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    • 11. 发明授权
    • Sound data processing appartus
    • 声音数据处理appartus
    • US08694138B2
    • 2014-04-08
    • US12039884
    • 2008-02-29
    • Kenichi OkuboKenichi Kojima
    • Kenichi OkuboKenichi Kojima
    • G06F17/00G06F3/00G06F9/445
    • G10L19/008G06F3/162
    • A sound data processing apparatus includes a central processing unit for controlling predetermined processing in the apparatus, a rewritable RAM, a decoder performing the decoding processing for sound data, and an interface unit for being fitted with an external memory. The sound data processing apparatus reads a driver from the external memory mounted in the interface unit and stores the read driver into the RAM, and reads the sound data from the external memory with the driver and processes the read sound data. As a result, the wastefully using of the memory capacity of the memory mounted in the sound data processing apparatus is reduced.
    • 声音数据处理装置包括用于控制装置中的预定处理的中央处理单元,可重写RAM,执行声音数据解码处理的解码器以及用于装配外部存储器的接口单元。 声音数据处理装置从安装在接口单元中的外部存储器读取驱动器,并将读取的驱动器存储到RAM中,并用驱动器从外部存储器读取声音数据,并处理读取的声音数据。 结果,减少了安装在声音数据处理装置中的存储器的存储容量的浪费。
    • 13. 发明授权
    • Substrate processing apparatus and substrate processing method
    • 基板加工装置及基板处理方法
    • US06851872B1
    • 2005-02-08
    • US09706817
    • 2000-11-07
    • Kenichi OkuboAkira Kanbayashi
    • Kenichi OkuboAkira Kanbayashi
    • H01L21/027B65G49/07G03D5/00H01L21/00
    • H01L21/67276Y10S414/135
    • Transferring apparatus control means movement of a transferring apparatus for transferring a wafer to a resist liquid coating unit from a cooling process unit. A storage section of the transferring apparatus controller stores a coating time required for a resist film coating and a moving time required for the transfer of the wafer. When a coating start time of a resist film is inputted, the control section calculates a coating end time from the stored coating time. Further, the control section calculates time of taking out a wafer W, which is next subjected to a coating process from the cooling process unit, from the coating end time and the stored moving time. Based on the calculated time, the transferring apparatus controller instructs the transferring apparatus about timing to take out the wafer. This makes it possible to improve the throughput.
    • 转印装置控制装置是用于从冷却处理单元移动用于将晶片转印到抗蚀剂涂料单元的转印装置。 转印装置控制器的存储部分存储抗蚀剂膜涂覆所需的涂布时间和晶片转印所需的移动时间。 当输入抗蚀剂膜的涂层开始时间时,控制部分从存储的涂布时间计算涂布结束时间。 此外,控制部分计算从涂覆结束时间和存储的移动时间取出接下来经过来自冷却处理单元的涂布处理的晶片W的时间。 基于计算出的时间,传送装置控制器指示传送装置关于取出晶片的定时。 这使得可以提高吞吐量。