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11. 发明申请

US20050279739A1 Semiconductor structure processing using multiple laser beam spots spaced on-axis to increase single-blow throughput 有权
标题翻译：使用在轴上间隔开的多个激光束点的半导体结构处理来增加单次打击吞吐量
公开(公告)号：US20050279739A1
公开(公告)日：2005-12-22
申请号：US11052000
申请日：2005-02-04
申请人： Kelly Bruland , Brian Baird , Ho Lo , Stephen Swaringen , Frank Evans
发明人： Kelly Bruland , Brian Baird , Ho Lo , Stephen Swaringen , Frank Evans
IPC分类号： B23K26/00 , B23K26/06 , B23K26/067 , B23K26/08 , B23K26/10 , B23K26/38 , B23K26/40 , H01L21/768 , H01L23/525
CPC分类号： H01L23/5258 , B23K26/0613 , B23K26/0624 , B23K26/067 , B23K26/10 , B23K2101/40 , H01L21/76894 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems selectively irradiate structures on or within a semiconductor substrate using a plurality of pulsed laser beams. The structures are arranged in a row extending in a generally lengthwise direction. The method generates a first pulsed laser beam that propagates along a first laser beam axis that intersects the semiconductor substrate and a second pulsed laser beam that propagates along a second laser beam axis that intersects the semiconductor substrate. The method directs respective first and second pulses from the first and second pulsed laser beams onto distinct first and second structures in the row so as to complete irradiation of said structures with a single laser pulse per structure. The method moves the first and second laser beam axes relative to the semiconductor substrate substantially in unison in a direction substantially parallel to the lengthwise direction of the row, so as to selectively irradiate structures in the row with either the first or the second laser beam. The moving step results in a speed that is greater than would occur if only a single laser beam were utilized to irradiate the structures in the row.
摘要翻译：方法和系统使用多个脉冲激光束选择性地照射半导体衬底上或内部的结构。这些结构被布置成在大体上沿长度方向延伸的一排。该方法产生沿着与半导体衬底相交的第一激光束轴传播的第一脉冲激光束和沿着与半导体衬底相交的第二激光束轴传播的第二脉冲激光束。该方法将来自第一和第二脉冲激光束的相应的第一和第二脉冲引导到行中不同的第一和第二结构，以便用每个结构的单个激光脉冲完成所述结构的照射。该方法相对于半导体衬底基本上在与行的长度方向平行的方向基本上一致地移动第一和第二激光束轴线，以便用第一或第二激光束选择性地照射该行中的结构。移动步骤导致的速度大于如果仅使用单个激光束来照射行中的结构的速度。

12. 发明申请

US20070008534A1 Systems and methods for distinguishing reflections of multiple laser beams for calibration for semiconductor structure processing 有权
标题翻译：用于区分多个激光束的反射用于半导体结构处理的校准的系统和方法
公开(公告)号：US20070008534A1
公开(公告)日：2007-01-11
申请号：US11499394
申请日：2006-08-03
申请人： Ho Lo , David Hemenway , Brady Nilsen , Kelly Bruland
发明人： Ho Lo , David Hemenway , Brady Nilsen , Kelly Bruland
IPC分类号： G01B11/00
CPC分类号： H01L23/5258 , G11C17/14 , G11C17/143 , H01L2924/0002 , H01L2924/00
摘要： A system determines relative positions of a semiconductor substrate and a plurality of laser beam spots on or within the semiconductor substrate in a machine for selectively irradiating structures on or within the substrate using a plurality of laser beams. The system comprises a laser source, first and second laser beam propagation paths, first and second reflection sensors, and a processor. The laser source produces at least the first and second laser beams, which propagate toward the substrate along the first and second propagation paths, respectively, which have respective first and second axes that intersects the substrate at respective first and second spots. The reflection sensors are positioned to detect reflection of the spots, as the spots moves relative to the substrate, thereby generating reflection signals. The processor is configured to determine, based on the reflection signals, positions of the spots on or within the substrate.
摘要翻译：系统确定半导体衬底和机器中半导体衬底上或半导体衬底内的多个激光束点的相对位置，用于使用多个激光束选择性地照射衬底上或衬底内的结构。该系统包括激光源，第一和第二激光束传播路径，第一和第二反射传感器以及处理器。激光源至少产生第一和第二激光束，其分别沿着第一和第二传播路径朝着衬底传播，其具有在相应的第一和第二点处与衬底相交的相应的第一和第二轴。反射传感器被定位成检测点的反射，因为光点相对于基板移动，从而产生反射信号。处理器被配置为基于反射信号确定基板上或内部的斑点的位置。

13. 发明申请

US20080093349A1 ON-THE-FLY LASER BEAM PATH DITHERING FOR ENHANCING THROUGHPUT 有权
标题翻译：在飞行激光光束路径加强增强
公开(公告)号：US20080093349A1
公开(公告)日：2008-04-24
申请号：US11925562
申请日：2007-10-26
申请人： Kelly Bruland , Mark Unrath , Stephen Swaringen , Ho Lo , Clint Vandergiessen , Keith Grant
发明人： Kelly Bruland , Mark Unrath , Stephen Swaringen , Ho Lo , Clint Vandergiessen , Keith Grant
IPC分类号： B23K26/38
CPC分类号： G02B26/101
摘要： A laser-based workpiece processing system includes sensors connected to a sensor controller that converts sensor signals into focused spot motion commands for actuating a beam steering device, such as a two-axis steering mirror. The sensors may include a beam position sensor for correcting errors detected in the optical path, such as thermally-induced beam wandering in response to laser or acousto-optic modulator pointing stability, or optical mount dynamics.
摘要翻译：基于激光的工件处理系统包括连接到传感器控制器的传感器，传感器控制器将传感器信号转换成聚焦点运动命令，用于致动诸如双轴转向镜的光束转向装置。传感器可以包括用于校正在光路中检测到的误差的光束位置传感器，例如响应于激光或声光调制器指向稳定性的热感应波束漂移或光学安装动态。

14. 发明申请

US20050209284A1 Tec kinase inhibitors 审中-公开
标题翻译： Tec激酶抑制剂
公开(公告)号：US20050209284A1
公开(公告)日：2005-09-22
申请号：US11055798
申请日：2005-02-09
申请人： Joerg Bentzien , Brian Cook , Xiang Li , Ho Lo , Chuk Man , Ingo Mugge , Peter Nemoto , Steven Pullen , Doris Riether , Gregory Roth , Fariba Soleymanzadeh , Hidenori Takahashi , Ji Wang , Andre White , Renee Zindell
发明人： Joerg Bentzien , Brian Cook , Xiang Li , Ho Lo , Chuk Man , Ingo Mugge , Peter Nemoto , Steven Pullen , Doris Riether , Gregory Roth , Fariba Soleymanzadeh , Hidenori Takahashi , Ji Wang , Andre White , Renee Zindell
IPC分类号： A61K31/4184 , A61K31/422 , A61K31/427 , A61K31/4439 , C07D235/30 , C07D401/14 , C07D409/12 , C07D409/14 , C07D413/02 , C07D413/12 , C07D413/14 , C07D417/02 , C07D417/14 , C07D491/10 , C07D43/02
CPC分类号： C07D235/30 , C07D401/14 , C07D409/12 , C07D409/14 , C07D413/12 , C07D413/14 , C07D417/14 , C07D491/10
摘要： Disclosed are compounds of formula(I): wherein Ar1, Ar2, R1, R2, R3, R4 and Xa are defined herein. The compounds of the invention inhibit Itk kinase and are therefore useful for treating diseases and pathological conditions involving inflammation, immunological disorders and allergic disorders. Also disclosed are processes for preparing these compounds and to pharmaceutical compositions comprising these compounds.
摘要翻译：公开了式（I）的化合物：其中Ar 1，Ar 2，R 1，R 2， R 3，R 4和X a a在本文中定义。本发明的化合物抑制Itk激酶，因此可用于治疗涉及炎症，免疫学障碍和过敏性疾病的疾病和病理状况。还公开了制备这些化合物的方法和包含这些化合物的药物组合物。

15. 发明申请

US20060261051A1 Synthetic pulse repetition rate processing for dual-headed laser micromachining systems 审中-公开
标题翻译：双头激光微加工系统的合成脉冲重复率处理
公开(公告)号：US20060261051A1
公开(公告)日：2006-11-23
申请号：US11134242
申请日：2005-05-19
申请人： Mark Unrath , Brian Johansen , Ho Lo
发明人： Mark Unrath , Brian Johansen , Ho Lo
IPC分类号： B23K26/067
CPC分类号： B23K26/0673 , B23K26/0006 , B23K26/0604 , B23K26/0613 , B23K26/067 , B23K2103/16 , B23K2103/30 , B23K2103/42
摘要： A method and system for increasing throughput of laser micromachining systems use more than one laser. Two or more pulsed laser beams are combined and then separated into multiple laser beams that enable the system to work simultaneously at multiple locations on the workpiece with pulse rates greater than those achievable with independently operating lasers while maintaining pulse energy equal to or greater than the pulse energy of each of the original independent laser beams. Most laser micromachining applications required multiple sequential pulses to process a workpiece. Increasing the pulse rate while maintaining pulse energy effects more rapid material removal and thereby increases throughput for a laser micromachining system.
摘要翻译：用于增加激光微加工系统的产量的方法和系统使用多于一个的激光器。将两个或多个脉冲激光束组合，然后分离成多个激光束，使得系统能够在工件上的多个位置处同时工作，其脉冲率大于独立操作的激光器可实现的脉冲频率，同时保持等于或大于脉冲的脉冲能量每个原始独立激光束的能量。大多数激光微加工应用需要多个顺序脉冲来处理工件。在保持脉冲能量的同时提高脉搏率可以更快速地去除材料，从而提高激光微加工系统的生产率。

16. 发明申请

US20070012667A1 Method of suppressing distortion of a working laser beam of a laser link processing system 有权
标题翻译：一种抑制激光连接处理系统的工作激光束变形的方法
公开(公告)号：US20070012667A1
公开(公告)日：2007-01-18
申请号：US11440696
申请日：2006-05-24
申请人： David Hemenway , Brady Nilsen , Ho Lo , Keith Grant
发明人： David Hemenway , Brady Nilsen , Ho Lo , Keith Grant
IPC分类号： B23K26/38 , B23K26/06
CPC分类号： B23K26/0665 , B23K26/032 , B23K26/064 , B23K26/0648 , B23K2101/40
摘要： A method of suppressing distortion of a working laser beam directed for incidence on a target specimen presented for processing by a laser link processing system uses a spatial filter to remove stray light-induced distortion from the working laser beam.
摘要翻译：一种抑制由激光连接处理系统处理的用于入射到目标样品上的工作激光束的变形的方法使用空间滤光器从工作激光束去除杂散光诱导的失真。

17. 发明申请

US20050203158A1 Substituted benzimidazole compounds 有权
标题翻译：取代的苯并咪唑化合物
公开(公告)号：US20050203158A1
公开(公告)日：2005-09-15
申请号：US10632888
申请日：2003-08-01
申请人： Joerg Bentzien , Brian Cook , Charles Cywin , Roman Fleck , Ho Lo , Peter Nemoto , Steven Pullen , Gregory Roth , Roger Snow , Hidenori Takahashi , Ji Wang , Kevin Moriarty , Lei Qiao , Michael Winters
发明人： Joerg Bentzien , Brian Cook , Charles Cywin , Roman Fleck , Ho Lo , Peter Nemoto , Steven Pullen , Gregory Roth , Roger Snow , Hidenori Takahashi , Ji Wang , Kevin Moriarty , Lei Qiao , Michael Winters
IPC分类号： A61K31/4184 , A61K39/00 , A61P1/04 , A61P3/10 , A61P11/00 , A61P11/06 , A61P11/08 , A61P17/00 , A61P17/06 , A61P25/00 , A61P27/02 , A61P27/16 , A61P29/00 , A61P35/00 , A61P37/02 , A61P37/08 , A61P43/00 , C07D235/28 , C07D235/30 , C07D409/12 , C07D43/02
CPC分类号： C07D409/12 , C07D235/30
摘要： Disclosed are substituted benzimidazole compounds of formula (I): wherein R1, R2, R3, R4 and Xa are defined herein. The compounds of the invention inhibit Itk kinase and are therefore useful for treating diseases and pathological conditions involving inflammation, immunological disorders and allergic disorders. Also disclosed are processes for preparing these compounds and to pharmaceutical compositions comprising these compounds.
摘要翻译：公开了式（I）的取代的苯并咪唑化合物：其中R 1，R 2，R 3，R 4， >和X > 。本发明的化合物抑制Itk激酶，因此可用于治疗涉及炎症，免疫学障碍和过敏性疾病的疾病和病理状况。还公开了制备这些化合物的方法和包含这些化合物的药物组合物。

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