专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US5204950A Data processing system for transmitting data between a host processor and an I/O device 失效
标题翻译：用于发送主机处理器和I / O设备之间的数据的数据处理系统
公开(公告)号：US5204950A
公开(公告)日：1993-04-20
申请号：US619788
申请日：1990-11-28
申请人： Kenichi Kawashima
发明人： Kenichi Kawashima
IPC分类号： G06F13/12
CPC分类号： G06F13/126
摘要： A data processing system having a host unit generating a command and address, a local channel control device which is connectable to the host unit for receiving the command and the address, a remote channel control device, and a control unit connected to the remote channel control device. The local channel control device generates an initial status responsive to the command and address from the host unit, and sends the initial status to the host unit. The remote channel control device and the control unit likewise receive the command and address, and the control unit controls an I/O device responsive and the command and address. The host unit responds to the initial status to control the connection and disconnection between the local channel control device and the host unit. Connection and disconnection between the remote channel control device and the control unit can also be controlled.

12. 发明授权

US5190836A Reflection type photomask with phase shifter 失效
标题翻译：反相型光电倍增管
公开(公告)号：US5190836A
公开(公告)日：1993-03-02
申请号：US667934
申请日：1991-03-12
申请人： Kenji Nakagawa , Kenichi Kawashima
发明人： Kenji Nakagawa , Kenichi Kawashima
IPC分类号： G03F1/70 , G03F1/00 , G03F1/26 , G03F1/76 , G03F1/80 , G03F7/20 , H01L21/027
CPC分类号： G03F1/26
摘要： A reflection type photomask includes a substrate, and a reflecting surface formed on the substrate and including a first region and a second region which have a relative height difference. Due to the concavo-convex structure of the reflecting surface, a light reflected from the first region and a light reflected from the second region have a predetermined phase difference which may be used effectively to form a pattern on a photoresist layer.

13. 发明授权

US4853870A Electron beam exposure system 失效
标题翻译：电子束曝光系统
公开(公告)号：US4853870A
公开(公告)日：1989-08-01
申请号：US54782
申请日：1987-05-27
申请人： Nobuyuki Yasutake , Jun-ichi Kai , Hiroshi Yasuda , Kenichi Kawashima
发明人： Nobuyuki Yasutake , Jun-ichi Kai , Hiroshi Yasuda , Kenichi Kawashima
IPC分类号： H01J37/147 , G05B15/02 , H01J37/304 , H01J37/317 , H01L21/027 , H01L21/30
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , H01J2237/15 , H01J2237/30455 , H01J2237/31766
摘要： In an electron beam exposure system controlled by a computer, the system includes: an electron optical device for generating electron beams and irradiating the beams to a sample on a stage through a plurality of electron lens, a main deflection coil, and sub deflection electrodes, to form predetermined circuit patterns on the sample. The system also includes a position control device controlling the driving of the stage based on a stage position coordinate designated by the computer, detecting an actual stage position coordinate, and calculating an error value between the designated stage position coordinate and the actual stage position coordinate, the error value being divided into two components of an upper bits portion having an relatively large error value and a lower bits portion having a relatively small error value, and a deflection control device controlling the direction of the electron beams based on the main pattern data corrected by the upper bits portion and the sub pattern data corrected by the lower bits portion, and based on selected main and sub wait times determined by exposure and non-exposure timings.
摘要翻译：在由计算机控制的电子束曝光系统中，该系统包括：用于产生电子束并通过多个电子透镜，主偏转线圈和副偏转电极将光束照射到载物台上的样品的电子光学装置，以在样品上形成预定的电路图案。该系统还包括：基于由计算机指定的舞台位置坐标来控制舞台的驾驶的位置控制装置，检测实际舞台位置坐标，以及计算指定舞台位置坐标与实际舞台位置坐标之间的误差值，误差值被分成具有相对较大误差值的较高位部分和具有相对较小误差值的较低位部分的两个分量，以及基于校正的主图案数据控制电子束方向的偏转控制装置通过由较低位部分校正的较高比特部分和子图形数据，并且基于由曝光和非曝光定时确定的选择的主等待时间和次等待时间。

14. 发明授权

US06431473B1 Fuel injection valve coated with anti-fouling perfluoropolyether film layer and associated method, and direct injection engine using same 有权
公开(公告)号：US06431473B1
公开(公告)日：2002-08-13
申请号：US09887110
申请日：2001-06-25
申请人： Mitsuyoshi Shouji , Hiroshi Sasaki , Kenichi Kawashima , Yutaka Ito , Yoshiyuki Tanabe , Atsushi Sekine
发明人： Mitsuyoshi Shouji , Hiroshi Sasaki , Kenichi Kawashima , Yutaka Ito , Yoshiyuki Tanabe , Atsushi Sekine
IPC分类号： F02M3710
摘要： The invention provides for a fuel injection valve for a direct gasoline injection engine, a direct injection engine and an automobile using the same, which can prevent the deposits produced during combustion of gasoline from accumulating on the surface of the fuel injection valve, or easily remove the deposits therefrom. A reaction-bonded layer of perfluoropolyether compounds having alkoxy silane as its terminal group is provided on the surface of the fuel injection valve of the invention.

15. 发明授权

US06176094B1 Refrigerating machine oil composition, and refrigeration and compressor using the refrigerating machine oil composition 失效
标题翻译：制冷机油组成，制冷压缩机采用冷冻机油组成
公开(公告)号：US06176094B1
公开(公告)日：2001-01-23
申请号：US09149221
申请日：1998-09-08
申请人： Ryou Ohta , Yutaka Ito , Kenichi Kawashima , Juichi Arai , Tadashi Iizuka
发明人： Ryou Ohta , Yutaka Ito , Kenichi Kawashima , Juichi Arai , Tadashi Iizuka
IPC分类号： F25B4100
CPC分类号： C10M131/12 , C10M129/84 , C10M171/007 , C10M2207/32 , C10M2211/044 , C10M2211/06 , C10N2240/00 , C10N2240/22 , C10N2240/30 , C10N2240/50 , C10N2240/52 , C10N2240/54 , C10N2240/56 , C10N2240/58 , C10N2240/60 , C10N2240/66 , F25B31/002
摘要： The present invention relates to a refrigerating machine oil composition, which is composed of a base oil as a main component containing a single component of a compound or a mixture of compounds selected from the group consisting of cyclic carbonates and aliphatic carbonate derivatives. For example, the refrigerating machine oil composition is characterized by that the single component of a compound or the mixture of compounds selected from the group consisting of cyclic carbonates and aliphatic carbonate derivatives are expressed by the following general chemical formulas for cyclic carbonates (1) and aliphatic carbonate derivatives (2): (R1, R2 in the formula (1) respectively and independently express a hydrogen atom or a fluorine atom or an alkyl having a carbon number of 1 to 4, or a perfluoroalkyl having a carbon number of 1 to 3. Therein, R1 and R2 may be the same or different from each other. R3, R4 in the formula (2) respectively and independently express an alkyl having a carbon number of 1 to 4 or a perfluoroalkyl having a carbon number of 1 to 3. Therein, R3 and R4 may be same or different from each other.) An object of the present invention is to provide a refrigerating machine oil having an excellent wear resistance, a refrigeration system working medium and a refrigeration system using the refrigerating machine oil, and a compressor used in the refrigeration system.
摘要翻译：本发明涉及一种制冷机油组合物，其由基油作为主要成分组成，其中含有化合物的单一成分或选自环状碳酸酯和脂肪族碳酸酯衍生物的化合物的混合物。例如，冷冻机油组合物的特征在于，化合物的单一成分或选自环状碳酸酯和脂肪族碳酸酯衍生物的化合物的混合物由以下的环状碳酸酯的一般化学式（1）和脂肪族碳酸酯衍生物（2）:(式（1）中的R 1，R 2分别独立地表示氢原子或氟原子或碳数为1〜4的烷基或碳数为1〜其中，R 1和R 2可以相同或不同，式（2）中的R 3，R 4分别独立地表示碳数为1〜4的烷基或碳数为1〜其中，R 3和R 4可以相同或不同。）本发明的目的是提供一种耐磨性优异的制冷机油，制冷系统工作介质 d使用制冷机油的制冷系统和用于制冷系统的压缩机。

16. 发明授权

US6027852A Article having a light-controllable super-water-repellent surface and a printing machine using the article 失效
公开(公告)号：US6027852A
公开(公告)日：2000-02-22
申请号：US940951
申请日：1997-10-08
申请人： Hiroshi Sasaki , Mitsuyoshi Shouji , Kenichi Kawashima , Yutaka Ito
发明人： Hiroshi Sasaki , Mitsuyoshi Shouji , Kenichi Kawashima , Yutaka Ito
IPC分类号： B41F17/00 , B41C1/10 , B41M5/26 , B41N1/22 , C09K3/18 , C09K9/02 , G03C1/73 , G03F7/00 , G03F7/004 , G03C1/74
CPC分类号： B41C1/1041 , G03F7/004
摘要： The present invention relates to an article with a surface having an contact angle with water of at least 150.degree. or more in which the contact angle with water on the surface is lowered to less than 150.degree. by photo-irradiation to the surface. According to the present invention, it is possible to control the super-water-repellency of an article with a super-water-repellent surface by photo-irradiation.

17. 发明授权

US4564764A Wafer having chips for determining the position of the wafer by means of electron beams 失效
标题翻译：晶片具有用于通过电子束确定晶片的位置的芯片
公开(公告)号：US4564764A
公开(公告)日：1986-01-14
申请号：US537624
申请日：1983-09-30
申请人： Hiroshi Yasuda , Kenichi Kawashima , Takayuki Miyazaki , Koichi Kobayashi
发明人： Hiroshi Yasuda , Kenichi Kawashima , Takayuki Miyazaki , Koichi Kobayashi
IPC分类号： G01B15/00 , H01J37/304 , H01L21/027 , G01N23/00
CPC分类号： H01J37/3045
摘要： A wafer having chips for determining the position of the wafer, at least one of the chips comprising a plurality of first-direction line groups formed on one side portion of the chip and a plurality of second-direction line groups formed on the other region of the chip, the first-direction line groups and the second-direction line groups being orthogonal to each other, each of the first-direction line groups comprising one first-direction main mark and one first-direction code mark expressing the position of the one first-direction main mark, each of the second-direction line groups comprising one second-direction main mark and one second-direction code mark, whereby, by scanning only one of the first-direction line groups and only one of the second-direction line groups by means of an electron beam, the position of the wafer is determined.
摘要翻译：具有用于确定晶片的位置的芯片的晶片，至少一个芯片包括形成在芯片的一个侧面上的多个第一方向线组和形成在芯片的另一个区域上的多个第二方向线组芯片，第一方向线组和第二方向线组彼此正交，每个第一方向线组包括一个第一方向主标记和一个表示一个位置的第一方向代码标记第一方向主标记，每个第二方向线组包括一个第二方向主标记和一个第二方向代码标记，由此，通过仅扫描第一方向线组中的一个并且只有一个第二方向线组，通过电子束确定晶片的位置。

18. 发明授权

US4426439A Method and apparatus for processing negative photoresist 失效
标题翻译：负光致抗蚀剂的处理方法和装置
公开(公告)号：US4426439A
公开(公告)日：1984-01-17
申请号：US329941
申请日：1981-12-11
申请人： Koichi Kobayashi , Kenichi Kawashima , Shuzo Oshio
发明人： Koichi Kobayashi , Kenichi Kawashima , Shuzo Oshio
IPC分类号： H01L21/302 , G03F7/038 , G03F7/20 , G03F7/26 , G03F7/38 , H01L21/3065 , G03C5/04
CPC分类号： G03F7/38 , G03F7/20 , Y10S430/168
摘要： A negative photoresist emulsion, wherein after a film of negative photoresist emulsion on a substrate has been exposed for pattern writing in vacuum to charged particle beams or soft X-ray beams, the film-coated substrate is transferred to, and kept in, a chamber filled with non-oxidizing gas, and then the substrate is removed to the outside atmosphere. By this method, a curing effect of the photoresist film is prevented, enabling formation of fine patterns with precision. An apparatus for carrying out the above method, has a gas chamber filled with non-oxidizing gas connected to an exposure chamber, and the substrate, after such exposure, is kept in an atmosphere of non-oxidizing gas in the gas chamber before being removed to the outside atmosphere. In either the above-method or apparatus, the concentration of oxygen in the non-oxidizing gas must be less than 5%, preferably less than 1%.
摘要翻译：一种负性光致抗蚀剂乳液，其中在基底上的负性光致抗蚀剂乳剂的膜已暴露以在真空中进行图案书写以填充带电粒子束或软X射线束之后，将该膜涂覆的基底转移到并保持在室中填充非氧化性气体，然后将基板除去到外部气氛。通过该方法，防止光致抗蚀剂膜的固化效果，从而能够精确地形成精细图案。用于执行上述方法的装置具有填充有与曝光室连接的非氧化性气体的气室，并且在暴露之后，将衬底在去除之前保持在气体室中的非氧化气体气氛中到外面的气氛。在上述方法或装置中，非氧化性气体中的氧浓度必须小于5％，优选小于1％。

19. 发明授权

US4291231A Electron beam exposure system and an apparatus for carrying out the same 失效
标题翻译：电子束曝光系统及其执行装置
公开(公告)号：US4291231A
公开(公告)日：1981-09-22
申请号：US971693
申请日：1978-12-21
申请人： Kenichi Kawashima , Hiroshi Yasuda , Kenyu Uema
发明人： Kenichi Kawashima , Hiroshi Yasuda , Kenyu Uema
IPC分类号： H01L21/027 , H01J37/302 , H01J37/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31762
摘要： Electron beam exposure system provides a basic pattern data memory for storing data corresponding to the dimensions and the positions of patterns of a basic unit pattern which frequently appears as a unit in a pattern to be exposed on a wafer, and a central processing unit provided with an additional memory system which stores data corresponding to the position at which the basic unit pattern is to be exposed. This system determines the position of the basic unit pattern by adding data from the basic pattern data memory and data from the additional memory system through the central processing unit in accordance with a command of the central processing unit. Thereafter, data corresponding to the dimensions of the patterns in the basic unit patterns from the basic pattern data memory are sent as an input to a deflection system. As a result, the system according to the present invention applies electron beam deflection signals, which are produced by using the obtained data corresponding to the positions and the dimensions of the basic unit patterns, to the deflecting means of the electron beam exposure apparatus.
摘要翻译：电子束曝光系统提供基本图案数据存储器，用于存储对应于经常以要暴露在晶片上的图案中以单元形式出现的基本单元图案的尺寸和图案的尺寸和位置的数据;以及中央处理单元，存储与基本单元图案要被曝光的位置对应的数据的附加存储器系统。该系统根据中央处理单元的命令，通过从基本模式数据存储器和来自附加存储器系统的数据通过中央处理单元添加数据来确定基本单元模式的位置。此后，将与来自基本图案数据存储器的基本单元图案中的图案的尺寸相对应的数据作为输入发送到偏转系统。结果，根据本发明的系统将通过使用与基本单元图案的位置和尺寸对应的获得的数据产生的电子束偏转信号应用于电子束曝光装置的偏转装置。

20. 发明授权

US06443375B1 Fuel injection valve coated with anti-fouling perfluoropolyether film layer and associated method, and direct injection engine using same 有权
公开(公告)号：US06443375B1
公开(公告)日：2002-09-03
申请号：US09887118
申请日：2001-06-25
申请人： Mitsuyoshi Shouji , Hiroshi Sasaki , Kenichi Kawashima , Yutaka Ito , Yoshiyuki Tanabe , Atsushi Sekine
发明人： Mitsuyoshi Shouji , Hiroshi Sasaki , Kenichi Kawashima , Yutaka Ito , Yoshiyuki Tanabe , Atsushi Sekine
IPC分类号： F02M3710
摘要： A fuel injection valve for a direct gasoline injection engine, a direct injection engine, and an automobile using the same. The fuel injection valve can prevent the deposits produced during combustion of gasoline from accumulating on the surface of the fuel injection valve, or easily remove the deposits therefrom. A reaction-bonded layer of perfluoropolyether compounds having alkoxy silane as its terminal group is provided on the surface of the fuel injection valve of the invention.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式