会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 12. 发明授权
    • System and method for managing monitoring equipment
    • 管理监控设备的系统和方法
    • US06675167B2
    • 2004-01-06
    • US09810581
    • 2001-03-19
    • Ichiro TakahashiSeigo KurokawaTatsuhiko AsanoHiromitsu Kaneko
    • Ichiro TakahashiSeigo KurokawaTatsuhiko AsanoHiromitsu Kaneko
    • G06F1730
    • G05B23/0283
    • An equipment management system structured by a monitoring apparatus to monitor equipment of a facility being monitored and retrieve operation data, a database apparatus in which the operation data retrieved by the monitoring apparatus is recorded, and a database client apparatus to send and receive information to and from the database apparatus via a network, display the data recorded in the database apparatus, and enter data. The database apparatus records maintenance reference values for the equipment of the facility being monitored and the monitoring apparatus or database client apparatus outputs a display or printout prompting an execution of maintenance work when the operation data is in excess of or close to the maintenance reference values.
    • 一种由监视装置构成的设备管理系统,用于监视被监视设备的设备并检索操作数据;数据库装置,其中监视装置检索到的操作数据被记录在该数据库装置中;以及数据库客户端装置,用于向 经由网络从数据库装置显示记录在数据库装置中的数据,并输入数据。 数据库装置记录被监视设备的设备的维护参考值,并且当操作数据超过或接近维护参考值时,监视设备或数据库客户端设备输出显示或打印输出,提示维护工作的执行。
    • 13. 发明授权
    • Chemical vapor deposition system with reduced material deposition on chamber wall surfaces
    • 化学气相沉积系统,在室壁表面上减少材料沉积
    • US06254687B1
    • 2001-07-03
    • US09280024
    • 1999-03-26
    • Ichiro Takahashi
    • Ichiro Takahashi
    • C23C1600
    • C23C16/45502C23C16/4584C23C16/4588
    • In a chemical vapor deposition system, susceptors are supported by a pair of turntables which are disposed in a vertical and parallel arrangement. A plurality of wafers to be processed are arranged circumferentially on opposing surfaces of the susceptors, and heater units are arranged behind the turntables. Because the wall surfaces exposed to the material gas are mostly covered by the wafers to be processed, any wasteful deposition of material on the chamber surfaces can be avoided. Thus, the need to clean the surface of the chamber wall is minimized. Such material deposition is not only wasteful but also could become a source of contamination as such deposition tends to peel off.
    • 在化学气相沉积系统中,基座由一对以垂直和平行布置的转盘支撑。 待处理的多个晶片周向布置在基座的相对表面上,并且加热器单元布置在转盘后面。 因为暴露于原料气体的壁表面大部分被要处理的晶片所覆盖,所以可以避免材料在室表面上的浪费沉积。 因此,清洁室壁表面的需要被最小化。 这种材料沉积不仅浪费,而且也可能成为污染源,因为这种沉积倾向于剥离。
    • 17. 发明授权
    • Endoscopic treatment tool
    • 内镜治疗工具
    • US07691104B2
    • 2010-04-06
    • US11880995
    • 2007-07-25
    • Hironori YamamotoMegumi KimuraIchiro TakahashiRyoko YamazakiTatsuya Kaneko
    • Hironori YamamotoMegumi KimuraIchiro TakahashiRyoko YamazakiTatsuya Kaneko
    • A61B18/18
    • A61B18/1445A61B18/1492A61B2018/144A61B2018/1475
    • An endoscopic treatment tool is provided which includes: a grasping portion that has a first shoulder portion and second shoulder portion; a current-carrying portion that protrudes out from a distal end of each of the first and second shoulder portions; a pivot portion that is disposed in the distal end of the first shoulder portion so as to protrude in substantially the same direction as the longitudinal direction of the first shoulder portion, the distal end of the pivot portion being provided with an insulating portion; a wire that is connected to the grasping portion; a sheath which has a tubular shape, and into which the wire and grasping portion are inserted; a main body to which the sheath is fixed; and a sliding portion which is disposed to move in the longitudinal direction of the main body in a sliding manner, and to which the wire is connected.
    • 提供一种内窥镜治疗工具,其包括:握持部,其具有第一肩部和第二肩部; 从所述第一和第二肩部中的每一个的远端突出的通电部分; 枢转部,其设置在所述第一肩部的远端,以与所述第一肩部的长度方向大致相同的方向突出,所述枢转部的前端设有绝缘部; 连接到所述把持部的线; 护套,其具有管状,并且所述线和把持部插入其中; 固定护套的主体; 以及滑动部,其设置成以滑动方式在主体的纵向方向上移动,并且所述线连接到该滑动部。
    • 19. 发明申请
    • ENDOSCOPIC TREATMENT INSTRUMENT
    • 内窥镜治疗仪
    • US20090036735A1
    • 2009-02-05
    • US11911734
    • 2006-03-16
    • Ichiro Takahashi
    • Ichiro Takahashi
    • A61B1/018
    • A61B10/06A61B2017/00292A61B2017/2905A61B2017/320064
    • In accordance with the present invention, a substrate for mounting a light-emitting element is provided including a core metal whose outer periphery is covered with an enameled layer and including a reflective cap portion provided on one surface thereof, wherein a heat radiating portion is formed, by partly eliminating the enameled layer so that the core metal is exposed, on the other surface thereof on which the reflective cap portion is not provided. Further, a light-emitting element module comprising a light-emitting element mounted on the aforementioned substrate, an illumination apparatus having this light-emitting element module, a display apparatus, and a traffic signal device are also provided.
    • 根据本发明,提供了一种用于安装发光元件的基板,其包括芯体金属,其外周被搪瓷层覆盖并且包括设置在其一个表面上的反射盖部分,其中形成热辐射部分 通过部分地消除漆包层使得芯金属暴露在其上没有设置反射盖部分的另一表面上。 此外,还提供了一种包括安装在上述基板上的发光元件的发光元件模块,具有该发光元件模块的照明装置,显示装置和交通信号装置。