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11. 发明申请

US20060272772A1 VACUUM REACTION CHAMBER WITH X-LAMP HEATER 有权
标题翻译：真空反应室与X灯加热器
公开(公告)号：US20060272772A1
公开(公告)日：2006-12-07
申请号：US11425974
申请日：2006-06-22
申请人： Amir Al-Bayati , Lester D'Cruz , Alexandros Demos , Dale Dubois , Khaled Elsheref , Naoyuki Iwasaki , Hichem M'Saad , Juan Rocha-Alvarez , Ashish Shah , Takashi Shimizu
发明人： Amir Al-Bayati , Lester D'Cruz , Alexandros Demos , Dale Dubois , Khaled Elsheref , Naoyuki Iwasaki , Hichem M'Saad , Juan Rocha-Alvarez , Ashish Shah , Takashi Shimizu
IPC分类号： C23F1/00 , B44C1/22
CPC分类号： H01J37/317 , B23K15/00 , C23F4/00 , H01J37/026 , H01J37/20 , H01J2237/004 , H01J2237/0044 , H01J2237/2001 , H01J2237/304 , H01J2237/3156 , H01J2237/316 , H01J2237/3165 , H01L21/67115
摘要： Methods and apparatus for electron beam treatment of a substrate are provided. An electron beam apparatus that includes a vacuum chamber, at least one thermocouple assembly in communication with the vacuum chamber, a heating device in communication with the vacuum chamber, and combinations thereof are provided. In one embodiment, the vacuum chamber comprises an electron source wherein the electron source comprises a cathode connected to a high voltage source, an anode connected to a low voltage source, and a substrate support. In another embodiment, the vacuum chamber comprises a grid located between the anode and the substrate support. In one embodiment the heating device comprises a first parallel light array and a second light array positioned such that the first parallel light array and the second light array intersect. In one embodiment the thermocouple assembly comprises a temperature sensor made of aluminum nitride.
摘要翻译：提供了用于基板的电子束处理的方法和装置。提供了一种电子束装置，其包括真空室，至少一个与真空室连通的热电偶组件，与真空室连通的加热装置及其组合。在一个实施例中，真空室包括电子源，其中电子源包括连接到高电压源的阴极，连接到低电压源的阳极和衬底支撑件。在另一个实施例中，真空室包括位于阳极和基板支撑件之间的格栅。在一个实施例中，加热装置包括第一平行光阵列和第二光阵列，其定位成使得第一平行光阵列和第二光阵列相交。在一个实施例中，热电偶组件包括由氮化铝制成的温度传感器。

12. 发明申请

US20060251827A1 TANDEM UV CHAMBER FOR CURING DIELECTRIC MATERIALS 审中-公开
标题翻译：用于固化电介质的TANDEM紫外线灯
公开(公告)号：US20060251827A1
公开(公告)日：2006-11-09
申请号：US11124908
申请日：2005-05-09
申请人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
发明人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
IPC分类号： B05D3/06 , B05B5/00
CPC分类号： B05D3/067 , B05D3/0209 , B05D3/0493 , H01L21/31058
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译：紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。紫外光可以在固化过程中被脉冲。使用远程生成的氧自由基/臭氧和/或原位实现清洁室。灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。

13. 发明申请

US20060249078A1 HIGH EFFICIENCY UV CURING SYSTEM 有权
标题翻译：高效UV固化系统
公开(公告)号：US20060249078A1
公开(公告)日：2006-11-09
申请号：US11424368
申请日：2006-06-15
申请人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
发明人： Thomas Nowak , Juan Rocha-Alvarez , Andrzej Kaszuba , Scott Hendrickson , Dustin Ho , Sanjeev Baluja , Tom Cho , Josephine Chang , Hichem M'Saad
IPC分类号： B05D3/06 , B01J3/04 , C23C16/00
CPC分类号： B05D3/067 , B05D3/0209 , B05D3/0493 , H01L21/31058
摘要： An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.
摘要翻译：紫外线（UV）固化室可固化设置在基底上的电介质材料并进行原位清洁。串联处理室提供由覆盖有盖的主体限定的两个单独的和相邻的过程区域，所述盖子具有分别位于每个处理区域上方的窗口。每个处理区域的一个或多个UV灯泡被耦合到盖的壳体覆盖，将通过窗口的UV光发射到位于处理区域内的衬底上。 UV灯泡可以是利用诸如微波或射频的源的发光二极管或灯泡阵列。紫外光可以在固化过程中被脉冲。使用远程生成的氧自由基/臭氧和/或原位实现清洁室。灯阵列的使用，基板和灯头的相对运动以及灯反射器形状和/或位置的实时修改可以增强基板照明的均匀性。

14. 发明申请

US20050263072A1 Uniformity control for low flow process and chamber to chamber matching 有权
标题翻译：低流量和室到室匹配的均匀性控制
公开(公告)号：US20050263072A1
公开(公告)日：2005-12-01
申请号：US11130554
申请日：2005-05-16
申请人： Ganesh Balasubramanian , Juan Rocha-Alvarez , Tom Cho , Daemian Raj
发明人： Ganesh Balasubramanian , Juan Rocha-Alvarez , Tom Cho , Daemian Raj
IPC分类号： C23C16/00 , C23C16/44 , C23C16/455
CPC分类号： C23C16/4405 , C23C16/45565 , C23C16/45574
摘要： Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the apparatus includes a gas distribution plate having a plurality of apertures disposed therethrough and a blocker plate having both a plurality of apertures disposed therethrough and a plurality of feed through passageways disposed therein. A first gas pathway delivers a first gas through the plurality of apertures in the blocker plate with sufficient pressure drop to more evenly distribute the gases prior to passing through the gas distribution plate. A bypass gas pathway delivers a second gas through the plurality of feed through passageways in the blocker plate and to areas around the blocker plate prior to the second gas passing through the gas distribution plate.
摘要翻译：公开了将气体分配到处理室中的装置和方法。在一个实施例中，该装置包括一个气体分配板，该气体分配板具有穿过其中的多个孔，以及一个阻挡板，其具有设置在其间的多个孔和设置在其中的多个进给通道。第一气体通道以足够的压降将阻塞板中的多个孔中的第一气体输送，以在通过气体分布板之前更均匀地分布气体。旁路气体通道在第二气体通过气体分配板之前，通过多个进料通过阻挡板中的通道和阻塞板周围的区域输送第二气体。

15. 发明申请

US20060225767A1 METHOD AND APPARATUS FOR CLEANING A CVD CHAMBER 失效
公开(公告)号：US20060225767A1
公开(公告)日：2006-10-12
申请号：US11424959
申请日：2006-06-19
申请人： Maosheng Zhao , Juan Rocha-Alvarez , Inna Shmurun , Soova Sen , Mao Lim , Shankar Venkataraman , Ju-Hyung Lee
发明人： Maosheng Zhao , Juan Rocha-Alvarez , Inna Shmurun , Soova Sen , Mao Lim , Shankar Venkataraman , Ju-Hyung Lee
IPC分类号： B08B6/00 , B08B9/00
CPC分类号： C23C16/4405 , C23C16/458 , C23C16/46 , H01J37/32082 , H01J37/32862 , H01L21/67103
摘要： The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.

16. 发明申请

US20060231205A1 METHOD AND APPARATUS FOR CLEANING A CVD CHAMBER 失效
公开(公告)号：US20060231205A1
公开(公告)日：2006-10-19
申请号：US11426154
申请日：2006-06-23
申请人： Maosheng Zhao , Juan Rocha-Alvarez , Inna Shmurun , Soova Sen , Mao Lim , Shankar Venkataraman , Ju-Hyung Lee
发明人： Maosheng Zhao , Juan Rocha-Alvarez , Inna Shmurun , Soova Sen , Mao Lim , Shankar Venkataraman , Ju-Hyung Lee
IPC分类号： H01L21/306 , C23F1/00
CPC分类号： C23C16/4405 , C23C16/458 , C23C16/46 , H01J37/32082 , H01J37/32862 , H01L21/67103
摘要： The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.

17. 发明申请

US20050252447A1 Gas blocker plate for improved deposition 审中-公开
标题翻译：阻气板用于改善沉积
公开(公告)号：US20050252447A1
公开(公告)日：2005-11-17
申请号：US10843839
申请日：2004-05-11
申请人： Maosheng Zhao , Juan Rocha-Alvarez
发明人： Maosheng Zhao , Juan Rocha-Alvarez
IPC分类号： C23C16/00 , H01J37/32
CPC分类号： H01J37/3244 , C23C16/45565
摘要： Embodiments of the present invention are directed to a blocker for a gas distribution system for use in semiconductor deposition apparatus. The gas distribution system includes a faceplate having a plurality of faceplate apertures to distribute a gas flow onto a surface of a substrate disposed downstream of the faceplate for film deposition on the substrate; and a blocker disposed upstream of the faceplate. The blocker includes a generally planar blocker surface facing the faceplate and a side wall disposed around a periphery of the blocker surface. The blocker surface includes a plurality of blocker holes to permit gas flow therethrough to the faceplate. The side wall is disposed near an edge of the faceplate and includes a plurality of side apertures to permit gas flow therethrough to the faceplate.
摘要翻译：本发明的实施例涉及一种用于半导体沉积设备中的气体分配系统的阻断器。气体分配系统包括具有多个面板孔的面板，以将气流分布到设置在面板下游的衬底的表面上，用于在衬底上沉积膜; 以及设置在面板上游的阻挡器。阻挡器包括面向面板的大致平面的阻挡面，以及围绕阻挡面的周边设置的侧壁。阻挡表面包括多个阻挡孔，以允许气体流过面板。侧壁设置在面板的边缘附近，并且包括多个侧孔，以允许气体流过面板。

18. 发明申请

US20070286963A1 APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO A ROTATING IRRADIANCE PATTERN OF UV RADIATION 有权
标题翻译：将基材暴露于紫外线辐射的旋转辐照图案的装置和方法
公开(公告)号：US20070286963A1
公开(公告)日：2007-12-13
申请号：US11686881
申请日：2007-03-15
申请人： Juan Rocha-Alvarez , Thomas Nowak , Dale Du Bois , Sanjeev Baluja , Scott Hendrickson , Dustin Ho , Andrzei Kaszuba , Tom Cho
发明人： Juan Rocha-Alvarez , Thomas Nowak , Dale Du Bois , Sanjeev Baluja , Scott Hendrickson , Dustin Ho , Andrzei Kaszuba , Tom Cho
IPC分类号： C08F2/48 , B01J19/08
CPC分类号： B05D3/0209 , B05D3/0493 , B05D3/067 , H01L21/31058 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译：本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。还公开了其他实施例。

19. 发明申请

US20070257205A1 APPARATUS AND METHOD FOR TREATING A SUBSTRATE WITH UV RADIATION USING PRIMARY AND SECONDARY REFLECTORS 有权
标题翻译：用初级和次级反射器处理具有紫外线辐射的基板的装置和方法
公开(公告)号：US20070257205A1
公开(公告)日：2007-11-08
申请号：US11686878
申请日：2007-03-15
申请人： Juan Rocha-Alvarez , Thomas Nowak , Dale Du Bois , Sanjeev Baluja , Scott Hendrickson , Dustin Ho , Andrzei Kaszuba , Tom Cho
发明人： Juan Rocha-Alvarez , Thomas Nowak , Dale Du Bois , Sanjeev Baluja , Scott Hendrickson , Dustin Ho , Andrzei Kaszuba , Tom Cho
IPC分类号： B01J19/08
CPC分类号： B05D3/067
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译：本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。还公开了其他实施例。

20. 发明申请

US20070228289A1 APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO UV RADIATION WHILE MONITORING DETERIORATION OF THE UV SOURCE AND REFLECTORS 有权
标题翻译：用于在紫外线源和反射器的监测下，将基底暴露于紫外线辐射的装置和方法
公开(公告)号：US20070228289A1
公开(公告)日：2007-10-04
申请号：US11686897
申请日：2007-03-15
申请人： Andrzei Kaszuba , Juan Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ndanka Mukuti
发明人： Andrzei Kaszuba , Juan Rocha-Alvarez , Thomas Nowak , Sanjeev Baluja , Ndanka Mukuti
IPC分类号： G21G5/00
CPC分类号： B05D3/067 , B29C71/04 , B29C2035/0827 , F26B3/28 , H01L21/67115
摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.
摘要翻译：本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。还公开了其他实施例。

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