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11. 发明授权

US5847569A Electrical contact probe for sampling high frequency electrical signals 失效
标题翻译：用于采样高频电信号的电接触探头
公开(公告)号：US5847569A
公开(公告)日：1998-12-08
申请号：US694925
申请日：1996-08-08
申请人： Francis Ho , David M. Bloom
发明人： Francis Ho , David M. Bloom
IPC分类号： G01R1/067 , G01R19/25 , G01R31/28
CPC分类号： G01R1/06772 , G01R19/2509 , Y10S977/852
摘要： An all-electrical high frequency contact sampling probe provides sub-micron spatial resolution and picosecond or sub-picosecond temporal resolution. In a preferred embodiment, the probe is a monolithic integration of a sampling circuit with a cantilever and probe tip, where the distance between the circuit and the tip is less than a wavelength of interest in an RF signal �V.sub.RF !. The sampling circuit �44! uses Schottky diodes �SD! for sampling the RF signal �V.sub.RF ! from a device under test at a rate determined by local oscillator signals �50, 52!. An IF signal �V.sub.IF ! produced by the sampling probe is an equivalent time representation of the RF signal. Applications include testing signals at interior nodes of high speed integrated circuits.
摘要翻译：全电高频接点采样探头提供亚微米空间分辨率和皮秒或次皮秒时间分辨率。在优选实施例中，探针是采样电路与悬臂和探针尖端的单片整合，其中电路和尖端之间的距离小于RF信号[VRF]中感兴趣的波长。采样电路[44]使用肖特基二极管[SD]以本地振荡器信号[50,52]确定的速率从被测器件采样RF信号[VRF]。由采样探针产生的IF信号[VIF]是RF信号的等效时间表示。应用包括在高速集成电路的内部节点的测试信号。

12. 发明授权

US09423211B2 Locking container for firearms 有权
标题翻译：火器锁具
公开(公告)号：US09423211B2
公开(公告)日：2016-08-23
申请号：US14531793
申请日：2014-11-03
申请人： Francis Ho
发明人： Francis Ho
IPC分类号： F41C33/06 , E05B65/52 , E05G1/00 , E05C9/02
CPC分类号： F41C33/06 , E05B37/163 , E05B47/0004 , E05B47/0661 , E05B65/52 , E05B2047/0058 , E05B2047/0086 , E05C9/02 , E05G1/005 , E05G1/04 , Y10T70/5031 , Y10T70/7107
摘要： The apparatus includes a body portion and a door removably connected to the body portion, revealing the interior of the body portion, the door having at least one latching element. An access assembly is attached to the body portion, the access assembly including a latch bar having an opening to receive the latching element. A plurality of actuating buttons are provided for the user. A mechanism responsive to operation of preselected buttons in a preselected sequence releases an actuation mechanism. An operating member accessible to the user and operatively connected to the actuation mechanism moves the released actuation mechanism to move the latching bar so that the latching element is released from the latching bar, allowing the door to be opened.
摘要翻译：该装置包括主体部分和可移除地连接到主体部分的门，露出主体部分的内部，门具有至少一个闩锁元件。入口组件附接到主体部分，进入组件包括具有用于接收闩锁元件的开口的闩锁杆。为用户提供多个致动按钮。响应于预选序列中的预选按钮的操作的机构释放致动机构。操作构件可由使用者访问并可操作地连接到致动机构移动释放的致动机构以移动闩锁杆，使得闩锁元件从闩锁杆释放，允许门打开。

13. 发明申请

US20110107013A1 High Throughput Flash Memory System 有权
标题翻译：高吞吐量闪存系统
公开(公告)号：US20110107013A1
公开(公告)日：2011-05-05
申请号：US12611834
申请日：2009-11-03
申请人： Francis Ho
发明人： Francis Ho
IPC分类号： G06F12/00 , G06F12/02
CPC分类号： G06F12/0246 , G06F11/1008 , G06F11/1044 , G06F11/108 , G06F12/0804 , G06F2212/7203 , G06F2212/7208
摘要： There is disclosed a memory system and method. The memory system may include a plurality of memory planes including two or more data memory areas, and a memory controller adapted to controlling reading, writing, and erasing of the plurality of memory planes. When any one of the data memory areas is occupied with one of a write operation and an erase operation, the controller may reconstruct data stored in the one occupied data memory area by reading parity information and data stored in the plurality of memory areas other than the one occupied data memory area.
摘要翻译：公开了一种存储器系统和方法。存储器系统可以包括包括两个或多个数据存储区域的多个存储器平面，以及适于控制多个存储器平面的读取，写入和擦除的存储器控制器。当任何一个数据存储区域被写入操作和擦除操作中的一个占用时，控制器可以通过读取存储在多个存储区域中的奇偶校验信息和除了一个占用的数据存储区。

14. 发明授权

US6086774A Method of making released micromachined structures by directional etching 失效
标题翻译：通过定向蚀刻制造释放的微加工结构的方法
公开(公告)号：US6086774A
公开(公告)日：2000-07-11
申请号：US993924
申请日：1997-12-18
申请人： Francis Ho , Yoshihisa Yamamoto
发明人： Francis Ho , Yoshihisa Yamamoto
IPC分类号： B81C1/00 , C25F3/02 , G01P15/08 , G01P15/09 , G01P15/12 , G01Q70/16 , B44C1/22 , C25F3/12 , G01P15/02
CPC分类号： G01Q70/16 , B81C1/00531 , B82Y35/00 , G01P15/0802 , G01P15/0922 , G01P15/123 , B81B2201/0235 , B81B2203/0118 , B81C2201/0132 , B81C2201/0143 , G01P2015/0828
摘要： A method of making released structures by using at least two directional etching steps. Cantilevers, bridges and many other structures can be made with the present invention. In a preferred embodiment, two directional etching steps are performed at opposing angles nonnormal to the substrate surface such that the substrate is undercut and a structure is released. Alternatively, more than two directional etching steps may be performed at various angles. For example, the substrate may be rotated continuously during the directional etching process. A cantilever formed by the method of the present invention necessarily has a substantially triangular cross section. Directional etching processes that can be used include focused ion beam etching and ECR plasma etching. Some directional etching processes may require the use of a patterned etch resist layer. Other etching processes such as focused ion beam etching may use scanning techniques to select which regions are etched. A backside etch can be performed to remove remaining substrate material under the released micromachined structure. The method is particularly well suited for making released cantilevers.
摘要翻译：通过使用至少两个方向蚀刻步骤来制造释放结构的方法。悬臂，桥梁和许多其他结构可以用本发明制成。在优选实施例中，以相对于基板表面非正常的角度执行两个定向蚀刻步骤，使得基底被切削并且结构被释放。或者，可以以各种角度执行多于两个的定向蚀刻步骤。例如，可以在定向蚀刻工艺期间连续旋转衬底。通过本发明的方法形成的悬臂必须具有基本上三角形的横截面。可以使用的定向蚀刻工艺包括聚焦离子束蚀刻和ECR等离子体蚀刻。一些定向蚀刻工艺可能需要使用图案化的抗蚀剂层。诸如聚焦离子束蚀刻的其它蚀刻工艺可以使用扫描技术来选择蚀刻哪些区域。可以执行背面蚀刻以在释放的微加工结构下去除剩余的基底材料。该方法特别适用于制备释放的悬臂。

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