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11. 发明授权

US5121160A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5121160A
公开(公告)日：1992-06-09
申请号：US715745
申请日：1991-06-18
申请人： Naoto Sano , Masato Aketagawa , Hitoshi Nakano , Takahisa Shiozawa
发明人： Naoto Sano , Masato Aketagawa , Hitoshi Nakano , Takahisa Shiozawa
IPC分类号： G03F7/20
CPC分类号： G03F7/70058
摘要： An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any change in the size of the laser beam; and a device for directing the laser beam to a substrate to be exposed, the directing device including a compensator responsive to an output signal from the detector for substantially correcting the change in the beam size.
摘要翻译：曝光方法包括以下步骤：将辐射束引导到要曝光的基底; 并且基本上校正辐射束的尺寸的任何变化。此外，公开了一种曝光装置，其包括用于发射激光束的激光器; 用于检测激光束尺寸变化的检测器; 以及用于将激光束引导到待暴露的基板的装置，所述引导装置包括响应于来自检测器的输出信号的补偿器，用于基本上校正光束尺寸的变化。

12. 发明授权

US07403397B2 Switching power-supply module 有权
标题翻译：开关电源模块
公开(公告)号：US07403397B2
公开(公告)日：2008-07-22
申请号：US10746660
申请日：2003-12-26
申请人： Tadahiko Matsumoto , Syuichi Honda , Yasuo Ohashi , Naoto Sano
发明人： Tadahiko Matsumoto , Syuichi Honda , Yasuo Ohashi , Naoto Sano
IPC分类号： H05K1/14
CPC分类号： H02M7/003 , H02M3/33538 , H02M2001/0074 , H05K1/144 , H05K3/3405 , H05K3/3421 , H05K3/368 , H05K2201/10386
摘要： A switching power-supply module includes circuit boards, power conversion circuit sections provided on the respective circuit boards, conductor land patterns provided with spacing therebetween along edges of the circuit boards, conductor terminals for interconnecting the conductor land patterns. The circuit boards are stacked with spacing therebetween with the corresponding conductor land patterns being aligned, and the aligned conductor land patterns are interconnected by the corresponding conductor terminals. At least one of the conductor terminals includes an interboard-connection portion for interconnecting the conductor land patterns of the circuit boards and a leg portion that extends from the interboard-connection portion in the stacking direction of the circuit boards and that defines an external-connection portion, and the other conductor terminals each function as an interboard-connection dedicated terminal for providing connection between the circuit boards.
摘要翻译：开关电源模块包括电路板，设置在各个电路板上的功率转换电路部分，沿着电路板的边缘设置有间隔的导体焊盘图案，用于互连导体焊盘图案的导体端子。电路板之间具有间隔地堆叠，相应的导体焊盘图案对准，并且对准的导体焊盘图案通过相应的导体端子互连。至少一个导体端子包括用于互连电路板的导体焊盘图案的板间连接部分和从电路板的堆叠方向上从板间连接部分延伸的脚部分，并且限定外部连接部分，其他导体端子各自用作板间连接专用端子，用于提供电路板之间的连接。

13. 发明授权

US07145925B2 Laser oscillation apparatus, exposure apparatus, semiconductor device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method 有权
标题翻译：激光振荡装置，曝光装置，半导体装置的制造方法，半导体制造厂和曝光装置维护方法
公开(公告)号：US07145925B2
公开(公告)日：2006-12-05
申请号：US10930745
申请日：2004-09-01
申请人： Yoshiyuki Nagai , Naoto Sano
发明人： Yoshiyuki Nagai , Naoto Sano
IPC分类号： H01S3/13
CPC分类号： H01S3/225 , H01S3/104 , H01S3/1055 , H01S3/106
摘要： A laser oscillation apparatus includes a wavelength change unit for driving a wavelength selection element in a band-narrowing module and changing the oscillation wavelength of a laser beam to a target value, and an oscillation history memory for storing the oscillation state of the laser beam as an oscillation history. The wavelength change unit drives the wavelength selection element on the basis of the oscillation history and changes the oscillation wavelength of the laser beam to the target value.
摘要翻译：激光振荡装置包括用于驱动频带变窄模块中的波长选择元件并将激光束的振荡波长改变为目标值的波长改变单元和用于将激光束的振荡状态存储的振荡历史存储器，振荡历史。波长改变单元基于振荡历史驱动波长选择元件，并将激光束的振荡波长改变为目标值。

14. 发明授权

US5949468A Light quantity measuring system and exposure apparatus using the same 失效
标题翻译：光量测量系统和使用其的曝光装置
公开(公告)号：US5949468A
公开(公告)日：1999-09-07
申请号：US677525
申请日：1996-07-10
申请人： Tsutomu Asahina , Naoto Sano
发明人： Tsutomu Asahina , Naoto Sano
IPC分类号： G01J1/02 , B41J2/44 , G01J1/42 , G03F7/20 , H01L21/027 , B41J2/47
CPC分类号： G03F7/70483 , B41J2/442 , G03F7/70358
摘要： A light quantity measuring system and an exposure apparatus using the same, wherein the measuring system includes a light intensity measuring device having a plurality of light receiving elements arrayed at least along a scan direction, a scanning mechanism for scanningly moving the light intensity measuring device relative to a particular region to be examined, and a storing device for storing an intensity of light of each light receiving element, as successively received by the light receiving elements as the light intensity measuring device is scanningly moved relative to the particular region. The light quantity is measured on the basis of information stored in the storing device.
摘要翻译：一种光量测量系统和使用该光量测量系统的曝光装置，其中测量系统包括：至少沿扫描方向排列有多个光接收元件的光强度测量装置，用于扫描光移动光强度测量装置相对的扫描机构以及存储装置，用于存储当光度测量装置相对于该特定区域扫描地移动时由光接收元件依次接收的每个光接收元件的光强度。光量是根据存储在存储装置中的信息来测量的。

15. 发明授权

US5846678A Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US5846678A
公开(公告)日：1998-12-08
申请号：US576694
申请日：1995-12-21
申请人： Hidetoshi Nishigori , Naoto Sano
发明人： Hidetoshi Nishigori , Naoto Sano
IPC分类号： G03F7/20 , H01L21/027 , G03B27/72
CPC分类号： G03F7/70058 , G03F7/70358 , G03F7/70558
摘要： An exposure apparatus for transferring, by exposure, a pattern of a mask onto a wafer, includes a pulse light source and a scanning system for relatively and scanningly moving the mask and the wafer relative to an illumination region to be defined by pulses of light to be sequentially provided by the pulse light source, wherein the number of pulses for exposure of the wafer is determined on the basis of information representing a relation between the pulse number and exposure non-uniformness, and wherein the pulse number is expressed by L/.DELTA.X where L is the width of the illumination region in a scan direction and .DELTA.X is the amount of relative displacement of the illumination region moving in the light emission interval of one pulse.
摘要翻译：用于通过曝光将掩模图案曝光于晶片上的曝光装置包括脉冲光源和扫描系统，用于相对于扫描和扫描地移动掩模和晶片相对于由光脉冲定义的照明区域的扫描系统由脉冲光源依次提供，其中基于表示脉冲数和曝光不均匀性之间的关系的信息确定用于晶片曝光的脉冲数，并且其中脉冲数由L / DELTA X，其中L是扫描方向上的照明区域的宽度，DELTA X是在一个脉冲的发光间隔中移动的照明区域的相对位移量。

16. 发明授权

US5597670A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5597670A
公开(公告)日：1997-01-28
申请号：US430158
申请日：1995-04-27
申请人： Masato Aketagawa , Naoto Sano
发明人： Masato Aketagawa , Naoto Sano
IPC分类号： G03F7/20 , G03G15/04 , H01L21/027 , H01L21/30 , H01S3/134
CPC分类号： G03F7/70575 , Y10S430/146
摘要： A method of exposing a photosensitive substrate with a band-narrowed laser beam from an excimer laser includes providing a stop having an opening in a path of the laser beam; adjusting a size of the opening of the stop to substantially compensate for a change in bandwidth of the laser beam; and exposing after the adjustment the substrate with the laser beam.
摘要翻译：用来自准分子激光器的带状激光束曝光感光基板的方法包括提供在激光束的路径中具有开口的止挡件; 调整停止开口的大小以基本上补偿激光束的带宽变化; 并且在用激光束调整基板之后曝光。

17. 发明授权

US06870865B2 Laser oscillation apparatus, exposure apparatus, semiconductor device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method 失效
公开(公告)号：US06870865B2
公开(公告)日：2005-03-22
申请号：US09839139
申请日：2001-04-23
申请人： Yoshiyuki Nagai , Naoto Sano
发明人： Yoshiyuki Nagai , Naoto Sano
IPC分类号： G03F7/20 , H01L21/027 , H01S3/104 , H01S3/1055 , H01S3/106 , H01S3/136 , H01S3/225 , H01S5/022 , H01S5/06 , H01S5/062 , H01S5/40 , H01S3/13
CPC分类号： H01S3/225 , H01S3/104 , H01S3/1055 , H01S3/106
摘要： A laser oscillation apparatus includes a wavelength change unit for driving a wavelength selection element in a band-narrowing module and changing the oscillation wavelength of a laser beam to a target value, and an oscillation history memory for storing the oscillation state of the laser beam as an oscillation history. The wavelength change unit drives the wavelength selection element on the basis of the oscillation history and changes the oscillation wavelength of the laser beam to the target value.

18. 发明申请

US20050030987A1 Laser oscillation apparatus, exposure apparatus, semiconductor device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method 有权
标题翻译：激光振荡装置，曝光装置，半导体装置的制造方法，半导体制造厂和曝光装置维护方法
公开(公告)号：US20050030987A1
公开(公告)日：2005-02-10
申请号：US10930745
申请日：2004-09-01
申请人： Yoshiyuki Nagai , Naoto Sano
发明人： Yoshiyuki Nagai , Naoto Sano
IPC分类号： G03F7/20 , H01L21/027 , H01S3/104 , H01S3/1055 , H01S3/106 , H01S3/136 , H01S3/225 , H01S5/022 , H01S5/06 , H01S5/062 , H01S5/40 , H01S3/13
CPC分类号： H01S3/225 , H01S3/104 , H01S3/1055 , H01S3/106
摘要： A laser oscillation apparatus includes a wavelength change unit for driving a wavelength selection element in a band-narrowing module and changing the oscillation wavelength of a laser beam to a target value, and an oscillation history memory for storing the oscillation state of the laser beam as an oscillation history. The wavelength change unit drives the wavelength selection element on the basis of the oscillation history and changes the oscillation wavelength of the laser beam to the target value.
摘要翻译：激光振荡装置包括用于驱动频带变窄模块中的波长选择元件并将激光束的振荡波长改变为目标值的波长改变单元和用于将激光束的振荡状态存储的振荡历史存储器，振荡历史。波长改变单元基于振荡历史驱动波长选择元件，并将激光束的振荡波长改变为目标值。

19. 发明授权

US06727976B2 Exposure apparatus with a pulsed laser 失效
标题翻译：带脉冲激光的曝光装置
公开(公告)号：US06727976B2
公开(公告)日：2004-04-27
申请号：US09978035
申请日：2001-10-17
申请人： Naoto Sano
发明人： Naoto Sano
IPC分类号： G03B2732
CPC分类号： G03F7/70575 , G03F7/70241 , Y10S438/942
摘要： An exposure apparatus comprising (a) irradiating means for illuminating a mask with laser light from an excimer laser and (b) a projection optical system for projecting a pattern of the mask onto a substrate with the laser light, wherein a characteristic of the projection optical system is measured by use of a harmonic of a predetermined laser, and wherein the laser light from the excimer laser has a wavelength corresponding to that of the harmonic of the predetermined laser.
摘要翻译：一种曝光装置，包括：（a）用于从准分子激光器的激光照射掩模的照射装置，以及（b）用于将所述掩模的图案用激光投射到基板上的投影光学系统，其中所述投影光学系统通过使用预定激光器的谐波来测量，并且其中来自准分子激光器的激光具有与预定激光器的谐波相对应的波长。

20. 发明授权

US06348357B2 Exposure apparatus with a pulsed laser 有权
标题翻译：带脉冲激光的曝光装置
公开(公告)号：US06348357B2
公开(公告)日：2002-02-19
申请号：US09285672
申请日：1999-04-05
申请人： Naoto Sano
发明人： Naoto Sano
IPC分类号： H01L2166
CPC分类号： G03F7/70575 , G03F7/70241 , Y10S438/942
摘要： A semiconductor device manufacturing method includes the steps of providing a projection exposure apparatus, exposing a wafer by using the projection exposure apparatus, the exposing step including projecting a circuit pattern onto the wafer through the projection optical system using light from a first laser, and developing the exposed wafer. Before the providing step, an optical performance of the projection optical system is measured by producing an interference fringe, bearing information related to aberration of the projection optical system, by use of a harmonic of a second laser having a coherency higher than that of the first laser, and then by analyzing the interference fringe. A wavelength of the light from the first laser is registered with that of the harmonic of the second laser.
摘要翻译：半导体器件制造方法包括以下步骤：提供投影曝光装置，通过使用投影曝光装置曝光晶片;曝光步骤包括使用来自第一激光的光通过投影光学系统将电路图案投影到晶片上，并且显影暴露的晶圆。在提供步骤之前，投影光学系统的光学性能通过使用具有高于第一像素的相干性的第二激光器的谐波产生干涉条纹，与投影光学系统的像差相关的轴承信息来测量激光，然后通过分析干涉条纹。来自第一激光器的光的波长与第二激光器的谐波的波长对应。

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