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11. 发明授权

US4011993A Apparatus for paint application 失效
标题翻译：涂料应用设备
公开(公告)号：US4011993A
公开(公告)日：1977-03-15
申请号：US580613
申请日：1975-05-27
申请人： Makoto Mizuno , Yoshio Nishiumi , Yukio Nagasaka
发明人： Makoto Mizuno , Yoshio Nishiumi , Yukio Nagasaka
IPC分类号： B05C5/00 , B05B3/02 , E01C23/16 , E01C23/20 , E01C23/22 , E01C23/24
CPC分类号： B05B3/02 , E01C23/22
摘要： An apparatus which is used for paint application to a road surface comprises a paint supply means provided with a valve means rotatably fitted in a bore-like space which is formed longitudinally in the body of the supply means, a plurality of orifices in two rows in an opposite relation on a lower portion of said paint supply means for paint discharging, a pair of rollers each provided on the external periphery thereof and in the axial direction of the roller with a vast plurality of projecting teeth and grooves formed side by side with the projecting teeth, said rollers being attached to said paint supply means to rotate inwardly and disposed adjacent said orifices, and a pair of cover members each adapted to cover one of the rollers. With the arrangement mentioned above, the paint having a high viscosity can be discharged sufficiently and effectively to draw or produce lines which have a fixed width and thickness of paint on the road surface without regard to the rise and fall of the road surface.
摘要翻译：用于油漆施用于路面的装置包括涂料供给装置，其具有可旋转地装配在纵向形成在供给装置的主体中的孔状空间中的阀装置，多个在两排中的孔在所述涂料供给装置的下部的涂料排出的下部具有相反的关系，一对辊设置在所述辊的外周和所述辊的轴向上，所述辊具有大量多个突出的齿和槽，突出的齿，所述辊被附着到所述油漆供应装置上以向内旋转并且邻近所述孔设置，以及一对盖构件，每个盖构件适于覆盖其中一个辊。通过上述布置，可以充分有效地排出具有高粘度的涂料，而不用考虑道路表面的上升和下降来绘制或生产具有固定的路面宽度和厚度的线条。

12. 发明授权

US07948695B2 Optical element positioning apparatus, projection optical system and exposure apparatus 有权
标题翻译：光学元件定位装置，投影光学系统和曝光装置
公开(公告)号：US07948695B2
公开(公告)日：2011-05-24
申请号：US12870877
申请日：2010-08-30
申请人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
发明人： Ryo Nawata , Makoto Mizuno , Shigeyuki Uzawa
IPC分类号： G02B7/02
CPC分类号： G02B7/005 , G02B7/1827 , G03F7/70258 , G03F7/70825
摘要： An optical element is moved in six-degrees-of-freedom. Three first displacement sensors are disposed on a base plate and measure respective displacement amounts of three mutually different points on the optical element in a first direction. A second displacement sensor measures a displacement amount of one point on the optical element in a second direction. Two third displacement sensors measure respective displacement amounts of two mutually different points on the optical element in a third direction. A transformation processor transforms the six measured displacement amounts. A calibration processor calibrates the transformed displacement amounts with a calibration matrix of which coefficients are previously obtained to calibrate the displacement amounts in the six-degrees-of-freedom, which have errors due to measurement errors of the displacement sensors. A controller outputs command values based on differences between the calibrated displacement amounts and target displacement amounts.
摘要翻译：光学元件以6自由度移动。三个第一位移传感器设置在基板上，并且在第一方向上测量光学元件上的三个相互不同的点的相应位移量。第二位移传感器在第二方向上测量光学元件上的一个点的位移量。两个第三位移传感器在第三方向测量光学元件上的两个相互不同的点的相应位移量。变换处理器转换六个测量的位移量。校准处理器使用预先获得系数的校准矩阵校准变换的位移量，以校准六自由度中的位移量，其由于位移传感器的测量误差而具有误差。控制器基于校准的位移量和目标位移量之间的差异输出命令值。

13. 发明授权

US07894036B2 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US07894036B2
公开(公告)日：2011-02-22
申请号：US11537071
申请日：2006-09-29
申请人： Makoto Mizuno , Hiroshi Ito
发明人： Makoto Mizuno , Hiroshi Ito
IPC分类号： G03B27/52
CPC分类号： G03B27/42 , G03F7/70341
摘要： An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a substrate to be exposed, via a liquid that is filled in a space between the substrate and a final lens that is closest to the substrate, a movement restricting part for restricting a movement of the liquid by forming a interval between the movement restricting part and the substrate, the interval is smaller than a interval of the space, and a moving part for moving the movement restricting part so that the interval between the movement restricting part and the substrate increases.
摘要翻译：曝光装置包括：投影光学系统，用于通过填充在基板和最靠近基板的最终透镜之间的空间中的液体将掩模版图案投影到待曝光的基板上;移动限制部件，用于通过在所述移动限制部和所述基板之间形成间隔来限制所述液体的移动，所述间隔小于所述间隔的间隔，以及移动部，其使所述移动限制部移动，使得所述移动限制部与所述移动限制部之间的间隔，衬底增加。

14. 发明授权

US07760452B2 Driving apparatus, optical system, exposure apparatus and device fabrication method 有权
标题翻译：驱动装置，光学系统，曝光装置和装置制造方法
公开(公告)号：US07760452B2
公开(公告)日：2010-07-20
申请号：US10830749
申请日：2004-04-23
申请人： Makoto Mizuno
发明人： Makoto Mizuno
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/027 , G02B7/1822
摘要： A driving apparatus comprising an optical element, a supporting block for supporting said optical element by contacting said optical element onto three supporting contact areas, a driving mechanism for practically connecting said supporting block to three driving contact areas and for moving said supporting block via the driving contact area, wherein a difference between an angle of each of the three supporting contact areas in a rotational direction around a rotation axis and an angle of each of the three driving contact areas corresponding with the three supporting contact areas is 10° or smaller, where the three supporting areas are substantially located on a first plane, and the rotational axis which is perpendicular to the first plane and passes through a barycenter of the three supporting contact areas.
摘要翻译：一种驱动装置，包括光学元件，支撑块，用于通过将所述光学元件接触到三个支撑接触区域来支撑所述光学元件;驱动机构，用于将所述支撑块实际上连接到三个驱动接触区域，并且用于通过所述驱动来移动所述支撑块接触区域，其中，围绕旋转轴线的旋转方向上的三个支撑接触区域中的每一个的角度与对应于三个支撑接触区域的三个驱动接触区域中的每一个的角度之间的差为10°或更小，其中三个支撑区域基本上位于第一平面上，旋转轴线垂直于第一平面并通过三个支撑接触区域的重心。

15. 发明申请

US20100136778A1 Semiconductor Memory Device and a Method of Manufacturing the Same, A Method of Manufacturing a Vertical MISFET and a Vertical MISFET, and a Method of Manufacturing a Semiconductor Device and a Semiconductor Device 有权
标题翻译：半导体存储器件及其制造方法，制造垂直MISFET和垂直MISFET的方法以及制造半导体器件和半导体器件的方法
公开(公告)号：US20100136778A1
公开(公告)日：2010-06-03
申请号：US12700344
申请日：2010-02-04
申请人： Hiraku Chakihara , Kousuke Okuyama , Masahiro Moniwa , Makoto Mizuno , Keiji Okamoto , Mitsuhiro Noguchi , Tadanori Yoshida , Yasuhiko Takahshi , Akio Nishida
发明人： Hiraku Chakihara , Kousuke Okuyama , Masahiro Moniwa , Makoto Mizuno , Keiji Okamoto , Mitsuhiro Noguchi , Tadanori Yoshida , Yasuhiko Takahshi , Akio Nishida
IPC分类号： H01L21/28
CPC分类号： H01L29/6675 , H01L21/823885 , H01L27/105 , H01L27/11 , H01L27/1104 , H01L27/1116 , H01L29/7833 , H01L29/78642
摘要： Vertical MISFETs are formed over drive MISFETs and transfer MISFETs. The vertical MISFETs comprise rectangular pillar laminated bodies each formed by laminating a lower semiconductor layer (drain), an intermediate semiconductor layer, and an upper semiconductor layer (source), and gate electrodes formed on corresponding side walls of the laminated bodies with gate insulating films interposed therebetween. In each vertical MISFET, the lower semiconductor layer constitutes a drain, the intermediate semiconductor layer constitutes a substrate (channel region), and the upper semiconductor layer constitutes a source. The lower semiconductor layer, the intermediate semiconductor layer and the upper semiconductor layer are each comprised of a silicon film. The lower semiconductor layer and the upper semiconductor layer are doped with a p type and constituted of a p type silicon film.
摘要翻译：垂直MISFET形成在驱动MISFET和传输MISFET上。垂直MISFET包括通过层叠下半导体层（漏极），中间半导体层和上半导体层（源极）形成的矩形柱层叠体以及在层叠体的相应侧壁上形成有栅极绝缘膜的栅电极插入其间。在每个垂直MISFET中，下半导体层构成漏极，中间半导体层构成衬底（沟道区），上半导体层构成源极。下半导体层，中间半导体层和上半导体层均由硅膜构成。下半导体层和上半导体层掺杂有p型并由p型硅膜构成。

16. 发明授权

US07719052B2 Semiconductor device 有权
标题翻译：半导体器件
公开(公告)号：US07719052B2
公开(公告)日：2010-05-18
申请号：US12020393
申请日：2008-01-25
申请人： Fumitoshi Ito , Yoshiyuki Kawashima , Takeshi Sakai , Yasushi Ishii , Yasuhiro Kanamaru , Takashi Hashimoto , Makoto Mizuno , Kousuke Okuyama , Yukiko Manabe
发明人： Fumitoshi Ito , Yoshiyuki Kawashima , Takeshi Sakai , Yasushi Ishii , Yasuhiro Kanamaru , Takashi Hashimoto , Makoto Mizuno , Kousuke Okuyama , Yukiko Manabe
IPC分类号： H01L29/792
CPC分类号： H01L27/11568 , G11C16/0466 , H01L21/28282 , H01L27/115 , H01L29/42344 , H01L29/66833 , H01L29/792
摘要： The degree of integration and the number of rewriting of a semiconductor device having a nonvolatile memory element are improved. A first MONOS nonvolatile-memory-element and a second MONOS nonvolatile-memory-element having a large gate width compared with the first MONOS nonvolatile-memory-element are mounted together on the same substrate, and the first MONOS nonvolatile-memory-element is used for storing program data which is scarcely rewritten, and the second MONOS nonvolatile-memory-element is used for storing processed data which is frequently rewritten.
摘要翻译：改善了具有非易失性存储元件的半导体器件的积分度和重写次数。与第一MONOS非易失性存储元件相比，具有大门宽度的第一MONOS非易失性存储元件和第二MONOS非易失性存储元件一起安装在同一衬底上，并且第一MONOS非易失性存储元件是用于存储几乎不被重写的程序数据，并且第二MONOS非易失性存储元件用于存储频繁重写的处理数据。

17. 发明授权

US07221463B2 Positioning apparatus, exposure apparatus, and method for producing device 失效
标题翻译：定位装置，曝光装置及其制造方法
公开(公告)号：US07221463B2
公开(公告)日：2007-05-22
申请号：US10798812
申请日：2004-03-10
申请人： Makoto Mizuno , Ryo Nawata , Mitsuru Inoue
发明人： Makoto Mizuno , Ryo Nawata , Mitsuru Inoue
IPC分类号： G01B11/14 , G03B27/42
CPC分类号： G02B7/005 , G02B7/023 , G02B7/1828 , G03F7/70825 , G03F7/70833
摘要： The present invention provides a positioning apparatus capable of performing six-axis micro adjustment of an optical element in an exposure apparatus with high accuracy, and the exposure apparatus. The positioning apparatus of the present invention includes a first measurement unit for measuring a position/inclination of a moving part having an optical element while being kept from contact with the moving part, and a driving unit capable of driving the moving part in directions of six axes with respect to a fixed part while being kept from contact with the moving part, based on the result of measurement by the first measurement unit.
摘要翻译：本发明提供一种能够以高精度对曝光装置中的光学元件进行六轴微调的定位装置和曝光装置。本发明的定位装置包括：第一测量单元，用于测量具有光学元件的运动部件的位置/倾斜度，同时不与运动部件接触;以及驱动单元，其能够沿六方向驱动运动部件基于第一测量单元的测量结果，相对于固定部分的轴线与运动部件保持接触。

18. 发明授权

US07187106B2 Positioning mechanism, exposure apparatus and device manufacturing method 有权
标题翻译：定位机构，曝光装置和装置制造方法
公开(公告)号：US07187106B2
公开(公告)日：2007-03-06
申请号：US10898444
申请日：2004-07-23
申请人： Naoto Fuse , Hiroshi Ito , Makoto Mizuno
发明人： Naoto Fuse , Hiroshi Ito , Makoto Mizuno
IPC分类号： H01L41/04 , H01L41/08
CPC分类号： G03F7/70825 , G02B7/003 , G03F7/70891 , G03F7/709 , G03F7/70916 , H01L41/053 , H01L41/0536
摘要： The present invention provides a positioning mechanism and an exposure apparatus that can be used in a vacuum ambience and has a damping function with small degassing and small dust creation. A positioning mechanism according to the present invention, when used with first and second members, serve to position the second member with respect to the first member, wherein the positioning mechanism include a positioning portion capable of relatively positioning the second member relative to the first member, and an attenuating material provided at least at a portion of a periphery of the positioning portion.
摘要翻译：本发明提供一种能够在真空环境中使用的定位机构和曝光装置，并且具有减少小的脱气和小的粉尘产生的阻尼功能。根据本发明的定位机构，当与第一和第二构件一起使用时，用于相对于第一构件定位第二构件，其中定位机构包括能够相对于第二构件相对于第一构件相对定位的定位部以及设置在所述定位部的周边的至少一部分的衰减材料。

19. 发明申请

US20050035684A1 Positioning mechanism, exposure apparatus and device manufacturing method 有权
标题翻译：定位机构，曝光装置和装置制造方法
公开(公告)号：US20050035684A1
公开(公告)日：2005-02-17
申请号：US10898444
申请日：2004-07-23
申请人： Naoto Fuse , Hiroshi Ito , Makoto Mizuno
发明人： Naoto Fuse , Hiroshi Ito , Makoto Mizuno
IPC分类号： F16F15/02 , G02B7/00 , G03F7/20 , H01L21/027 , H01L41/053 , D05B23/00
CPC分类号： G03F7/70825 , G02B7/003 , G03F7/70891 , G03F7/709 , G03F7/70916 , H01L41/053 , H01L41/0536
摘要： The present invention provides a positioning mechanism and an exposure apparatus that can be used in a vacuum ambience and has a damping function with small degassing and small dust creation. A positioning mechanism according to the present invention, when used with first and second members, serve to position the second member with respect to the first member, wherein the positioning mechanism include a positioning portion capable of relatively positioning the second member relative to the first member, and an attenuating material provided at least at a portion of a periphery of the positioning portion.
摘要翻译：本发明提供一种能够在真空环境中使用的定位机构和曝光装置，并且具有减少小的脱气和小的粉尘产生的阻尼功能。根据本发明的定位机构，当与第一和第二构件一起使用时，用于相对于第一构件定位第二构件，其中定位机构包括能够相对于第二构件相对于第一构件相对定位的定位部以及设置在所述定位部的周边的至少一部分的衰减材料。

20. 发明授权

US5822133A Optical structure and device manufacturing method using the same 失效
标题翻译：光学结构和器件制造方法采用相同的方法
公开(公告)号：US5822133A
公开(公告)日：1998-10-13
申请号：US695203
申请日：1996-08-01
申请人： Makoto Mizuno , Ryuichi Ebinuma , Toshinori Minowa
发明人： Makoto Mizuno , Ryuichi Ebinuma , Toshinori Minowa
IPC分类号： G02B7/04 , G02B3/14 , G02B7/02 , G02B26/08 , G02B27/00 , G03F7/20 , H01L21/027 , H01L21/68 , G02B15/14
CPC分类号： G03F7/70241 , G02B26/0875 , G02B27/0025 , G02B3/14 , G02B7/023 , G02B7/026 , G03F7/70825 , G03F7/70883
摘要： An optical component moving device having a driving portion and guiding portion, for moving an optical component, wherein the driving portion includes fluid enclosure system being expandable and contractible and the guiding portion includes a leaf spring.
摘要翻译：一种具有用于移动光学部件的驱动部分和引导部分的光学部件移动装置，其中驱动部分包括可扩张和收缩的流体封闭系统，并且引导部分包括板簧。

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