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    • 11. 发明授权
    • Nitride semiconductor light emitting device and method of manufacturing the same
    • 氮化物半导体发光器件及其制造方法
    • US08030640B2
    • 2011-10-04
    • US12618164
    • 2009-11-13
    • Jeong Tak OhYong Chun KimDong Joon KimDong Ju Lee
    • Jeong Tak OhYong Chun KimDong Joon KimDong Ju Lee
    • H01L33/00H01L21/30
    • H01L33/18H01L33/20H01L33/32
    • A nitride semiconductor light emitting device includes a substrate, a first conductivity type nitride semiconductor layer disposed on the substrate and including a plurality of V-pits placed in a top surface thereof, a silicon compound formed in the vertex region of each of the V-pits, an active layer disposed on the first conductivity type nitride semiconductor layer and including depressions conforming to the shape of the plurality of V-pits, and a second conductivity type nitride semiconductor layer disposed on the active layer. The nitride semiconductor light emitting device, when receiving static electricity achieves high resistance to electrostatic discharge (ESD) since current is concentrated in the V-pits and the silicon compound placed on dislocations caused by lattice defects.
    • 氮化物半导体发光器件包括衬底,设置在衬底上的第一导电型氮化物半导体层,并且包括放置在其顶表面中的多个V凹坑,形成在每个V形衬底的顶点区域中的硅化合物, 凹坑,设置在第一导电型氮化物半导体层上并包括符合多个V凹坑形状的凹陷的有源层和设置在有源层上的第二导电型氮化物半导体层。 氮化物半导体发光器件在接收到静电时实现了高静电放电(ESD)的抗性,因为电流集中在V型凹坑中,并且硅化合物置于由晶格缺陷引起的位错上。
    • 15. 发明申请
    • NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD OF MANUFACTURING THE SAME
    • 氮化物半导体发光器件及其制造方法
    • US20090166669A1
    • 2009-07-02
    • US12251782
    • 2008-10-15
    • Je Won KimYong Chun KimSang Won KangSeok Min HwangSeung Wan Chae
    • Je Won KimYong Chun KimSang Won KangSeok Min HwangSeung Wan Chae
    • H01L21/20H01L33/00
    • H01L33/12H01L21/0237H01L21/02458H01L21/02488H01L21/02505H01L21/02513H01L21/0254H01L33/025
    • A nitride semiconductor light emitting device and a method of manufacturing the same, which can prevent crystal defects such as dislocation while ensuring uniform current spreading into an active layer. The nitride semiconductor light emitting device includes a first n-nitride semiconductor layer formed on a substrate, a first intermediate pattern layer formed on the first n-nitride semiconductor layer, the first intermediate pattern layer having a nanoscale dot structure made of Si compound, a second n-nitride semiconductor layer formed on the first n-nitride semiconductor layer, a second intermediate pattern layer formed on the second n-nitride semiconductor layer, the second intermediate pattern layer having a nanoscale dot structure made of Si compound, which is electrically insulating, a third n-nitride semiconductor layer formed on the second n-nitride semiconductor layer, an active layer formed on the third n-nitride semiconductor layer, and a p-nitride semiconductor layer formed on the active layer.
    • 一种氮化物半导体发光器件及其制造方法,其可以在确保均匀的电流扩展到有源层的同时防止诸如位错之类的晶体缺陷。 氮化物半导体发光器件包括形成在衬底上的第一氮化物半导体层,形成在第一氮化物半导体层上的第一中间图案层,具有由Si化合物制成的纳米级点结构的第一中间图案层, 形成在所述第一氮化物半导体层上的第二氮化物半导体层,形成在所述第二氮化物半导体层上的第二中间图案层,所述第二中间图案层具有由Si化合物制成的纳米级点结构,所述第二中间图案层是电绝缘的 形成在第二氮化物半导体层上的第三氮化物半导体层,形成在第三氮化物半导体层上的有源层和形成在有源层上的p型氮化物半导体层。