专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US06740269B2 Method and apparatus of treating a disc plate 失效
标题翻译：处理盘片的方法和装置
公开(公告)号：US06740269B2
公开(公告)日：2004-05-25
申请号：US09973048
申请日：2001-10-10
申请人： Takayuki Suzuki , Masahiro Nakamura , Hideo Kobayashi , Shinichi Shinohara
发明人： Takayuki Suzuki , Masahiro Nakamura , Hideo Kobayashi , Shinichi Shinohara
IPC分类号： B29C4964
CPC分类号： B29C53/18 , B29C35/16 , B29C45/0053 , B29C45/7207 , B29C47/0019 , B29C47/0033 , B29C47/0038 , B29C47/004 , B29C69/00 , B29L2017/003 , B29L2017/005 , Y10S425/81
摘要： A method of treating a disc plate. has the following operations of: molding a mold disc plate through an injection molding; and spinning the mold disc plate at a high spin speed. The spinning operation has at least one of the following two sub-operations of: reducing a warp of the mold disc plate with a centrifugal force caused during the spinning operation, and reducing a temperature of the mold disc plate during the spinning operation. Moreover, an apparatus of treating a disc plate has: a conveyer for conveying a mold disc plate obtained through an injection molding; a disc bench for receiving the mold disc plate conveyed with the conveyer; and a spin driver for spinning the disc bench when a temperature of the mold disc plate is higher than 90° C., to thereby spin the mold disc plate.
摘要翻译：一种盘片处理方法。具有以下操作：通过注塑成型模板盘; 并以高旋转速度旋转模具盘片。纺丝操作具有以下两个子操作中的至少一个：在纺丝操作期间由于离心力而减小模具盘片的翘曲，并且在纺丝操作期间降低模具盘片的温度。此外，一种处理盘片的设备具有：输送机，用于输送通过注射成型获得的模具盘片; 用于接收用输送机输送的模板的盘台; 以及当模盘盘的温度高于90℃时旋转盘台的旋转驱动器，从而旋转模具盘片。

12. 发明申请

US20070291630A1 Optical Disc Production Apparatus 有权
标题翻译：光盘制作装置
公开(公告)号：US20070291630A1
公开(公告)日：2007-12-20
申请号：US11665589
申请日：2006-03-10
申请人： Hironobu Nishimura , Masahiko Kotoyori , Masahiro Nakamura , Kazuya Hisada , Eiji Ohno , Keiji Nishikiori
发明人： Hironobu Nishimura , Masahiko Kotoyori , Masahiro Nakamura , Kazuya Hisada , Eiji Ohno , Keiji Nishikiori
IPC分类号： G11B7/26
CPC分类号： G11B7/265 , G11B7/26
摘要： An optical disc production apparatus for producing a disc substrate with one or two signal layers including: a first signal layer forming mechanism for forming a first signal layer on a disc substrate (hereinafter, substrate); a layer forming mechanism which selectively forms a first reflection layer on the first signal layer and forms a second reflection layer on a second signal layer; a second signal layer forming mechanism which forms the second signal layer on the substrate on which the first reflection layer is formed on the first signal layer; a light transmission layer forming mechanism which forms a light transmission layer on the first/second reflection layer; a first transportation mechanism in a loop shape which is arranged close to each of the above-described constitutional element; a second transportation mechanism which is arranged closed to the first transportation mechanism, and which transports the substrate on which the first/second reflection layer is formed on the first signal layer to the light transmission layer forming mechanism; a first transfer mechanism which transfers the substrate on which the first signal layer is formed to the first transportation mechanism; a second transfer mechanism that selectively transfers the substrate transported by the first transportation mechanism on which the first/second reflection layer is formed on the first signal layer to the second transportation mechanism; and a third transfer mechanism that transfers the substrate transported by the first transportation mechanism on which the first reflection layer is formed on the first signal layer to the second signal layer forming mechanism, and that transfers the substrate on which the second signal layer is formed at the second signal layer forming apparatus to the first transportation mechanism.
摘要翻译：一种用于制造具有一个或两个信号层的盘基片的光盘制造装置，包括：用于在盘基片（以下称为基片）上形成第一信号层的第一信号层形成机构; 层形成机构，其在所述第一信号层上选择性地形成第一反射层，并在第二信号层上形成第二反射层; 第二信号层形成机构，在第一信号层上形成有第一反射层的基板上形成第二信号层; 在第一/第二反射层上形成透光层的透光层形成机构; 环状的第一输送机构，靠近上述构成要素配置; 第二传送机构，其布置成与第一传送机构相邻，并且将在第一信号层上形成有第一/第二反射层的基板传送到光传输层形成机构; 第一传送机构，其将形成有第一信号层的基板传送到第一传送机构; 第二传送机构，其选择性地将由第一传送机构传送的基板传送到第一信号层上的第一/第二反射层到第二传送机构; 以及第三传送机构，其将由其上形成有第一反射层的第一传送机构传送的基板在第一信号层形成机构上传送到第二信号层形成机构，并且将其上形成有第二信号层的基板第二信号层形成装置到第一传送机构。

13. 发明授权

US08130627B2 Optical disc production apparatus 有权
标题翻译：光盘制作装置
公开(公告)号：US08130627B2
公开(公告)日：2012-03-06
申请号：US11665589
申请日：2006-03-10
申请人： Hironobu Nishimura , Masahiko Kotoyori , Masahiro Nakamura , Kazuya Hisada , Eiji Ohno , Keiji Nishikiori
发明人： Hironobu Nishimura , Masahiko Kotoyori , Masahiro Nakamura , Kazuya Hisada , Eiji Ohno , Keiji Nishikiori
IPC分类号： G11B7/00 , B29D11/00
CPC分类号： G11B7/265 , G11B7/26
摘要： An optical disk manufacturing apparatus which employs first and second signal layer forming mechanisms, a reflection layer forming mechanism, a light transmission layer forming mechanism and first, second and third transportation mechanisms. The apparatus further includes a liquid material supplying mechanism, a first and second rotation mechanism, first and second hardening light radiation apparatuses, a ring-shaped mask portion, and a mask transfer mechanism.
摘要翻译：采用第一和第二信号层形成机构的光盘制造装置，反射层形成机构，光透射层形成机构和第一，第二和第三传送机构。该装置还包括液体材料供给机构，第一和第二旋转机构，第一和第二硬化光辐射装置，环形掩模部分和掩模转移机构。

14. 发明授权

US07044183B2 Apparatus for processing substrates 有权
公开(公告)号：US07044183B2
公开(公告)日：2006-05-16
申请号：US11253029
申请日：2005-10-17
申请人： Takayuki Suzuki , Masahiro Nakamura , Tsuyoshi Wakahira , Hideo Kobayashi
发明人： Takayuki Suzuki , Masahiro Nakamura , Tsuyoshi Wakahira , Hideo Kobayashi
IPC分类号： B32B31/26 , B32B31/28
CPC分类号： B32B37/0015 , B29C65/1406 , B29C65/1435 , B29C65/1483 , B29C65/4845 , B29C65/7847 , B29C66/1122 , B29C66/452 , B29C66/91212 , B29C66/91216 , B29C66/91221 , B29C66/91231 , B29C66/91411 , B29C66/91421 , B29C66/91445 , B29C66/961 , B29C66/962 , B29D17/005 , B29L2017/005 , B32B37/12 , B32B2038/0076 , B32B2038/1891 , B32B2309/02 , B32B2310/024 , B32B2429/02 , G11B7/26
摘要： A processing apparatus for substrates that include a plurality of individual substrates having a photo-curable adhesive layer interposed therebetween, including a mounting table, an irradiating device that irradiates the substrates, and a control device that controls the deflection of the substrates (X) while the individual substrates are bonded together by photo-curing the adhesive. The control device calculates a temperature difference ΔT between the temperature Th of the mounting table and the temperature Td of the substrates before curing, finds a deflection difference ΔX between the deflection X of the substrates after curing and the target deflection setting value Xt, finds a temperature Tc by calculating Tc=ΔT−M×ΔX using the constant of proportionality M; and controls the temperatures of at least one of the substrates before curing and the mounting table according to the temperature Tc such that Tc=Th−Td.

15. 发明授权

US06982017B2 Method for controlling deflection of substrates by temperature 失效
标题翻译：通过温度控制基板偏转的方法
公开(公告)号：US06982017B2
公开(公告)日：2006-01-03
申请号：US10769301
申请日：2004-01-30
申请人： Takayuki Suzuki , Masahiro Nakamura , Tsuyoshi Wakahira , Hideo Kobayashi
发明人： Takayuki Suzuki , Masahiro Nakamura , Tsuyoshi Wakahira , Hideo Kobayashi
IPC分类号： B32B31/26 , B32B31/28
CPC分类号： B32B37/0015 , B29C65/1406 , B29C65/1435 , B29C65/1483 , B29C65/4845 , B29C65/7847 , B29C66/1122 , B29C66/452 , B29C66/91212 , B29C66/91216 , B29C66/91221 , B29C66/91231 , B29C66/91411 , B29C66/91421 , B29C66/91445 , B29C66/961 , B29C66/962 , B29D17/005 , B29L2017/005 , B32B37/12 , B32B2038/0076 , B32B2038/1891 , B32B2309/02 , B32B2310/024 , B32B2429/02 , G11B7/26
摘要： A substrate consisting of a plurality of individual substrates and a photo-curable adhesive layer interposed therebetween is irradiated by a curing light, and the deflection of the substrate is controlled by controlling the temperature. The step for controlling the deflection includes the steps of finding the temperature difference ΔT between the temperature Th of a mounting table and the temperature Td of the substrates before curing; finding deflection difference ΔX between the deflection X of the substrates after curing and the target deflection setting value Xt; finding the temperature Tc by Tc=ΔT−M×ΔX by using the constant of proportionality M; and controlling the temperatures of at least one of the substrates before curing and the mounting table according to the temperature Tc such that Tc=Th−Td.
摘要翻译：通过固化光照射由多个单独基板和介于其间的光固化粘合剂层构成的基板，通过控制温度来控制基板的偏转。用于控制偏转的步骤包括以下步骤：找到安装台的温度Th与固化前的基板的温度Td之间的温差DeltaT; 在固化后的基板的挠曲X与目标偏转设定值Xt之间求出偏差ΔX; 通过使用比例常数M求得Tc = DeltaT-MxDeltaX的温度Tc; 并根据温度Tc控制固化前的至少一个基板的温度和安装台，使得Tc = Th-Td。

16. 发明申请

US20050139306A1 Method and apparatus for processing substrates 失效
标题翻译：用于处理衬底的方法和装置
公开(公告)号：US20050139306A1
公开(公告)日：2005-06-30
申请号：US10769301
申请日：2004-01-30
申请人： Takayuki Suzuki , Masahiro Nakamura , Tsuyoshi Wakahira , Hideo Kobayashi
发明人： Takayuki Suzuki , Masahiro Nakamura , Tsuyoshi Wakahira , Hideo Kobayashi
IPC分类号： B32B37/12 , G05G15/00 , G11B7/26 , B32B31/00 , B32B31/24
CPC分类号： B32B37/0015 , B29C65/1406 , B29C65/1435 , B29C65/1483 , B29C65/4845 , B29C65/7847 , B29C66/1122 , B29C66/452 , B29C66/91212 , B29C66/91216 , B29C66/91221 , B29C66/91231 , B29C66/91411 , B29C66/91421 , B29C66/91445 , B29C66/961 , B29C66/962 , B29D17/005 , B29L2017/005 , B32B37/12 , B32B2038/0076 , B32B2038/1891 , B32B2309/02 , B32B2310/024 , B32B2429/02 , G11B7/26
摘要： A substrate consisting of a plurality of individual substrates and a photo-curable adhesive layer interposed there between is irradiated by a curing light, and the deflection of the substrate is controlled by controlling the temperature. The step for controlling the deflection includes the steps of finding the temperature difference ΔT between the temperature Th of a mounting table and the temperature Td of the substrates before curing; finding deflection difference ΔX between the deflection X of the substrates after curing and the target deflection setting value Xt; finding the temperature Tc by Tc=ΔT−10. M×ΔX by using the constant of proportionality M; and controlling the temperatures of at least one of the substrates before curing and the mounting table according to the temperature Tc such that Tc=Th−Td.
摘要翻译：由固化光照射由多个单独基板和插入其间的光固化粘合剂层构成的基板，通过控制温度来控制基板的挠曲。用于控制偏转的步骤包括以下步骤：找到安装台的温度Th与固化前的基板的温度Td之间的温差DeltaT; 在固化后的基板的挠曲X与目标偏转设定值Xt之间求出偏差ΔX; 通过Tc = DeltaT-10找到温度Tc。 MxDeltaX通过使用常数的比例M; 并根据温度Tc控制固化前的至少一个基板的温度和安装台，使得Tc = Th-Td。

17. 发明申请

US20060153054A1 Optical disk and optical disk manufacturing method and device 审中-公开
标题翻译：光盘和光盘制造方法及装置
公开(公告)号：US20060153054A1
公开(公告)日：2006-07-13
申请号：US11325384
申请日：2006-01-03
申请人： Hideo Kobayashi , Takayuki Suzuki , Masahiro Nakamura , Naoto Ozawa
发明人： Hideo Kobayashi , Takayuki Suzuki , Masahiro Nakamura , Naoto Ozawa
IPC分类号： G11B7/24
CPC分类号： G11B7/266
摘要： An optical disk manufacturing method including a process of toroidally supplying a first resin on one side of a first disk substrate having an aperture at the center, in a region adjacent to the perimeter of the aperture; a process of rotating the first disk substrate provided with the first resin at a first rotational speed, and spreading the first resin; a process of curing the spread first resin in the surrounding vicinity of the aperture; a process of toroidally supplying a second resin that is superimposed on the first resin of the first disk substrate on which the first resin has cured, in the region adjacent to the perimeter of the aperture; a process of rotating the first disk substrate provided with the second resin at a second rotational speed, and spreading the second resin; and a process of curing the spread second resin.
摘要翻译：一种光盘制造方法，包括：在与所述孔周边相邻的区域中，在第一圆盘基板的一侧上具有中心孔径的第一树脂环状供给工序; 以第一旋转速度旋转设置有第一树脂的第一盘基板并使第一树脂铺展的工序; 在孔周围附近固化展开的第一树脂的工艺; 在与孔的周边相邻的区域中环状地供给叠加在第一树脂固化的第一盘基板的第一树脂上的第二树脂的工序; 以第二旋转速度旋转设置有第二树脂的第一盘基片并使第二树脂铺展的过程; 以及使分散的第二树脂固化的方法。

18. 发明申请

US20060048895A1 Apparatus for processing substrates 有权
标题翻译：用于处理衬底的设备
公开(公告)号：US20060048895A1
公开(公告)日：2006-03-09
申请号：US11253029
申请日：2005-10-17
申请人： Takayuki Suzuki , Masahiro Nakamura , Tsuyoshi Wakahira , Hideo Kobayashi
发明人： Takayuki Suzuki , Masahiro Nakamura , Tsuyoshi Wakahira , Hideo Kobayashi
IPC分类号： B32B37/00 , B32B41/00
CPC分类号： B32B37/0015 , B29C65/1406 , B29C65/1435 , B29C65/1483 , B29C65/4845 , B29C65/7847 , B29C66/1122 , B29C66/452 , B29C66/91212 , B29C66/91216 , B29C66/91221 , B29C66/91231 , B29C66/91411 , B29C66/91421 , B29C66/91445 , B29C66/961 , B29C66/962 , B29D17/005 , B29L2017/005 , B32B37/12 , B32B2038/0076 , B32B2038/1891 , B32B2309/02 , B32B2310/024 , B32B2429/02 , G11B7/26
摘要： A processing apparatus for substrates that include a plurality of individual substrates having a photo-curable adhesive layer interposed therebetween, including a mounting table, an irradiating device that irradiates the substrates, and a control device that controls the deflection of the substrates (X) while the individual substrates are bonded together by photo-curing the adhesive. The control device calculates a temperature difference ΔT between the temperature Th of the mounting table and the temperature Td of the substrates before curing, finds a deflection difference ΔX between the deflection X of the substrates after curing and the target deflection setting value Xt, finds a temperature Tc by calculating Tc=ΔT−M×ΔX using the constant of proportionality M; and controls the temperatures of at least one of the substrates before curing and the mounting table according to the temperature Tc such that Tc=Th−Td.
摘要翻译：一种基板的处理装置，其特征在于，具备包含安装台，照射所述基板的照射装置以及控制所述基板（X）的偏转的控制装置的多个具有光固化型粘合剂层的基板的基板的处理装置，各个基板通过光固化粘合剂而结合在一起。控制装置计算安装台的温度Th与固化前的基板的温度Td之间的温差DeltaT，求出固化后的基板的挠曲X与目标偏转设定值Xt之间的偏转差ΔX，求出温度Tc通过使用比例常数M计算Tc = DeltaT-MxDeltaX; 并根据温度Tc控制固化前的至少一个基板和安装台的温度，使得Tc = Th-Td。

19. 发明授权

US09482200B2 Starter 有权
标题翻译：起动机
公开(公告)号：US09482200B2
公开(公告)日：2016-11-01
申请号：US14388055
申请日：2012-03-30
申请人： Tomohiko Ikemori , Hiroshi Ooka , Masaaki Oya , Masataka Odagiri , Shigehiro Kanbe , Hiroki Yamada , Seiji Shimada , Yusuke Fukada , Takayuki Yamagata , Masahiro Nakamura
发明人： Tomohiko Ikemori , Hiroshi Ooka , Masaaki Oya , Masataka Odagiri , Shigehiro Kanbe , Hiroki Yamada , Seiji Shimada , Yusuke Fukada , Takayuki Yamagata , Masahiro Nakamura
IPC分类号： F02N15/02 , F02N11/00 , F02N15/06 , F02N15/00 , F02N11/08
CPC分类号： F02N15/062 , F02N11/00 , F02N11/0851 , F02N15/00 , F02N15/02
摘要： Formed in a pinion (74) are pinion-side helical external teeth (74A) that mesh with a ring gear 823), and pinion-side helical internal teeth (74a) that mesh with a pinion inner (71). Formed in the pinion inner (71) are pinion inner-side helical external teeth (73) that mesh with the pinion-side helical internal teeth (74a). The configuration is formed so that when the rotational speed of the pinion (74) is slower than that of the ring gear (23), a thrust load is generated in a direction toward the ring gear (23), and when the rotational speed of the pinion (74) is faster than that of the ring gear (23), a thrust load is generated in a direction away from the ring gear (23).
摘要翻译：形成在小齿轮（74）中的是与齿圈823啮合的小齿轮侧螺旋状外齿（74A）和与小齿轮内部（71）啮合的小齿轮侧螺旋状内齿（74a）。在小齿轮内部（71）中形成有与小齿轮侧螺旋内齿（74a）啮合的小齿轮内侧螺旋形外齿（73）。该构造形成为当小齿轮（74）的旋转速度比环形齿轮（23）的转速慢时，在朝向齿圈（23）的方向上产生推力载荷，小齿轮（74）比环形齿轮（23）的速度更快，所以在远离齿圈（23）的方向产生推力负载。

20. 发明授权

US09190316B2 Low energy etch process for nitrogen-containing dielectric layer 有权
标题翻译：含氮介电层的低能蚀刻工艺
公开(公告)号：US09190316B2
公开(公告)日：2015-11-17
申请号：US13281732
申请日：2011-10-26
申请人： Markus Brink , Robert L. Bruce , Sebastian U. Engelmann , Nicholas C. M. Fuller , Hiroyuki Miyazoe , Masahiro Nakamura
发明人： Markus Brink , Robert L. Bruce , Sebastian U. Engelmann , Nicholas C. M. Fuller , Hiroyuki Miyazoe , Masahiro Nakamura
IPC分类号： H01L21/00 , H01L21/768 , H01L21/311 , H01L21/321
CPC分类号： H01L23/53295 , H01L21/31116 , H01L21/31144 , H01L21/3212 , H01L21/76802 , H01L21/76813 , H01L21/76831 , H01L21/76834 , H01L21/76835 , H01L23/5226 , H01L23/528 , H01L2924/0002 , H01L2924/00
摘要： A stack that includes, from bottom to top, a nitrogen-containing dielectric layer, an interconnect level dielectric material layer, and a hard mask layer is formed on a substrate. The hard mask layer and the interconnect level dielectric material layer are patterned by an etch. Employing the patterned hard mask layer as an etch mask, the nitrogen-containing dielectric layer is patterned by a break-through anisotropic etch, which employs a fluorohydrocarbon-containing plasma to break through the nitrogen-containing dielectric layer. Fluorohydrocarbon gases used to generate the fluorohydrocarbon-containing plasma generate a carbon-rich polymer residue, which interact with the nitrogen-containing dielectric layer to form volatile compounds. Plasma energy can be decreased below 100 eV to reduce damage to physically exposed surfaces of the interconnect level dielectric material layer.
摘要翻译：在基板上形成从底部到顶部包括含氮介电层，互连层介电材料层和硬掩模层的堆叠。通过蚀刻对硬掩模层和互连层电介质材料层进行图案化。使用图案化的硬掩模层作为蚀刻掩模，通过使用含氟烃的等离子体穿过含氮介电层的穿透各向异性蚀刻来对含氮介电层进行图案化。用于产生含氟烃的等离子体的氟烃气体产生富含碳的聚合物残余物，其与含氮介电层相互作用以形成挥发性化合物。等离子体能量可以降低到低于100eV，以减少互连层介电材料层的物理暴露表面的损伤。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式