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11. 发明授权

US06719491B2 Fluid level control system 失效
标题翻译：液位控制系统
公开(公告)号：US06719491B2
公开(公告)日：2004-04-13
申请号：US10067398
申请日：2002-02-07
申请人： Dusko Antonio Kezele , Jason J. Cerny , Alan J. Royce , Fariborz Taghipour , George Traubenberg , Edward P. Kambulow
发明人： Dusko Antonio Kezele , Jason J. Cerny , Alan J. Royce , Fariborz Taghipour , George Traubenberg , Edward P. Kambulow
IPC分类号： E02B740
CPC分类号： E02B7/40 , E02B7/205 , G05D7/0173 , Y10T137/7287
摘要： A fluid level control system, particularly useful for controlling the level of water flowing in an open channel. The fluid level control system includes a gate having a flap portion interconnected to a lever portion. The flap portion is rotatable about a first pivot point. The system further includes a frame which is fixed with respect to the flap portion. A linkage interconnects the flap portion and the lever portion, and is connected to the frame at a second pivot point different than the first pivot point. Under changing flow conditions in the channel, the present system operates by both: (i) absolute movement of the lever portion and the flap portion, and (ii) relative movement between the lever portion and the flap portion. A fluid treatment system and a method for controlling the level of a flowing fluid may also use such a fluid level control system.
摘要翻译：液位控制系统，特别适用于控制在开放通道中流动的水位。液位控制系统包括具有互连到杆部分的翼片部分的门。翼片部分可围绕第一枢转点旋转。该系统还包括相对于翼片部分固定的框架。连杆将翼片部分和杆部分互连，并且在与第一枢转点不同的第二枢轴点处连接到框架。在通道中的流动条件变化的情况下，本系统通过以下操作：（i）杠杆部分和翼片部分的绝对运动，以及（ii）杠杆部分和翼片部分之间的相对运动。流体处理系统和用于控制流动流体的水平的方法也可以使用这种液位控制系统。

12. 发明申请

US20060091326A1 Fluid treatment system and radiation source module for use therein 有权
标题翻译：流体处理系统和辐射源模块
公开(公告)号：US20060091326A1
公开(公告)日：2006-05-04
申请号：US11250473
申请日：2005-10-17
申请人： George Traubenberg , Steven Bakker , Kuang-Ping Chiu
发明人： George Traubenberg , Steven Bakker , Kuang-Ping Chiu
IPC分类号： G21F5/02
CPC分类号： C02F1/325 , B01J19/123 , B01J2219/0877 , C02F2201/3227 , C02F2201/324 , C02F2201/328 , C02F2303/14 , Y10S422/906
摘要： A radiation source module comprising a support member, a radiation source assembly connected to the support member, the radiation source assembly comprising at least one elongate radiation source having a source longitudinal axis and a module-to-surface seal disposed on a first elongate surface of the module, the first elongate surface comprising a first longitudinal axis transverse to the source longitudinal axis, the seal operable to provide a substantially fluid tight seal between the first surface and a second surface which is adjacent to the first surface. A fluid treatment system employ the radiation source module is also described.
摘要翻译：辐射源模块，包括支撑构件，连接到所述支撑构件的辐射源组件，所述辐射源组件包括至少一个细长辐射源，所述辐射源组件具有源纵向轴线和模块到表面密封件，所述辐射源组件设置在第一细长表面上所述模块，所述第一细长表面包括横向于所述源纵向轴线的第一纵向轴线，所述密封件可操作以在所述第一表面与邻近所述第一表面的第二表面之间提供基本上流体密封的密封。还描述了采用辐射源模块的流体处理系统。

13. 发明授权

US06646269B1 Radiation source module and cleaning apparatus therefor 失效
标题翻译：辐射源模块及其清洁装置
公开(公告)号：US06646269B1
公开(公告)日：2003-11-11
申请号：US09258142
申请日：1999-02-26
申请人： George Traubenberg , Vivian Francesca Dall'Armi , Steven Mark Bakker
发明人： George Traubenberg , Vivian Francesca Dall'Armi , Steven Mark Bakker
IPC分类号： C02F132
CPC分类号： C02F1/325 , C02F2201/3227 , C02F2201/324
摘要： A cleaning apparatus for a radiation source assembly in a fluid treatment system is described. The cleaning apparatus comprises: a carriage movable with respect to an exterior of the radiation source assembly; at least one cleaning sleeve in sliding engagement with the exterior of the radiation source assembly, the at least one cleaning sleeve being moveable with respect to the carriage; and drive means coupled to the carriage to translate the carriage whereby the at least one cleaning sleeve is translated over the exterior of the radiation source assembly. A radiation source module comprising the cleaning apparatus is also disclosed. The radiation source module is particularly useful for ultraviolet radiation of wastewater while having the advantages of in situ cleaning of the radiation source when it becomes fouled. Radiation source replacement is also facilitated.
摘要翻译：描述了用于流体处理系统中的辐射源组件的清洁装置。清洁装置包括：可相对于辐射源组件的外部移动的托架; 至少一个与所述辐射源组件的外部滑动接合的清洁套筒，所述至少一个清洁套筒可相对于所述托架移动; 以及驱动装置，其联接到滑架以平移滑架，由此至少一个清洁套筒在辐射源组件的外部平移。还公开了一种包括清洁装置的辐射源模块。辐射源模块特别适用于废水的紫外线辐射，同时具有当辐射源成为污垢时原位清洁辐射源的优点。辐射源更换也方便。

14. 发明申请

US20120318376A1 CLEANING APPARATUS, RADIATION SOURCE MODULE AND FLUID TREATMENT SYSTEM 审中-公开
标题翻译：清洁装置，辐射源模块和流体处理系统
公开(公告)号：US20120318376A1
公开(公告)日：2012-12-20
申请号：US13509448
申请日：2010-11-10
申请人： George Traubenberg , Allan Archer , Cristian Moglan
发明人： George Traubenberg , Allan Archer , Cristian Moglan
IPC分类号： B08B1/00
CPC分类号： B08B1/008 , B08B9/023 , C02F1/325 , C02F2201/3225 , C02F2201/3227 , C02F2201/324 , Y10T137/4238
摘要： There is described a cleaning apparatus for a surface (e.g., a radiation source assembly) in a fluid treatment system. A preferred embodiment of the cleaning apparatus comprises: a wiping element for contact with at least a portion of the surface; at least one cutting element connected to the wiping element for cutting elongate debris in contact with the surface; and a motive element for moving the carriage between a first position and a second position. This preferred embodiment of the present cleaning apparatus is particularly advantageous for removing elongate debris from one or more radiation source assemblies disposed in the fluid treatment system. The approach utilized in this preferred embodiment of the present cleaning apparatus is to include at least one cutting element which is moved along the exterior of the radiation source assembly. The cutting element is connected to a wiping element that is translated between a first position and a second position. As the wiping element is moved from the first position to the second position, it will tend to push the elongate debris toward a distal portion of the radiation source assembly. During this translation step, it is possible that some of the debris may be cut by the cutting element. As the wiping element approaches the distal portion of the radiation source assembly, it will tend to clamp down on the elongate debris and, as the force of movement is continually applied, the cutting element will cut the elongate debris. Once the elongate debris is cut, it will more readily fall away from the radiation source assembly and this action is facilitated by a flow of fluid past the radiation source assembly.
摘要翻译：在流体处理系统中描述了用于表面（例如，辐射源组件）的清洁装置。清洁装置的优选实施例包括：用于与表面的至少一部分接触的擦拭元件; 连接到所述擦拭元件的至少一个切割元件，用于切割与所述表面接触的细长碎片; 以及用于在第一位置和第二位置之间移动托架的动力元件。本清洁装置的该优选实施例对于从设置在流体处理系统中的一个或多个辐射源组件移除细长碎片是特别有利的。本清洁装置的该优选实施例中采用的方法是包括沿着辐射源组件的外部移动的至少一个切割元件。切割元件连接到在第一位置和第二位置之间平移的擦拭元件。当擦拭元件从第一位置移动到第二位置时，它将倾向于将细长碎片推向辐射源组件的远端部分。在该平移步骤期间，有些碎片可能被切割元件切割。当擦拭元件接近辐射源组件的远端部分时，它将倾向于夹紧在细长碎片上，并且随着移动力被连续施加，切割元件将切割细长碎片。一旦细长的碎片被切割，它将更容易地从辐射源组件脱落，并且通过流过该辐射源组件的流体促进了该作用。

15. 发明申请

US20110006223A1 RADIATION SOURCE ASSEMBLY AND FLUID TREATMENT SYSTEM 审中-公开
标题翻译：辐射源组件和流体处理系统
公开(公告)号：US20110006223A1
公开(公告)日：2011-01-13
申请号：US12808092
申请日：2008-12-12
申请人： Li-Zheng Ma , George Traubenberg
发明人： Li-Zheng Ma , George Traubenberg
IPC分类号： G21K5/00 , G21K1/00
CPC分类号： C02F1/325 , C02F2201/3228 , H01J61/025 , H01J61/33 , H01J61/34
摘要： There is disclosed a radiation source assembly comprising an elongate radiation emitting outer portion having non-circular cross-sectional shape and an elongate radiation source. A radiation source module and a fluid system incorporating the radiation source assembly are also disclosed. It has been discovered that the use of a non-circular shaped sleeve or outer lamp surface reduces the stress placed on these elements in a fluid treatment system in which the radiation source assemblies are disposed transverse (e.g., orthogonal) to the direction of fluid flow through the fluid treatment zone of the system.
摘要翻译：公开了一种辐射源组件，其包括具有非圆形横截面形状的细长辐射发射外部部分和细长辐射源。还公开了一种辐射源模块和结合有辐射源组件的流体系统。已经发现，使用非圆形套筒或外部灯表面减少了在流体处理系统中放置在这些元件上的应力，其中辐射源组件横向（例如，垂直于流体流动方向）设置通过系统的流体处理区。

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