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    • 13. 发明授权
    • Method for producing a mould for nanostructured polymer objects
    • 用于生产纳米结构聚合物物体的模具的方法
    • US08168076B2
    • 2012-05-01
    • US12588878
    • 2009-10-30
    • Jerome GavilletPierre Juliet
    • Jerome GavilletPierre Juliet
    • C03C15/00
    • B29C33/3842B29C33/424B29C45/2632B29C45/372B29K2907/04B82Y10/00B82Y40/00C23C16/0281C23C16/26C23C16/56G03F7/0002G03F7/164G03F7/165G03F7/167
    • A mould for objects made of polymer material is produced by successively depositing a barrier thin layer and a thin layer of diamond-like carbon on at least a part of a metal support. The thin layer of diamond-like carbon is then nanopatterned with a predetermined pattern presenting a form factor of more than 1. Nanopatterning is performed by selective chemical etching in dry phase through a hard mask and etching stops at an interface between the thin layer of diamond-like carbon and the barrier thin layer. The hard mask used was formed beforehand on a free surface of the thin layer of diamond-like carbon by selective chemical etching in dry phase performed through a void lattice delineated by nanoparticles deposited beforehand on a free surface of said hard mask. The barrier thin layer and the nanopatterned thin layer of diamond-like carbon form a bilayer coating presenting a thickness comprised between about 100 nm and about 10 μm.
    • 通过在金属载体的至少一部分上连续沉积阻挡薄层和类金刚石薄层来制造由聚合物材料制成的物体的模具。 然后将金刚石样碳的薄层以预定图案形成,其形状因子大于1.纳米图案通过硬掩模在干相中的选择性化学蚀刻进行,并且蚀刻停止在金刚石薄层之间的界面处 类碳和阻挡薄层。 使用的硬掩模通过在预先沉积在所述硬掩模的自由表面上的纳米粒子划定的空隙格子的干相中通过选择性化学蚀刻预先形成在类金刚石碳薄层的自由表面上。 阻挡薄层和纳米图案的类金刚石碳形成双层涂层,其厚度为约100nm至约10μm。