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    • 12. 发明申请
    • GAS BARRIER THIN FILM LAMINATE, GAS BARRIER RESIN SUBSTRATE AND ORGANIC EL DEVICE
    • 气体阻隔薄膜层压板,气体阻挡树脂基板和有机EL器件
    • US20090267489A1
    • 2009-10-29
    • US11721855
    • 2005-12-06
    • Hiroaki AritaKazuhiro Fukuda
    • Hiroaki AritaKazuhiro Fukuda
    • H01L51/50B32B15/00
    • H01L51/5256H01L51/524
    • Disclosed is a gas-barrier thin film laminate which can be produced with high yield while having higher gas barrier properties than the conventional ones. The gas barrier properties of this gas-barrier thin film laminate do not deteriorate even when the laminate is bent. Also disclosed is an organic EL device (hereinafter also referred to as OLED) with excellent environmental resistance which uses the gas-barrier thin film laminate. The gas-barrier thin film laminate having at least one inorganic film and at least one stress relaxation film is characterized in that at least one stress relaxation film is formed by an atmospheric pressure plasma method wherein two or more electric fields of different frequencies are applied.
    • 本发明公开了一种阻气薄膜层叠体,其能够以高产率制造,同时具有比常规阻气性更高的阻气性。 即使层叠体弯曲,该阻气性薄膜层叠体的阻气性也不会劣化。 还公开了使用阻气性薄膜层叠体的耐环境性优异的有机EL元件(以下也称为OLED)。 具有至少一种无机膜和至少一种应力松弛膜的阻气薄膜层叠体的特征在于,通过施加两个以上的不同频率的电场的大气压等离子体法形成至少一个应力松弛膜。
    • 13. 发明申请
    • Plasma discharge treatment apparatus, and method of manufacturing gas barrier film
    • 等离子体放电处理装置以及阻气膜的制造方法
    • US20090252893A1
    • 2009-10-08
    • US11990958
    • 2006-08-17
    • Koji OzakiKazuhiro FukudaHiroaki Arita
    • Koji OzakiKazuhiro FukudaHiroaki Arita
    • C23C16/50C23C16/54
    • C23C16/45595C23C16/517C23C16/545H01J37/3277
    • Provide is a method of preparing a highly-functional film capable of reducing surface failure and of improving the yield, and a manufacturing apparatus thereof. This is a plasma discharge treatment apparatus to plasma-discharge-treat for the surface of a substrate conveyed between a winder and an unwinder at atmospheric pressure or approximately atmospheric pressure, and is a plasma discharge treatment apparatus by which the substrate is conveyed with no contact by only nip roller separating the discharge section from outside. Provided is a method of preparing a gas barrier film exhibiting high gas barrier, together with reduction of surface failure (crack failure) during gas barrier thin layer formation. The surface on the gas barrier thin layer side of the gas barrier film has a curvature radius of at least 75 mm during conveyance, and the surface on the opposite side has a curvature radius of at least 37.5 mm.
    • 提供一种制备能够降低表面破坏并提高产率的高功能膜的方法及其制造装置。 这是一种等离子体放电处理装置,用于在大气压或大气压下在卷绕机和退绕机之间输送的基板的表面进行等离子体放电处理,并且是等离子体放电处理装置,其中基板以不接触的方式被输送 仅通过将排出部分与外部分开的压辊。 提供了一种制备阻气薄膜形成时表现出高阻气性的气体阻隔膜以及表面破坏(裂纹破坏)减少的方法。 阻气膜的阻气性薄膜侧的表面在输送时的曲率半径为75mm以上,相反侧的表面的曲率半径为37.5mm以上。