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    • 13. 发明申请
    • RUBBER COMPOSITION AND CROSSLINKED OBJECT
    • 橡胶组合物和交联物体
    • US20100152368A1
    • 2010-06-17
    • US12067821
    • 2006-09-21
    • Yoshio HirayamaKei HirataKoichi WadaKenji Shachi
    • Yoshio HirayamaKei HirataKoichi WadaKenji Shachi
    • C08L47/00
    • C08L21/00C08K3/36C08K5/548C08L9/00C08L13/00C08L15/00C08L2666/02
    • The present invention relates to a rubber composition comprising 100 parts by mass of a solid diene-based rubber (1), 5 to 150 parts by mass of silica (2), 0.1 to 50 parts by mass of a liquid diene-based rubber (3) which is modified with an unsaturated carboxylic acid and/or derivative thereof and has a number average molecular weight of 5000 to 100000, and further 0,1 to 50 parts by mass of an unmodified liquid diene-based rubber (4) having a number average molecular weight of 5000 to 100000 with respect to 100 parts by mass of the solid diene-based rubber (1) and/or 1.5 to 14.0 parts by mass of water (5) with respect to 100 parts by mass of silica (2), and a crosslinked product obtained by crosslinking the rubber composition.A rubber composition obtained by the present invention is improved in processability when silica is added and mixed with a diene-based rubber and is excellent in dynamic properties after crosslinking.
    • 本发明涉及一种橡胶组合物,其包含100质量份固体二烯系橡胶(1),5〜150质量份二氧化硅(2),0.1〜50质量份液态二烯系橡胶( 3),其用不饱和羧酸和/或其衍生物改性,数均分子量为5000〜100000,进一步为0.1〜50质量份未改性的液体二烯类橡胶(4),其具有 相对于100质量份的固体二烯系橡胶(1),数均分子量为5000〜100000,和/或相对于100质量份的二氧化硅(2)为1.5〜14.0质量份的水(5) )和通过使橡胶组合物交联而得到的交联物。 通过本发明获得的橡胶组合物在加入二氧化硅并与二烯系橡胶混合时的加工性提高,交联后的动态性能优异。
    • 16. 发明申请
    • Filter device
    • 过滤装置
    • US20080117000A1
    • 2008-05-22
    • US11984639
    • 2007-11-20
    • Koichi Wada
    • Koichi Wada
    • H03H9/64H03H9/54
    • H03H9/009
    • A lattice-type filter circuit includes first and second balanced signal terminals; first and second balanced signal terminals; a first resonator connected to a series arm between the first balanced signal terminal on the input side and the first balanced signal terminal on the output side; a second resonator connected to a series arm between the second balanced signal terminal on the input side and the second balanced signal terminal on the output side; a first resonant circuit including impedance elements, being connected to a lattice arm between the first balanced signal terminal on the output side and the second balanced signal terminal on the input side; and a second resonant circuit including impedance elements, being connected to a lattice arm between the second balanced signal terminal on the output side and the first balanced signal terminal on the input side.
    • 格子型滤波电路包括第一和第二平衡信号端子; 第一和第二平衡信号端子; 连接到输入侧的第一平衡信号端子与输出侧的第一平衡信号端子之间的串联臂的第一谐振器; 连接到输入侧的第二平衡信号端子与输出侧的第二平衡信号端子之间的串联臂的第二谐振器; 包括阻抗元件的第一谐振电路,连接到输出侧的第一平衡信号端子与输入侧的第二平衡信号端子之间的格子臂; 以及包括阻抗元件的第二谐振电路,连接到输出侧的第二平衡信号端子与输入侧的第一平衡信号端子之间的格子臂。
    • 20. 发明授权
    • Electrolytic decontamination process and process for reproducing
decontaminating electrolyte by electrodeposition and apparatuses
therefore
    • 电解净化工艺和通过电沉积再现净化电解质的方法和装置
    • US4615776A
    • 1986-10-07
    • US661696
    • 1984-10-17
    • Takashi SasakiToshio KobayashiKoichi Wada
    • Takashi SasakiToshio KobayashiKoichi Wada
    • G21F9/00C25F3/16
    • G21F9/004
    • This disclosure relates to electrolytic decontamination of radioactively contaminated objects such as equipment or parts. The objects to be decontaminated are divided into two types: First, wastes resulting from dismantlement of radioactively contaminated equipment and parts, and second, equipment, vessels, pipes and tools that are to be reused. The electrolyte used for decontamination of the first type may be an inorganic acid aqueous solution of relatively low concentration that is inexpensive and rapid in polishing. A suitable inorganic acid is sulfuric acid that does not generate harmful gases in the process of electrolysis. The concentration of the sulfuric acid should be high to achieve polishing efficiency. About 5 Vol. % is the most suitable for uniform polishing and disposal of waste electrolyte. An electrolyte of this concentration is effective in macroscopic polishing but not in microscopic polishing (mirror finish), however. Therefore, an electrolyte for decontamination of the second type that requires microscopic polishing must be a high concentration acid solution, preferably 70% or higher phosphoric acid content. The electrolyte is reproduced by an electrodeposition process in diaphragm electrolysis.
    • 本公开涉及放射性污染物体如设备或部件的电解去污。 要净化的物体分为两种:一是废弃物,这些废物是由于放射性污染的设备和零件的拆除而造成的,二是被重复使用的设备,船只,管道和工具。 用于第一类净化的电解质可以是廉价且快速抛光的相对低浓度的无机酸水溶液。 合适的无机酸是在电解过程中不产生有害气体的硫酸。 硫酸的浓度应高,以达到抛光效率。 约5卷 %是最适合于均匀抛光和处理废电解液的。 然而,这种浓度的电解质在宏观抛光中是有效的,但是在微观抛光(镜面抛光)中是有效的。 因此,需要微观研磨的第二种类型的净化用电解液必须是高浓度的酸溶液,优选为70%以上的磷酸含量。 通过隔膜电解中的电沉积工艺再生电解质。