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11. 发明申请

US20090174851A1 LIQUID CRYSTAL DISPLAY PANEL AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：液晶显示面板及其制造方法
公开(公告)号：US20090174851A1
公开(公告)日：2009-07-09
申请号：US12168072
申请日：2008-07-04
申请人： Szu-Fen Chen , Huang-Ming Chen , Wei-Ching Wu , Han-Ping D. Shieh
发明人： Szu-Fen Chen , Huang-Ming Chen , Wei-Ching Wu , Han-Ping D. Shieh
IPC分类号： G02F1/1337 , G02F1/1333
CPC分类号： G02F1/1395 , G02F1/133711 , G02F2001/133715 , G02F2001/133726
摘要： An optically self-compensated birefringence liquid crystal display (OCB-LCD) panel including a first substrate, a first splay aligned layer, a second substrate and an OCB liquid crystal layer is provided. A first alignment layer is disposed on a surface of the first substrate. The first splay aligned layer is disposed on a surface of the first alignment layer, and the material of the first splay aligned layer includes a polymer polymerized by a first reactive mesogen (RM) monomer. The second substrate is disposed opposite to the first substrate, and a second alignment layer is disposed on a surface of the second substrate. The OCB liquid crystal layer is interposed between the first substrate and the second substrate.
摘要翻译：提供了包括第一基板，第一喷射取向层，第二基板和OCB液晶层的光学自补偿双折射液晶显示器（OCB-LCD）面板。第一取向层设置在第一基板的表面上。第一喷射对准层设置在第一取向层的表面上，并且第一喷射取向层的材料包括由第一反应性介晶（RM）单体聚合的聚合物。第二基板与第一基板相对设置，第二取向层设置在第二基板的表面上。 OCB液晶层介于第一基板和第二基板之间。

12. 发明申请

US20050164506A1 Method and apparatus for backside polymer reduction in dry-etch process 有权
标题翻译：用于干蚀刻工艺中背面聚合物还原的方法和装置
公开(公告)号：US20050164506A1
公开(公告)日：2005-07-28
申请号：US10765808
申请日：2004-01-27
申请人： Huang-Ming Chen , Chun-Li Chou , Chao-Cheng Chen , Hun-Jan Tao
发明人： Huang-Ming Chen , Chun-Li Chou , Chao-Cheng Chen , Hun-Jan Tao
IPC分类号： H01J37/32 , H01L21/00 , H01L21/302 , H01L21/306 , H01L21/3065 , H01L21/311 , H01L21/461 , H01L21/687
CPC分类号： H01L21/68735 , H01J37/3244 , H01J37/32642 , H01L21/02046 , H01L21/31116 , H01L21/67069 , Y10S156/914 , Y10S156/915 , Y10T279/23
摘要： A method for preventing the formation of contaminating polymeric films on the backsides of semiconductor substrates includes providing an oxygen-impregnated focus ring and/or an oxygen-impregnated chuck that releases oxygen during etching operations. The method further provides delivering oxygen gas to the substrate by mixing oxygen in the cooling gas mixture, maintaining the focus ring at a temperature no greater than the substrate temperature during etching and cleaning the substrate using a two step plasma cleaning sequence that includes suspending the substrate above the chuck.
摘要翻译：防止在半导体衬底的背面形成污染性聚合物膜的方法包括提供在蚀刻操作期间释放氧气的氧浸渍聚焦环和/或氧浸渍卡盘。该方法还通过在冷却气体混合物中混合氧将氧气输送到衬底，在蚀刻和清洁衬底期间将聚焦环保持在不高于衬底温度的温度，使用包括悬浮衬底的两步骤等离子体清洗序列在卡盘上方

13. 发明授权

US09105570B2 Methods for introducing carbon to a semiconductor structure 有权
标题翻译：将碳引入半导体结构的方法
公开(公告)号：US09105570B2
公开(公告)日：2015-08-11
申请号：US13548783
申请日：2012-07-13
申请人： Yu-Chen Su , Huang-Ming Chen , Chun-Feng Nieh , Pei-Chao Su
发明人： Yu-Chen Su , Huang-Ming Chen , Chun-Feng Nieh , Pei-Chao Su
IPC分类号： H01L21/00 , H01L21/26 , H01L21/225 , H01L21/265 , H01L29/66 , H01L29/78
CPC分类号： H01L29/0638 , H01L21/225 , H01L21/26586 , H01L21/31155 , H01L21/76825 , H01L21/76826 , H01L21/76828 , H01L21/76834 , H01L21/76897 , H01L27/092 , H01L29/165 , H01L29/517 , H01L29/66545 , H01L29/66606 , H01L29/66636 , H01L29/7833 , H01L29/7834
摘要： An embodiment is a method comprising diffusing carbon through a surface of a substrate, implanting carbon through the surface of the substrate, and annealing the substrate after the diffusing the carbon and implanting the carbon through the surface of the substrate. The substrate comprises a first gate, a gate spacer, an etch stop layer, and an inter-layer dielectric. The first gate is over a semiconductor substrate. The gate spacer is along a sidewall of the first gate. The etch stop layer is on a surface of the gate spacer and over a surface of the semiconductor substrate. The inter-layer dielectric is over the etch stop layer. The surface of the substrate comprises a surface of the inter-layer dielectric.
摘要翻译：一个实施方案是一种方法，其包括通过基底的表面扩散碳，通过基底的表面注入碳，以及在扩散碳并将碳注入到基底的表面之后退火基底。衬底包括第一栅极，栅极间隔物，蚀刻停止层和层间电介质。第一个栅极在半导体衬底之上。栅极间隔物沿着第一栅极的侧壁。蚀刻停止层位于栅极间隔物的表面上并在半导体衬底的表面上方。层间电介质在蚀刻停止层之上。衬底的表面包括层间电介质的表面。

14. 发明申请

US20100190349A1 Method for backside polymer reduction in dry-etch process 有权
标题翻译：干蚀刻工艺中背面聚合物还原的方法
公开(公告)号：US20100190349A1
公开(公告)日：2010-07-29
申请号：US12798201
申请日：2010-03-30
申请人： Huang-Ming Chen , Chun-Li Chou , Chao-Cheng Chen , Hun-Jan Tao
发明人： Huang-Ming Chen , Chun-Li Chou , Chao-Cheng Chen , Hun-Jan Tao
IPC分类号： H01L21/465 , C23F1/00
CPC分类号： H01L21/68735 , H01J37/3244 , H01J37/32642 , H01L21/02046 , H01L21/31116 , H01L21/67069 , Y10S156/914 , Y10S156/915 , Y10T279/23
摘要： A method for preventing the formation of contaminating polymeric films on the backsides of semiconductor substrates includes providing an oxygen-impregnated focus ring and/or an oxygen-impregnated chuck that releases oxygen during etching operations. The method further provides delivering oxygen gas to the substrate by mixing oxygen in the cooling gas mixture, maintaining the focus ring at a temperature no greater than the substrate temperature during etching and cleaning the substrate using a two step plasma cleaning sequence that includes suspending the substrate above the chuck.
摘要翻译：防止在半导体衬底的背面形成污染性聚合物膜的方法包括提供在蚀刻操作期间释放氧气的氧浸渍聚焦环和/或氧浸渍卡盘。该方法还通过在冷却气体混合物中混合氧将氧气输送到衬底，在蚀刻和清洁衬底期间将聚焦环保持在不高于衬底温度的温度，使用包括悬浮衬底的两步骤等离子体清洗序列在卡盘上方

15. 发明申请

US20050263741A1 GLASSY CHIRAL-NEMATIC LIQUID CRYSTALS AND OPTICAL DEVICES CONTAINING SAME 失效
标题翻译：玻璃精细液晶和包含其的光学装置
公开(公告)号：US20050263741A1
公开(公告)日：2005-12-01
申请号：US10805150
申请日：2004-03-19
申请人： Shaw Chen , Huang-Ming Chen
发明人： Shaw Chen , Huang-Ming Chen
IPC分类号： C09K20060101 , C09K19/12 , C09K19/20 , C09K19/30 , C09K19/32 , C09K19/36 , C09K19/52
CPC分类号： C09K19/2021 , C09K19/2028 , C09K19/3068 , C09K19/322 , C09K19/36 , C09K2019/3095 , Y10T428/10 , Y10T428/1036
摘要： A glassy chiral-nematic liquid crystal composition includes a compound having the structural formula wherein each N represents a nematic group connected to the 1,3,5-benzenetricarbonyl central moiety by a carboxylic ester linkage and Ch represents a chiral group connected to the central moiety by a carboxylic ester linkage. An optical device is formed from at least one of the glassy chiral-nematic liquid crystal compositions.
摘要翻译：玻璃状手性向列型液晶组合物包括具有以下结构式的化合物，其中每个N表示通过羧酸酯键与1,3,5-苯三羰基中心部分连接的向列基团，Ch表示与中心部分连接的手性基团通过羧酸酯键。光学装置由玻璃状手性向列型液晶组合物中的至少一种形成。

16. 发明授权

US06967795B2 Color wheel 失效
公开(公告)号：US06967795B2
公开(公告)日：2005-11-22
申请号：US11117345
申请日：2005-04-29
申请人： Chu-Ming Cheng , Jiunn-Lih Lin , Huang-Ming Chen
发明人： Chu-Ming Cheng , Jiunn-Lih Lin , Huang-Ming Chen
IPC分类号： G02B5/22 , G02F1/1335 , H04N9/31
CPC分类号： H04N9/3114
摘要： The present invention provides a color wheel including a motor and a color filter module. The color filter module includes a first color filter having a first transmittance and a second color filter having a second transmittance that is smaller than the first transmittance. 50% of the first transmittance is corresponding to a first light wavelength and a second light wavelength that is larger than the first light wavelength. The second color filter and the first color filter have substantially same hues. 50% of the second transmittance is corresponding to a third light wavelength and a fourth light wavelength that is larger than the third light wavelength. The second color filter satisfies a first condition chosen from the third light wavelength being larger than the first light wavelength or the second light wavelength being larger than the fourth light wavelength.

17. 发明授权

US08529783B2 Method for backside polymer reduction in dry-etch process 有权
标题翻译：干蚀刻工艺中背面聚合物还原的方法
公开(公告)号：US08529783B2
公开(公告)日：2013-09-10
申请号：US12798201
申请日：2010-03-30
申请人： Huang-Ming Chen , Chun-Li Chou , Chao-Cheng Chen , Hun-Jan Tao
发明人： Huang-Ming Chen , Chun-Li Chou , Chao-Cheng Chen , Hun-Jan Tao
IPC分类号： H01L21/302
CPC分类号： H01L21/68735 , H01J37/3244 , H01J37/32642 , H01L21/02046 , H01L21/31116 , H01L21/67069 , Y10S156/914 , Y10S156/915 , Y10T279/23
摘要： A method for preventing the formation of contaminating polymeric films on the backsides of semiconductor substrates includes providing an oxygen-impregnated focus ring and/or an oxygen-impregnated chuck that releases oxygen during etching operations. The method further provides delivering oxygen gas to the substrate by mixing oxygen in the cooling gas mixture, maintaining the focus ring at a temperature no greater than the substrate temperature during etching and cleaning the substrate using a two step plasma cleaning sequence that includes suspending the substrate above the chuck.
摘要翻译：防止在半导体衬底的背面形成污染性聚合物膜的方法包括提供在蚀刻操作期间释放氧气的氧浸渍聚焦环和/或氧浸渍卡盘。该方法还通过在冷却气体混合物中混合氧将氧气输送到衬底，在蚀刻和清洁衬底期间将聚焦环保持在不高于衬底温度的温度，使用包括悬浮衬底的两步骤等离子体清洗序列在卡盘上方

18. 发明申请

US20070247591A1 DIGITAL LIGHT PROCESSING PROJECTION APPARATUS 审中-公开
标题翻译：数码光处理投影设备
公开(公告)号：US20070247591A1
公开(公告)日：2007-10-25
申请号：US11457820
申请日：2006-07-17
申请人： Jyh-Horng Shyu , Chia-Chen Liao , Chu-Ming Cheng , Huang-Ming Chen
发明人： Jyh-Horng Shyu , Chia-Chen Liao , Chu-Ming Cheng , Huang-Ming Chen
IPC分类号： G03B21/00
CPC分类号： G03B21/008
摘要： A digital light processing (DLP) projection apparatus including an illumination system, a digital micro-mirror device (DMD) and an imaging system is provided. The DMD having a common plane and micro mirrors disposed on the common plane is disposed on a transmission path of the illumination beam to convert an illumination beam from the illumination system into an imaging beam into a screen. The imaging system includes a projection lens disposed on a transmission path of the imaging beam and a total internal reflection (TIR) prism disposed between the DMD and the projection lens. The projection lens has an optical axis, which is not parallel to a normal vector of the common plane and a chief beam of the imaging beam. At least one of the normal vectors of the surfaces of the TIR prism opposite to the projection lens and the DMD is not parallel to the optical axis.
摘要翻译：提供了包括照明系统，数字微镜装置（DMD）和成像系统的数字光处理（DLP）投影装置。具有设置在公共平面上的公共平面和微反射镜的DMD设置在照明光束的传输路径上，以将来自照明系统的照明光束转换成成像光束到屏幕。成像系统包括设置在成像光束的透射路径上的投影透镜和设置在DMD和投影透镜之间的全内反射（TIR）棱镜。投影透镜具有不与公共平面的法线矢量和成像光束的主光束平行的光轴。与投影透镜和DMD相反的TIR棱镜的表面的法向矢量中的至少一个不平行于光轴。

19. 发明授权

US08911822B2 Method of repairing color filter and pre-repair material used thereby 有权
标题翻译：维修滤色片的方法及其修补材料
公开(公告)号：US08911822B2
公开(公告)日：2014-12-16
申请号：US12547493
申请日：2009-08-26
申请人： Feng-Chin Tang , Chi-Hsin Li , Wen-Jen Hsieh , Huang-Ming Chen
发明人： Feng-Chin Tang , Chi-Hsin Li , Wen-Jen Hsieh , Huang-Ming Chen
IPC分类号： B05D3/00 , B32B43/00 , G02F1/1335 , C08L79/08 , G02B5/20 , C08L77/00
CPC分类号： G02F1/133516 , C08L77/00 , C08L79/08 , G02B5/201 , G02F2201/506
摘要： A method of repairing a color filter and a pre-repair material used thereby are provided. The method includes the following steps. First, a color filter including a substrate and a color filter layer is provided, and the color filter layer having at least one defect pattern is disposed on the substrate. Then, a pre-repair layer is formed in the at least one defect pattern. After that, a repair layer is formed on the pre-repair layer, and the repair layer is connected to the substrate through the pre-repair layer.
摘要翻译：提供了修复滤色器的方法和由此使用的预修复材料。该方法包括以下步骤。首先，提供包括基板和滤色器层的滤色器，并且在基板上设置具有至少一个缺陷图案的滤色器层。然后，在至少一个缺陷图案中形成预修复层。之后，在预修复层上形成修复层，修复层通过预修复层与基板连接。

20. 发明申请

US20130049219A1 Semiconductor Device and Method for Forming the Same 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US20130049219A1
公开(公告)日：2013-02-28
申请号：US13222502
申请日：2011-08-31
申请人： Wen-Chi Tsai , Chia-Han Lai , Yung-Chung Chen , Mei-Yun Wang , Chii-Ming Wu , Fang-Cheng Chen , Huang-Ming Chen , Ming-ta Lei
发明人： Wen-Chi Tsai , Chia-Han Lai , Yung-Chung Chen , Mei-Yun Wang , Chii-Ming Wu , Fang-Cheng Chen , Huang-Ming Chen , Ming-ta Lei
IPC分类号： H01L21/768 , H01L23/48
CPC分类号： H01L29/78 , H01L21/02063 , H01L21/28512 , H01L21/28518 , H01L21/76802 , H01L21/76805 , H01L21/76814 , H01L21/76825 , H01L21/76831 , H01L21/76844 , H01L21/76855 , H01L23/485 , H01L23/535 , H01L29/41775 , H01L29/45 , H01L29/6659 , H01L2924/0002 , H01L2924/00
摘要： A system and method for forming and using a liner is provided. An embodiment comprises forming an opening in an inter-layer dielectric over a substrate and forming the liner along the sidewalls of the opening. A portion of the liner is removed from a bottom of the opening, and a cleaning process may be performed through the liner. By using the liner, damage to the sidewalls of the opening from the cleaning process may be reduced or eliminated. Additionally, the liner may be used to help implantation of ions within the substrate.
摘要翻译：提供了一种用于形成和使用衬套的系统和方法。一个实施例包括在衬底之上的层间电介质中形成开口，并沿着开口的侧壁形成衬垫。衬套的一部分从开口的底部移除，并且可以通过衬套执行清洁过程。通过使用衬垫，可以减少或消除从清洁过程对开口侧壁的损坏。另外，衬垫可用于帮助衬底内的离子注入。

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