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11. 发明申请

US20050031988A1 Resist polymer, resist composition and patterning process 审中-公开
标题翻译：抗蚀聚合物，抗蚀剂组成和图案化工艺
公开(公告)号：US20050031988A1
公开(公告)日：2005-02-10
申请号：US10910308
申请日：2004-08-04
申请人： Takeru Watanabe , Tsunehiro Nishi , Kenji Funatsu , Takao Yoshihara
发明人： Takeru Watanabe , Tsunehiro Nishi , Kenji Funatsu , Takao Yoshihara
IPC分类号： C08F220/18 , G03C1/76 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397
摘要： A polymer comprising recurring units of formulae (1), (2) and (3) increases a dissolution rate in an alkali developer under the action of an acid. R1, R2 and R5 are H or CH3, R3 and R4 are H or OH, and X is a tertiary exo-alkyl group having a bicyclo[2.2.1]heptane structure, represented by any of formulae (X-1) to (X-4): wherein R6 is a C1-C10 alkyl group. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and minimized line edge roughness and lends itself to micropatterning with electron beams or deep UV for VLSI fabrication.
摘要翻译：包含式（1），（2）和（3）的重复单元的聚合物在酸的作用下增加碱显影剂中的溶解速率。 R 1，R 2和R 5是H或CH 3，R 3和R 4是H或OH，X是具有双环[2.2.1] 庚烷结构，由式（X-1）至（X-4）中的任一个表示：其中R 6是C 1 -C 10烷基。包含本发明聚合物的抗蚀剂组合物对高能量辐射具有敏感性，改进的分辨率和最小化的线边缘粗糙度，并且借助于电子束或深紫外线用于VLSI制造的微图案化。

12. 发明授权

US07871752B2 Lactone-containing compound, polymer, resist composition, and patterning process 有权
标题翻译：含内酯的化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07871752B2
公开(公告)日：2011-01-18
申请号：US11878759
申请日：2007-07-26
申请人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Seiichiro Tachibana
发明人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Seiichiro Tachibana
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/28 , G03F7/0046 , Y10S430/111
摘要： Lactone-containing compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic hydrocarbon ring, R4 is H or CO2R5, R5 is a monovalent hydrocarbon group, W is CH2, O or S, and k1 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, pattern edge roughness, pattern density dependency and exposure margin.
摘要翻译：具有式（1）的含内酯的化合物是新的，其中R 1是H，F，甲基或三氟甲基，R 2和R 3是一价烃基，或者R 2和R 3可以一起形成脂族烃环，R 4是H或CO 2 R 5，R 5是一价烃基，W是CH 2，O或S，k 1是0或1.它们可用作产生对辐射透明的聚合物的单体; 500nm。包含作为基础树脂的聚合物的辐射敏感性抗蚀剂组合物表现出优异的性能，包括分辨率，图案边缘粗糙度，图案密度依赖性和曝光余量。

13. 发明申请

US20100062366A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：积极的组合和绘图过程
公开(公告)号：US20100062366A1
公开(公告)日：2010-03-11
申请号：US12548866
申请日：2009-08-27
申请人： Tsunehiro Nishi , Takeshi Kinsho , Masaki Ohashi , Koji Hasegawa , Masashi Iio
发明人： Tsunehiro Nishi , Takeshi Kinsho , Masaki Ohashi , Koji Hasegawa , Masashi Iio
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, m is 1 or 2, and the hydroxyl group attaches to a tertiary carbon atom. The composition is improved in resolution when processed by lithography.
摘要翻译：正型抗蚀剂组合物包含（A）在酸的作用下变得可溶于碱性显影剂的树脂组分和（B）酸产生剂。树脂（A）是包含由式（1）表示的不含离去羟基的重复单元的聚合物，其中R 1是H，甲基或三氟甲基，m是1或2，羟基连接到叔碳原子上。当通过光刻处理时，组合物的分辨率得到改善。

14. 发明申请

US20090274984A1 CARBOXYL-CONTAINING LACTONE COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权
标题翻译：含羧酸的化合物，聚合物，耐腐蚀组合物和图案处理
公开(公告)号：US20090274984A1
公开(公告)日：2009-11-05
申请号：US12434365
申请日：2009-05-01
申请人： Satoshi SHINACHI , Tsunehiro Nishi , Koji Hasegawa , Takeshi Kinsho , Seiichiro Tachibana , Takeru Watanabe
发明人： Satoshi SHINACHI , Tsunehiro Nishi , Koji Hasegawa , Takeshi Kinsho , Seiichiro Tachibana , Takeru Watanabe
IPC分类号： G03F7/20 , C07D307/77 , C08F24/00
CPC分类号： G03F7/0397 , C07D307/77 , C08F220/28 , G03F7/0045 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： Carboxyl-containing lactone compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic ring, W is CH2, O or S, k1 is an integer of 0 to 4, and k2 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.
摘要翻译：具有式（1）的含羧基的内酯化合物是新的，其中R 1是H，F，甲基或三氟甲基，R 2和R 3是H或一价烃基，或者R 2和R 3可以一起形成脂族环，W是CH 2，O或 S，k1为0〜4的整数，k2为0或1.它们可用作单体以产生对辐射<= 500nm透明的聚合物。包含作为基础树脂的聚合物的辐射敏感性抗蚀剂组合物表现出优异的性能，包括分辨率，LER，图案密度依赖性和曝光余量。

15. 发明授权

US06667145B1 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US06667145B1
公开(公告)日：2003-12-23
申请号：US09694369
申请日：2000-10-24
申请人： Tsunehiro Nishi , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tomohiro Kobayashi , Jun Hatakeyama
发明人： Tsunehiro Nishi , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tomohiro Kobayashi , Jun Hatakeyama
IPC分类号： G03C173
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A resist composition contains as a base resin a polymer represented by the following formula and having a Mw of 1,000-500,000. R1 is H, methyl or CO2R2, R2 is alkyl, R3 is H, methyl or CH2CO2R2, at least one of R4 to R7 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are independently H or alkyl, at least one of R8 to R11 is a monovalent hydrocarbon group of 2 to 15 carbon atoms containing a —CO2— partial structure, and the reminders are independently H or alkyl, R12 is a polycyclic hydrocarbon group or an alkyl group containing such a polycyclic hydrocarbon group, R13 is an acid labile group, Z is a divalent group of atoms to construct a 5- or 6-membered ring which contains a carboxylate, carbonate or acid anhydride therein, k is 0 or 1, x is a number from more than 0 to 1, “a” to “d” are from 0 to less than 1, x+a+b+c+d=1. The resist composition has significantly improved resolution, substrate adhesiveness, and etching resistance and is very useful in precise microfabrication.
摘要翻译：抗蚀剂组合物包含作为基础树脂的由下式表示的聚合物，其Mw为1,000-500,000.R 1是H，甲基或CO 2 R 2，R 2是烷基，R 3是 H，甲基或CH 2 CO 2 R 2，R 4至R 7中的至少一个是含羧基或羟基的一价烃基，并且提醒独立地为H或烷基，R 8， R 11是含有-CO 2 - 部分结构的2至15个碳原子的一价烃基，并且提醒独立地是H或烷基，R 12是多环烃基或含有这种多环的烷基烃基，R 13是酸不稳定基团，Z是构成其中含有羧酸酯，碳酸酯或酸酐的5-或6-元环的二价原子基团，k是0或1，x是数字从0到1，“a”到“d”从0到小于1，x + a + b + c + d = 1。抗蚀剂组合物具有显着提高的分辨率，基底粘附性和耐蚀刻性，并且在精确微细加工中非常有用。

16. 发明授权

US06500971B2 Ester compounds having alicyclic and oxirane structures and method for preparing the same 有权
标题翻译：具有脂环和环氧乙烷结构的酯化合物及其制备方法
公开(公告)号：US06500971B2
公开(公告)日：2002-12-31
申请号：US09873193
申请日：2001-06-05
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： C07D30316
CPC分类号： C08G65/22 , C07D303/48 , G03F7/0395
摘要： An ester compound of formula (1) is provided. R1 is H or methyl, R2 is tertiary C4-20 alkyl, and k=0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance and substrate adhesion, and is suited for micropatterning using electron beams or deep-UV.
摘要翻译：提供式（1）的酯化合物.R1是H或甲基，R2是叔C4-20烷基，k = 0或1.包含作为基础树脂的抗蚀剂组合物由酯化合物产生的聚合物敏感高能量辐射，具有优异的灵敏度，分辨率，耐蚀刻性和基板粘合性，适用于使用电子束或深紫外线的微图案。

17. 发明授权

US06492090B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06492090B2
公开(公告)日：2002-12-10
申请号：US09842113
申请日：2001-04-26
申请人： Tsunehiro Nishi , Seiichiro Tachibana , Mutsuo Nakashima , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Jun Hatakeyama
发明人： Tsunehiro Nishi , Seiichiro Tachibana , Mutsuo Nakashima , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： G03F7/039 , C08F222/06 , C08F222/40 , C08F232/08 , G03F7/0045 , C08F2220/1866 , C08F232/04 , C08F234/04 , C08F232/00
摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 is alkyl or aryl, Y is a divalent hydrocarbon group which may contain a hetero atom and which forms a ring with the carbon atom, Z is a trivalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.
摘要翻译：提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R1是H，CH3或CH2CO2R3，R2是H，CH3或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基，R5是烷基或芳基，Y是可以含有杂原子的二价烃基，与碳原子形成环，Z为三价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

18. 发明授权

US06448420B1 Acid-decomposable ester compound suitable for use in resist material 有权
标题翻译：适用于抗蚀材料的酸分解酯化合物
公开(公告)号：US06448420B1
公开(公告)日：2002-09-10
申请号：US09572975
申请日：2000-05-18
申请人： Takeshi Kinsho , Tsunehiro Nishi , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
发明人： Takeshi Kinsho , Tsunehiro Nishi , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
IPC分类号： C07J900
CPC分类号： C07C69/753 , C07C69/013 , C07C2602/42 , C07C2603/68 , C07C2603/74 , G03F7/0045 , G03F7/038 , G03F7/039
摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl ester as the acid-decomposable site is used as a dissolution regulator to formulate a resist composition having a high sensitivity, resolution, etching resistance and storage stability.
摘要翻译：使用具有外型2-烷基双环[2.2.1]庚-2-基酯作为酸可分解部位的新型酯化合物作为溶解调节剂，以配制具有高灵敏度，分辨率，耐蚀刻性和储存稳定性。

19. 发明授权

US06399274B1 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US06399274B1
公开(公告)日：2002-06-04
申请号：US09694706
申请日：2000-10-24
申请人： Takeshi Kinsho , Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
发明人： Takeshi Kinsho , Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045
摘要： A resist composition contains as a base resin a polymer comprising recurring units of the formula (1-1) or (1-2) and having a Mw of 1,000-500,000. R1 is H, methyl or CO2R2, R2 is a straight, branched or cyclic C1-15 alkyl group, R3 is hydrogen, methyl or CH2CO2R2, R4 is an acid labile group, i is an integer of 1 to 4, and k is equal to 0 or 1. The resist composition has significantly improved sensitivity, resolution and etching resistance and is very useful in precise microfabrication.
摘要翻译：抗蚀剂组合物含有作为基础树脂的包含式（1-1）或（1-2）的重复单元并且具有1,000-500,000的Mw的聚合物.R1是H，甲基或CO 2 R 2，R 2是直链，支链的或环状C 1-15烷基，R 3是氢，甲基或CH 2 CO 2 R 2，R 4是酸不稳定基团，i是1至4的整数，并且k等于0或1.抗蚀剂组合物具有显着提高的灵敏度，分辨率和抗蚀刻性，并且在精密微细加工中非常有用。

20. 发明授权

US06312867B1 Ester compounds, polymers, resist compositions and patterning process 有权
公开(公告)号：US06312867B1
公开(公告)日：2001-11-06
申请号：US09431139
申请日：1999-11-01
申请人： Takeshi Kinsho , Tsunehiro Nishi , Hideshi Kurihara , Koji Hasegawa , Takeru Watanabe , Osamu Watanabe , Mutsuo Nakashima , Takanobu Takeda , Jun Hatakeyama
发明人： Takeshi Kinsho , Tsunehiro Nishi , Hideshi Kurihara , Koji Hasegawa , Takeru Watanabe , Osamu Watanabe , Mutsuo Nakashima , Takanobu Takeda , Jun Hatakeyama
IPC分类号： G03F7004
CPC分类号： C07C69/56 , C07C69/013 , C07C69/533 , C07C69/54 , C07C69/593 , C07C69/60 , C07C2602/42 , C07C2603/68 , C07C2603/86 , C08F20/18 , G03F7/0045 , G03F7/039 , Y02P20/55
摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

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