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    • 17. 发明申请
    • DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME
    • 其显示装置及其制造方法
    • US20080239214A1
    • 2008-10-02
    • US11939155
    • 2007-11-13
    • Sang-Hun LEEByoung-Joo KIMChul HUHGwan-Soo KIM
    • Sang-Hun LEEByoung-Joo KIMChul HUHGwan-Soo KIM
    • G02F1/1335G03F1/00
    • G06F3/0412G02F1/13338G02F1/1362G03F1/00G03F7/0005
    • A display device includes a first substrate including pixels and sensing electrodes corresponding with the pixels, and a second substrate facing the first substrate. The second substrate includes an organic layer with a black matrix dividing the pixels and a sensing spacer opposite to the sensing electrode. The organic layer including the black matrix and the sensing spacer may be formed in a single process using organic photoresist material. A mask includes a light-intercepting pattern including slits to block a portion of ultraviolet light emitted towards a photoresist layer to form the black matrix. The mask also includes a pattern to block ultraviolet light in a region corresponding to the sensing spacer if a negative type photoresist material is used, or the mask does not block ultraviolet light in the region corresponding to the sensing spacer if a positive type photoresist material is used.
    • 显示装置包括:第一基板,包括像素和与像素相对应的检测电极;以及面向第一基板的第二基板。 第二基板包括具有黑色矩阵分割像素的有机层和与感测电极相对的感测间隔件。 包括黑矩阵和传感间隔物的有机层可以使用有机光致抗蚀剂材料在单一工艺中形成。 掩模包括遮光图案,其包括狭缝以阻挡朝向光致抗蚀剂层发射的紫外光的一部分以形成黑色矩阵。 如果使用负型光致抗蚀剂材料,掩模还包括阻挡紫外光的图案,如果使用负型光致抗蚀剂材料,或者如果正型光致抗蚀剂材料为 用过的。