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    • 12. 发明申请
    • Cylinder-type capacitor and storage device, and method(s) for fabricating the same
    • 圆筒型电容器和存储装置及其制造方法
    • US20060145229A1
    • 2006-07-06
    • US11322882
    • 2005-12-29
    • Jae Kang
    • Jae Kang
    • H01L21/8242
    • H01L28/91G03F1/32H01L27/10817H01L27/10852
    • A one cylinder storage device and a method for fabricating a capacitor are disclosed, realizing simplified fabrication by overexposure with a mask having a plurality of holes, in which the method includes forming a contact hole in an insulating layer on a semiconductor substrate forming a conductive layer on the insulating layer to fill the contact hole; forming a photoresist layer on the conductive layer; forming a photoresist layer pattern by overexposure and generating a side lobe phenomenon; forming a cylindrical lower electrode by patterning the conductive layer using the photoresist layer pattern as a mask; and forming a dielectric layer and an upper electrode covering the lower electrode.
    • 公开了一种单缸存储装置和一种制造电容器的方法,通过具有多个孔的掩模实现了过度曝光的简化制造,其中该方法包括在形成导电层的半导体衬底上的绝缘层中形成接触孔 在绝缘层上填充接触孔; 在导电层上形成光致抗蚀剂层; 通过过度曝光形成光致抗蚀剂层图案并产生旁瓣现象; 通过使用光致抗蚀剂层图案作为掩模对导电层进行图案化来形成圆柱形下电极; 以及形成覆盖下电极的电介质层和上电极。