会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 12. 发明授权
    • Method for forming an electronic device
    • 电子设备的形成方法
    • US08097400B2
    • 2012-01-17
    • US11062384
    • 2005-02-22
    • Warren JacksonCarl TaussigPing Mei
    • Warren JacksonCarl TaussigPing Mei
    • G03F7/20
    • G03F7/0002B82Y10/00B82Y40/00
    • Provided is a low cost system and method for forming electronic devices, especially large surface area devices. The process of imprint lithography is combined with alternate manufacturing techniques to fabricate the devices. Initially, a template imprints a three-dimensional pattern into a resist layer deposited on a flexible substrate. The resist layer is cured using ultraviolet light or other curing techniques. After curing, the 3-D pattern is modified using one of several techniques to include inkjetting, electrodeposition or laser patterning. In one embodiment, a semi-fluid material may be jetted into channels formed in the pattern, thereby forming conductive or insulating lead lines. Alternatively, a two-dimensional pattern may be jetted onto the resist layer. Final processing may include multiple etch-mask-etch steps. The integration of techniques into a single system provides a low cost, efficient method for manufacturing high quality, large surface area electronic devices.
    • 提供一种用于形成电子装置,特别是大型表面积装置的低成本系统和方法。 压印光刻的过程与替代制造技术相结合以制造器件。 最初,模板将三维图案印刷到沉积在柔性基板上的抗蚀剂层中。 使用紫外线或其他固化技术固化抗蚀剂层。 固化后,使用几种技术之一来修改3-D图案,以包括喷墨,电沉积或激光图案化。 在一个实施例中,可以将半流体材料喷射到在图案中形成的通道中,从而形成导电或绝缘导线。 或者,可以将二维图案喷射到抗蚀剂层上。 最终处理可以包括多个蚀刻掩模蚀刻步骤。 将技术整合到单个系统中提供了用于制造高质量,大表面积电子器件的低成本,有效的方法。
    • 15. 发明申请
    • Method for forming an electronic device
    • 电子设备的形成方法
    • US20060188823A1
    • 2006-08-24
    • US11062384
    • 2005-02-22
    • Warren JacksonCarl TaussigPing Mei
    • Warren JacksonCarl TaussigPing Mei
    • G03F7/00
    • G03F7/0002B82Y10/00B82Y40/00
    • Provided is a low cost system and method for forming electronic devices, especially large surface area devices. The process of imprint lithography is combined with alternate manufacturing techniques to fabricate the devices. Initially, a template imprints a three-dimensional pattern into a resist layer deposited on a flexible substrate. The resist layer is cured using ultraviolet light or other curing techniques. After curing, the 3-D pattern is modified using one of several techniques to include inkjetting, electrodeposition or laser patterning. In one embodiment, a semi-fluid material may be jetted into channels formed in the pattern, thereby forming conductive or insulating lead lines. Alternatively, a two-dimensional pattern may be jetted onto the resist layer. Final processing may include multiple etch-mask-etch steps. The integration of techniques into a single system provides a low cost, efficient method for manufacturing high quality, large surface area electronic devices.
    • 提供一种用于形成电子装置,特别是大型表面积装置的低成本系统和方法。 压印光刻的过程与替代制造技术相结合以制造器件。 最初,模板将三维图案印刷到沉积在柔性基板上的抗蚀剂层中。 使用紫外线或其他固化技术固化抗蚀剂层。 固化后,使用几种技术之一来修改3-D图案,以包括喷墨,电沉积或激光图案化。 在一个实施例中,可以将半流体材料喷射到在图案中形成的通道中,从而形成导电或绝缘引线。 或者,可以将二维图案喷射到抗蚀剂层上。 最终处理可以包括多个蚀刻掩模蚀刻步骤。 将技术整合到单个系统中提供了用于制造高质量,大表面积电子器件的低成本,有效的方法。
    • 18. 发明授权
    • Addressing and sensing a cross-point diode memory array
    • US06567295B2
    • 2003-05-20
    • US09875496
    • 2001-06-05
    • Carl TaussigRichard Elder
    • Carl TaussigRichard Elder
    • G11C1706
    • G11C8/10G11C17/06G11C17/18
    • A memory circuit includes a cross-point memory array having first and second sets of transverse electrodes with respective memory elements formed at the crossing-points of the first and second set electrodes. Each of the memory elements is formed to include, in at least one of its binary states, a diode element. The memory circuit also includes an addressing circuit coupled to the memory array. The addressing circuit has a first set of address lines with first diode connections between the first set address lines and the first set memory array electrodes, with the first diode connections coupling each memory array electrode in the first set to a respective unique subset of the first set address lines. The addressing circuit also has a second set of address lines with second diode connections between the second set address lines and the second set memory array electrodes, with the second diode connections coupling each memory array electrode in the second set to a respective unique subset of the second set address lines. The first and second diode connections form a permuted diode logic circuit whereby application of predetermined voltages to selected subsets of the first and second address lines enables unique addressing of a single memory element in the array. By sensing the current in the address lines the binary state of the addressed memory element may be determined. Also, by application of a writing voltage to the selected subsets of address lines, the binary state of a memory element can be changed by substantially and permanently changing the resistance thereof.