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11. 发明申请

US20070030592A1 Magnetic head, fabrication process of magnetic head, and magnetic disk storage apparatus mounting magnetic head 失效
标题翻译：磁头，磁头制造工艺和安装磁头的磁盘存储装置
公开(公告)号：US20070030592A1
公开(公告)日：2007-02-08
申请号：US11492324
申请日：2006-07-24
申请人： Taku Shintani , Katsuro Watanabe , Nobuo Yoshida , Hisako Takei
发明人： Taku Shintani , Katsuro Watanabe , Nobuo Yoshida , Hisako Takei
IPC分类号： G11B5/33
CPC分类号： G11B5/398 , G11B5/3163 , G11B5/3909 , G11B5/3912 , G11B2005/3996
摘要： This invention provides a high-output magnetic head with a high yield, which is capable of minimizing sense current leak or noise caused by a shift of the magnetic wall of an upper shield layer. In one embodiment, the magnetic head is fabricated so that the height of the upper surface of the refill film along the sensor height direction is the same as that of the magnetoresistance layer in a portion where the refill film along the sensor height direction comes in contact with the magnetoresistance layer and the distance from the upper surface of the refill film along the sensor height direction to the upper surface of the lower shield layer gradually increases in a region from the portion where the refill film along the sensor height direction comes in contact with the magnetoresistance layer to a point at a certain distance away from the portion.
摘要翻译：本发明提供了一种高产量的高输出磁头，其能够使由上屏蔽层的磁壁移动引起的感应电流泄漏或噪声最小化。在一个实施例中，磁头被制造成使得沿着传感器高度方向的补充膜的上表面的高度与沿着传感器高度方向的补充膜接触的部分中的磁阻层的高度相同与沿着传感器高度方向的再充填膜的上表面的距离相对于下屏蔽层的上表面的距离从沿着传感器高度方向的再填充膜的部分接触的区域逐渐增加磁阻层到远离该部分一定距离处的点。

12. 发明授权

US07536776B2 Fabrication method for thin film magnetic heads 失效
标题翻译：薄膜磁头制造方法
公开(公告)号：US07536776B2
公开(公告)日：2009-05-26
申请号：US11454310
申请日：2006-06-13
申请人： Nobuo Yoshida , Taku Shintani , Hisako Takei
发明人： Nobuo Yoshida , Taku Shintani , Hisako Takei
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3909 , B82Y10/00 , G11B5/3163 , G11B5/3912 , G11B2005/3996 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A fabrication method for thin film magnetic heads, comprises, forming a Current Perpendicular to a Plane (CPP) sensor film over a lower shield and a first chemical mechanical polishing (CMP) stop film over the CPP sensor film, etching the CPP sensor film and forming a track width on the CPP sensor film, and covering at least the etching section of the CPP sensor film with an insulating film. The method further comprises forming a CMP dummy film over the insulating film and a second CMP stop film over the CMP dummy film, exposing the first CMP stop film, and removing the first CMP stop film and the second CMP stop film by oxygen reactive ion etching (RIE) and the CMP dummy film by fluorine RIE, and forming an upper shield film over the insulating film and over the CPP sensor film.
摘要翻译：一种用于薄膜磁头的制造方法，包括在CPP传感器膜上形成垂直于平面（CPP）传感器膜的电流通过下屏蔽和第一化学机械抛光（CMP）阻挡膜，蚀刻CPP传感器膜和在CPP传感器膜上形成轨道宽度，并用绝缘膜覆盖至少CPP传感器膜的蚀刻部分。该方法还包括在绝缘膜上形成CMP虚拟膜，在CMP伪膜上形成第二CMP停止膜，暴露第一CMP停止膜，并通过氧反应离子蚀刻去除第一CMP停止膜和第二CMP停止膜（RIE）和通过氟RIE的CMP虚拟膜，并且在绝缘膜上和CPP传感器膜上形成上屏蔽膜。

13. 发明授权

US07881022B2 Magnetic head and method for fabricating the same 有权
标题翻译：磁头及其制造方法
公开(公告)号：US07881022B2
公开(公告)日：2011-02-01
申请号：US11788038
申请日：2007-04-17
申请人： Hisako Takei , Nobuo Yoshida , Hiroyuki Hoshiya , Taku Shintani
发明人： Hisako Takei , Nobuo Yoshida , Hiroyuki Hoshiya , Taku Shintani
IPC分类号： G11B5/39
CPC分类号： G01R33/093 , B82Y25/00 , G11B5/3163 , G11B5/398 , Y10T29/49021
摘要： Embodiments in accordance with the present invention provide a sensor to produce high output with a small track width. Particular embodiments include forming a magnetoresistive sensor of a read head to be substantially vertical in its upper portion and gently upwardly convexly curved in its lower portion.
摘要翻译：根据本发明的实施例提供一种用于产生具有小轨道宽度的高输出的传感器。具体实施例包括形成读头的磁阻传感器在其上部基本垂直并且在其下部中轻轻地向上凸起地弯曲。

14. 发明授权

US08137571B2 Method for manufacturing perpendicular magnetic recording head 有权
标题翻译：制造垂直磁记录头的方法
公开(公告)号：US08137571B2
公开(公告)日：2012-03-20
申请号：US12381972
申请日：2009-03-17
申请人： Tomohiro Okada , Hisashi Kimura , Taku Shintani , Tadashi Umezawa
发明人： Tomohiro Okada , Hisashi Kimura , Taku Shintani , Tadashi Umezawa
IPC分类号： B44C1/22
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163
摘要： Embodiments of the present invention help to provide a method for manufacturing a perpendicular magnetic recording head including a main magnetic pole having a width that does not generally vary. According to one embodiment, a magnetic film, a first inorganic mask film, an organic film, a second inorganic mask film, and a resist pattern are formed in this order. Reactive ion etching (RIE) is performed using the resist pattern as a mask to etch the second inorganic mask film and the organic film and form a mask for the subsequent step. A flow rate of an Ar gas is then controlled, and ion milling is performed, to correct a difference between the width of the mask located at the central portion of the wafer and the width of the mask located at the outer peripheral portion of the wafer. The magnetic film is processed to have a uniform track width. Ion milling is then performed to form the main magnetic pole having an inverted trapezoidal shape.
摘要翻译：本发明的实施例有助于提供一种用于制造垂直磁记录头的方法，所述垂直磁记录头包括具有通常不变化的宽度的主磁极。根据一个实施例，依次形成磁性膜，第一无机掩模膜，有机膜，第二无机掩模膜和抗蚀剂图案。使用抗蚀剂图案作为掩模进行反应离子蚀刻（RIE），以蚀刻第二无机掩模膜和有机膜并形成用于后续步骤的掩模。然后控制Ar气体的流量，进行离子铣削，以校正位于晶片中心部分的掩模的宽度与位于晶片外周部分的掩模的宽度之间的差异。磁膜被处理成具有均匀的轨迹宽度。然后进行离子铣削以形成具有倒梯形形状的主磁极。

15. 发明申请

US20090236307A1 Method for manufacturing perpendicular magnetic recording head 有权
标题翻译：制造垂直磁记录头的方法
公开(公告)号：US20090236307A1
公开(公告)日：2009-09-24
申请号：US12381972
申请日：2009-03-17
申请人： Tomohiro Okada , Hisashi Kimura , Taku Shintani , Tadashi Umezawa
发明人： Tomohiro Okada , Hisashi Kimura , Taku Shintani , Tadashi Umezawa
IPC分类号： B44C1/22
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/3163
摘要： Embodiments of the present invention help to provide a method for manufacturing a perpendicular magnetic recording head including a main magnetic pole having a width that does not generally vary. According to one embodiment, a magnetic film, a first inorganic mask film, an organic film, a second inorganic mask film, and a resist pattern are formed in this order. Reactive ion etching (RIE) is performed using the resist pattern as a mask to etch the second inorganic mask film and the organic film and form a mask for the subsequent step. A flow rate of an Ar gas is then controlled, and ion milling is performed, to correct a difference between the width of the mask located at the central portion of the wafer and the width of the mask located at the outer peripheral portion of the wafer. The magnetic film is processed to have a uniform track width. Ion milling is then performed to form the main magnetic pole having an inverted trapezoidal shape.
摘要翻译：本发明的实施例有助于提供一种用于制造垂直磁记录头的方法，所述垂直磁记录头包括具有通常不变化的宽度的主磁极。根据一个实施例，依次形成磁性膜，第一无机掩模膜，有机膜，第二无机掩模膜和抗蚀剂图案。使用抗蚀剂图案作为掩模进行反应离子蚀刻（RIE），以蚀刻第二无机掩模膜和有机膜并形成用于后续步骤的掩模。然后控制Ar气体的流量，进行离子铣削，以校正位于晶片中心部分的掩模的宽度与位于晶片外周部分的掩模的宽度之间的差异。磁膜被处理成具有均匀的轨迹宽度。然后进行离子铣削以形成具有倒梯形形状的主磁极。

16. 发明申请

US20060278604A1 Magnetic recording head, fabrication process, and magnetic disk storage apparatus mounting the magnetic head 失效
标题翻译：磁记录头，制造工艺和安装磁头的磁盘存储装置
公开(公告)号：US20060278604A1
公开(公告)日：2006-12-14
申请号：US11454310
申请日：2006-06-13
申请人： Nobuo Yoshida , Taku Shintani , Hisako Takei
发明人： Nobuo Yoshida , Taku Shintani , Hisako Takei
IPC分类号： B44C1/22
CPC分类号： G11B5/3909 , B82Y10/00 , G11B5/3163 , G11B5/3912 , G11B2005/3996 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Embodiments of the invention provide a manufacturing method for thin magnetic heads capable of achieving narrow tracks, preventing shape defects and electrical short defects, as well as improving the production yield. Shape defects and short defects can be reduced and a high production yield achieved even with a narrow track width by lift-off technology utilizing planarizing techniques with CMP for forming the track width and stripe height and employing a process and structure for positioning the CMP dummy film.
摘要翻译：本发明的实施例提供一种能够实现窄轨迹，防止形状缺陷和电短缺陷以及提高产量的薄磁头的制造方法。可以减少形状缺陷和短缺陷，并且通过使用CMP的平面化技术利用CMP形成轨迹宽度和条纹高度的剥离技术即使具有窄的轨道宽度也被采用，并且采用用于定位CMP虚拟膜的工艺和结构。

17. 发明申请

US20070253117A1 Magnetic head and method for fabricating the same 有权
标题翻译：磁头及其制造方法
公开(公告)号：US20070253117A1
公开(公告)日：2007-11-01
申请号：US11788038
申请日：2007-04-17
申请人： Hisako Takei , Nobuo Yoshida , Hiroyuki Hoshiya , Taku Shintani
发明人： Hisako Takei , Nobuo Yoshida , Hiroyuki Hoshiya , Taku Shintani
IPC分类号： G11B5/33 , G11B5/127
CPC分类号： G01R33/093 , B82Y25/00 , G11B5/3163 , G11B5/398 , Y10T29/49021
摘要： Embodiments in accordance with the present invention provide a sensor to produce high output with a small track width. Particular embodiments include forming a magnetoresistive sensor of a read head to be substantially vertical in its upper portion and gently upwardly convexly curved in its lower portion.
摘要翻译：根据本发明的实施例提供一种用于产生具有小轨道宽度的高输出的传感器。具体实施例包括形成读头的磁阻传感器在其上部基本垂直并且在其下部中轻轻地向上凸起地弯曲。

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