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    • 14. 发明授权
    • Alkali-free glass substrate, method for producing it and liquid crystal display panel
    • 无碱玻璃基板,其制造方法和液晶显示面板
    • US07754631B2
    • 2010-07-13
    • US12349559
    • 2009-01-07
    • Terutaka MaeharaManabu NishizawaJunichiro KaseSyuji Matsumoto
    • Terutaka MaeharaManabu NishizawaJunichiro KaseSyuji Matsumoto
    • C03C3/087C03C3/091C03C3/083C03C3/085C03C3/078
    • C03C3/091G02F2001/133302G02F2202/09
    • To provide an alkali-free glass substrate, which has a high Young's modulus, a low linear expansion coefficient, a high strain point and a low density, does not devitrify in the float forming process and is excellent in acid resistance.An alkali-free glass substrate, which contains neither alkali component nor BaO and consists essentially of, as represented by mol % based on oxide, from 57.0 to 65.0% of SiO2, from 10.0 to 12.0% of Al2O3, from 6.0 to 9.0% of B2O3, from 5.0 to 10.0% of MgO, from 5.0 to 10.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 19.0%, MgO/(MgO+CaO+SrO)≧0.40, and B2O3/(SiO2+Al2O3+B2O3)≦0.12; wherein Young's modulus ≧75 GPa; the linear expansion coefficient at from 50 to 350° C. is from 30×10−7/° C. to 40×10−7/° C.; the strain point ≧640° C.; the temperature T2 (the viscosity η satisfies log η=2)≦1,620° C.; the temperature T4 (the viscosity η satisfies log η=4)≦1,245° C.; the devitrification temperature ≦T4; and weight loss per unit area is at most 0.6 mg/cm2, when immersed in 0.1N HCl at 90° C. for 20 hours.
    • 为了提供具有高杨氏模量,低线膨胀系数,高应变点和低密度的无碱玻璃基板,在浮法成形工艺中不会失透,并且耐酸性优异。 不含碱成分和BaO的碱性玻璃基材,其基本上由氧化物的摩尔%表示,SiO 2为57.0〜65.0%,Al 2 O 3为10.0〜12.0%,Al 2 O 3为6.0〜9.0% B 2 O 3,MgO 5.0〜10.0%,CaO 5.0〜10.0%,SrO 2.5〜5.5%,MgO + CaO + SrO为16.0〜19.0%,MgO /(MgO + CaO + SrO)≥ 0.40和B2O3 /(SiO2 + Al2O3 + B2O3)≦̸ 0.12; 其中杨氏模量≥75GPa; 50〜350℃的线膨胀系数为30×10 -7 /℃至40×10 -7 /℃。 应变点≧640℃。 温度T2(粘度&eegr;满足log&eegr = 2)≦̸ 1,620℃。 温度T4(粘度&eegr;满足log&eegr; = 4)≦̸ 1,245℃; 失透温度≦̸ T4; 当在90℃下浸入0.1N HCl中20小时时,每单位面积的重量损失为0.6mg / cm 2以下。
    • 15. 发明申请
    • ALKALI-FREE GLASS SUBSTRATE, METHOD FOR PRODUCING IT AND LIQUID CRYSTAL DISPLAY PANEL
    • 无碱玻璃基材,其制造方法和液晶显示面板
    • US20090176640A1
    • 2009-07-09
    • US12349559
    • 2009-01-07
    • Terutaka MaeharaManabu NishizawaJunichiro KaseSyuji Matsumoto
    • Terutaka MaeharaManabu NishizawaJunichiro KaseSyuji Matsumoto
    • C03C3/091C03B18/00
    • C03C3/091G02F2001/133302G02F2202/09
    • To provide an alkali-free glass substrate, which has a high Young's modulus, a low linear expansion coefficient, a high strain point and a low density, does not devitrify in the float forming process and is excellent in acid resistance.An alkali-free glass substrate, which contains neither alkali component nor BaO and consists essentially of, as represented by mol % based on oxide, from 57.0 to 65.0% of SiO2, from 10.0 to 12.0% of Al2O3, from 6.0 to 9.0% of B2O3, from 5.0 to 10.0% of MgO, from 5.0 to 10.0% of CaO and from 2.5 to 5.5% of SrO, provided that MgO+CaO+SrO is from 16.0 to 19.0%, MgO/(MgO+CaO+SrO)≧0.40, and B2O3/(SiO2+Al2O3+B2O3)≦0.12; wherein Young's modulus ≧75 GPa; the linear expansion coefficient at from 50 to 350° C. is from 30×10−7/° C. to 40×10−7/° C.; the strain point ≧640° C.; the temperature T2 (the viscosity η satisfies log η=2)≦1,620° C.; the temperature T4 (the viscosity η satisfies log η=4)≦1,245° C.; the devitrification temperature ≦T4; and weight loss per unit area is at most 0.6 mg/cm2, when immersed in 0.1N HCl at 90° C. for 20 hours.
    • 为了提供具有高杨氏模量,低线膨胀系数,高应变点和低密度的无碱玻璃基板,在浮法成形工艺中不会失透,并且耐酸性优异。 不含碱成分和BaO的碱性玻璃基材,其基本上由氧化物的摩尔%表示,SiO 2为57.0〜65.0%,Al 2 O 3为10.0〜12.0%,Al 2 O 3为6.0〜9.0% B2O3为5.0〜10.0%,CaO为5.0〜10.0%,SrO为2.5〜5.5%,MgO + CaO + SrO为16.0〜19.0%,MgO /(MgO + CaO + SrO) = 0.40,B2O3 /(SiO2 + Al2O3 + B2O3)= 0.12; 其中杨氏模量> 75GPa; 在50至350℃的线性膨胀系数为30×10 -7 /℃至40×10 -7 /℃。 应变点> = 640°C。 温度T2(粘度eta满足log eta = 2)= 1,620℃。 温度T4(粘度eta满足log eta = 4)<= 1,245℃。 失透温度<= T4; 当在90℃下浸入0.1N HCl中20小时时,每单位面积的重量损失为0.6mg / cm 2以下。