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    • 19. 发明授权
    • Memory cells, methods of forming memory cells and methods of forming memory arrays
    • 存储单元,形成存储单元的方法和形成存储器阵列的方法
    • US08735862B2
    • 2014-05-27
    • US13084011
    • 2011-04-11
    • Jun LiuJohn K. Zahurak
    • Jun LiuJohn K. Zahurak
    • H01L47/00
    • H01L45/06H01L27/2436H01L27/2463H01L45/1233H01L45/1246H01L45/1253H01L45/144H01L45/1608H01L45/1683
    • Some embodiments include memory cells which have multiple programmable material structures between a pair of electrodes. One of the programmable material structures has a first edge, and another of the programmable material structures has a second edge that contacts the first edge. Some embodiments include methods of forming an array of memory cells. First programmable material segments are formed over bottom electrodes. The first programmable material segments extend along a first axis. Lines of second programmable material are formed over the first programmable material segments, and are formed to extend along a second axis that intersects the first axis. The second programmable material lines have lower surfaces that contact upper surfaces of the first programmable material segments. Top electrode lines are formed over the second programmable material lines.
    • 一些实施例包括在一对电极之间具有多个可编程材料结构的存储器单元。 可编程材料结构之一具有第一边缘,另一个可编程材料结构具有接触第一边缘的第二边缘。 一些实施例包括形成存储器单元阵列的方法。 第一可编程材料段形成在底部电极上。 第一可编程材料段沿第一轴线延伸。 第二可编程材料的线形成在第一可编程材料段上,并且形成为沿与第一轴相交的第二轴线延伸。 第二可编程材料线具有接触第一可编程材料段的上表面的下表面。 顶部电极线形成在第二可编程材料线上。