会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 11. 发明授权
    • Inspection of pipe interior
    • 检查管内部
    • US08869638B2
    • 2014-10-28
    • US13439438
    • 2012-04-04
    • Anthony G. RazzellRobert J. Mitchell
    • Anthony G. RazzellRobert J. Mitchell
    • G01N21/88G01F23/296G01N29/22G01N29/265
    • G01F23/296G01N29/222G01N29/265G01N2291/044
    • A method for inspecting the interior of a non-horizontal pipe includes (a) filling the pipe with a first fluid, (b) feeding a second fluid into a lower part of the pipe when the second fluid is more dense than the first fluid or into an upper part of the pipe when the second fluid is less dense than the second fluid the pipe, a meniscus forming between the first and the second fluid and moving along the pipe, (c) introducing an inspection device having an average density between the densities of the first and second fluids such that the device locates at and moves with the meniscus, (d) obtaining inspection data from the inspection device as the device moves along the pipe, (e) determining positions of the meniscus as it moves along the pipe, and (f) relating the meniscus positions to positions at which the inspection data is obtained.
    • 用于检查非水平管的内部的方法包括(a)用第一流体填充管,(b)当第二流体比第一流体更致密时,将第二流体供给到管的下部,或 当所述第二流体比所述第二流体密度小时,在所述管的上部形成弯液面,所述弯液面在所述第一流体和所述第二流体之间形成并沿着所述管移动,(c)引入检查装置,所述检查装置的平均密度在 所述第一和第二流体的密度使得所述装置位于所述弯月面处并随其移动,(d)当所述装置沿着所述管移动时,从所述检查装置获得检查数据,(e)确定所述弯月面沿着所述弯液面移动时的位置 管道,以及(f)将弯液面位置与获得检​​查数据的位置相关联。
    • 12. 发明申请
    • MANDIBULAR DISTRACTION SYSTEM AND METHOD OF USE
    • 权力分配系统及其使用方法
    • US20110106094A1
    • 2011-05-05
    • US12609668
    • 2009-10-30
    • Robert J. Mitchell
    • Robert J. Mitchell
    • A61B17/60
    • A61H1/02A61F2005/563A61H1/0222A61H23/0236A61H2201/0207A61H2201/1215A61H2201/1238A61H2201/1246A61H2201/1253A61H2201/1604A61H2205/026
    • A mandibular distraction system and method for treating temporomandibular joint disorders by stretching and relaxing the periarticular muscles of the temporomandibular joint. The system includes a head immobilization device, a patient support device and a facial harness. The system also includes upper and lower mouth guards arranged to fit at least partially around the upper and lower teeth. The mouth guards are configured to operate with a chin strap, sliding assembly, and a displacement device. The displacement device may be actuated to apply force to the facial harness by applying pressure on the chin strap, which is converted by the mouth guards to apply a downward uniform pressure on the back of the jaw, stretching and relaxing the periarticular muscles of the temporomandibular joint. The method of the present invention generally provides steps for allowing distraction of the periarticular muscles to occur while the patient is in a passive, supine position with their mouth closed.
    • 一种下颌牵引系统和方法,用于通过拉伸和放松颞下颌关节的关节周围肌肉来治疗颞下颌关节疾病。 该系统包括头部固定装置,患者支撑装置和面部线束。 该系统还包括布置成至少部分地围绕上下齿配合的上下口护罩。 口罩被配置成用下巴带,滑动组件和位移装置操作。 位移装置可以被致动以通过在下巴带上施加压力来施加力量,所述下巴带由口罩转换,以对钳口的背面施加向下均匀的压力,拉伸和放松颞下颌关节周围的肌肉 联合。 本发明的方法通常提供了当患者处于被关闭的被动仰卧位时允许关节周围肌肉发生分离的步骤。
    • 15. 发明授权
    • Umbilical cord facilities connection for an ion beam implanter
    • 用于离子束注入机的脐带设备连接
    • US06794664B1
    • 2004-09-21
    • US10728669
    • 2003-12-04
    • Robert J. MitchellKevin T. Ryan
    • Robert J. MitchellKevin T. Ryan
    • H01J3708
    • H01L21/68764H01J37/3171H01J2237/2001H01L21/67069H01L21/67109H01L21/6831H01L21/68792
    • An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a chuck including a rotatable pedestal for supporting the workpiece. The workpiece support structure further includes a first rotatable reel coupled to and rotatable with the pedestal and a flexible, hollow cord carrying facilities such as coolant lines and electrical power conductors coupled to the rotatable reel such that, as the pedestal is rotated in a first direction, a length of the flexible cord that is wrapped around the first reel increases and, as the pedestal is rotated in an opposite direction, a length of the flexible cord that is wrapped around the first reel decreases.
    • 离子束注入机包括用于产生沿着束线移动的离子束的离子束源和真空注入室,其中工件被定位成与离子束相交,用于通过离子束离子注入工件的表面。 离子束注入机还包括耦合到注入室并支撑工件的工件支撑结构。 工件支撑结构包括夹头,该卡盘包括用于支撑工件的可旋转底座。 所述工件支撑结构还包括联接到所述基座上并与所述基座一起旋转的第一可旋转卷轴以及耦合到所述可旋转卷轴的诸如冷却剂管线和电力导体之类的柔性中空绳索承载设施,使得当所述基座沿第一方向旋转时 围绕第一卷轴卷绕的柔性绳的长度增加,并且当基座沿相反方向旋转时,卷绕在第一卷轴上的柔性帘线的长度减小。
    • 17. 发明授权
    • High throughput wafer notch aligner
    • 高通量晶圆缺口对准器
    • US07949425B2
    • 2011-05-24
    • US11634697
    • 2006-12-06
    • Robert J. MitchellJoseph Ferrara
    • Robert J. MitchellJoseph Ferrara
    • G07F7/00
    • H01L21/681H01L21/67265H01L21/67745
    • An ion implantation apparatus, system, and method are provided for a transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.
    • 提供一种用于在真空和大气压之间传送多个工件的离子注入装置,系统和方法,其中对准机构可操作以将多个工件对准,以便大体上同时传送到双工件加载锁定室。 对准机构包括表征装置,电梯和用于支撑两个工件的两个垂直对准的工件支撑件。 第一和第二大气机器人被配置为一般在负载锁定模块,对准机构和FOUP之间同时传送两个工件。 第三和第四真空机器人被配置为在加载锁模块和处理模块之间一次传送一个工件。
    • 19. 发明授权
    • Work-piece treatment system having load lock and buffer
    • 具有加载锁定和缓冲功能的工件处理系统
    • US07010388B2
    • 2006-03-07
    • US10444019
    • 2003-05-22
    • Robert J. MitchellAllan D. WeedRichard Gueler
    • Robert J. MitchellAllan D. WeedRichard Gueler
    • G06F7/00
    • H01L21/67763H01L21/67213H01L21/67745Y10S414/139Y10S414/141
    • A transfer system for use with a tool for treating a work-piece at sub-atmospheric pressure such as an ion implanter for implanting silicon wafers. An enclosure defines a low pressure region for treatment of work-pieces placed at a work-piece treatment station within the low pressure region. Multiple work-piece isolation load locks transfer work-pieces, one or two at a time, from a higher pressure region to the lower pressure for treatment and back to said higher pressure subsequent to said treatment. A first robot transfers work-pieces within the low pressure region from the load locks to a treatment station within the low pressure region. Multiple other robots positioned outside the low pressure region transfers work-pieces to and from the multiple work-piece isolation load locks from a source of said work-pieces prior to treatment and to a destination of said work-pieces after said treatment.
    • 一种用于处理亚大气压下的工件的工具的转移系统,例如用于植入硅晶片的离子注入机。 外壳限定了用于处理放置在低压区域内的工件处理站的工件的低压区域。 多个工件隔离负载锁将工件一次一个或两个从较高压力区域传递到较低压力以进行处理,并在所述处理之后返回到所述较高压力。 第一机器人将低压区域内的工件从负载锁转移到低压区域内的处理站。 定位在低压区域之外的多个其它机器人在处理之前将工件从多个工件隔离负载锁转移到所述工件的源并在所述处理之后传送到所述工件的目的地。
    • 20. 发明授权
    • Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor
    • 使用线性扫描电机的离子束注入机的可调植入角度工件支撑结构
    • US06740894B1
    • 2004-05-25
    • US10371606
    • 2003-02-21
    • Robert J. Mitchell
    • Robert J. Mitchell
    • H01J37317
    • H01J37/20H01J37/3171H01J2237/202
    • An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a rotation member rotatably affixed to the implantation chamber. Rotation of the rotation member with respect to the implantation chamber changes an implantation angle of the workpiece with respect to the portion of the ion beam beam line within the implantation chamber. The workpiece support structure further includes a translation member disposed within the implantation chamber, movably coupled to the rotation member and supporting the workpiece for linear movement along a path of travel. The translation member includes a linear motor.
    • 离子束注入机包括用于产生沿着束线移动的离子束的离子束源和真空或注入室,其中工件被定位成与离子束相交,用于通过离子束离子注入工件的表面。 离子束注入机还包括耦合到注入室并支撑工件的工件支撑结构。 工件支撑结构包括可旋转地固定到植入室的旋转构件。 旋转构件相对于注入室的旋转改变了工件相对于植入室内的离子束束线的部分的注入角度。 所述工件支撑结构还包括设置在所述注入室内的平移构件,所述平移构件可移动地联接到所述旋转构件并且支撑所述工件以沿着行进路径线性移动。 平移构件包括线性电动机。