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    • 11. 发明申请
    • OPTICAL DEVICE AND METHOD OF MANUFACTURING THE SAME
    • 光学装置及其制造方法
    • US20160085174A1
    • 2016-03-24
    • US14891182
    • 2014-07-09
    • CANON KABUSHIKI KAISHA
    • Masayasu TeramuraTakeyoshi SaigaYu Miyajima
    • B41J2/385
    • G03G15/0415B41J2/447B41J2/45B41J2/451H04N1/036
    • Provided is an optical device capable of adjusting astigmatism due to a manufacturing error to attain excellent imaging performance while securing optical efficiency. The optical device includes: an imaging optical system including multiple lens arrays in an optical axis direction, the multiple lens arrays each including multiple lens units arrayed in a first direction perpendicular to the optical axis direction; a light source including multiple light-emitting points arrayed in the first direction; and first changing means for changing a first distance in the optical axis direction between the light source and one of the lens arrays, closest to the light source. The imaging optical system is configured to image the light source at equal magnification as an erecting image within a first cross-sectional plane, and image, within a second cross-sectional plane perpendicular to the first direction, the light source at a different magnification than at the first cross-sectional plane.
    • 提供一种光学装置,其能够由于制造误差而调节散光,以在确保光学效率的同时获得优异的成像性能。 光学装置包括:成像光学系统,其在光轴方向上具有多个透镜阵列,所述多个透镜阵列具有沿与所述光轴方向垂直的第一方向排列的多个透镜单元; 光源,其包括沿所述第一方向排列的多个发光点; 以及第一改变装置,用于改变光源与最靠近光源的一个透镜阵列之间的光轴方向上的第一距离。 成像光学系统被配置为以与第一横截面内的竖立图像相等的倍率成像光源,并且在垂直于第一方向的第二截面平面内的图像在与 在第一个横截面。
    • 12. 发明申请
    • EXPOSURE DEVICE AND IMAGE FORMING APPARATUS
    • 曝光装置和图像形成装置
    • US20150261119A1
    • 2015-09-17
    • US14433595
    • 2013-09-27
    • CANON KABUSHIKI KAISHA
    • Noa SumidaTakeyoshi SaigaYu MiyajimaNobutaka MizunoYojiro Matsuda
    • B41J2/385
    • G03G15/0409B41J2/451H01L51/50H04N1/02865H04N1/02895
    • An exposure device includes an element array that includes a plurality of organic electroluminescent elements and a lens array optical system that uses a lens array that includes a plurality of lenses, which forms images of light from the element array on a photosensitive body. In the exposure device, each electroluminescent element has a first electrode disposed on a light emitting side, a second electrode disposed on a light reflecting side, and a light emitting layer. In the exposure device, in each organic electroluminescent element, an optical path length L1 between a light emitting position of the light emitting layer and the second electrode is an optical path length within ±10% of an optical path length at which variation in light amount during light exposure is minimized.
    • 曝光装置包括包括多个有机电致发光元件的元件阵列和使用包括多个透镜的透镜阵列的透镜阵列光学系统,该透镜阵列在感光体上形成来自元件阵列的光的图像。 在曝光装置中,每个电致发光元件具有设置在发光侧的第一电极,设置在光反射侧的第二电极和发光层。 在曝光装置中,在各有机电致发光元件中,发光层的发光位置与第二电极之间的光路长度L1为光路长度的±10%以内的光程长度, 在曝光期间最小化。
    • 13. 发明授权
    • Lens array, imaging apparatus, and image reading apparatus
    • 透镜阵列,成像装置和图像读取装置
    • US08873114B2
    • 2014-10-28
    • US14139652
    • 2013-12-23
    • Canon Kabushiki Kaisha
    • Yu Miyajima
    • H04N1/04H04N1/46G02B5/32H01L31/00B41J2/435G02B3/00
    • G02B3/0037
    • A lens array including: a plurality of imaging portions arrayed in a first direction; wherein each of the plurality of imaging portions includes a first optical system configured to form an intermediate image of an object and a second optical system configured to re-form the intermediate image of the object in a first cross section parallel to the first direction and a direction of optical axes of the imaging portions, and wherein in each of the plurality of imaging portions, an optical flux from an object height at which a light available efficiency becomes 90% is restricted by at least one of a first aperture surface of the first optical system and a second aperture surface of the second optical system, and the optical flux from an object height at which the light available efficiency becomes 10% is restricted by the aperture surface which restricts the optical flux from the object height at which the light available efficiency becomes 90%.
    • 一种透镜阵列,包括:沿第一方向排列的多个成像部分; 其中所述多个成像部分中的每一个包括构造成形成物体的中间图像的第一光学系统和被配置为在平行于所述第一方向的第一横截面中重新形成所述物体的中间图像的第二光学系统,以及 成像部分的光轴的方向,并且其中在多个成像部分的每一个中,从光可获得效率变为90%的物体高度的光通量由第一孔径的第一孔径表面中的至少一个限制 光学系统和第二光学系统的第二孔径表面,并且来自光可用效率变为10%的物体高度的光通量被限制光束从可用光的物体高度的孔径面限制 效率达到90%。