专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US4632960A Resin composition comprising a thermosetting resin component and a functional, rubbery copolymer component 失效
标题翻译：树脂组合物，其包含热固性树脂组分和功能橡胶状共聚物组分
公开(公告)号：US4632960A
公开(公告)日：1986-12-30
申请号：US766347
申请日：1985-08-16
申请人： Hozumi Sato , Tatsuaki Matsunaga , Shin-ichiro Iwanaga , Hiroji Enyo , Yoshiaki Kawamura , Yasuhiko Takemura
发明人： Hozumi Sato , Tatsuaki Matsunaga , Shin-ichiro Iwanaga , Hiroji Enyo , Yoshiaki Kawamura , Yasuhiko Takemura
IPC分类号： C08L61/06 , C08L61/20 , C08L63/00
CPC分类号： C08L61/06 , C08L61/20 , C08L63/00
摘要： A resin composition comprising 100 parts by weight of a thermosetting resin and 1 to 100 parts by weight of a functional, rubbery copolymer containing among the monomer units which constitute the copolymer, at least one monomer containing a substituent selected from the group consisting of epoxy, hydroxyl, carboxyl and amino groups, said copolymer being prepared by one of three emulsion polymerization processes in which a nonionic surface active agent and/or ionic surface active agent is employed as the emulsifying agent.
摘要翻译：一种树脂组合物，其包含100重量份的热固性树脂和1至100重量份的包含构成共聚物的单体单元之间的功能性橡胶共聚物，至少一种含有选自环氧基，羟基，羧基和氨基，所述共聚物通过三种乳液聚合方法之一制备，其中使用非离子表面活性剂和/或离子表面活性剂作为乳化剂。

12. 发明授权

US6040117A Negative photoresist stripping liquid composition 失效
标题翻译：负光致抗蚀剂剥离液组成
公开(公告)号：US6040117A
公开(公告)日：2000-03-21
申请号：US28290
申请日：1998-02-24
申请人： Toshiyuki Ota , Kimiyasu Sano , Hideaki Tashiro , Hozumi Sato
发明人： Toshiyuki Ota , Kimiyasu Sano , Hideaki Tashiro , Hozumi Sato
IPC分类号： G03F7/42
CPC分类号： G03F7/426
摘要： A negative photoresist stripping liquid composition is provided which comprises from 30 to 75% by weight of dimethyl sulfoxide, from 20 to 65% by weight of 1,3-dimethyl-2-imidazolidinone, from 0.1 to 5% by weight of a tetraalkylammonium hydroxide and from 0.5 to 15% by weight of water. The composition has a superior stripping performance especially against photoresists that are alkali-developable and can form films of at least 20 .mu.m in thickness, and has no problem of freezing even when stored outdoors in the winter. The composition is useful for the stripping of negative photoresists for bump formation and for fabricating circuit substrates.
摘要翻译：提供了一种负性光致抗蚀剂剥离液体组合物，其包含30至75重量％的二甲基亚砜，20至65重量％的1,3-二甲基-2-咪唑啉酮，0.1至5重量％的四烷基氢氧化铵和0.5至15重量％的水。该组合物具有优异的剥离性能，特别是对于可碱显影的光致抗蚀剂，并且可以形成厚度至少为20μm的膜，并且即使在冬季储存在户外时也不存在冷冻问题。该组合物可用于剥离阴极光致抗蚀剂用于凸块形成和用于制造电路基板。

13. 发明授权

US5965328A Radiation sensitive resin composition and material for forming bumps containing the same 失效
标题翻译：辐射敏感性树脂组合物和用于形成含有它的凸块的材料
公开(公告)号：US5965328A
公开(公告)日：1999-10-12
申请号：US925427
申请日：1997-09-08
申请人： Kimiyasu Sano , Hideki Chiba , Katsutoshi Igarashi , Toshiyuki Ota , Yoshiyuki Michino , Hozumi Sato
发明人： Kimiyasu Sano , Hideki Chiba , Katsutoshi Igarashi , Toshiyuki Ota , Yoshiyuki Michino , Hozumi Sato
IPC分类号： G02F1/133 , C08F2/48 , C08F2/54 , C08L33/00 , C08L33/02 , C08L33/04 , C25F3/14 , G02F1/1333 , G03F7/033 , H01L21/321 , H01L21/60 , H05K3/00 , H05K3/24 , G03F7/40
CPC分类号： G03F7/033 , H05K3/243 , H05K2203/0793 , H05K3/0076 , Y10S430/111
摘要： A radiation sensitive resin composition comprising:(A) an alkali-soluble copolymer comprising:(a) 10 to 50% by weight of a first unit consisting of a radical polymerizable compound having a carboxylic group,(b) 20 to 60% by weight of a second unit consisting of a radical polymerizable compound having a cycloalkyl group, the unit containing no carboxyl group, and(c) 5 to 40% by weight of a third unit consisting of a radical polymerizable compound other than the radical polymerizable compounds in (a) and (b) above;(B) a polymerizable compound having at least one ethylenically unsaturated double bond; and(C) a radiation sensitive radical initiator. Also is disclosed a material for forming bumps containing the radiation sensitive resin composition. The radiation sensitive resin composition has sufficient developability with an alkali developer and sufficient resolution when the composition is in the form of a 20 .mu.m or more thick film. The composition and material of the present invention have excellent resistance to plating liquids and good wettability to plating liquids, and improved adhesion to substrates upon development. Therefore, the composition and material of the present invention can form bumps having sufficient characteristics by plating and give rise to a cured product which has excellent peelability from the substrate on which it is formed.
摘要翻译：一种辐射敏感性树脂组合物，其包含：（A）碱溶性共聚物，其包含：（a）10至50重量％的由具有羧基的自由基聚合性化合物组成的第一单元，（b）20至60重量％由具有环烷基的自由基聚合性化合物，不含羧基的单元构成的第二单元，和（c）5〜40重量％的第三单元，由（ a）和（b）（B）具有至少一个烯键式不饱和双键的聚合性化合物; 和（C）辐射敏感的自由基引发剂。还公开了用于形成包含辐射敏感性树脂组合物的凸块的材料。当组合物为20μm或更厚的膜的形式时，辐射敏感性树脂组合物与碱性显影剂具有足够的显影性和足够的分辨率。本发明的组合物和材料具有优异的耐电镀性和对电镀液的良好润湿性，并且在显影时具有改进的与基材的粘合性。因此，本发明的组合物和材料可以通过电镀形成具有足够特性的凸块，并产生与其形成的基板具有优异的剥离性的固化产物。

14. 发明授权

US5942369A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US5942369A
公开(公告)日：1999-08-24
申请号：US13908
申请日：1998-01-27
申请人： Toshiyuki Ota , Kimiyasu Sano , Masaru Ohta , Hozumi Sato
发明人： Toshiyuki Ota , Kimiyasu Sano , Masaru Ohta , Hozumi Sato
IPC分类号： G03F7/004 , C08G8/08 , G03F7/022 , G03F7/023 , G03F7/033 , H01L21/027 , G03F7/30
CPC分类号： C08G8/08 , G03F7/0233
摘要： A positive photoresist composition including (A) 100 parts by weight of an alkali-soluble novolak resin, and based thereon; (B) 5 to 50 parts by weight of an alkali-soluble acrylic resin containing, as s, 10 to 80% by weight of a unit of a radical-polymerizable compound having an alcoholic hydroxyl group and 3 to 50% by weight of at least one of a unit of a radical-polymerizable compound having a carboxyl group and a unit of a radical-polymerizable compound having a phenolic hydroxyl group; (C) 5 to 100 parts by weight of a quinonediazide group-containing compound; and (D) a solvent, is provided. This composition has a good adhesion to substrates at the time of development and a good plating solution resistance and moreover can be well wetted with plating solutions, can be well developed with alkali developing solutions and can be well stripped from substrates at the resist unexposed areas, and is suited for the formation of thick films suitable as bump forming materials.
摘要翻译：一种正型光致抗蚀剂组合物，其包含（A）100重量份的碱溶性酚醛清漆树脂，并基于此; （B）5〜50重量份的碱溶性丙烯酸树脂，其中，s为10〜80重量％的具有醇羟基的自由基聚合性化合物和3〜50重量％具有羧基的自由基聚合性化合物和具有酚性羟基的自由基聚合性化合物的单元中的至少一种; （C）5〜100重量份含醌二叠氮化物基团的化合物; 和（D）溶剂。该组合物在显影时具有与基材的良好粘合性和良好的耐电镀溶液性，并且还可以用电镀液充分润湿，可以用碱性显影液充分发展，并且可以在抗蚀剂未曝光的区域从基材中良好剥离，并且适于形成适合作为凸块形成材料的厚膜。

15. 发明授权

US4912186A Acrylic rubber, acrylic rubber composition and cured rubber article thereof 失效
标题翻译：丙烯酸橡胶，丙烯酸橡胶组合物及其固化橡胶制品
公开(公告)号：US4912186A
公开(公告)日：1990-03-27
申请号：US236218
申请日：1988-08-25
申请人： Toshio Ohhara , Yukihiro Sawada , Hiroshi Ise , Toshio Miyabayashi , Hiroji Enyo , Hozumi Sato
发明人： Toshio Ohhara , Yukihiro Sawada , Hiroshi Ise , Toshio Miyabayashi , Hiroji Enyo , Hozumi Sato
IPC分类号： C08F220/12 , C08F220/28
CPC分类号： C08F220/12 , C08F220/28
摘要： An acrylic rubber obtainable by copolymerizing a monomer mixture of:(A) 70 to 99.99% by weight of at least one compound selected from the group consisting of alkyl acrylates and alkoxyalkyl acrylates,(B) 0.01 to 10% by weight of at least one compound represented by the general formula: ##STR1## wherein R.sup.1 is a hydrogen atom or a methyl group; X is a hydrogen atom, --COOR.sup.6 (R.sup.6 is an alkyl group having 1-10 carbon atoms or an alkoxyalkyl group having 2-14 carbon atoms), or ##STR2## R.sup.2, R.sup.3 and R.sup.4 are independently hydrogen atoms or groups having 1-10 carbon atoms whose carbon atom adjacent to C.dbd.C has no hydrogen; R.sup.5 is a group having 1-10 carbon atoms whose carbon atom adjacent to C.dbd.C has no hydrogen; Y is ##STR3## or --O--; and n is 1 or 0, and (C) 0-20% by weight of at least one compound selected from the group consisting of other unsaturated compounds of the vinyl type, vinylidene type and vinylene type, in the presence of a radical polymerization initiator. Said acrylic rubber, when crosslinked with a crosslinking agent, gives a cured article having good heat resistance and a good compression set property and accordingly suitable for use as a hose or a sealing material.

16. 发明授权

US06517744B1 Curing composition for forming a heat-conductive sheet, heat-conductive sheet, production thereof and heat sink structure 有权
标题翻译：用于形成导热片的固化组合物，导热片，其制造和散热器结构
公开(公告)号：US06517744B1
公开(公告)日：2003-02-11
申请号：US09711528
申请日：2000-11-14
申请人： Takeo Hara , Shin-ichiro Iwanaga , Hozumi Sato , Ryoji Setaka
发明人： Takeo Hara , Shin-ichiro Iwanaga , Hozumi Sato , Ryoji Setaka
IPC分类号： H01B124
CPC分类号： B29C70/543 , B29C70/025 , B29C70/14
摘要： A heat-conductive sheet comprising a cured or semi-cured binder wherein a carbon fiber is orientated in the direction of the thickness of the heat-conductive sheet. This heat-conductive sheet exhibits a high anisotropic heat conductivity along the direction of the thickness thereof to thereby enable efficiently releasing heat from a heating element such as a semiconductor element or semiconductor package. Moreover, the heat-conductive sheet is excellent in not only heat resistance, durability and mechanical strength but also adherence to the heating element.
摘要翻译：一种导热片，其包含固化或半固化的粘合剂，其中碳纤维沿着导热片的厚度方向取向。该导热片在其厚度方向上显示出高的各向异性热传导性，从而能够有效地从诸如半导体元件或半导体封装的加热元件释放热量。此外，导热片不仅耐热性，耐久性和机械强度优异，而且对加热元件的粘附性优异。

17. 发明授权

US06495636B2 Oxetane compound, oxetane copolymer, and process for producing the oxetane compound 失效
标题翻译：氧杂环丁烷化合物，氧杂环丁烷共聚物，和氧杂环丁烷化合物的制造方法
公开(公告)号：US06495636B2
公开(公告)日：2002-12-17
申请号：US09756220
申请日：2001-01-09
申请人： Naoki Sugiyama , Manabu Sekiguchi , Hozumi Sato
发明人： Naoki Sugiyama , Manabu Sekiguchi , Hozumi Sato
IPC分类号： C08G5938
CPC分类号： C07D407/04 , C07D305/06 , C07D409/04 , C08F16/26 , C08F216/14 , C08G61/12 , C08G65/18 , C08G65/22
摘要： Oxetane compounds represented by general formula (1), which are excellent in radical polymerizability and cationic polymerizability and in compatibility and copolymerizability with other copolymerizable monomers; a process for producing the compounds; and an oxetane copolymer which is excellent in compatibility among the monomer units and has a low water absorption and excellent transparency. [In general formula (1), substituent R1 is hydrogen, alkyl, fluorine, fluoroalkyl, allyl, aryl, furyl, or thienyl; substituents R2, R3, and R4 each independently is hydrogen or C1-6 alkyl; and m and n each is an integer of 1 to 10 (provided that not all of R2, R3, and R4 are hydrogen)].
摘要翻译：由通式（1）表示的氧杂环丁烷化合物，其自由基聚合性和阳离子聚合性优异，与其它可共聚单体的相容性和共聚性优异; 一种生产该化合物的方法; （通式（1）中，取代基R 1为氢，烷基，氟，氟代烷基，烯丙基，芳基，呋喃基或噻吩基），其中， ; 取代基R 2，R 3和R 4各自独立地为氢或C 1-6烷基; m和n各自为1〜10的整数（条件是不是全部R2，R3和R4均为氢）]。

18. 发明授权

US06207728B1 Photo-curable composition and photo-cured product 有权
标题翻译：光固化组合物和光固化产物
公开(公告)号：US06207728B1
公开(公告)日：2001-03-27
申请号：US09335269
申请日：1999-06-17
申请人： Manabu Sekiguchi , Naoki Sugiyama , Hozumi Sato
发明人： Manabu Sekiguchi , Naoki Sugiyama , Hozumi Sato
IPC分类号： C08K322
CPC分类号： G03F7/0757 , C09D4/00 , C09D183/06 , C08G77/04 , C08L2666/28
摘要： Disclosed is a photo-curable composition comprising the following components (A) to (C): (A) hydrolyzable silane compound represented by the general formula (1) or a hydrolyzate thereof: (R1)pSi(X)4−p (1) wherein R1 is a non-hydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer of 0 to 3; (B) photo acid generator; and (C) dehydrating agent. By such constitution, it is possible to provide a photo-curable composition which has a rapid photo-curable rate, is excellent in characteristics such as storage stability, heat resistance, weather-ability, scratch resistance and the like, and is applicable to base materials having low heat resistance such as plastics, as well as a cured product obtained therefrom.
摘要翻译：公开了包含以下组分（A）至（C）的光固化组合物：（A）由通式（1）表示的可水解硅烷化合物或其水解产物：（R1）pSi（X）4-p ）其中R1是具有1至12个碳原子的不可水解的有机基团，X是可水解基团，p是0-3的整数; （B）光酸产生剂; 和（C）脱水剂。通过这样的结构，可以提供光固化速度快的光固化性组合物，储存稳定性，耐热性，耐候性，耐划伤性等特性优异，适用于碱具有低耐热性的材料如塑料，以及由其获得的固化产品。

19. 发明授权

US06190833B1 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06190833B1
公开(公告)日：2001-02-20
申请号：US09163008
申请日：1998-09-30
申请人： Atsushi Shiota , Masako Suzuki , Hozumi Sato
发明人： Atsushi Shiota , Masako Suzuki , Hozumi Sato
IPC分类号： G03F7029
CPC分类号： G03F7/0045 , G03F7/038 , H05K3/4661 , H05K3/4676
摘要： A radiation-sensitive resin composition comprising: (A) a phenol resin, (B) an amino resin, (C) a compound having two or more crosslinking groups in a molecule, and (D) a halomethyl-1,3,5-triazine compound. The composition can form insulating layers exhibiting high resolution, high plating solution resistance, high adhesion to conductor wiring, and developability using an alkaline aqueous solution, producing cured insulating layers with superior solvent resistance, excellent waterproofing characteristics, and high heat resistance. The composition is useful for fabricating multilayered wiring boards.
摘要翻译：一种辐射敏感性树脂组合物，其包含：（A）酚醛树脂，（B）氨基树脂，（C）分子中具有两个以上交联基团的化合物，和（D）卤代甲基-1,3,5-三三嗪化合物。该组合物可以形成表现出高分辨率，高电镀溶液电阻，对导体布线的高粘附性和使用碱性水溶液的显影性的绝缘层，产生具有优异的耐溶剂性，优异的防水性能和高耐热性的固化绝缘层。该组合物可用于制造多层布线板。

20. 发明授权

US06048666A Radiation sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06048666A
公开(公告)日：2000-04-11
申请号：US89501
申请日：1998-06-03
申请人： Kazuaki Niwa , Masako Suzuki , Toshiyuki Ota , Hozumi Sato , Hideki Chiba
发明人： Kazuaki Niwa , Masako Suzuki , Toshiyuki Ota , Hozumi Sato , Hideki Chiba
IPC分类号： G03F7/004 , C08L61/10 , C08L61/28 , G03F7/027 , G03F7/032 , G03F7/038 , H05K3/46 , G03F7/16 , G03F7/40
CPC分类号： G03F7/038 , H05K3/4644 , Y10S430/136
摘要： A radiation sensitive resin composition comprising an alkali-soluble resin such as a polyvinyl phenol or a phenol resin other than a polyvinyl phenol having a weight average molecular weight of 2,000 or higher, a cross-linking agent such as an amino resin having two or more active methylol groups in a molecule, a particulate rubbery material comprising a cross-linked polymer chemically modified with an epoxy compound, a liquid rubbery material having a number average molecular weight between 1,000 and 10,000 and a glass transition temperature of -20.degree. C. or lower, and a radiation polymerization initiator. The composition is best suited for use as a material for preparing an insulating layer interposed between two layers of conductive wiring that are arranged in an overlaying stack.
摘要翻译：一种辐射敏感性树脂组合物，其包含碱溶性树脂如聚乙烯基苯酚或重均分子量为2,000以上的聚乙烯基苯酚以外的酚醛树脂，具有两个以上的氨基树脂的交联剂分子中的活性羟甲基，包含用环氧化合物化学改性的交联聚合物的颗粒状橡胶状材料，数均分子量为1,000〜10,000，玻璃化转变温度为-20℃的液态橡胶材料，或较低的和辐射聚合引发剂。组合物最适合用作制备布置在叠层叠层中的两层导电布线之间的绝缘层的材料。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式