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11. 发明申请

US20130063095A1 POWER SUPPLY DEVICE 有权
标题翻译：电源设备
公开(公告)号：US20130063095A1
公开(公告)日：2013-03-14
申请号：US13560108
申请日：2012-07-27
申请人： Kazunori WATANABE , Koji ASAKAWA
发明人： Kazunori WATANABE , Koji ASAKAWA
IPC分类号： H02J7/00
CPC分类号： H02J7/0078 , H02J7/0081 , H02J7/044 , H02J7/045
摘要： Provided is a power supply device integrally combined with an electrical device body including a motor, comprising a rechargeable battery for supplying power to the motor, a microcomputer for detecting a residual capacity and a battery voltage of the battery, and a switching element provided between the battery and the microcomputer. The microcomputer stops charging the battery when the detected residual capacity has become 100%, and when the detected value of the battery voltage has become lower than a peak value after the value of the battery voltage passes the peak value, making it possible to prevent overcharging of the battery. The microcomputer also controls to turn off the switching element to stop the power supply from the battery to the microcomputer when the residual capacity becomes less than a predetermined threshold value, making it possible to reduce power consumption.
摘要翻译：提供了一种与包括电动机的电气设备主体整体组合的电源装置，包括用于向电动机供电的可再充电电池，用于检测电池的剩余容量和电池电压的微型计算机，以及设置在电动机之间的开关元件电池和微电脑。当检测到的剩余容量变为100％时，微型计算机停止对电池充电，并且当电池电压的检测值变得低于电池电压值通过峰值后的峰值时，可以防止过充电的电池。当剩余容量小于预定阈值时，微型计算机还控制关闭开关元件以停止从电池向微型计算机供电，从而可以降低功耗。

12. 发明申请

US20120041121A1 METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN 有权
标题翻译：制造多孔结构的方法和形成图案的方法
公开(公告)号：US20120041121A1
公开(公告)日：2012-02-16
申请号：US13278904
申请日：2011-10-21
申请人： Koji ASAKAWA , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
发明人： Koji ASAKAWA , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
IPC分类号： C08K5/07 , C08G77/00 , C08K5/101 , C08F220/06
CPC分类号： C08J9/26 , B82Y10/00 , B82Y30/00 , C03C17/007 , C03C2217/425 , C03C2217/479 , C03C2218/33 , C08J2333/12 , C08J2383/16 , C23F1/30 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/0029 , H01G11/30 , H01G11/56 , H01J9/02 , H01J9/025 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/0337 , H01L21/31695 , H01M2/145 , H01M2/1653 , H01M4/131 , H01M4/133 , H01M4/8605 , H01M4/96 , H01M8/0234 , H01M8/0245 , H01M8/026 , H01M8/1011 , H01M10/0525 , Y02E60/13 , Y02E60/523 , Y02P70/56 , Y10S438/945 , Y10S438/947 , Y10S977/90 , Y10T428/24149
摘要： A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
摘要翻译：图案形成材料含有嵌段共聚物或接枝共聚物，并形成具有微聚合物相的结构，其中，关于构成嵌段共聚物或接枝共聚物的聚合物链中的至少两个聚合物链，N /（Nc- 否）构成各聚合物链的单体单元的值为1.4以上，其中N表示单体单元中的总原子数，Nc表示单体单元中的碳原子数，No表示单体单元中的氧原子数。

13. 发明申请

US20120037594A1 METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN 失效
公开(公告)号：US20120037594A1
公开(公告)日：2012-02-16
申请号：US13278833
申请日：2011-10-21
申请人： Koji ASAKAWA , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
发明人： Koji ASAKAWA , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
IPC分类号： C23F1/04
CPC分类号： C08J9/26 , B82Y10/00 , B82Y30/00 , C03C17/007 , C03C2217/425 , C03C2217/479 , C03C2218/33 , C08J2333/12 , C08J2383/16 , C23F1/30 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/0029 , H01G11/30 , H01G11/56 , H01J9/02 , H01J9/025 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/0337 , H01L21/31695 , H01M2/145 , H01M2/1653 , H01M4/131 , H01M4/133 , H01M4/8605 , H01M4/96 , H01M8/0234 , H01M8/0245 , H01M8/026 , H01M8/1011 , H01M10/0525 , Y02E60/13 , Y02E60/523 , Y02P70/56 , Y10S438/945 , Y10S438/947 , Y10S977/90 , Y10T428/24149
摘要： A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.

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