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    • 11. 发明授权
    • Method using block copolymers for making a master mold for nanoimprinting patterned magnetic recording disks with chevron servo patterns
    • 使用嵌段共聚物制造用于纳米压印具有人字形伺服图案的图案化磁记录盘的母模的方法
    • US08815105B2
    • 2014-08-26
    • US13036346
    • 2011-02-28
    • Elizabeth Ann DobiszRicardo RuizGuoliang LiuPaul Franklin Nealey
    • Elizabeth Ann DobiszRicardo RuizGuoliang LiuPaul Franklin Nealey
    • B28B7/38B05D3/10B05D5/00G03F7/00G11B5/855B81C1/00
    • G03F7/0002B81C1/0046B82Y10/00B82Y40/00G11B5/855
    • A method for making a master mold used to nanoimprint patterned magnetic recording disks that have chevron servo patterns with minimal defects uses directed self-assembly of block copolymers. A pattern of chemically modified polymer brush material is formed on the master mold substrate. The pattern includes sets of slanted stripes and interface strips between the sets of slanted stripes. A block copolymer material is deposited on the pattern, which results in directed self-assembly of the block copolymer as lamellae perpendicular to the substrate that are formed into alternating slanted stripes of alternating first and second components of the block copolymer. This component also forms on the interface strips, but as a lamella parallel to the substrate. One of the components is then removed, leaving the remaining component as a grid that acts as a mask for etching the substrate to form the master mold. The disks nanoimprinted by the master mold have reduced defective areas in the transition regions of the chevron servo patterns.
    • 用于制造具有最小缺陷的人字形伺服图案的用于纳米压印图案化磁记录盘的母模的方法使用嵌段共聚物的定向自组装。 在母模基板上形成化学改性聚合物刷材料的图案。 该图案包括在这些倾斜条纹组之间的一组倾斜条纹和界面条。 嵌段共聚物材料沉积在图案上,这导致嵌段共聚物的定向自组装作为垂直于衬底的薄片,其形成为嵌段共聚物交替的第一和第二组分的交替倾斜条纹。 该组件也形成在界面条上,而是形成平行于基底的薄片。 然后除去其中一个部件,留下剩余的部件作为栅格,其用作蚀刻基板以形成母模的掩模。 由主模具纳米压印的盘片减少了人字形伺服模式的过渡区域中的缺陷区域。
    • 14. 发明申请
    • METHOD USING BLOCK COPOLYMERS FOR MAKING A MASTER MOLD FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS WITH CHEVRON SERVO PATTERNS
    • 使用块状共聚物制备主要模具的方法,用于对具有CHEVRON SERVO模式的图形磁记录盘进行纳米压印
    • US20120217220A1
    • 2012-08-30
    • US13036346
    • 2011-02-28
    • Elizabeth Ann DobiszRicardo RuizGuoliang LiuPaul Franklin Nealey
    • Elizabeth Ann DobiszRicardo RuizGuoliang LiuPaul Franklin Nealey
    • B28B7/38B05D3/10B05D5/00
    • G03F7/0002B81C1/0046B82Y10/00B82Y40/00G11B5/855
    • A method for making a master mold used to nanoimprint patterned magnetic recording disks that have chevron servo patterns with minimal defects uses directed self-assembly of block copolymers. A pattern of chemically modified polymer brush material is formed on the master mold substrate. The pattern includes sets of slanted stripes and interface strips between the sets of slanted stripes. A block copolymer material is deposited on the pattern, which results in directed self-assembly of the block copolymer as lamellae perpendicular to the substrate that are formed into alternating slanted stripes of alternating first and second components of the block copolymer. This component also forms on the interface strips, but as a lamella parallel to the substrate. One of the components is then removed, leaving the remaining component as a grid that acts as a mask for etching the substrate to form the master mold. The disks nanoimprinted by the master mold have reduced defective areas in the transition regions of the chevron servo patterns.
    • 用于制造具有最小缺陷的人字形伺服图案的用于纳米压印图案化磁记录盘的母模的方法使用嵌段共聚物的定向自组装。 在母模基板上形成化学改性聚合物刷材料的图案。 该图案包括在这些倾斜条纹组之间的一组倾斜条纹和界面条。 嵌段共聚物材料沉积在图案上,这导致嵌段共聚物的定向自组装作为垂直于衬底的薄片,其形成为嵌段共聚物交替的第一和第二组分的交替倾斜条纹。 该组件也形成在界面条上,而是形成平行于基底的薄片。 然后除去其中一个部件,留下剩余的部件作为栅格,其用作蚀刻基板以形成母模的掩模。 由主模具纳米压印的盘片减少了人字形伺服模式的过渡区域中的缺陷区域。
    • 15. 发明授权
    • Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks
    • 使用嵌段共聚物制造用于纳米压印图案化磁记录盘的高位纵横比的母模的方法
    • US07976715B2
    • 2011-07-12
    • US12539818
    • 2009-08-12
    • Elizabeth Ann DobiszRicardo Ruiz
    • Elizabeth Ann DobiszRicardo Ruiz
    • C25F3/00B44C1/22G11B5/706
    • G11B5/855B82Y10/00B82Y40/00G03F7/0002G11B5/743G11B5/82
    • A method for making a master mold that is used in the nanoimprinting process to make patterned-media disks with patterned data islands uses guided self-assembly of a block copolymer into its components. Conventional or e-beam lithography is used to first form a pattern of generally radial stripes on a substrate, with the stripes being grouped into annular zones or bands. A block copolymer material is then deposited on the pattern, resulting in guided self-assembly of the block copolymer into its components to multiply the generally radial stripes into generally radial lines. Various methods, including conventional lithography, guided self-assembly of a second block copolymer, and e-beam lithography, are then used to form concentric rings over the generally radial lines. After etching and resist removal, the master mold has a pattern of either pillars or holes, depending on the method used.
    • 用于制造在纳米压印过程中制造具有图案化数据岛的图案化介质盘的主模具的方法使用嵌段共聚物向其组分的引导自组装。 使用常规或电子束光刻来首先在基底上形成大致径向条纹的图案,其中条纹被分组成环形区域或带。 然后将嵌段共聚物材料沉积在图案上,导致嵌段共聚物向其组分的引导自组装,以将大致径向的条纹乘以大致的径向线。 然后使用各种方法,包括常规光刻,第二嵌段共聚物的引导自组装和电子束光刻,以在大致径向线上形成同心环。 在蚀刻和抗蚀剂去除之后,主模具有任何柱或孔的图案,这取决于所使用的方法。
    • 16. 发明申请
    • METHOD USING BLOCK COPOLYMERS FOR MAKING A MASTER MOLD WITH HIGH BIT-ASPECT-RATIO FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS
    • 使用块状共聚物制备具有高比特比例的主模的纳米压印图形磁记录盘的方法
    • US20090311363A1
    • 2009-12-17
    • US12539818
    • 2009-08-12
    • Elizabeth Ann DobiszRicardo Ruiz
    • Elizabeth Ann DobiszRicardo Ruiz
    • C23F1/00B05D5/00B29C33/00
    • G11B5/855B82Y10/00B82Y40/00G03F7/0002G11B5/743G11B5/82
    • A method for making a master mold that is used in the nanoimprinting process to make patterned-media disks with patterned data islands uses guided self-assembly of a block copolymer into its components. Conventional or e-beam lithography is used to first form a pattern of generally radial stripes on a substrate, with the stripes being grouped into annular zones or bands. A block copolymer material is then deposited on the pattern, resulting in guided self-assembly of the block copolymer into its components to multiply the generally radial stripes into generally radial lines. Various methods, including conventional lithography, guided self-assembly of a second block copolymer, and e-beam lithography, are then used to form concentric rings over the generally radial lines. After etching and resist removal, the master mold has a pattern of either pillars or holes, depending on the method used.
    • 用于制造在纳米压印过程中制造具有图案化数据岛的图案化介质盘的主模具的方法使用嵌段共聚物向其组分的引导自组装。 使用常规或电子束光刻来首先在基底上形成大致径向条纹的图案,其中条纹被分组成环形区域或带。 然后将嵌段共聚物材料沉积在图案上,导致嵌段共聚物向其组分的引导自组装,以将大致径向的条纹乘以大致的径向线。 然后使用各种方法,包括常规光刻,第二嵌段共聚物的引导自组装和电子束光刻,以在大致径向线上形成同心环。 在蚀刻和抗蚀剂去除之后,主模具有任何柱或孔的图案,这取决于所使用的方法。