专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明申请

US20090040496A1 MICROLITHOGRAPHIC EXPOSURE METHOD AS WELL AS A PROJECTION EXPOSURE SYSTEM FOR CARRYING OUT THE METHOD 有权
标题翻译：作为实施方法的投影曝光系统的微观曝光方法
公开(公告)号：US20090040496A1
公开(公告)日：2009-02-12
申请号：US12177715
申请日：2008-07-22
申请人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf GRUNER , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

12. 发明授权

US07408616B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07408616B2
公开(公告)日：2008-08-05
申请号：US10949396
申请日：2004-09-27
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/42
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

13. 发明申请

US20060061886A1 System for setting and maintaining a gas atmosphere in an optical system 审中-公开
标题翻译：用于在光学系统中设置和维持气体气氛的系统
公开(公告)号：US20060061886A1
公开(公告)日：2006-03-23
申请号：US11247925
申请日：2005-10-11
申请人： Bernhard Gellrich , Nils Dieckmann
发明人： Bernhard Gellrich , Nils Dieckmann
IPC分类号： G02B7/02
CPC分类号： G03F7/70916 , G03F7/70933
摘要： Arranged in a system for setting and maintaining a gas atmosphere in an objective having at least one optical element is a first, inner gas compartment that is separated from a second, outer gas compartment by an inner casing. Both gas compartments are provided with gas inlet and gas outlet openings. At least one of the two gas compartments is under a pressure that is higher than the ambient pressure.
摘要翻译：布置在用于在具有至少一个光学元件的物镜中设置和维持气体气氛的系统中，是通过内壳与第二外部气体隔室分离的第一内部气体隔室。两个气室都设有气体入口和气体出口。两个气体室中的至少一个处于高于环境压力的压力下。

14. 发明申请

US20090323043A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：US20090323043A1
公开(公告)日：2009-12-31
申请号：US12509738
申请日：2009-07-27
申请人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
发明人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
IPC分类号： G03B27/72
CPC分类号： G03F7/70191
摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.
摘要翻译：微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器。可以确定透射率分布，使得其具有对椭圆率的场依赖校正效应。在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

15. 发明授权

US06985218B2 Method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus 失效
标题翻译：确定在投影曝光装置中照射物体的光的角度分布的特征的至少一个参数的方法
公开(公告)号：US06985218B2
公开(公告)日：2006-01-10
申请号：US10855252
申请日：2004-05-27
申请人： Nils Dieckmann
发明人： Nils Dieckmann
IPC分类号： G01J1/00
CPC分类号： G03F7/70058 , G03F7/70066 , G03F7/70075 , G03F7/70133 , G03F7/70141 , G03F7/70191 , G03F7/70591
摘要： A method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus is described. This parameter may be, for example, a pupil asymmetry. The method comprises the step of inserting a filter element in or in close proximity of a pupil plane of an illumination system that is arranged between a light source and the object. The filter element has a filter function that varies in an azimuthal direction with respect to the optical axis of the illumination system. Then the intensity of the light in a plane downstream of the pupil plane is measured. After rotating the filter element around the optical axis by an angle Φ, the measurement of the intensity is repeated. From the filter function, the angle Φ and the measured intensities the parameter is measured.
摘要翻译：描述了确定在投影曝光设备中照射物体的光的角度分布的特征的至少一个参数的方法。该参数可以是例如瞳孔不对称。该方法包括将滤光器元件插入在与光源和物体之间布置的照明系统的光瞳平面中或其附近的步骤。滤光元件具有相对于照明系统的光轴在方位角方向上变化的滤光器功能。然后测量瞳孔平面下游平面中光的强度。在将滤光器元件围绕光轴旋转角度Phi之后，重复测量强度。从滤波函数，测量角度Phi和测量的强度参数。

16. 发明授权

US06636367B2 Projection exposure device 失效
公开(公告)号：US06636367B2
公开(公告)日：2003-10-21
申请号：US09955921
申请日：2001-09-19
申请人： Ulrich Drodofsky , Nils Dieckmann , Martin Antoni , Hans-Joachim Miesner
发明人： Ulrich Drodofsky , Nils Dieckmann , Martin Antoni , Hans-Joachim Miesner
IPC分类号： G02B702
CPC分类号： G03F7/70133 , G03F7/70141
摘要： A projection exposure device (1), in particular for micro-lithography, serves to produce an image of an object (2) in an image plane (11) positioned in an object plane (10). For this reason the projection exposure device (1) has a radiation source (4) emitting projection radiation (5). Illumination optics (6) are positioned between the radiation source (4) and the object plane (10) and projection optics (8) are positioned between the object plane (10) and the image plane (11). A detection device (30) is provided to measure the illumination angle distribution of the projection radiation (5) in a field plane (10). This communicates via at least one control device (34, 18) with at least one manipulator (20, 45, 47). The latter serves to move at least one optical component (7, 41) within the projection ray path (5, 9). The illumination angle distribution changes as a result of the controlled movement of the optical component (7, 41). This can therefore be adjusted depending on the measurement result and for example adapted to the object structure.

17. 发明授权

US09116441B2 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统
公开(公告)号：US09116441B2
公开(公告)日：2015-08-25
申请号：US13438179
申请日：2012-04-03
申请人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
发明人： Nils Dieckmann , Manfred Maul , Christian Hettich , Oliver Natt
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20
CPC分类号： G03F7/70191
摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane. The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.
摘要翻译：微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器。可以确定透射率分布，使得其具有对椭圆率的场依赖校正效果。在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

18. 发明申请

US20110285979A1 PROJECTION OBJECTIVE WITH DIAPHRAGMS 有权
标题翻译：投影目标与石墨片
公开(公告)号：US20110285979A1
公开(公告)日：2011-11-24
申请号：US13107011
申请日：2011-05-13
申请人： Nils Dieckmann , Alexander Wolf , Christian Holland , Ulrich Loering , Franz Sorg
发明人： Nils Dieckmann , Alexander Wolf , Christian Holland , Ulrich Loering , Franz Sorg
IPC分类号： G03B27/72 , G02B17/08 , G02B27/18
CPC分类号： G03F7/70941 , G02B27/0043
摘要： A projection objective for imaging an object arranged in an object plane of the projection objective into an image of the object lying in an image plane of the projection objective has a multiplicity of transparent optical elements and holding devices for holding the optical elements at prescribable positions along an imaging beam path of the projection objective. Each of the optical elements has an optical useful region lying in the imaging beam path and an edge region lying outside the optical useful region. At least one holding element of the holding device assigned to the optical element acts at the edge region in the region of a contact zone. At least one of the optical elements is assigned a diaphragm arrangement with a false light diaphragm arranged directly upstream of the optical element and a second false light diaphragm arranged directly downstream of the optical element. Each of the false light diaphragms is fashioned in such a way that the false light diaphragm screens at least a part of the edge region against radiation running outside the imaging beam path.
摘要翻译：用于将布置在投影物镜的物平面中的物体成像为位于投影物镜的像平面中的物体的图像的投影物镜具有多个透明光学元件和用于将光学元件保持在规定位置的保持装置投影物镜的成像光束路径。每个光学元件具有位于成像光束路径中的光学有用区域和位于光学有用区域外部的边缘区域。分配给光学元件的保持装置的至少一个保持元件作用在接触区域的边缘区域。至少一个光学元件被分配有具有布置在光学元件的正上游的假光膜的膜片装置和直接布置在光学元件的下游的第二假光膜。每个假光隔膜以这样的方式形成，使得假光隔膜将至少一部分边缘区域屏蔽到抵抗在成像光束路径外部运行的辐射。

19. 发明授权

US06936825B2 Process for the decontamination of microlithographic projection exposure devices 失效
标题翻译：微光刻投影曝光装置去污的方法
公开(公告)号：US06936825B2
公开(公告)日：2005-08-30
申请号：US09754841
申请日：2001-01-03
申请人： Michael Gerhard , Nils Dieckmann , Christine Sieler , Marcus Zehetbauer , Martin Schriever , Gerd Reisinger
发明人： Michael Gerhard , Nils Dieckmann , Christine Sieler , Marcus Zehetbauer , Martin Schriever , Gerd Reisinger
IPC分类号： B08B7/00 , G03F7/20 , H01L21/027 , G01N21/01 , G01N21/51
CPC分类号： G03F7/70883 , B08B7/0057 , G03F7/7005 , G03F7/70925
摘要： UV light and a fluid are used in a process for the decontamination of microlithographic projection exposure devices with optical elements or portions thereof, in particular of the surfaces of optical elements. A second UV light source is directed for decontamination, in intervals between exposures, toward at least a portion of the optical elements.
摘要翻译： UV光和流体用于具有光学元件或其部分，特别是光学元件的表面的微光刻投影曝光装置的净化过程中。第二UV光源被引导用于在曝光之间的间隔中朝向至少一部分光学元件的净化。

20. 发明申请

US20050117203A1 Method for producing an optical element from a quartz substrate 审中-公开
标题翻译：从石英基板制造光学元件的方法
公开(公告)号：US20050117203A1
公开(公告)日：2005-06-02
申请号：US10985488
申请日：2004-11-10
申请人： Nils Dieckmann , Kirstin Becker , Dieter Bader
发明人： Nils Dieckmann , Kirstin Becker , Dieter Bader
IPC分类号： G02B5/18 , G03F7/20 , H01L21/027 , G03B27/54 , G02B1/00 , G02B5/02 , G02B13/20 , G02B27/42 , G03B27/72 , G03F7/40
CPC分类号： G03F7/70075 , G02B5/1838 , G02B5/1857 , G03F7/70158 , G03F7/70958
摘要： In a method for producing an optical element from a quartz substrate for illumination systems with illumination sources which emit beams of wavelength 157 nm or shorter, the quartz substrate is joined to a support body on at least one side. Subsequently, from the quartz substrate material is removed to a desired value with a thickness in the μ region. The optical element can be a diffractive optical element or diffusion plate.
摘要翻译：在从具有发射波长为157nm或更短的光束的照明源的照明系统的石英基板制造光学元件的方法中，石英基板在至少一侧与支撑体接合。随后，从石英衬底材料中去除具有μ区域厚度的期望值。光学元件可以是衍射光学元件或扩散板。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式