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11. 发明授权

US6081319A Illumination system and scan type exposure apparatus 失效
标题翻译：照明系统和扫描型曝光装置
公开(公告)号：US6081319A
公开(公告)日：2000-06-27
申请号：US578339
申请日：1995-12-26
申请人： Kunitaka Ozawa , Eiji Sakamoto , Kazuhiro Takahashi , Youzou Fukagawa
发明人： Kunitaka Ozawa , Eiji Sakamoto , Kazuhiro Takahashi , Youzou Fukagawa
IPC分类号： G03F7/20 , H01L21/027 , G03B27/54 , G03B27/42 , G03B27/72
CPC分类号： G03F7/70558 , G03F7/70358
摘要： An illumination system includes a light source for providing pulse light, and a scanning system for relatively and scanningly moving an article, to be illuminated, relative to an illumination region to be defined by the pulse light, wherein, in a light intensity distribution defined in the illumination region with respect to a scan direction, the light intensity changes non-linearly from an least one end portion to a highest light intensity point in the distribution, wherein the light intensity distribution includes a first point at the one end portion, a second point whereat light intensity increase changes, a third point whereat light intensity increase changes, and a fourth point whereat the light intensity is highest, and wherein at least one of a width Wa between the first and second points and a width Wb between the third and fourth points substantially corresponds to or is greater than the relative movement amount between the illumination region and the article per pulse.
摘要翻译：照明系统包括用于提供脉冲光的光源和用于相对于扫描地移动要被照明的物品的扫描系统相对于由脉冲光限定的照明区域，其中在以所述照明区域相对于扫描方向，所述光强度从所述分布中的至少一个端部到最高光强度点非线性地变化，其中所述光强度分布包括在所述一个端部处的第一点，光强度增加变化的点，光强度增加变化的第三点，以及光强度最高的第四点，并且其中第一和第二点之间的宽度Wa和第三和第二点之间的宽度Wb中的至少一个第四点基本上对应于或大于照明区域和物品/脉冲之间的相对移动量。

12. 发明授权

US07939938B2 Functional device package with metallization arrangement for improved bondability of two substrates 有权
标题翻译：具有金属化布置的功能器件封装，用于改善两个衬底的粘合性
公开(公告)号：US07939938B2
公开(公告)日：2011-05-10
申请号：US12028108
申请日：2008-02-08
申请人： Shohei Hata , Naoki Matsushima , Eiji Sakamoto , Ryoji Okada , Takanori Aono , Atsushi Kazama , Toshiki Kida
发明人： Shohei Hata , Naoki Matsushima , Eiji Sakamoto , Ryoji Okada , Takanori Aono , Atsushi Kazama , Toshiki Kida
IPC分类号： H01L23/04
CPC分类号： B81C1/00269 , B81C2203/019 , H01L2924/0002 , H01L2924/00
摘要： A packaging structure for hermetically sealing a functional device by solder connection at a wafer level in which a first Si substrate having a concave portion metallized on its internal surface and a second Si substrate metallized at a position opposed to said concave portion are used, the metallization applied to the internal surface of the concave portion of the first Si substrate and the metallization applied to the second Si substrate at the position opposed to the concave portion are connected by molten solder to hermetically seal the functional device between the first Si substrate and the second Si substrate, whereby the wettability of the solder for the two Si substrates is improved, the bondability between the Si substrates is enhanced, and the yield at which the package is manufactured is improved.
摘要翻译：一种封装结构，用于通过在晶片级焊接连接来密封功能器件，其中使用在其内表面上具有金属化的凹部的第一Si衬底和在与所述凹部相对的位置上金属化的第二Si衬底，所述金属化施加到第一Si衬底的凹部的内表面，并且在与凹部相对的位置处施加到第二Si衬底的金属化通过熔融焊料连接，以将功能器件密封在第一Si衬底和第二Si衬底之间 Si衬底，由此提高了用于两个Si衬底的焊料的润湿性，提高了Si衬底之间的粘合性，并提高了制造封装的成品率。

13. 发明授权

US07078706B2 Chamber, exposure apparatus, and device manufacturing method 失效
标题翻译：室，曝光装置和装置制造方法
公开(公告)号：US07078706B2
公开(公告)日：2006-07-18
申请号：US10859770
申请日：2004-06-03
申请人： Eiji Sakamoto
发明人： Eiji Sakamoto
IPC分类号： G01F23/00 , G21K5/08 , G21K5/10
CPC分类号： F16C29/025 , F16C32/0603 , F16C33/748 , F16C2300/62 , G03F7/70841 , G03F7/70975
摘要： Disclosed is a chamber having a static-pressure bearing disposed therein, the chamber including an inside pressure gauge for detecting an inside pressure of said chamber, and a pressure controller for decreasing the inside pressure of the chamber on the basis of the detection made through the inside pressure gauge. This arrangement effectively prevents unwanted increase of the chamber inside pressure and avoids local breakage of the chamber.
摘要翻译：公开了一种具有设置在其中的静压力轴承的室，所述室包括用于检测所述室的内部压力的内部压力计，以及用于基于通过所述室的所述检测而降低所述室的内部压力的压力控制器内压力表。这种布置有效地防止了室内不希望的增加压力，并避免了室的局部破裂。

14. 发明申请

US20080129971A1 EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE 失效
标题翻译：曝光装置和制造装置的方法
公开(公告)号：US20080129971A1
公开(公告)日：2008-06-05
申请号：US11859541
申请日：2007-09-21
申请人： Eiji Sakamoto
发明人： Eiji Sakamoto
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70933
摘要： An exposure apparatus used to expose a substrate includes an optical system which includes two optical elements and which is configured to guide light emitted from a light source to the substrate, gas supply sections configured to supply gas to a space between the optical elements, and gas exhaust sections configured to exhaust the gas from the space. The gas is supplied to the space such that a swirl flow is formed in the space.
摘要翻译：用于曝光基板的曝光装置包括：光学系统，其包括两个光学元件，其被配置为将从光源发射的光引导到基板;气体供应部分，被配置为将气体供应到光学元件之间的空间，以及气体排气部分构造成从空间排出气体。气体被供应到空间，使得在该空间中形成涡流。

15. 发明授权

US07054079B2 Optical element holder, exposure apparatus, and device fabricating method 有权
公开(公告)号：US07054079B2
公开(公告)日：2006-05-30
申请号：US10844919
申请日：2004-05-12
申请人： Eiji Sakamoto
发明人： Eiji Sakamoto
IPC分类号： G22B7/02
CPC分类号： G03F7/70891 , G02B7/008 , G02B7/028 , G03F7/70825
摘要： An optical element holder for holding an optical element includes a holding element to hold the optical element or a holding part provided to the optical element unitedly, wherein there is substantially no heat exchange between the optical element and the holding element or the holding part and the holding element.

16. 发明申请

US20050206861A1 Correcting device, exposure apparatus, device production method, and device produced by the device production method 失效
公开(公告)号：US20050206861A1
公开(公告)日：2005-09-22
申请号：US11126362
申请日：2005-05-11
申请人： Nobuyoshi Tanaka , Eiji Sakamoto
发明人： Nobuyoshi Tanaka , Eiji Sakamoto
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68 , G03B27/52
CPC分类号： H01L21/682 , G03F7/70691 , G03F7/70783 , G03F7/70875 , Y10T29/41
摘要： A correcting device that properly maintains the flatness of a mask, an exposure apparatus in which overlay accuracy is increased by making use of the correcting device, and a device production method. The correcting device includes a gas flow path including a first area and a second area. The first area is formed above a reticle having formed thereon a pattern that is projected onto a material to be processed in order to form an image of the pattern on the material to be processed. The second area is connected to the first area, has a cross-sectional area that is different from that of the first area, and is not disposed in line with the reticle. The correcting device also includes a blowing section that blows gas to the gas flow path.

17. 发明授权

US06495847B1 Stage control apparatus and exposure apparatus 有权
标题翻译：舞台控制装置和曝光装置
公开(公告)号：US06495847B1
公开(公告)日：2002-12-17
申请号：US09469516
申请日：1999-12-22
申请人： Toshiya Asano , Mitsuru Inoue , Eiji Sakamoto
发明人： Toshiya Asano , Mitsuru Inoue , Eiji Sakamoto
IPC分类号： G03B2742
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F9/70
摘要： An exposure apparatus includes a projection optical system for projecting exposure light, with which a reticle formed with a pattern is irradiated, onto a wafer, a stage for holding and aligning the wafer or reticle, an alignment optical system for outputting alignment light, a reflection mirror provided on the stage, and a plurality of interferometers for measuring the position of the stage by irradiating the reflection mirror with measurement light. The interferometer to be used to measure the position of the stage in a predetermined direction is switched to another in accordance with whether the stage is aligned to the projection optical system or to the alignment optical system.
摘要翻译：曝光装置包括投影光学系统，用于将照射有图案的掩模版的曝光光投射到晶片上，用于保持和对准晶片或掩模版的平台，用于输出对准光的对准光学系统，反射设置在舞台上的反射镜和多个干涉仪，用于通过用测量光照射反射镜来测量舞台的位置。根据舞台与投影光学系统或对准光学系统对准，用于测量舞台在预定方向上的位置的干涉仪被切换到另一个。

18. 发明授权

US6097790A Pressure partition for X-ray exposure apparatus 失效
标题翻译： X射线曝光装置的压力分隔
公开(公告)号：US6097790A
公开(公告)日：2000-08-01
申请号：US30080
申请日：1998-02-25
申请人： Takayuki Hasegawa , Eiji Sakamoto
发明人： Takayuki Hasegawa , Eiji Sakamoto
IPC分类号： G21K5/00 , G03F7/20 , H01L21/027 , H05H13/04 , G21K1/00
CPC分类号： G03F7/70808 , G03F7/70841
摘要： A pressure partition includes a thin film for dividing a predetermined space into two spatial zones and a supporting device for supporting the film at an outside peripheral portion thereof. The supporting device has a curved surface for producing curvature in the outside peripheral portion of the film. The curved surface is disposed at one of the two spatial zones having a lower pressure as compared with the other, and the curved surface has a convex shape with respect to a plane intersecting the film.
摘要翻译：压力分隔件包括用于将预定空间分成两个空间区域的薄膜和用于在其外围部分处支撑薄膜的支撑装置。支撑装置具有用于在膜的外周部分产生曲率的曲面。弯曲表面设置在与另一个相比具有较低压力的两个空间区域中的一个空间区域中，并且弯曲表面相对于与膜相交的平面具有凸形形状。

19. 发明授权

US4777117A Process for producing color filter using alignment marks 失效
标题翻译：使用对准标记生产滤色片的方法
公开(公告)号：US4777117A
公开(公告)日：1988-10-11
申请号：US924737
申请日：1986-10-30
申请人： Tatsuo Murata , Masaru Kamio , Hideaki Takao , Taiko Motoi , Eiji Sakamoto , Nobuyuki Sekimura
发明人： Tatsuo Murata , Masaru Kamio , Hideaki Takao , Taiko Motoi , Eiji Sakamoto , Nobuyuki Sekimura
IPC分类号： G02B5/20 , G03F7/00 , G03F9/00 , H01L27/14 , G03C5/00
CPC分类号： G03F7/0035 , G03F7/0007 , G03F9/00
摘要： A process for producing a color filter having plural number of colorant layer patterns by repeating, for each of a plural number of starting materials for colorant layer, the steps of subjecting a substrate having a photoresist laminated thereon to pattern exposure to effect patterning of said photo-resist, laminating a colorant layer from said photoresist above and removing the layer of said photoresist having said colorant layer laminated thereon by dissolution to form a colorant layer pattern, comprises forming an alignment mark on said substrate with the same starting material as a first colorant layer pattern simultaneously with formation of said first colorant layer pattern and performing registration of the mask during formation of a second colorant layer pattern et seq. through said alignment mark.
摘要翻译：一种用于制造具有多个着色剂层图案的滤色器的方法，对于多个用于着色剂层的原料的每一个，对其上具有光致抗蚀剂的基材进行图案曝光以对所述照片进行图案化 - 抗蚀剂，从上述光致抗蚀剂层压着色剂层，并通过溶解除去其上层压有所述着色剂层的所述光致抗蚀剂层以形成着色剂层图案，包括在所述基板上用与第一着色剂相同的起始材料形成对准标记同时形成所述第一着色剂层图案并在形成第二着色剂层图案期间执行掩模的配准等。通过所述对准标记。

20. 发明授权

US08258637B2 Bonding structure and method for manufacturing same 有权
标题翻译：粘结结构及其制造方法
公开(公告)号：US08258637B2
公开(公告)日：2012-09-04
申请号：US12964907
申请日：2010-12-10
申请人： Eiji Sakamoto , Shohei Hata
发明人： Eiji Sakamoto , Shohei Hata
IPC分类号： H01L23/29
CPC分类号： H01L24/29 , H01L23/488 , H01L23/49816 , H01L24/03 , H01L24/05 , H01L24/13 , H01L24/16 , H01L24/32 , H01L24/81 , H01L24/83 , H01L2224/0401 , H01L2224/04026 , H01L2224/05551 , H01L2224/05624 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/13099 , H01L2224/13101 , H01L2224/13688 , H01L2224/291 , H01L2224/29101 , H01L2224/29111 , H01L2224/32014 , H01L2224/32245 , H01L2224/81191 , H01L2224/81192 , H01L2224/81193 , H01L2224/81355 , H01L2224/81815 , H01L2224/8189 , H01L2224/81905 , H01L2224/83192 , H01L2224/83424 , H01L2224/83444 , H01L2224/83447 , H01L2224/83455 , H01L2224/83801 , H01L2224/8389 , H01L2224/83905 , H01L2924/01004 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/0105 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/0132 , H01L2924/014 , H01L2924/10272 , H01L2924/1033 , H01L2924/157 , H01L2924/351 , H01L2924/00014 , H01L2924/00
摘要： A bonding structure that a bonding region can endure a high temperature environment and the bonding can be maintained with high reliability is provided as a bonding material capable of maintaining reliable bonding in high temperature environment in place of solder including Pb. In the bonding structure for a first member and a second member, solder and glass are used to bond the first member and the second member together and the glass seals the solder. Thereby, electrical conductivity is ensured and the outflow of melting solder in high temperatures can be inhibited to improve the durability.
摘要翻译：作为能够在高温环境下保持可靠的接合而代替含Pb的焊料的接合材料，可以提供接合区域能够耐受高温环境并且可以高可靠性地保持接合的接合结构。在第一构件和第二构件的接合结构中，使用焊料和玻璃将第一构件和第二构件结合在一起，并且玻璃密封焊料。由此，确保导电性，能够抑制高温熔融焊料的流出，提高耐久性。

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