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11. 发明授权

US4566765A Apparatus for summing several ring-shape laser beams 失效
标题翻译：用于求和几个环形激光束的装置
公开(公告)号：US4566765A
公开(公告)日：1986-01-28
申请号：US541439
申请日：1983-10-13
申请人： Tateoki Miyauchi , Mikio Hongo , Katsuro Mizukoshi , Hiroshi Yamaguchi , Akira Shimase
发明人： Tateoki Miyauchi , Mikio Hongo , Katsuro Mizukoshi , Hiroshi Yamaguchi , Akira Shimase
IPC分类号： B23K26/00 , B23K26/06 , B23K26/073 , G02B27/09 , H01S3/10 , H01S3/101 , G02B5/08 , B23K9/00 , G01B11/26 , G02B27/14
CPC分类号： G02B27/0927 , B23K26/0604 , B23K26/0734 , G02B27/09 , G02B27/0905 , G02B27/0977
摘要： A light source apparatus comprises one laser oscillator, at least one other laser oscillator, a light converter for converting a laser beam emitted from the other laser oscillator into a ring-shaped laser beam, and a reflecting mirror for passing a laser light beam emitted from the one laser oscillator through the center hole of the mirror and for reflecting the ring-shaped laser beam from the other laser oscillator via the light converter, the laser beam reflected by the reflecting mirror being coaxial with and being overlapped with the laser beam transmitted through the mirror from the one laser oscillator.
摘要翻译：光源装置包括一个激光振荡器，至少一个激光振荡器，用于将从另一个激光振荡器发射的激光束转换为环形激光束的光转换器，以及用于使从一个激光振荡器通过反射镜的中心孔，并通过光转换器反射来自另一激光振荡器的环形激光束，由反射镜反射的激光束与传输的激光束同轴并与其重叠一个激光振荡器的镜子。

12. 发明授权

US4444801A Method and apparatus for correcting transparent defects on a photomask 失效
标题翻译：用于校正光掩模上的透明缺陷的方法和装置
公开(公告)号：US4444801A
公开(公告)日：1984-04-24
申请号：US338864
申请日：1982-01-12
申请人： Mikio Hongo , Masao Mitani , Tateoki Miyauchi , Masaaki Okunaka , Katsuro Mizukoshi
发明人： Mikio Hongo , Masao Mitani , Tateoki Miyauchi , Masaaki Okunaka , Katsuro Mizukoshi
IPC分类号： G03F1/72 , H05K3/10 , H05K3/22 , B23K9/00 , B05D3/06 , G01D9/42 , G01D15/10
CPC分类号： G03F1/72 , H05K3/105 , H05K3/225
摘要： A method and apparatus for correcting transparent defects on a photomask are disclosed. A metal-organic complex solution is applied to a transparent defect portion and its periphery on the photomask. The transparent defect portion is then exposed to a visible ray or ultraviolet ray to deposit a metal, a metal oxide or a composition thereof, while the light transmission quantity through the transparent defect portion is measured. After the measurement falls below a predetermined level relative to the quantity of the transmitted light at the start of exposure, the exposure is terminated to thereby complete the correction of the transparent defects.
摘要翻译：公开了一种用于校正光掩模上的透明缺陷的方法和装置。将金属 - 有机络合物溶液施加到光掩模上的透明缺陷部分及其周边。然后透明的缺陷部分暴露于可见光或紫外线以沉积金属，金属氧化物或其组合物，同时测量通过透明缺陷部分的透光量。在相对于曝光开始时的透射光量的测量值下降到预定水平之外，终止曝光，从而完成透明缺陷的校正。

13. 发明授权

US4463073A Method and apparatus for redressing defective photomask 失效
标题翻译：用于纠正有缺陷的光掩模的方法和装置
公开(公告)号：US4463073A
公开(公告)日：1984-07-31
申请号：US394642
申请日：1982-07-01
申请人： Tateoki Miyauchi , Katsuro Mizukoshi , Mikio Hongo , Masao Mitani , Masaaki Okunaka , Takao Kawanabe , Isao Tanabe
发明人： Tateoki Miyauchi , Katsuro Mizukoshi , Mikio Hongo , Masao Mitani , Masaaki Okunaka , Takao Kawanabe , Isao Tanabe
IPC分类号： G03F1/00 , G03F1/72 , H01L21/027 , H01L21/30 , G03F9/00
CPC分类号： G03F1/72 , H01L21/30 , Y10S430/139 , Y10S430/146
摘要： A method and apparatus for repairing defect portions of a photomask. A complex material from which a light shading material can be deposited is applied over the photomask. A white (blank) defect region is irradiated with a continuous wave laser light beam projected in a slit-like light image to thereby convert the complex material into the shading material. After washing, a half-deposited portion formed in a peripheral portion of the light shading region is further deposited by a post-baking process. Those portions of the light shading film which depart from the desired mask pattern are removed together with black (solid) defect portion originally present in the photomask through irradiation with a pulse laser light beam. The pulse laser is constituted by a Dye-laser, while the continuous wave laser is constituted by an Ar-laser. A specific half-mirror which transmits therethrough Ar-laser light while reflecting Dye-laser light is displaceable provided. The white and the black defects are selectively centered on a same optical axis of an optical projection system including a slit and a condenser lens, whereby the white and the black defect portions are each removed through irradiation with the associated laser light projected thereto in a slit-like light image through the same optical projection system.
摘要翻译：一种用于修复光掩模的缺陷部分的方法和装置。将光阴影材料沉积的复合材料施加在光掩模上。用投影在狭缝状光图像中的连续波激光束照射白色（空白）缺陷区域，从而将复合材料转换成遮光材料。洗涤后，通过后烘烤处理进一步沉积形成在遮光区域的周边部分中的半沉积部分。通过照射脉冲激光，与原来存在于光掩模中的黑色（实心）缺陷部分一起除去遮光膜的偏离所需掩模图案的那些部分。脉冲激光由染料激光器构成，而连续波激光由Ar激光器构成。通过反射染料激光而透过其的Ar激光的特定半反射镜是可置换的。白色和黑色缺陷选择性地集中在包括狭缝和聚光透镜的光学投影系统的相同光轴上，由此白色和黑色缺陷部分通过照射投射到狭缝中的相关激光而被去除类似的光图像通过相同的光学投影系统。

14. 发明授权

US4510222A Photomask with corrected white defects 失效
标题翻译：具有校正白色缺陷的光掩模
公开(公告)号：US4510222A
公开(公告)日：1985-04-09
申请号：US496245
申请日：1983-05-19
申请人： Masaaki Okunaka , Katsuro Mizukoshi , Mikio Hongo , Tateoki Miyauchi
发明人： Masaaki Okunaka , Katsuro Mizukoshi , Mikio Hongo , Tateoki Miyauchi
IPC分类号： C09D1/00 , C09D10/00 , C09D11/00 , G03F1/00 , G03F1/72 , H01L21/027 , G03F9/00
CPC分类号： G03F1/72 , G03F1/54 , Y10S430/139 , Y10S430/146
摘要： A photomask with white defects that have corrected with a film comprising a mixture of silver and tantalum oxide. The film has a good resistance to chemicals.
摘要翻译：具有用包含银和氧化钽的混合物的膜校正的具有白色缺陷的光掩模。这部电影对化学品有很好的抵抗力。

15. 发明授权

US4503329A Ion beam processing apparatus and method of correcting mask defects 失效
标题翻译：离子束处理装置及矫正掩模缺陷的方法
公开(公告)号：US4503329A
公开(公告)日：1985-03-05
申请号：US427584
申请日：1982-09-29
申请人： Hiroshi Yamaguchi , Tateoki Miyauchi , Akira Shimase , Mikio Hongo
发明人： Hiroshi Yamaguchi , Tateoki Miyauchi , Akira Shimase , Mikio Hongo
IPC分类号： G01Q10/00 , G01Q30/02 , G03F1/00 , G03F1/72 , G03F1/74 , H01J37/30 , H01J37/305 , H01L21/027 , H01L21/30 , G01N23/00
CPC分类号： H01L21/30 , G03F1/74 , H01J37/3007 , H01J37/3053 , H01J2237/0044 , H01J2237/0807
摘要： Disclosed is an ion beam processing apparatus comprising within a vacuum container a specimen chamber with a table for mounting a specimen provided therein, a high intensity ion source, such as a liquid metal ion source or an electric field ionizing ion source which operates in ultra-low temperature, confronting the specimen chamber, an extraction electrode for extracting an ion beam out of the ion source, a charged-particle optical system for focusing the ion beam to a spot, and an aperture for adjusting the spot diameter.
摘要翻译：公开了一种离子束处理装置，在真空容器内具有试样室，具有用于安装其中设置的试样的工作台，高强度离子源，例如液体金属离子源或电场离子源，低温，对准样品室，用于从离子源中提取离子束的提取电极，用于将离子束聚焦到点的带电粒子光学系统和用于调节光斑直径的孔。

16. 发明授权

US4609809A Method and apparatus for correcting delicate wiring of IC device 失效
标题翻译：用于校正IC器件精密布线的方法和装置
公开(公告)号：US4609809A
公开(公告)日：1986-09-02
申请号：US590344
申请日：1984-03-16
申请人： Hiroshi Yamaguchi , Akira Shimase , Tateoki Miyauchi , Mikio Hongo
发明人： Hiroshi Yamaguchi , Akira Shimase , Tateoki Miyauchi , Mikio Hongo
IPC分类号： H01L21/3213 , B23K15/08 , B23K17/00 , G03F1/00 , H01J37/305 , H01L21/28 , H01L21/302 , H01L21/3065 , H01L21/66 , H01L21/768 , B23K15/00
CPC分类号： G03F1/74 , B23K15/08 , B23K17/00 , H01J37/3056 , H01J2237/08
摘要： The invention discloses a method and apparatus for correcting a device characterized in that an ion beam is extracted from an ion source having high luminance such as a liquid metal ion source or the like, the ion beam is then converged to a delicate spot by use of a charged particle optical system and apertures, a wiring portion formed on and outside of an active layer region of a device and connected to the device is located to the spot by observing the wiring portion through an SIM, the ion beam in neutralized by an electron shower so as to prevent the wiring portion from being charged electrically, the converged ion beam spot is radiated to the wiring portion to remove the wiring portion, and radiation of the ion beam is stopped while observing the ion beam by a second ion mass spectrometer which detects that the wiring portion is cut by the ion beam and the ion beam reaches an insulating layer.
摘要翻译：本发明公开了一种用于校正装置的方法和装置，其特征在于，离子束从诸如液体金属离子源等的高亮度的离子源提取，然后通过使用离子束会聚到微妙的位置带电粒子光学系统和孔，在器件的有源层区域上形成并连接到器件的布线部分通过SIM通过观察布线部分而位于该点，离子束被电子中和淋浴，以防止布线部分被电荷充电，会聚的离子束点辐射到布线部分以去除布线部分，并且通过第二离子质谱仪观察离子束来停止离子束的辐射，其中第二离子质谱仪检测出配线部分被离子束切断，离子束到达绝缘层。

17. 再颁专利

USRE33193E Ion beam processing apparatus and method of correcting mask defects 失效
标题翻译：离子束处理装置及矫正掩模缺陷的方法
公开(公告)号：USRE33193E
公开(公告)日：1990-04-03
申请号：US22059
申请日：1987-03-05
申请人： Hiroshi Yamaguchi , Tateoki Miyauchi , Akira Shimase , Mikio Hongo
发明人： Hiroshi Yamaguchi , Tateoki Miyauchi , Akira Shimase , Mikio Hongo
IPC分类号： G03F1/74 , H01J37/30 , H01J37/305
CPC分类号： G03F1/74 , H01J37/3007 , H01J37/3053
摘要： Disclosed is an ion beam processing apparatus comprising within a vacuum container a specimen chamber with a table for mounting a specimen provided therein, a high intensity ion source, such as a liquid metal ion source or an electric field ionizing ion source which operates in ultra-low temperature, confronting the specimen chamber, an extraction electrode for extracting an ion beam out of the ion source, a charged-particle optical system for focusing the ion beam to a spot, and an aperture for adjusting the spot diameter.

18. 发明授权

US07397831B2 Laser annealing apparatus and annealing method of semiconductor thin film using the same 有权
标题翻译：激光退火装置及使用其的半导体薄膜的退火方法
公开(公告)号：US07397831B2
公开(公告)日：2008-07-08
申请号：US10986936
申请日：2004-11-15
申请人： Mikio Hongo , Akio Yazaki , Mutsuko Hatano
发明人： Mikio Hongo , Akio Yazaki , Mutsuko Hatano
IPC分类号： H01S3/00
CPC分类号： B23K26/0738 , B23K26/0853 , G02B27/0927 , G02B27/0966 , H01L21/02678 , H01L21/02683 , H01L21/02691 , H01L21/2026 , H01L27/1285 , H01L27/1296
摘要： A laser beam temporally modulated in amplitude by a modulator and shaped into a long and narrow shape by a beam shaper is rotated around the optical axis of an image rotator inserted between the beam shaper and a substrate. Thus, the longitudinal direction of the laser beam having the long and narrow shape is rotated around the optical axis on the substrate. In order to perform annealing in a plurality of directions on the substrate, the laser beam shaped into the long and narrow shape is rotated on the substrate while a stage mounted with the substrate is moved only in two directions, that is, X- and Y-directions.In such a manner, the substrate can be scanned at a high speed with a continuous wave laser beam modulated temporally in amplitude and shaped into a long and narrow shape, without rotating the substrate. Thus, a semiconductor film can be annealed.
摘要翻译：通过调制器暂时调制振幅的激光束并通过光束整形器成形为长而窄的形状围绕插入在光束整形器和基板之间的图像旋转器的光轴旋转。因此，具有长而窄形状的激光束的纵向方向围绕基板上的光轴旋转。为了在基板上沿多个方向进行退火，将形成为长而窄的形状的激光束在基板上旋转，而安装有基板的台仅沿两个方向移动，即，X轴和Y轴方向以这样一种方式，可以用波长时间上调制并成形为长而窄的连续波激光束高速扫描基板，而不旋转基板。因此，半导体膜可以退火。

19. 发明申请

US20060003478A1 Method of manufacturing display device 有权
标题翻译：显示装置的制造方法
公开(公告)号：US20060003478A1
公开(公告)日：2006-01-05
申请号：US11209742
申请日：2005-08-24
申请人： Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Nakoto Ohkura
发明人： Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Nakoto Ohkura
IPC分类号： H01L21/00
CPC分类号： H01L29/04 , B23K26/0622 , B23K26/064 , B23K26/0648 , B23K26/066 , B23K26/0665 , B23K26/0732 , H01L21/02422 , H01L21/02532 , H01L21/02678 , H01L21/02683 , H01L21/268 , H01L27/1285 , H01L27/1296 , H01L29/66757 , H01L29/78675
摘要： Arrangements (e.g., methods) for manufacturing a display device, including irradiating an amorphous semiconductor film formed on a substrate with an excimer laser beam to convert the amorphous semiconductor film into a polycrystalline semiconductor film; and irradiating predetermined areas of the polycrystalline semiconductor film intermittently with a continuous wave laser beam while a position of the substrate with respect to the continuous wave laser beam is scanned, crystal grains larger than those of the polycrystalline semiconductor film other than the predetermined areas are formed in each of the predetermined areas locally in the polycrystalline semiconductor film, wherein first thin film transistors are formed in the predetermined areas while second thin film transistors are formed in the polycrystalline semiconductor film other than the predetermined areas thereof.
摘要翻译：包括用于制造显示装置的布置（例如，方法），包括用准分子激光束照射形成在衬底上的非晶半导体膜，以将非晶半导体膜转换为多晶半导体膜; 并且在扫描基板相对于连续波激光束的位置时，用连续波激光束间歇地照射多晶半导体膜的预定区域，形成比除了预定区域以外的多晶半导体膜的晶粒大的晶粒在多晶半导体膜中局部的每个预定区域中，其中第一薄膜晶体管形成在预定区域中，而第二薄膜晶体管形成在除了其预定区域之外的多晶半导体膜中。

20. 发明申请

US20050169330A1 Laser annealing apparatus and annealing method of semiconductor thin film 审中-公开
标题翻译：半导体薄膜的激光退火装置和退火方法
公开(公告)号：US20050169330A1
公开(公告)日：2005-08-04
申请号：US10987003
申请日：2004-11-15
申请人： Mikio Hongo , Akio Yazaki , Mutsuko Hatano , Takeshi Noda , Yukio Takasaki
发明人： Mikio Hongo , Akio Yazaki , Mutsuko Hatano , Takeshi Noda , Yukio Takasaki
IPC分类号： H01L21/324 , B23K26/073 , C30B13/24 , C30B29/06 , H01L21/20 , H01L21/268 , H01L29/04 , H01L29/786 , H01S3/00 , H01L21/00 , H01L21/84 , H01L21/76 , C30B1/00 , H01L21/36
CPC分类号： H01L21/02691 , B23K26/0738 , C30B13/24 , C30B29/06 , H01L21/02678 , H01L21/02683 , H01L21/2026 , H01L29/04 , H01L29/78675
摘要： When a laser bean temporally modulated in amplitude by a modulator is shaped into a long and narrow beam by a beam shaper, the scanning-direction size of the long and narrow beam shaped by the beam shaper is selected to be in a range of from 2 to 10 microns, preferably in a range of from 2 to 4 microns and the scanning speed of the beam is selected to be in a range of from 300 to 1000 mm/s, preferably in a range of from 500 to 1000 m/s. As a result, damage of the silicon thin film can be suppressed while energy utilizing efficiency of the laser beam can be improved. Accordingly, laterally grown crystals (belt-like crystals) improved in throughput can be obtained on a required region of a substrate scanned and irradiated with the laser beam.
摘要翻译：当通过调制器在振幅时间上调制的激光束通过光束整形器成形为长而窄的光束时，由光束整形器成形的长而窄的光束的扫描方向尺寸被选择在2 至10微米，优选在2至4微米的范围内，并且光束的扫描速度选择在300至1000mm / s的范围内，优选在500至1000m / s的范围内。结果，可以抑制硅薄膜的损伤，同时提高激光束的能量利用效率。因此，可以在扫描并照射激光束的基板的所需区域上获得提高生产量的横向生长的晶体（带状晶体）。

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