
公开(公告)号：US06819038B2
公开(公告)日：2004-11-16
申请号：US10216876
申请日：2002-08-13
申请人： Yong-Seok Song , Sung-Jun An , Do-Hyoung Kim
发明人： Yong-Seok Song , Sung-Jun An , Do-Hyoung Kim
IPC分类号： H01J2950
CPC分类号： H01J29/503
摘要： An electron gun for a cathode ray tube includes at least one auxiliary quadruple lens forming unit adapted to control an electron beam diverging in the vertical direction and focused in the horizontal direction by a plurality of focus electrodes, at least one first quadruple lens forming unit adapted to control the electron beam passing through the auxiliary quadruple lens focused in the vertical direction and diverging in the horizontal direction, and at least one second quadruple forming unit adapted to control the electron beam passing through the first quadruple lens diverging in the vertical direction and focused in the horizontal direction, installed between the screen electrode of a triode portion and a final acceleration electrode of the cathode ray tube and sequentially arranged in a direction from a screen electrode to a screen of the cathode ray tube.
摘要翻译：一种用于阴极射线管的电子枪包括至少一个辅助四重透镜形成单元，其适于控制在垂直方向上发散的电子束并且通过多个聚焦电极在水平方向上聚焦，至少一个第一四重透镜形成单元适于以控制通过在垂直方向上聚焦并在水平方向上发散的辅助四重透镜的电子束，以及至少一个第二四倍形成单元，其适于控制通过在垂直方向上发散的第一四极透镜的电子束并聚焦在水平方向上，安装在三极管部分的屏幕电极和阴极射线管的最终加速电极之间，并且沿着从屏幕电极到阴极射线管的屏幕的方向依次布置。

20. 发明申请

US20140158755A1 METHOD FOR GENERATING AND RESTORING DIGITAL CONTENTS, AND COMPUTER-READABLE RECORDING MEDIUM INCLUDING PROGRAM FOR THE SAME 审中-公开
标题翻译：用于生成和恢复数字内容的方法以及包含程序的计算机可读记录介质
公开(公告)号：US20140158755A1
公开(公告)日：2014-06-12
申请号：US13837444
申请日：2013-03-15
申请人： Chang-Soo Lim , Do-Hyoung Kim
发明人： Chang-Soo Lim , Do-Hyoung Kim
IPC分类号： G06F17/30
CPC分类号： G06F16/683 , G06K7/10544 , G06K19/06037
摘要： The present invention relates to a digital contents generation and restoration technology. More particularly, the present invention relates to a method for generating and restoring digital contents, which prints numerical values constituting a digital contents file or a data image composed of various colors of dots mapped with data values of a digital contents file on a printable medium and restores the original contents file using the image including the numerical values printed on the printable medium or the various colors of dots.
摘要翻译：本发明涉及数字内容生成和恢复技术。更具体地说，本发明涉及一种生成和恢复数字内容的方法，该数字内容打印出数字内容文件的数字值或由可打印介质上数字内容文件的数据值映射的各种颜色的点组成的数据图像，使用包括打印在可打印介质上的数值的图像或各种点的颜色来恢复原始内容文件。

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