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    • 18. 发明授权
    • Polyimide silicone resin, its solution composition, and polyimide silicone resin film
    • 聚酰亚胺硅树脂,其溶液组成和聚酰亚胺硅树脂薄膜
    • US06703133B2
    • 2004-03-09
    • US09892445
    • 2001-06-28
    • Michihiro SugoHideto Kato
    • Michihiro SugoHideto Kato
    • C08G7726
    • C08G77/455C08L83/10H05K3/285Y10T428/31663
    • A polyimide silicone resin which is obtained from a diamine containing an acid dianhydride and a diaminopolysiloxane, contains 50% by weight or more of a siloxane residual group and has an elongation at rupture of 400% or higher and a modulus of elasticity of 500 N/mm2 or lower. Also disclosed are a polyimide silicone resin solution composition comprising this polyimide silicone resin and a ketone solvent having a boiling point of 130° C. or below, and a polyimide silicone resin film comprising this polyimide silicone resin and formed on a substrate. The polyimide silicone resin can form films at relatively low temperature, has superior adhesiveness to substrates and durability under conditions of high humidity and also has low stress and high elongation.
    • 由含有酸二酐和二氨基聚硅氧烷的二胺获得的聚酰亚胺硅树脂含有50重量%以上的硅氧烷残基,断裂伸长率在400%以上,弹性模量为500N / mm 2以下。 还公开了包含该聚酰亚胺硅树脂和沸点为130℃以下的酮溶剂的聚酰亚胺硅树脂溶液组合物和形成在基材上的聚酰亚胺硅树脂薄膜。 聚酰亚胺硅树脂可以在较低温度下形成薄膜,在高湿度条件下具有优异的基材粘合性和耐久性,并且应力低和伸长率高。